| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 04/21/1990 | CA2000710A1 Copolymers of 4-hydroxystyrene and alkyl substituted-4-hydroxystyrene |
| 04/21/1990 | CA2000461A1 Solid transfer negative - or positive - working color proofing method on diverse paper stock |
| 04/21/1990 | CA2000385A1 Method for forming a colored image on a degradable sheet material |
| 04/21/1990 | CA2000381A1 Negative working, peel developable, single sheet color proofing method |
| 04/21/1990 | CA2000375A1 Preparation of receiver sheet materials for peel developable, single sheet color proofing system |
| 04/20/1990 | CA2000924A1 Positive photoresists with increased heat stability |
| 04/19/1990 | WO1990004211A1 Synergistic initiator compositions for the visible light fabrication and postcure of stereolithographic objects |
| 04/19/1990 | WO1990003989A1 Cationically curable polyurethane compositions having vinyl ether functionality |
| 04/19/1990 | DE3933969A1 Lithographic printing plate treatment - using ink receiving silver image with two or more different organic cpds. contg. two or more mercapto or thione gps. |
| 04/19/1990 | DE3835039A1 Negative-working radiation-sensitive mixture containing a polymer containing 1,2,3-thiadiazole groups, and a recording material containing this mixture |
| 04/18/1990 | EP0364425A2 A drying section equipped with blowing nozzles |
| 04/18/1990 | EP0364368A2 Electrically conductive layer-providing composition and process for formation of resist patterns |
| 04/18/1990 | EP0364251A2 Encapsulated photosensitive compositions |
| 04/18/1990 | EP0364250A2 Producing images |
| 04/18/1990 | EP0364073A1 Energy-curable cyanate compositions |
| 04/18/1990 | EP0363981A2 Automatic masking device |
| 04/18/1990 | EP0363978A2 Resist composition |
| 04/18/1990 | EP0363817A2 Negative-working light-sensitive mixture comprising a polymeric compound with 1,2,3-thiadiazol groups and a light-sensitive recording material comprising said mixture |
| 04/18/1990 | EP0363790A2 Image forming method and image forming medium |
| 04/18/1990 | EP0363776A2 Light-sensitive composition and light-sensitive copy material produced therewith |
| 04/18/1990 | EP0363775A2 Stabilisation process of a leuco dye solution, and mixture, polymerizable by radiation, containing a leuco dye |
| 04/18/1990 | EP0363737A2 Compositions for production of electronic coatings |
| 04/18/1990 | EP0363590A2 Method and device for exposing light sensitive layers provided on support |
| 04/18/1990 | EP0363571A1 1,2-Naphthoquinone-2-diazido-sulphonamides and light sensitive mixtures containing them |
| 04/18/1990 | EP0363547A1 Method for etching mirror facets of III-V semiconductor structures |
| 04/18/1990 | EP0363504A1 Method of providing a substrate with a layer comprising a polyvinylbased hydrogel and a biochemically active material |
| 04/18/1990 | CN1041480A 短弧放电灯 Short-arc discharge lamps |
| 04/17/1990 | US4918583 Illuminating optical device |
| 04/17/1990 | US4918536 Facsimile recording system using photosensitive microcapsule recording medium |
| 04/17/1990 | US4918482 Image forming apparatus |
| 04/17/1990 | US4917990 Plastic, dimensionally stable support, chlorosulfonated polyethylene adhesive, and light hardenable elastomer; bonding strength |
| 04/17/1990 | US4917988 Dissolving in 1-methoxy-2-propanol. methyl lactate and an amino group-free polar solvent |
| 04/17/1990 | US4917977 Methine dye, ethylenically unsaturated compound and free radical generators |
| 04/17/1990 | US4917939 Recording method and recording medium |
| 04/17/1990 | US4917122 Photoresist stripping solution |
| 04/13/1990 | CA2000552A1 Resist composition |
| 04/11/1990 | EP0363235A1 Process and apparatus for the uniform application of a resist layer to a substrate |
| 04/11/1990 | EP0363210A2 Photoimageable composition and dry film formed therefrom |
| 04/11/1990 | EP0363198A2 Positive working photosensitive composition |
| 04/11/1990 | EP0363171A2 Method of and apparatus for forming volume type phase hologram |
| 04/11/1990 | EP0363164A2 X-ray exposure system |
| 04/11/1990 | EP0363163A2 X-ray exposure apparatus |
| 04/11/1990 | EP0363098A2 Temperature controlling device |
| 04/11/1990 | EP0362982A2 Stereolithographic curl reduction |
| 04/11/1990 | EP0362827A1 Image forming method and image forming medium |
| 04/11/1990 | EP0362778A2 Photosensitive composition |
| 04/11/1990 | EP0362649A2 Radiation-sensitive compositions and their use |
| 04/11/1990 | EP0362644A1 Radiation-sensitive compositions and their use |
| 04/11/1990 | EP0362641A2 Continuous process for the production of a light-sensitive recording element |
| 04/11/1990 | EP0362441A1 A method for making a color filter as well as a color filter thus made |
| 04/11/1990 | EP0362418A1 Improved method and system for the angled exposition of a surface portion to an emission impinging obliquely thereon, and semiconductor wafers having facets exposed according to said method |
| 04/11/1990 | EP0362213A1 Process for manufacturing a structured ceramic film or a ceramic object composed of such films. |
| 04/11/1990 | CN1041227A Developer composition having improved blocking resistance |
| 04/11/1990 | CA2000331A1 Synergistic initiator compositions for the visible light fabrication and postcure of stereolithographic objects |
| 04/10/1990 | US4916478 Method for the formation of images and an apparatus for the same |
| 04/10/1990 | US4916340 Movement guiding mechanism |
| 04/10/1990 | US4916322 Lithographic system |
| 04/10/1990 | US4916319 Beam intensity profilometer |
| 04/10/1990 | US4916247 Intermediates for polymers suitable for photoresists; oxygen resistant |
| 04/10/1990 | US4916046 Shelf life, resolution |
| 04/10/1990 | US4916045 Photosensitive recording element containing an ionic polymer |
| 04/10/1990 | US4916043 Image-forming method employing light-sensitive material comprising the removal of water from the base paper support |
| 04/10/1990 | US4916041 Presensitized lithographic plate comprising silver halide, reducing agent and polymerizable compound all in microcapsules |
| 04/10/1990 | US4916011 Carboxyl modified polymer |
| 04/10/1990 | US4915997 Multilayer sealed structure; adhesive is epoxy resin and organosilicon polymer |
| 04/10/1990 | EP0351413A4 Method and apparatus for production of three-dimensional objects by photosolidification. |
| 04/10/1990 | CA1267656A1 Photoinitiators for photopolymerization of unsaturated systems |
| 04/10/1990 | CA1267559A1 Light-sensitive composition for the preparation of a positive-acting photoresist |
| 04/08/1990 | CA2000052A1 Radiation-sensitive mixture and radiation-sensitive copying material prepared therefrom |
| 04/05/1990 | WO1990003662A1 Hybrid microchip bonding article |
| 04/05/1990 | WO1990003601A1 Radiation sensitive resist material |
| 04/05/1990 | WO1990003600A1 Aqueous solutions of oleophilic compounds |
| 04/05/1990 | WO1990003598A1 Multifunctional photolithographic compositions |
| 04/05/1990 | WO1990003597A1 Soft-bake treatment of photoresists |
| 04/05/1990 | WO1990003275A1 Baking treatment of lithographic printing plate |
| 04/04/1990 | EP0362143A2 Antistatic and electrically conductive relief images, process for manufacturing the same, coating material and radiation-sensitive polymers |
| 04/04/1990 | EP0361985A1 Hybrid microchip bonding article |
| 04/04/1990 | EP0361959A2 A substrate conveying apparatus |
| 04/04/1990 | EP0361934A2 Exposure method |
| 04/04/1990 | EP0361907A2 Photoresist compositions for deep UV image reversal |
| 04/04/1990 | EP0361906A2 Method of producing an image reversal negative photoresist having a photo-labile blocked imide |
| 04/04/1990 | EP0361812A2 A pressure device for use in image forming apparatuses |
| 04/04/1990 | EP0361682A1 Halomethyl-1,3,5-triazines containing a photoinitiator moiety |
| 04/04/1990 | EP0361627A2 Aryl nitrones |
| 04/04/1990 | EP0361460A2 A method for forming a pattern |
| 04/04/1990 | EP0361409A2 Flame-retardant liquid photosensitive resin composition |
| 04/04/1990 | EP0361173A1 Light-sensitive recording material |
| 04/04/1990 | CN1041045A Photosensitive semi-aqueous developable ceramic coating composition |
| 04/03/1990 | US4914479 Image formation apparatus with cartridge for roll of photosensitive sheet |
| 04/03/1990 | US4914473 Multiple-exposure apparatus in a graphic arts copying machine of a slit-exposure type |
| 04/03/1990 | US4914463 Development of imaging sheets employing photosensitive microcapsules |
| 04/03/1990 | US4914304 Charged-beam exposure system |
| 04/03/1990 | US4914182 Autophotocrosslinkable; protective films, photographic relief images |
| 04/03/1990 | US4914181 Polyimides, a process for their preparation and their use, and tetracarboxylic acids and tetracarboxylic acid derivatives |
| 04/03/1990 | US4914165 Radiation crosslinkable compositions |
| 04/03/1990 | US4914039 Water developable, negative working overlay or transfer type diazo color proofing system |
| 04/03/1990 | US4914006 Used for processing semiconductors |
| 04/03/1990 | US4914004 Radiation curable; immobilized photoinitiator |
| 04/03/1990 | US4914000 Three dimensional reproduction material diazonium condensates and use in light sensitive |
| 04/03/1990 | US4913999 Silver halide emulsion, unsaturated polymer of ethylene, hydrophobic polymer and a pigment, colored photography |