| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 03/07/1990 | EP0357424A2 A wafer supporting apparatus |
| 03/07/1990 | EP0357423A2 An exposure apparatus |
| 03/07/1990 | EP0357396A2 Microlens arrays and methods of producing the same |
| 03/07/1990 | EP0357325A2 Positive working color proofing system comprising polyvinyl acetal/polyvinyl alcohol/polyvinyl acetate resin |
| 03/07/1990 | EP0357324A2 Optical brightener containing positive working color proofing system |
| 03/07/1990 | EP0357063A2 Photosensitive ceramic coating composition |
| 03/07/1990 | EP0356954A2 A plasticized polyvinyl alcohol release layer for a flexographic printing plate |
| 03/07/1990 | EP0356953A2 Aqueous processible photosensitive compositions containing core shell microgels |
| 03/07/1990 | EP0356952A2 Process for making flexographic plates with increased flexibility |
| 03/07/1990 | EP0209544B1 Graphic design article |
| 03/07/1990 | CN1040198A Photopolymerization sensitizers active at longer wavelengths |
| 03/06/1990 | US4907030 Image formation apparatus with a cartridge for a roll of photosensitive sheet |
| 03/06/1990 | US4907029 Uniform deep ultraviolet radiant source for sub micron resolution systems |
| 03/06/1990 | US4907028 Photo pressure sensitive recording medium and process for copying an image with said recording medium and apparatus for carrying out said process |
| 03/06/1990 | US4907021 Projection exposure apparatus |
| 03/06/1990 | US4906728 Acetal copolymers with backbone bromo functional groups |
| 03/06/1990 | US4906552 Two layer dye photoresist process for sub-half micrometer resolution photolithography |
| 03/06/1990 | US4906551 Process for the post-treatment of developed relief printing forms for use in flexographic printing |
| 03/06/1990 | US4906550 Method of producing polydiacetylene thin film |
| 03/06/1990 | US4906549 Positive-working photoresist composition with quinone diazide sulfonic acid ester and novolac made from m-cresol, p-cresol and aliphatic phenol with 2-6 carbon atoms |
| 03/06/1990 | US4906080 for use in a semiconductor device |
| 03/06/1990 | CA1266395A1 Developer compositions for lithographic plates |
| 03/01/1990 | DE3828513A1 Photoresist stripper contg. alkanolamine and di:methyl-imidazolidone - or di:methyl-tetra:hydro-pyrimidinone free from toxic hazard |
| 02/28/1990 | EP0355934A2 Photobleachable composites |
| 02/28/1990 | EP0355927A2 A precursor of a low thermal stress polyimide and a photopolymerizable composition containing a polyimide precursor |
| 02/28/1990 | EP0355810A2 Process for the production of patterned thin film |
| 02/28/1990 | EP0355789A2 Process for the production of flexographic printing reliefs |
| 02/28/1990 | EP0355652A2 Polymers of substituted (2-haloalkoxy-1,1,2 trifluoroethoxy)styrene, process for their preparation and their use |
| 02/28/1990 | EP0355581A2 Positive photosensitive mixture, and photosensitive registration material prepared therefrom |
| 02/28/1990 | EP0355387A2 Photopolymerisable mixture and recording material manufactured therefrom |
| 02/28/1990 | EP0355335A1 Light-sensitive recording material, its use and leuco compound suitable therefor |
| 02/28/1990 | CN2053762U Numerically controlled photoelectric engraving machine |
| 02/27/1990 | US4905041 Exposure apparatus |
| 02/27/1990 | US4905038 For use in an image recording apparatus |
| 02/27/1990 | US4905037 Image transfer system |
| 02/27/1990 | US4905036 Image forming process and system, including heating step or device for increased density of images |
| 02/27/1990 | US4904866 Wide area soft vacuum abnormal glow electron beam discharge hardening process |
| 02/27/1990 | US4904621 Flowing plasma through baffles improves uniformity of velocity distribution and wafer treatment |
| 02/27/1990 | US4904571 Remover solution for photoresist |
| 02/27/1990 | US4904570 Method of using a projection aligner for photoetching |
| 02/27/1990 | US4904569 Method of forming pattern and projection aligner for carrying out the same |
| 02/27/1990 | US4904568 Method of forming printed image |
| 02/27/1990 | US4904564 Phenolic-formaldehyde novolak; diazo sensitizer; imidazole, benzimidazole, triazole or indazole to increase solubility |
| 02/27/1990 | US4904563 Acid-producting compound, thermal polymerization initiator, compound containing two double bonds and linking group which is cleavable with acid |
| 02/27/1990 | US4904561 Light-sensitive material containing silver halide, reducing agent and polymerizable compound wherein the material is sensitive from only 600 nm to 950 nm |
| 02/27/1990 | US4904555 Photosensitive composition for making repeatably tonable layers |
| 02/27/1990 | US4904554 Treatment of dehydrated hologram with aldehyde |
| 02/27/1990 | US4903595 Arrangement for producing a plurality of printing forms automatically and in sequence |
| 02/27/1990 | CA1266197A1 Light-sensitive recording material and its use in a process for the production of a printing form or printed circuit |
| 02/27/1990 | CA1266196A1 Gumming solution for use in the burning-in of offset- printing plates and process for the production of an offset-printing plate |
| 02/22/1990 | WO1990001729A1 Hydrogen ion microlithography |
| 02/22/1990 | WO1990001727A1 Photocurable compositions and method of investment casting |
| 02/22/1990 | WO1990001726A1 Light-sensitive novolac resins |
| 02/22/1990 | WO1990001713A1 Production method of color filter |
| 02/22/1990 | WO1990001517A1 Acid-curing binder systems containing 1,2-disulfones |
| 02/22/1990 | WO1990001512A1 Photo-curable vinyl ether compositions |
| 02/21/1990 | EP0355025A2 Substituted (2-haloalkoxy-1,1,2-trifluoroethoxy)styrenes, process for their preparation and their use |
| 02/21/1990 | EP0355015A2 Process for developing positively acting photoresists |
| 02/21/1990 | CN1039904A Aqueous developer composition for solvent developable photoresist coatings |
| 02/20/1990 | US4903071 Image forming system using a photosensitive medium |
| 02/20/1990 | US4903070 Image recording apparatus |
| 02/20/1990 | US4902900 Device for detecting the levelling of the surface of an object |
| 02/20/1990 | US4902899 Lithographic process having improved image quality |
| 02/20/1990 | US4902785 Phenolic photosensitizers containing quinone diazide and acidic halide substituents |
| 02/20/1990 | US4902784 Photosensitizers |
| 02/20/1990 | US4902770 Undercoating material for photosensitive resins |
| 02/20/1990 | US4902726 Photosensitive resin composition solution |
| 02/20/1990 | US4902608 Controlled temperature and concentration of bath |
| 02/20/1990 | US4902607 Metal-etching process |
| 02/20/1990 | US4902605 Photoresist composition comprising cyclohexyleneoxyalkyl acrylates |
| 02/20/1990 | US4902604 Cationic azulene derivative; printing plates, resists |
| 02/20/1990 | US4902603 Negative working in deep uv light areas |
| 02/20/1990 | US4902602 Enhanced ink receptivity |
| 02/20/1990 | US4902601 Radiation sensitive polymeric diazonium salt and methods of making the polymeric diazonium salt |
| 02/20/1990 | US4902600 Light-sensitive material comprising light-sensitive layer provided on support wherein the light-sensitive layer and support have specified pH values |
| 02/20/1990 | US4902599 Containing hydrazide and hydrozine compound |
| 02/20/1990 | US4902594 Transferrable, thermoplastic, antiblocking/adhesive protecting layer for images |
| 02/20/1990 | US4902363 Method using compressible temporary support for transfer layer |
| 02/20/1990 | CA1266148A1 Plasma-resistant polymeric material, preparation thereof, and use thereof |
| 02/20/1990 | CA1265948A1 Thermally stable positive resist |
| 02/14/1990 | EP0354789A2 High energy beam-sensitive copolymer |
| 02/14/1990 | EP0354691A2 Image-creating apparatus |
| 02/14/1990 | EP0354637A2 CAD/CAM stereolithographic data conversion |
| 02/14/1990 | EP0354536A1 Pattering method |
| 02/14/1990 | EP0354475A2 Photopolymerisable image registration material |
| 02/14/1990 | EP0354458A2 Photoinitiators with a combined structure |
| 02/14/1990 | CN1039600A Acetal copolymers with backbone bromo functional groups |
| 02/13/1990 | US4901104 Image recording apparatus |
| 02/13/1990 | US4901103 Image recording apparatus using pressure sensitive sheet |
| 02/13/1990 | US4900939 System for processing and conveying substrate |
| 02/13/1990 | US4900938 Method of treating photoresists |
| 02/13/1990 | US4900831 Novel benzofuran dyes |
| 02/13/1990 | US4900823 Phenyl ketone derivatives |
| 02/13/1990 | US4900696 Method for patterning photo resist film |
| 02/13/1990 | US4899686 Coating device |
| 02/13/1990 | US4899685 Substrate coating equipment |
| 02/13/1990 | CA1265697A1 Photopolymerizable color proofing films |
| 02/13/1990 | CA1265696A1 Multilayer dry-film positive-acting photoresist |
| 02/13/1990 | CA1265695A1 Imaging systems employing photosensitive microcapsules containing 4-(4-aminophenyl)-pyridine compounds |
| 02/13/1990 | CA1265694A1 Photosensitive recording material for use in the production of planographic printing plates |