Patents for C23F 1 - Etching metallic material by chemical means (16,062)
01/2011
01/13/2011US20110008211 Microfluid channel, method for its implementation, and microfluidic system containing said channel
01/13/2011US20110007453 Method for forming a concavo-convex textured structure on a housing of an electronic device and related structure
01/13/2011US20110007376 Micromechanical component and method for producing same
01/13/2011US20110006799 Method for manufacturing probe supporting plate, computer storage medium and probe supporting plate
01/13/2011US20110006040 Methods for Plasma Processing
01/13/2011US20110006039 Plasma generating electrode assembly
01/13/2011US20110006038 Plasma processing chamber with enhanced gas delivery
01/13/2011US20110005931 Apparatus and method for manipulating micro component
01/13/2011US20110005686 Loading table structure and processing device
01/13/2011US20110005685 Plasma reactor with uniform process rate distribution by improved rf ground return path
01/13/2011US20110005684 Plasma processing apparatus
01/13/2011US20110005683 Plasma generating apparatus
01/13/2011US20110005682 Apparatus for Plasma Processing
01/13/2011US20110005681 Plasma Generating Units for Processing a Substrate
01/12/2011EP2178466B1 Nanosurface
01/12/2011CN201704407U Acid etching waste liquid acid replacement and absorption device of circuit board
01/12/2011CN201704406U Liquid medicine exchanging system
01/12/2011CN201704405U Baffle plate of automatic degumming machine tooling clamp
01/12/2011CN101942662A Method and system for regenerating nitric acid deplating liquid
01/12/2011CN101942661A System and method for performing single-side continuous chemical wet treatment by using mist chemical agent
01/12/2011CN101942660A Method for directly forming cutter die by utilizing one-time etching and cutter die formed by same
01/12/2011CN101941000A Preparation method of superhydrophobic surface of metal zirconium
01/12/2011CN101542019B Exhaust system
01/12/2011CN101538715B Flexible circuit board etching liquid concentration control device
01/12/2011CN101104747B Mica-base ultra-black material and its preparation method and application
01/11/2011US7867409 Control of ion angular distribution function at wafer surface
01/11/2011US7867408 Anisotropic wet etching of silicon
01/11/2011US7867404 Method for converting electrical components
01/11/2011US7867355 Adjustable height PIF probe
01/06/2011US20110003109 Modified carbon nanotube arrays
01/06/2011US20110001153 Substrate bearing an electrode, organic light-emitting device incorporating it, and its manufacture
01/06/2011US20110000884 Method for Etching Copper and Recovery of the Spent Etching Solution
01/06/2011US20110000883 Plasma processing apparatus, focus ring, and susceptor
01/06/2011US20110000882 Apparatus and methods for supporting workpieces during plasma processing
01/06/2011US20110000876 Stripper solution and method of manufacturing liquid crystal display using the same
01/06/2011US20110000618 Apparatus and method for processing substrate
01/05/2011EP2268852A1 Electrochemical process for the recovery of metallic iron and sulfuric acid values from iron-rich sulfate wastes, mining residues and pickling liquors
01/05/2011CN201695088U Tank type polycrystalline silicon wet-process texturing equipment
01/05/2011CN101937732A Nano cable made of magnetic material and half-metallic material and preparation method thereof
01/05/2011CN101935838A Microetching processing method used before copper deposition of printed circuit board
01/05/2011CN101635322B Method and device for chain velvet making of multi-crystalline solar cell
01/05/2011CN101476127B Surface recombination processing method for rare earth-magnesium-nickel based AB3 type hydrogen storage alloy
01/04/2011US7862683 Chamber dry cleaning
01/04/2011US7862682 Showerhead electrode assemblies for plasma processing apparatuses
01/04/2011US7862659 Semiconductor manufacturing device
01/04/2011US7862658 Etching and cleaning methods and etching and cleaning apparatuses used therefor
01/04/2011CA2446063C Bis (perfluoroalkanesulfonyl)imides and their salts as surfactants/additives for applications having extreme environments and methods therefor
12/2010
12/30/2010US20100330409 Method and apparatus
12/30/2010US20100330345 Methods utilizing scanning probe microscope tips and products thereof or produced thereby
12/30/2010US20100328840 Mems device and method of manufacturing the same
12/30/2010US20100327956 Graphene device and method of fabricating a graphene device
12/30/2010US20100327508 Wafer chucking apparatus for plasma process
12/30/2010US20100327413 Hardmask open and etch profile control with hardmask open
12/30/2010US20100326957 Plasma processing apparatus and plasma processing method
12/30/2010US20100326954 Method of etching a multi-layer
12/30/2010US20100326601 Plasma processing apparatus
12/29/2010WO2010151471A1 Methods of wet etching a self-assembled monolayer patterned substrate and metal patterned articles
12/29/2010EP1192050B1 Substrate treatment method
12/29/2010CN201689695U Window for X-ray microscopic transmission imaging
12/29/2010CN201686753U Electrolysis device for extracting copper through electrolysis of alkaline waste etching solution
12/29/2010CN1899003B Etching solution, method of etching and printed wiring board
12/29/2010CN101932754A Single phase fluid imprint lithography method
12/29/2010CN101930930A Method for forming Cr-Al-Cr metal routing on indium tin oxid glass substrate
12/29/2010CN101928941A Reactive ion etching method for etching silicon
12/29/2010CN101210341B Method for producing reaming electrolyte and high specific surface area aluminum electrolytic capacitor electrode foil
12/28/2010US7857987 Implant surface preparation
12/23/2010WO2010147512A2 Device for etching the surface of an elongated metal article (embodiments)
12/23/2010WO2010147508A2 Method for etching the surface of an elongated metal article
12/23/2010US20100320170 Method and apparatus for etching a structure in a plasma chamber
12/23/2010US20100320156 Oxidative Treatment Method
12/23/2010US20100319855 Substrate supporting unit, substrate processing apparatus, and method of manufacturing substrate supporting unit
12/23/2010US20100319853 Gas supply device and apparatus for processing a substrate
12/23/2010US20100319852 Capacitivley coupled plasma reactor having a cooled/heated wafer support with uniform temperature distribution
12/23/2010US20100319851 Plasma reactor with feed forward thermal control system using a thermal model for accommodating rf power changes or wafer temperature changes
12/23/2010US20100319813 Bare aluminum baffles for resist stripping chambers
12/23/2010DE102009019674A1 Verfahren zum Aufrauhen einer Metalloberfläche, insbesondere einer Zylinderwandung eines Kurbelgehäuses A process for roughening a metal surface, in particular a cylinder of a crankcase
12/22/2010EP2264468A2 Merged-mask micro-machining process
12/22/2010EP1741124B1 Segmented baffle plate assembly for a plasma processing system
12/22/2010CN201678769U Polycrystalline cashmere making machine of mobile cooling mechanism
12/22/2010CN101924031A System and method for treating substrate by using nano vaporific chemical agent
12/22/2010CN101922008A Method for monitoring corrosion depth of silicon in real time
12/22/2010CN101061253B Substrate processing apparatus using a batch processing chamber
12/21/2010US7854213 Modulated gap segmented antenna for inductively-coupled plasma processing system
12/16/2010WO2010143033A1 Process for recovering alkaline solutions
12/16/2010US20100314353 Nano-construction of complex 3-D Structures and modification of existing structures
12/16/2010US20100314047 Etching System
12/16/2010DE102009022477A1 Verfahren zum Texturieren einer Oberfläche eines Halbleitersubstrates sowie Vorrichtung zum Durchführen des Verfahrens A method for texturing a surface of a semiconductor substrate, as well as apparatus for carrying out the method
12/15/2010EP2261393A2 Plasma uniformity control by gas diffuser hole design
12/15/2010CN1995458B Method for promoting rustless steel surface hydrophilicity
12/15/2010CN101916740A In-situ dry clean chamber for front end of line fabrication
12/15/2010CN101916715A In-situ dry clean chamber for front end of line fabrication
12/15/2010CN101914770A Corrosion technology of high-reflectivity acid corrosion wafer
12/15/2010CN101914769A Wafer aluminum corrosion method
12/15/2010CN101913052A Aluminum surface micro-groove preparation method
12/15/2010CN101368889B Method for displaying high-strength vessel slab original austenite crystal grain
12/14/2010US7851976 Micro movable device and method of making the same using wet etching
12/14/2010US7850866 Peroxide (H2O2) to oxidize molydenum and copper, sulfuric acid to react with cupric oxide,and a peroxide stabilizer; concurrent etching a the multilayer to form the molybdenum layer extending outwardly from underneath an edge of the copperline; thin film transistor liquid crystal-displays
12/14/2010US7850862 Textured surface having undercut micro recesses in a surface
12/14/2010US7850861 Microfluidic device, and related methods
12/14/2010US7850819 Plasma reactor with high productivity
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