Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
05/2012
05/29/2012US8187673 Methods utilizing scanning probe microscope tips and products thereof or produced thereby
05/29/2012US8187507 GaN crystal producing method, GaN crystal, GaN crystal substrate, semiconductor device and GaN crystal producing apparatus
05/29/2012US8187487 Material removal methods employing solutions with reversible ETCH selectivities
05/29/2012US8187485 Plasma processing apparatus including etching processing apparatus and ashing processing apparatus and plasma processing method using plasma processing apparatus
05/29/2012US8187483 Method to minimize CD etch bias
05/29/2012US8187416 Interior antenna for substrate processing chamber
05/29/2012US8187415 Plasma etch reactor with distribution of etch gases across a wafer surface and a polymer oxidizing gas in an independently fed center gas zone
05/29/2012US8187414 Anchoring inserts, electrode assemblies, and plasma processing chambers
05/29/2012US8187413 Electrode assembly and plasma processing chamber utilizing thermally conductive gasket
05/29/2012US8187412 Apparatus for providing device with gaps for capacitance reduction
05/29/2012US8187386 Temporally variable deposition rate of CdTe in apparatus and process for continuous deposition
05/29/2012US8187384 Vacuum processing apparatus
05/29/2012US8187379 Method of producing high quality relaxed silicon germanium layers
05/29/2012US8187377 Non-contact etch annealing of strained layers
05/29/2012US8187055 Polishing apparatus and polishing method
05/29/2012US8186300 Plasma processing apparatus
05/29/2012US8186045 Multilayer printed circuit board and multilayer printed circuit board manufacturing method
05/24/2012WO2012068428A2 Polishing pad comprising transmissive region
05/24/2012WO2012068417A1 Direct current ion implantation for solid phase epitaxial regrowth in solar cell fabrication
05/24/2012WO2012068323A2 Method for matching of patterns
05/24/2012WO2012068322A1 Semiconductor structure made using improved pseudo-simultaneous multiple ion implantation process
05/24/2012WO2012068206A2 Method for manufacturing a mos-field effect transistor
05/24/2012WO2012068088A1 Doping of planar or three-dimensional structures at elevated temperatures
05/24/2012WO2012068066A2 Ohmic contact to semiconductor
05/24/2012WO2012068039A1 Improved simultaneous multiple ion implantation process and apparatus semiconductor structure made using same
05/24/2012WO2012068034A1 Semiconductor structure made using improved multiple ion implantation process
05/24/2012WO2012067990A1 Microelectronic package with terminals on dielectric mass
05/24/2012WO2012067955A2 Methods for forming planarized hermetic barrier layers and structures formed thereby
05/24/2012WO2012067920A1 Double -gated dram transistors and methods of fabricating and operating the same
05/24/2012WO2012067919A1 Double gated fin transistors and methods of fabricating and operating the same
05/24/2012WO2012067917A1 Vertically stacked fin transistors and methods of fabricating and operating the same
05/24/2012WO2012067883A2 An adhesive material used for joining chamber components
05/24/2012WO2012067625A1 Shallow heavily doped semiconductor layer by cyclic selective epitaxial deposition process
05/24/2012WO2012067455A1 Thin film deposition method using silicon precursor compound
05/24/2012WO2012067332A1 Substrate-transfer apparatus and substrate-transfer method using same
05/24/2012WO2012067283A1 Method for manufacturing semiconductor thin film for electronic circuit
05/24/2012WO2012067246A1 Proximity exposure device and proximity exposure method
05/24/2012WO2012067239A1 Member for mounting and temperature controlled mounting device
05/24/2012WO2012067182A1 Organic semiconductor device
05/24/2012WO2012067162A1 Contact probe pin and test method
05/24/2012WO2012067161A1 Contact probe pin
05/24/2012WO2012067158A1 Film-like resin composition for sealing and filling semiconductor, method for manufacturing semiconductor device, and semiconductor device
05/24/2012WO2012067119A1 Method for producing solar cell
05/24/2012WO2012067118A1 Method for producing solar cell
05/24/2012WO2012067117A1 Method for producing solar cell
05/24/2012WO2012067112A1 Method for producing epitaxial silicon carbide single crystal substrate
05/24/2012WO2012067105A1 Silicon carbide substrate, and method for producing semi-conductor element and silicon carbide substrate
05/24/2012WO2012067085A1 Film-forming apparatus
05/24/2012WO2012067079A1 Silicon carbide substrate and semiconductor element
05/24/2012WO2012067060A1 Production method for thin film transistor, and display device containing thin film transistor produced thereby
05/24/2012WO2012067040A1 Resist underlayer film forming composition, and method for forming resist pattern using same
05/24/2012WO2012067033A1 Substrate drying apparatus and substrate drying method
05/24/2012WO2012067030A1 Electrode film, sputtering target, thin-film transistor, method for manufacturing thin-film transistor
05/24/2012WO2012067025A1 Method for cleaning silicon wafer and apparatus for cleaning silicon wafer
05/24/2012WO2012067015A1 METHOD FOR PRODUCING GaN FILM
05/24/2012WO2012067003A1 Circuit substrate and manufacturing method therefor
05/24/2012WO2012066977A1 Method for producing semiconductor device, method for substrate treatment, and device for substrate treatment
05/24/2012WO2012066941A1 Method for manufacturing semiconductor device
05/24/2012WO2012066894A1 Liquid composition for cleaning semiconductor substrate and method for cleaning semiconductor substrate using same
05/24/2012WO2012066892A1 Semiconductor device and manufacturing method therefor
05/24/2012WO2012066864A1 Double-side imprinting apparatus
05/24/2012WO2012066820A1 Silicon carbide semiconductor device
05/24/2012WO2012066803A1 Semiconductor element, semiconductor device, and method for manufacturing semiconductor element
05/24/2012WO2012066779A1 Apparatus for plasma treatment and method for plasma treatment
05/24/2012WO2012066761A1 Method of producing epitaxial wafer and the epitaxial wafer
05/24/2012WO2012066755A1 Thin-film transistor substrate, display device provided with same, and method for manufacturing thin-film transistor substrate
05/24/2012WO2012066752A1 Susceptor and method of manufacturing epitaxial wafer
05/24/2012WO2012066726A1 Tape adhesion device and tape adhesion method
05/24/2012WO2012066703A1 Semiconductor device and method for manufacturing same
05/24/2012WO2012066701A1 Nitride semiconductor device
05/24/2012WO2012066695A1 Semiconductor device and method for manufacturing same
05/24/2012WO2012066269A1 Semiconductor wafer comprising gallium nitride layer having one or more silicon nitride interlayer therein
05/24/2012WO2012066049A1 A method for forming a buried dielectric layer underneath a semiconductor fin
05/24/2012WO2012066033A1 Method for forming a buried metal layer structure
05/24/2012WO2012066021A1 Electronic device for radiofrequency or power applications and process for manufacturing such a device
05/24/2012WO2012066019A1 Replacement metal gate with borderless contact
05/24/2012WO2012065615A1 Method for determining the position of a rotation axis
05/24/2012WO2012065536A1 Semiconductor structure and method for forming the same
05/24/2012WO2012065515A1 Vdmos device and method for fabricating the same
05/24/2012WO2012065514A1 Ldmos device and method for fabricating the same
05/24/2012WO2012065485A1 Ldmos device and method for fabricating the same
05/24/2012WO2012065378A1 Semiconductor device and method for fabricating the same
05/24/2012WO2012065377A1 Semiconductor structure and manufacture method thereof
05/24/2012WO2012065370A1 Trench isolation structure and manufacturing method thereof
05/24/2012WO2012065369A1 Trench isolation structure and manufacturing method thereof
05/24/2012WO2012030380A3 Memory cell structures and methods
05/24/2012WO2012030379A3 Phase change memory structures and methods
05/24/2012WO2012024696A3 Laser treatment of a medium for microfluidics and various other applications
05/24/2012WO2012015967A3 Method and system for providing process tool correctables
05/24/2012WO2012015699A3 Selecting reference libraries for monitoring of multiple zones on a substrate
05/24/2012WO2012010662A3 Process for direct bonding two elements comprising copper portions and dielectric materials
05/24/2012WO2012009639A9 Aqueous cleaner for the removal of post-etch residues
05/24/2012WO2011162890A3 Mask design and opc for device manufacture
05/24/2012WO2011150879A3 Method for encapsulating component and structure thereof
05/24/2012WO2011128134A3 Method for producing a solar cell, and solar cell produced according to this method
05/24/2012WO2009111053A3 Buffer layer deposition for thin-film solar cells
05/24/2012US20120129988 Adhesive composition, adhesive sheet, circuit board and semiconductor device both produced using these, and processes for producing these
05/24/2012US20120129359 Laser processing method
05/24/2012US20120129358 Substrate processing apparatus and method of manufacturing semiconductor device
05/24/2012US20120129357 Two-dimensional patterning employing self-assembled material
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