Patents for C23F 1 - Etching metallic material by chemical means (16,062) |
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01/13/2011 | US20110008211 Microfluid channel, method for its implementation, and microfluidic system containing said channel |
01/13/2011 | US20110007453 Method for forming a concavo-convex textured structure on a housing of an electronic device and related structure |
01/13/2011 | US20110007376 Micromechanical component and method for producing same |
01/13/2011 | US20110006799 Method for manufacturing probe supporting plate, computer storage medium and probe supporting plate |
01/13/2011 | US20110006040 Methods for Plasma Processing |
01/13/2011 | US20110006039 Plasma generating electrode assembly |
01/13/2011 | US20110006038 Plasma processing chamber with enhanced gas delivery |
01/13/2011 | US20110005931 Apparatus and method for manipulating micro component |
01/13/2011 | US20110005686 Loading table structure and processing device |
01/13/2011 | US20110005685 Plasma reactor with uniform process rate distribution by improved rf ground return path |
01/13/2011 | US20110005684 Plasma processing apparatus |
01/13/2011 | US20110005683 Plasma generating apparatus |
01/13/2011 | US20110005682 Apparatus for Plasma Processing |
01/13/2011 | US20110005681 Plasma Generating Units for Processing a Substrate |
01/12/2011 | EP2178466B1 Nanosurface |
01/12/2011 | CN201704407U Acid etching waste liquid acid replacement and absorption device of circuit board |
01/12/2011 | CN201704406U Liquid medicine exchanging system |
01/12/2011 | CN201704405U Baffle plate of automatic degumming machine tooling clamp |
01/12/2011 | CN101942662A Method and system for regenerating nitric acid deplating liquid |
01/12/2011 | CN101942661A System and method for performing single-side continuous chemical wet treatment by using mist chemical agent |
01/12/2011 | CN101942660A Method for directly forming cutter die by utilizing one-time etching and cutter die formed by same |
01/12/2011 | CN101941000A Preparation method of superhydrophobic surface of metal zirconium |
01/12/2011 | CN101542019B Exhaust system |
01/12/2011 | CN101538715B Flexible circuit board etching liquid concentration control device |
01/12/2011 | CN101104747B Mica-base ultra-black material and its preparation method and application |
01/11/2011 | US7867409 Control of ion angular distribution function at wafer surface |
01/11/2011 | US7867408 Anisotropic wet etching of silicon |
01/11/2011 | US7867404 Method for converting electrical components |
01/11/2011 | US7867355 Adjustable height PIF probe |
01/06/2011 | US20110003109 Modified carbon nanotube arrays |
01/06/2011 | US20110001153 Substrate bearing an electrode, organic light-emitting device incorporating it, and its manufacture |
01/06/2011 | US20110000884 Method for Etching Copper and Recovery of the Spent Etching Solution |
01/06/2011 | US20110000883 Plasma processing apparatus, focus ring, and susceptor |
01/06/2011 | US20110000882 Apparatus and methods for supporting workpieces during plasma processing |
01/06/2011 | US20110000876 Stripper solution and method of manufacturing liquid crystal display using the same |
01/06/2011 | US20110000618 Apparatus and method for processing substrate |
01/05/2011 | EP2268852A1 Electrochemical process for the recovery of metallic iron and sulfuric acid values from iron-rich sulfate wastes, mining residues and pickling liquors |
01/05/2011 | CN201695088U Tank type polycrystalline silicon wet-process texturing equipment |
01/05/2011 | CN101937732A Nano cable made of magnetic material and half-metallic material and preparation method thereof |
01/05/2011 | CN101935838A Microetching processing method used before copper deposition of printed circuit board |
01/05/2011 | CN101635322B Method and device for chain velvet making of multi-crystalline solar cell |
01/05/2011 | CN101476127B Surface recombination processing method for rare earth-magnesium-nickel based AB3 type hydrogen storage alloy |
01/04/2011 | US7862683 Chamber dry cleaning |
01/04/2011 | US7862682 Showerhead electrode assemblies for plasma processing apparatuses |
01/04/2011 | US7862659 Semiconductor manufacturing device |
01/04/2011 | US7862658 Etching and cleaning methods and etching and cleaning apparatuses used therefor |
01/04/2011 | CA2446063C Bis (perfluoroalkanesulfonyl)imides and their salts as surfactants/additives for applications having extreme environments and methods therefor |
12/30/2010 | US20100330409 Method and apparatus |
12/30/2010 | US20100330345 Methods utilizing scanning probe microscope tips and products thereof or produced thereby |
12/30/2010 | US20100328840 Mems device and method of manufacturing the same |
12/30/2010 | US20100327956 Graphene device and method of fabricating a graphene device |
12/30/2010 | US20100327508 Wafer chucking apparatus for plasma process |
12/30/2010 | US20100327413 Hardmask open and etch profile control with hardmask open |
12/30/2010 | US20100326957 Plasma processing apparatus and plasma processing method |
12/30/2010 | US20100326954 Method of etching a multi-layer |
12/30/2010 | US20100326601 Plasma processing apparatus |
12/29/2010 | WO2010151471A1 Methods of wet etching a self-assembled monolayer patterned substrate and metal patterned articles |
12/29/2010 | EP1192050B1 Substrate treatment method |
12/29/2010 | CN201689695U Window for X-ray microscopic transmission imaging |
12/29/2010 | CN201686753U Electrolysis device for extracting copper through electrolysis of alkaline waste etching solution |
12/29/2010 | CN1899003B Etching solution, method of etching and printed wiring board |
12/29/2010 | CN101932754A Single phase fluid imprint lithography method |
12/29/2010 | CN101930930A Method for forming Cr-Al-Cr metal routing on indium tin oxid glass substrate |
12/29/2010 | CN101928941A Reactive ion etching method for etching silicon |
12/29/2010 | CN101210341B Method for producing reaming electrolyte and high specific surface area aluminum electrolytic capacitor electrode foil |
12/28/2010 | US7857987 Implant surface preparation |
12/23/2010 | WO2010147512A2 Device for etching the surface of an elongated metal article (embodiments) |
12/23/2010 | WO2010147508A2 Method for etching the surface of an elongated metal article |
12/23/2010 | US20100320170 Method and apparatus for etching a structure in a plasma chamber |
12/23/2010 | US20100320156 Oxidative Treatment Method |
12/23/2010 | US20100319855 Substrate supporting unit, substrate processing apparatus, and method of manufacturing substrate supporting unit |
12/23/2010 | US20100319853 Gas supply device and apparatus for processing a substrate |
12/23/2010 | US20100319852 Capacitivley coupled plasma reactor having a cooled/heated wafer support with uniform temperature distribution |
12/23/2010 | US20100319851 Plasma reactor with feed forward thermal control system using a thermal model for accommodating rf power changes or wafer temperature changes |
12/23/2010 | US20100319813 Bare aluminum baffles for resist stripping chambers |
12/23/2010 | DE102009019674A1 Verfahren zum Aufrauhen einer Metalloberfläche, insbesondere einer Zylinderwandung eines Kurbelgehäuses A process for roughening a metal surface, in particular a cylinder of a crankcase |
12/22/2010 | EP2264468A2 Merged-mask micro-machining process |
12/22/2010 | EP1741124B1 Segmented baffle plate assembly for a plasma processing system |
12/22/2010 | CN201678769U Polycrystalline cashmere making machine of mobile cooling mechanism |
12/22/2010 | CN101924031A System and method for treating substrate by using nano vaporific chemical agent |
12/22/2010 | CN101922008A Method for monitoring corrosion depth of silicon in real time |
12/22/2010 | CN101061253B Substrate processing apparatus using a batch processing chamber |
12/21/2010 | US7854213 Modulated gap segmented antenna for inductively-coupled plasma processing system |
12/16/2010 | WO2010143033A1 Process for recovering alkaline solutions |
12/16/2010 | US20100314353 Nano-construction of complex 3-D Structures and modification of existing structures |
12/16/2010 | US20100314047 Etching System |
12/16/2010 | DE102009022477A1 Verfahren zum Texturieren einer Oberfläche eines Halbleitersubstrates sowie Vorrichtung zum Durchführen des Verfahrens A method for texturing a surface of a semiconductor substrate, as well as apparatus for carrying out the method |
12/15/2010 | EP2261393A2 Plasma uniformity control by gas diffuser hole design |
12/15/2010 | CN1995458B Method for promoting rustless steel surface hydrophilicity |
12/15/2010 | CN101916740A In-situ dry clean chamber for front end of line fabrication |
12/15/2010 | CN101916715A In-situ dry clean chamber for front end of line fabrication |
12/15/2010 | CN101914770A Corrosion technology of high-reflectivity acid corrosion wafer |
12/15/2010 | CN101914769A Wafer aluminum corrosion method |
12/15/2010 | CN101913052A Aluminum surface micro-groove preparation method |
12/15/2010 | CN101368889B Method for displaying high-strength vessel slab original austenite crystal grain |
12/14/2010 | US7851976 Micro movable device and method of making the same using wet etching |
12/14/2010 | US7850866 Peroxide (H2O2) to oxidize molydenum and copper, sulfuric acid to react with cupric oxide,and a peroxide stabilizer; concurrent etching a the multilayer to form the molybdenum layer extending outwardly from underneath an edge of the copperline; thin film transistor liquid crystal-displays |
12/14/2010 | US7850862 Textured surface having undercut micro recesses in a surface |
12/14/2010 | US7850861 Microfluidic device, and related methods |
12/14/2010 | US7850819 Plasma reactor with high productivity |