Patents for C25D 5 - Electroplating characterised by the process; Pretreatment or after-treatment of workpieces (17,883)
12/2005
12/28/2005EP1610132A2 Fabricating interconnects using sacrificial substrates
12/28/2005CN1714412A Method for increasing the copper to superconductor ratio in a superconductor wire
12/28/2005CN1714176A Plain or zinc-plated steel plate coated with a zinc or zinc alloy layer comprising a polymer, and method for making same by electroplating
12/28/2005CN1712573A Surface cladding treatment of ferro-manganese aluminium alloy
12/28/2005CN1712562A Non-electrolytic gold plating method on polycarbnate contained resin
12/27/2005US6979645 Method of producing a semiconductor device having copper wiring
12/27/2005US6979515 Surface-treated steel plate for battery case and battery case
12/27/2005US6979393 Method for plating copper conductors and devices formed
12/27/2005US6979391 continuous reel-to-reel electrolysis and electrolytic cell; insulating wall between electrodes; one- or two-sided metallization; conductive foils for printed circuits
12/22/2005WO2005122297A1 Metal foil with carrier foil, method for producing such metal foil with carrier foil, collector for nonaqueous electrolyte secondary battery using such metal foil with carrier foil
12/22/2005US20050282399 Electroformed metallization
12/22/2005US20050282371 Sequential station tool for wet processing of semiconductor wafers
12/22/2005US20050280498 Conductive base material with resistance layer and circuit board material with resistance layer
12/22/2005US20050279643 Gas diffusion electrodes, membrane-electrode assemblies and method for the production thereof
12/22/2005US20050279642 Common rack for electroplating and PVD coating operations
12/22/2005US20050279641 Plating method and apparatus that creates a differential between additive disposed on a top surface and a cavity surface of a workpiece using an external influence
12/22/2005US20050279640 Method of forming a lead-free bump and a plating apparatus therefor
12/22/2005US20050279638 producing electrodes having generally regularly oriented and shaped pores with a diameter of less than one micron; are highly electrically and thermally conductive, allow unimpeded transport of gases or liquids through the electrode
12/22/2005DE102005024071A1 Rollelement und Verfahren zu dessen Herstellung Rolling element and process for its preparation
12/21/2005EP1608209A1 Conductive base material with resistance layer and circuit board material with resistance layer
12/21/2005EP1607496A1 Electroformed metallization
12/21/2005EP1606107A2 Composite article comprising a ceramic coating
12/21/2005EP1606085A2 High precision multi-grit slicing blade
12/20/2005US6977223 Three dimensional microfabrication
12/15/2005WO2005118918A2 Efficient analysis of organic additives in an acid copper plating bath
12/15/2005US20050277293 Fabrication method of wafer level chip scale packages
12/15/2005US20050276992 Method for metallizing a non-metallic surface and the metallized surface structure thereof
12/15/2005US20050276914 Method for manufacturing light guide plate mold cores
12/15/2005US20050276743 Method for fabrication of porous metal templates and growth of carbon nanotubes and utilization thereof
12/15/2005US20050274622 Plating chemistry and method of single-step electroplating of copper on a barrier metal
12/15/2005US20050274621 Method of barrier layer surface treatment to enable direct copper plating on barrier metal
12/15/2005US20050274594 Metallic keypad and method for making the same
12/15/2005US20050274445 Method for manufacturing decoration of imitation metal
12/14/2005EP1605481A1 Metallic keypad and method for making the same
12/14/2005EP1240365B1 Method for producing an electrolytically coated cold rolled strip and battery sheath produced therefrom
12/14/2005CN1707759A Method and apparatus for processing wafer surfaces using thin, high velocity fluid layer
12/14/2005CN1231290C Vibration stirring device, and device and method for processing using stirring device
12/13/2005US6974636 Protective coating for turbine engine component
12/13/2005US6974531 Current or voltage is changed during plating resulting in an average current increase from an initially small current to a final current corresponding to the desired current density for the total plated area.
12/13/2005US6974530 Method and system for controlling ion distribution during plating of a metal on a workpiece surface
12/08/2005US20050269673 Pure copper-coated copper foil and method of producing the same, and TAB tape and method of producing the same
12/08/2005US20050269212 Method of making rolling electrical contact to wafer front surface
12/08/2005US20050269206 Production method of wiring substrate having ultra-fine pattern, and wiring substrate
12/08/2005DE19727264B4 Halbleitervorrichtung mit einer t-förmigen Feldoxidschicht und Verfahren zu deren Herstellung A semiconductor device comprising a T-shaped field oxide film and methods for their preparation
12/08/2005DE10011455B4 Verfahren zum Aufbringen von metallischen Leiterbahnen als Elektroden auf eine Kanalplatte aus Glas für großflächige Flachbildschirme A method of applying metallic interconnects as electrodes on a channel plate glass for large flat panel displays
12/07/2005EP1602750A1 SURFACE-TREATED Al SHEET EXCELLENT IN SOLDERABILITY, HEAT SINK USING THE SAME, AND METHOD FOR PRODUCING SURFACE-TREATED Al SHEET EXCELLENT IN SOLDERABILITY
12/07/2005EP1602127A2 Plating apparatus
12/07/2005EP1601822A1 Method of electroplating a workpiece having high-aspect ratio holes
12/07/2005EP1601821A1 Electroplating pcb components
12/07/2005CN1705774A Integrated plating and planarization process and apparatus therefor
12/07/2005CN1705770A Stabilized aluminum laminate having aluminum and stabilizing layer laminated thereon
12/07/2005CN1230575C Continuous nickel plating process for stainless steel wire
12/06/2005US6972082 Method for the selectively electroplating a strip-shaped, metal support material
12/06/2005US6972081 Fabrication of embedded vertical spiral inductor for multichip module (MCM) package
12/01/2005WO2005078164A3 Method of anodizing metallic surfaces and compositions therefore
12/01/2005US20050266165 Method for metallizing plastic surfaces
12/01/2005US20050263400 Method of applying cladding material on conductive lines of MRAM devices
12/01/2005US20050263399 No cell cleaning and rinsing between the analyses; reduces the analysis time, consumption of expensive chemicals, and quantity of hazardous waste generated
12/01/2005US20050263273 Electroformed microchannel cooler and methods of making same
12/01/2005DE102004022297A1 Verfahren und System zum selektiven Beschichten oder Ätzen von Oberflächen A method and system for selectively coating or etching surfaces
12/01/2005DE102004021926A1 Verfahren zur Herstellung einer Beschichtung sowie Anode zur Verwendung in einem solchen Verfahren A process for preparing a coating and anode for use in such a method
12/01/2005DE102004021214A1 Producing and maintaining a prescribed gas composition in the environment of a band material after immersion treatment comprises moving the band material in a sealed housing from an immersion bath
11/2005
11/30/2005EP1601006A2 An apparatus and a method for processing a fluid meniscus
11/30/2005EP1600528A2 Method for the metallisation of plastic surfaces
11/30/2005EP1407062B1 Composite foil and its manufacturing process
11/30/2005CN1703535A Aqueous alkaline zincate solutions and methods
11/30/2005CN1229525C Gradient composite plating coat for continuous casting crystallizer copper plate and production method thereof
11/29/2005US6969672 Method and apparatus for controlling a thickness of a conductive layer in a semiconductor manufacturing operation
11/29/2005US6969557 Surface-treated copper foil low-dielectric substrate and copper-clad laminate and printed wiring board using the same
11/29/2005CA2376377C Tin-plated steel sheet
11/24/2005WO2005111275A2 Methods and apparatuses for monitoring organic additives in electrochemical deposition solutions
11/24/2005WO2005111274A2 Selective catalytic activation of non-conductive substrates
11/24/2005WO2005110287A2 Electroplating solution for gold-tin eutectic alloy
11/24/2005US20050258047 Process for electrochemical deposition of tantalum and an article having a surface modification
11/24/2005US20050258046 Plating method and apparatus for controlling deposition on predetermined portions of a workpiece
11/24/2005US20050258044 Magnetic focus rings for improved copper plating
11/23/2005EP1598449A2 Improved plating method
11/23/2005EP1598448A1 Lead-free bump and method for forming the same
11/23/2005CN1701137A Surface-treated copper foil having blackening-treated surface, process for producing the surface-treated copper foil and, using the surface-treated copper foil, electromagnetic wave shielding conducti
11/23/2005CN1701136A Low-force electrochemical mechanical processing method and apparatus
11/23/2005CN1699634A Method for electroplating magnesium and magnesium alloy
11/22/2005US6967166 Method for monitoring and controlling force applied on workpiece surface during electrochemical mechanical processing
11/22/2005CA2302916C Anodizing method and apparatus for performing the same
11/17/2005WO2005109972A2 Design and method for plating pci express (pcie) edge connector
11/17/2005WO2005108651A2 Method for production of a coating and anode used in such a method
11/17/2005WO2005108650A1 Methods and apparatus for determining organic component concentrations in an electrolytic solution
11/17/2005WO2005108649A2 One-point recalibration method for reducing error in concentration measurements for an electrolytic solution
11/17/2005WO2005108648A2 Production of a structured hard chromium layer and production of a coating
11/17/2005WO2005108058A1 Process for producing a new high-strength dual-phase steel product from lightly alloyed steel
11/17/2005WO2005107982A1 Tool holder with vibration damping means and a method for manufacturing the same
11/17/2005US20050255581 Self-organized nanopore arrays with controlled symmetry and order
11/17/2005US20050252783 Electroplating solution for gold-tin eutectic alloy
11/17/2005US20050252780 Seeding a magnetic layer alloy of nickel, iron, and/or cobalt ; removing portion to define a feature; depositing nonmagnetic conductive layer of tantalum or rhodium; forming cavities; electroplating
11/17/2005US20050252583 Copper film containing tungsten nitride for improving thermal stability, electrical conductivity and electric leakage properties and a manufacturing method for the copper film
11/17/2005US20050252262 Hot press forming method, and a plated steel material therefor and its manufacturing method
11/16/2005EP1595289A2 Thermal interconnect systems methods of production and uses thereof
11/16/2005EP1595001A1 Surface-coating method
11/16/2005CN1697893A Apparatus and method for treating a substrate electrochemically while reducing metal corrosion
11/16/2005CN1696353A Method for making Nano surface of metal material
11/15/2005US6964792 Using diffuser membrane in electrolytic cells