Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
05/2010
05/12/2010CN101705473A Physical vapor deposition equipment for use in study on light trapping structure of silicon thin-film battery
05/12/2010CN101705472A Method for attaching rotary target
05/12/2010CN101705471A Preparation method of chromium nitride titanium aluminum nitrogen gradient hard reaction film
05/12/2010CN101705470A Non-conducting vacuum plating process for communication products
05/12/2010CN101705469A Growth of in-situ thin films by reactive evaporation
05/12/2010CN101705468A Method for preparing slow-release type skeleton-type TiN/Cu-Zu metal layer antibacterial film
05/12/2010CN101705467A Method for preparing rotary ceramic target
05/12/2010CN101704076A Preparation method of ingot material for target material production
05/12/2010CN101200802B Engine inner surface ceramic treatment method
05/12/2010CN101153383B Control method for ionic beam electric charge
05/12/2010CN101044260B Thin film forming apparatus and method thereof
05/12/2010CN101041889B Film plating method
05/12/2010CN101017761B Metal gas mixing ion injector
05/11/2010US7714504 Multicolor organic electroluminescent device formed of vertically stacked light emitting devices
05/11/2010US7713639 made of magnesium oxide containing at least one rare earth element selected from rare earth elements in which the content of the rare earth element is 5.0x10-5 to 6.0x10-4 per 1 part by weight of the magnesium oxide
05/11/2010US7713638 Layer system
05/11/2010US7713635 Copper oxide thin film low-friction material and film-forming method therefor
05/11/2010US7713591 disk-shaped longitudinal granular magnetic recording medium having high orientation ratio in circumferential direction is patterned to form uniform array of magnetic islands which are radiated with ions to increase magnetic exchange coupling between grains, aligning axes of magnetic anisotropy
05/11/2010US7713390 Ground shield for a PVD chamber
05/11/2010US7713389 intermediate layer is deposited at relatively low sputtering pressure to thereby reduce roughness of recording layer RL and overcoat, while nucleation film and RL are deposited at substantially higher sputtering pressures; resulting disk has good recording properties and improved corrosion resistance
05/11/2010US7713388 stress engineered springs on semiconductor substrate; at least one structure component formed of first material on substrate such that structure is out of plane of substrate; first coating of second material coats structure; second coating of non-oxidizing material coats structure at lesser thickness
05/11/2010US7713373 introducing oxygen-containing gas in silver vapor atmosphere, carrying web-like base film in silver vapor atmosphere to form thin film of metallic silver on surface of web, oxidizing film into thin film of silver oxide, drawing out base film to obtain base layer, laminating with thermally sealable layer
05/11/2010US7713364 Manganese alloy sputtering target and method for producing the same
05/11/2010US7712514 Sputter targets and methods of manufacturing same to reduce particulate emission during sputtering
05/11/2010US7712432 Printing apparatus and method for bonding material
05/11/2010CA2332856C Method for deposition of wear resistant coatings to improve service life of coated components
05/06/2010WO2010051282A1 Low-temperature pulsed dc reactive sputtering deposition of thin films from metal targets
05/06/2010WO2010051040A1 Method of making a sputter target and sputter targets made thereby
05/06/2010WO2010051024A1 Facilitating adhesion between substrate and patterned layer
05/06/2010WO2010050542A1 Hard multilayer film formed body and method for manufacturing same
05/06/2010WO2010050409A1 Method for storing target comprising rare earth metal or oxide thereof
05/06/2010WO2010050374A1 Surface covered tool
05/06/2010WO2010050359A1 Multilayer film sputtering device and multilayer film formation method
05/06/2010WO2010050358A1 Scintillator panel, radiation detector, and processes for producing these
05/06/2010WO2010050292A1 Processes for producing dielectric film and semiconductor device, dielectric film, and recording medium
05/06/2010WO2010050166A1 Device for supplying film forming material
05/06/2010WO2010049279A1 A vacuum vapor coating device for coating a substrate
05/06/2010WO2010049064A1 Method and device for applying or embedding particles to/in a layer applied by plasma coating
05/06/2010WO2010049012A1 Hafnium oxide or zirconium oxide coating
05/06/2010WO2010048975A1 Hafnium oxide coating
05/06/2010WO2010048931A1 Apparatus for partial covering of a component zone
05/06/2010WO2009151386A8 Coated cutting tool for metal cutting applications generating high temperatures
05/06/2010US20100112316 Visual camouflage with thermal and radar suppression and methods of making the same
05/06/2010US20100112293 Device housing and method for manufacturing the same
05/06/2010US20100112237 Thermal transfer donor elements with ionic liquids
05/06/2010US20100112233 Method for manufacturing piezoelectric device
05/06/2010US20100112194 Mask fixing device in vacuum processing apparatus
05/06/2010US20100110860 Data storage media containing magnesium metal layer
05/06/2010US20100110144 Applying a Layer to a Nozzle Outlet
05/06/2010US20100109058 Conductive oxynitride and method for manufacturing conductive oxynitride film
05/06/2010US20100108951 Material for transparent conductive film
05/06/2010US20100108638 Method for producing a mould for nanostructured polymer objects
05/06/2010US20100108636 Integrated Tool for Fabricating an Electronic Component
05/06/2010US20100108504 Sample fixing device of evaporation machine
05/06/2010US20100108503 Chalcogenide alloy sputter targets for photovoltaic applications and methods of manufacturing the same
05/06/2010US20100108502 Sputtering Target and Oxide Semiconductor Film
05/06/2010US20100108501 Mo-based sputtering target plate and method for manufacturing the same
05/06/2010US20100108500 Encapsulated sputtering target
05/06/2010US20100108499 Sputtering target for forming phase-change film and method for manufacturing the same
05/06/2010US20100108496 Sputtering apparatus, thin film formation apparatus, and magnetic recording medium manufacturing method
05/06/2010US20100108495 Thin film formation apparatus and magnetic recording medium manufacturing method
05/06/2010US20100108494 Microporous article having metallic nanoparticle coating
05/06/2010US20100107982 Vacuum deposition apparatus part and vacuum deposition apparatus using the part
05/06/2010US20100107980 Method and apparatus for extracting ions from an ion source for use in ion implantation
05/06/2010US20100107761 Vibratory gyroscopic device for determining angular velocity
05/06/2010US20100107672 Dual substrate loadlock process equipment
05/06/2010DE102008043361A1 Anschlussdraht und Verfahren zur Herstellung eines solchen Lead wire and method for producing such
05/05/2010EP2182087A1 A vacuum vapor coating device for coating a substrate
05/05/2010EP2182083A1 Copper-gallium alloy sputtering target, method for fabricating the same and related applications
05/05/2010EP2182016A1 Graft copolymer, thermoplastic resin composition, and molded object
05/05/2010EP2181759A2 Methods for introduction of a reactive material into a vacuum chamber
05/05/2010EP2181200A2 Method of patterning vapour deposition by printing
05/05/2010EP1422316B1 Method for cleaning reaction container
05/05/2010EP1381708B1 Method of optimizing target profile
05/05/2010CN201447502U Continuous vacuum coater with multiple chambers
05/05/2010CN201447501U Coated line rotating water target head system
05/05/2010CN1970827B Method for making die with multilayer diamond-like carbon film
05/05/2010CN1955336B Barrier mechanism
05/05/2010CN1934679B Method and apparatus for forming silicon dots
05/05/2010CN1934286B Process for producing material film and material film production apparatus
05/05/2010CN1922338B Carbonaceous thin film, process for producing the same and member utilizing the thin film
05/05/2010CN1871662B Silver selenide film stoichiometry and morphology control in sputter deposition
05/05/2010CN1831185B Evaporate source module and vapor deposited apparatus using thereof
05/05/2010CN1776008B Vacuum chamber and dividing method thereof
05/05/2010CN1726302B Method of cleaning a coated process chamber component
05/05/2010CN1716473B Method for producing multilayer ceramic capacitor using vacuum sputtering method
05/05/2010CN1541196B Visible-light-responsive photoactive coating, coated article, and method of making same
05/05/2010CN101702032A Method for measuring ionic translation energy of laser plasma
05/05/2010CN101701332A Method for preparing compound diamond-like carbon coating by using medium-frequency magnetic-control glow discharge method
05/05/2010CN101701328A Plastic deforming method of sputtering target material
05/05/2010CN101700703A Chromium-plated plastic product
05/05/2010CN101700592A Method for soldering specific metal difficult to solder by ion injection deposition pretreatment
05/05/2010CN101700573A Mold for molding magnetic material powder with high hardness and high wear resistance and manufacturing method thereof
05/05/2010CN101116170B Encapsulated wafer processing device and process for making thereof
05/05/2010CN101057021B Metal-coated textile
05/05/2010CN101031989B Method for the production of magnetron-coated substrates and magnetron sputter source
05/05/2010CN101001972B Method for sticking metallic thin sheet to frame, and device therefor
05/04/2010US7710015 Self-emitting display
05/04/2010US7709082 vaporizing metal under vacuum conditions, optionally in oxidizing atmosphere; lithography; superimposing; electrolytic capacitors
05/04/2010US7709062 Scanning ion beams; filling aperture; process control