H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
10/2011
10/13/2011	WO2011126973A2 Forming metal filled die back-side film for electromagnetic interference shielding with coreless packages
10/13/2011	WO2011126914A1 Seed layer deposition in microscale features
10/13/2011	WO2011126820A2 Non-contact detection of surface fluid droplets
10/13/2011	WO2011126770A2 Ldmos with no reverse recovery
10/13/2011	WO2011126766A1 A pre-lamination core and method for making a pre-lamination core for electronic cards and tags
10/13/2011	WO2011126761A2 Two step poly etch ldmos gate formation
10/13/2011	WO2011126748A2 Depositing conformal boron nitride films
10/13/2011	WO2011126726A1 Electrically bonded arrays of transfer printed active components
10/13/2011	WO2011126680A2 Methods of forming a plurality of spaced features
10/13/2011	WO2011126649A2 Use of laser energy transparent stop layer to achieve minimal debris generation in laser scribing a multilayer patterned workpiece
10/13/2011	WO2011126621A2 Inorganic rapid alternating process for silicon etch
10/13/2011	WO2011126618A2 4-transistor non-volatile memory cell with pmos-nmos-pmos-nmos structure
10/13/2011	WO2011126612A2 Nitrogen doped amorphous carbon hardmask
10/13/2011	WO2011126610A2 Interferometric encoder systems
10/13/2011	WO2011126609A2 Semiconductor device and method
10/13/2011	WO2011126602A1 Side pad design for edge pedestal
10/13/2011	WO2011126553A1 Apparatus and method for depositing alkali metals
10/13/2011	WO2011126528A1 Virtual substrates for epitaxial growth and methods of making the same
10/13/2011	WO2011126471A2 System and method for providing symmetric, efficient bi-directional power flow and power conditioning
10/13/2011	WO2011126438A1 Free form printing of silicon micro- and nanostructures
10/13/2011	WO2011126307A2 Pad pattern repair apparatus
10/13/2011	WO2011126292A2 Method for repairing cnt-antistatic-processed working stage
10/13/2011	WO2011126232A2 Atomic force microscope
10/13/2011	WO2011126145A1 Process for producing epitaxial single-crystal silicon carbide substrate and epitaxial single-crystal silicon carbide substrate obtained by the process
10/13/2011	WO2011126131A1 Pattern forming method and process for producing pattern substrates
10/13/2011	WO2011126101A1 Curable composition for imprints and producing method of polymerizable monomer for imprints
10/13/2011	WO2011126093A1 Oxide for semiconductor layer of thin film transistor, sputtering target, and thin film transistor
10/13/2011	WO2011126076A1 Thin-film transistor substrate
10/13/2011	WO2011126073A1 Wire material for saw wire and method for producing same
10/13/2011	WO2011126044A1 Production method and production device for article having microrelief structure on surface thereof
10/13/2011	WO2011125977A1 Cleaning method, device manufacturing method, exposure apparatus, and device manufacturing system
10/13/2011	WO2011125975A1 Filter box, exposure device, and device production method
10/13/2011	WO2011125974A1 Filter apparatus, filter housing method, and exposure device
10/13/2011	WO2011125973A1 Filter holder, exposure device, and device production method
10/13/2011	WO2011125970A1 Active energy ray-curable resin composition, nano ridge/groove structure using same and production method for said structure, and water repellent article provided with nano ridge/groove structure
10/13/2011	WO2011125940A1 Thin-film transistor and method for manufacturing the same
10/13/2011	WO2011125935A1 Semiconductor device and manufacturing method thereof
10/13/2011	WO2011125928A1 Semiconductor device and method for manufacturing same
10/13/2011	WO2011125925A1 Inspection method and device therefor
10/13/2011	WO2011125827A1 Light source apparatus, optical apparatus, exposure apparatus, device manufacturing method, illuminating method, exposure method, and method for manufacturing optical apparatus
10/13/2011	WO2011125806A1 Manufacturing method of semiconductor device
10/13/2011	WO2011125803A1 Interconnect structure
10/13/2011	WO2011125802A1 Wiring structure, display device and semiconductor device
10/13/2011	WO2011125800A1 Curable composition for nanoimprint, semiconductor element, and nanoimprint method
10/13/2011	WO2011125778A1 Adhesive composition, bonding sheet, and semiconductor device
10/13/2011	WO2011125754A1 Method for manufacturing ferroelectric device
10/13/2011	WO2011125733A1 Film-forming apparatus
10/13/2011	WO2011125712A1 Adhesive composition, adhesive sheet, and method for producing semiconductor device
10/13/2011	WO2011125711A1 Sheet for forming resin film for chip, and method for manufacturing semiconductor chip
10/13/2011	WO2011125705A1 Plasma nitriding treatment method and plasma nitriding treatment device.
10/13/2011	WO2011125704A1 Plasma processing device and plasma processing method
10/13/2011	WO2011125703A1 Plasma nitridization method
10/13/2011	WO2011125691A1 Resin composition for use in an organic thin-film transistor insulation layer, overcoat insulation layer, and organic thin-film transistor
10/13/2011	WO2011125690A1 Composition, containing a fluorine organic compound solvent, for use in an organic thin-film transistor insulation layer
10/13/2011	WO2011125686A1 Radiation-sensitive resin composition and polymer
10/13/2011	WO2011125685A1 Radiation-sensitive resin composition
10/13/2011	WO2011125684A1 Radiation-sensitive resin composition, resist pattern formation method, polymer and compound
10/13/2011	WO2011125683A1 Adhesive sheet for semiconductor wafer processing
10/13/2011	WO2011125655A1 Paste composition for solar cell, method for producing same, and solar cell
10/13/2011	WO2011125654A1 Heating control system, deposition device provided therewith, and temperature control method
10/13/2011	WO2011125605A1 Mask pattern formation method and manufacturing method for semiconductor device
10/13/2011	WO2011125571A1 Resist developer, method for forming a resist pattern and method for manufacturing a mold
10/13/2011	WO2011125570A1 Donor substrate for transfer, device manufacturing method and organic el element
10/13/2011	WO2011125550A1 Nitriding treatment method and nitriding treatment device
10/13/2011	WO2011125532A1 Molded oxide and process for producing same
10/13/2011	WO2011125524A1 Dielectric window for plasma processing device, plasma processing device, and method for attaching dielectric window for plasma processing device
10/13/2011	WO2011125514A1 Etching method and device
10/13/2011	WO2011125492A1 Semiconductor device manufacturing method
10/13/2011	WO2011125471A1 Plasma processing device and plasma processing method
10/13/2011	WO2011125470A1 Plasma processing device and plasma processing method
10/13/2011	WO2011125456A1 Semiconductor device
10/13/2011	WO2011125434A1 Electronic device
10/13/2011	WO2011125432A1 Semiconductor memory device
10/13/2011	WO2011125420A1 Periphery exposure apparatus and periphery exposure method
10/13/2011	WO2011125407A1 Photomask unit and method of manufacturing same
10/13/2011	WO2011125401A1 Exposure method and exposure device
10/13/2011	WO2011125395A1 Process for production of semiconductor device, method for treatment of substrate, and device for treatment of substrate
10/13/2011	WO2011125394A1 Vacuum processing device, substrate processing method, and low-dielectric constant film manufacturing device
10/13/2011	WO2011125353A1 Circuit board, display device, and method for manufacturing circuit board
10/13/2011	WO2011125335A1 Pattern forming method and pattern substrate manufacturing method
10/13/2011	WO2011125305A1 Silicon epitaxial wafer, method for manufacturing silicon epitaxial wafer, and method for manufacturing semiconductor element or integrated circuit
10/13/2011	WO2011125298A1 Flat plate conveying device and method for conveying flat plate
10/13/2011	WO2011125291A1 Homoadamantane derivative, method for producing same, and photosensitive material for photoresist
10/13/2011	WO2011125282A1 Silicon epitaxial wafer and method for producing the same, as well as bonded soi wafer and method for producing the same
10/13/2011	WO2011125279A1 Nitride semiconductor element and manufacturing method therefor
10/13/2011	WO2011125275A1 Thin film transistor substrate and method for manufacturing same
10/13/2011	WO2011125260A1 θZ DRIVE APPARATUS AND STAGE APPARATUS
10/13/2011	WO2011125254A1 Polishing slurry and polishing method therefor
10/13/2011	WO2011125235A1 Semiconductor device
10/13/2011	WO2011125230A1 Semiconductor device, and method and program for testing semiconductor device
10/13/2011	WO2011125191A1 Probe and manufacturing method for same
10/13/2011	WO2011125156A1 Semiconductor device provided with semiconductor substrate having diode region and igbt region
10/13/2011	WO2011125140A1 Connecting material, semiconductor device, and process for producing same
10/13/2011	WO2011125043A1 Ldmos transistors for cmos technologies and an associated production method
10/13/2011	WO2011125036A1 P-type oxide alloys based on copper oxides, tin oxides, tin-copper alloy oxides and metal alloy thereof, and nickel oxide, with embedded metals thereof, fabrication process and use thereof
10/13/2011	WO2011124997A1 Substrate for epitaxial growth
10/13/2011	WO2011124855A1 Ram memory cell comprising a transistor
10/13/2011	WO2011124205A2 Package for metal-ceramic substrate, and method for packaging such substrates
10/13/2011	WO2011124091A1 Silicon wafer alignment method applied to through silicon via interconnection
10/13/2011	WO2011124088A1 Gate stack structure, semiconductor device, and methods for manufacturing them

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