Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
09/2010
09/01/2010CN101820016A Method for preparing titanium dioxide ultraviolet photoelectric detector
09/01/2010CN101820005A Method for preparing Mn-doped beta-FeSi2 film
09/01/2010CN101820003A Doubles-layer zinc oxide transparent and conductive film for film solar cell and preparation method thereof
09/01/2010CN101819071A Film thermocouple and manufacturing method thereof
09/01/2010CN101819030A Method and system for monitoring surface roughness of magnetic control spattering target
09/01/2010CN101818331A Functional film and method for manufacturing the functional film
09/01/2010CN101818330A Unbalanced magnetron sputtering C/Ta graphite-like carbon film and preparation method thereof
09/01/2010CN101818329A Sand spraying, washing and drying automation integrated device
09/01/2010CN101818328A Preparation method of multilayer compound solar energy selective absorption plating layer
09/01/2010CN101818327A Method for preparing barium dititanate (BaTi2O5) ferroelectric film on silicon (Si) single crystal substrate
09/01/2010CN101818326A Sputtering device
09/01/2010CN101818325A Method for preparing coating having continuous transition layer by using intense pulsed ion beam
09/01/2010CN101818324A Method for growing n-type ZnMgO:Ga transparent conductive film by flexible substrate
09/01/2010CN101818323A Method for cladding modified tin base or indium base lead-free solder alloy powder
09/01/2010CN101818322A Composition for making metal matrix composites
09/01/2010CN101818321A AlCrN composite coating on surface of piston ring and process thereof
09/01/2010CN101818294A Nanometer composite phase-change material, preparation method and optimization method
09/01/2010CN101818009A Imitation electroplating nano sheet aluminum slurry and preparation method thereof
09/01/2010CN101817644A Hypovanadic oxide-based composite film with adjustable radiance and preparation method thereof
09/01/2010CN101580269B Method for preparing green emission ZnO nano-rod
09/01/2010CN101417380B Manufacture method of composite roller for rolling narrow strip
09/01/2010CN101407907B Sheath for producing target material by hot isostatic pressing and method for producing target material
09/01/2010CN101407904B Method for producing ITO target material by hot isostatic pressing
09/01/2010CN101328576B Vacuum film coating equipment and atmosphere turntable therefor
09/01/2010CN101280418B Multi-source vacuum evaporation device having multi-layer radial type evaporation source distribution structure
09/01/2010CN101235480B Method for preparing antimony-doping tin oxide thin film carrier material
09/01/2010CN101215684B Ferroelectric film, semiconductor device, ferroelectric film manufacturing method, and ferroelectric film manufacturing apparatus
09/01/2010CN101168834B Mask and deposition device adopting the mask
08/2010
08/31/2010US7786002 Method for producing a component comprising a conductor structure that is suitable for use at high frequencies
08/31/2010US7785671 metal substrate, metal bonding layer, ceramics thermal barrier; columnar structure of stabilized zirconia, or ZrO2-HfO2 solid solution; simultaneously melting two ZrO2 deposition and Lanthanum oxide deposition materials by electron beam physical vapor deposition; low thermal conductivity; durability
08/31/2010US7785663 Successive vapour deposition system, vapour deposition system, and vapour deposition process
08/31/2010US7785456 Magnetic latch for a vapour deposition system
08/31/2010US7785455 Cross-contaminant shield in sputtering system
08/31/2010US7785454 Gas diffusion electrodes, membrane-electrode assemblies and method for the production thereof
08/31/2010US7785449 Magnetron unit, magnetron sputtering apparatus, and method of manufacturing electronic device
08/31/2010US7785441 Plasma generator, plasma control method, and method of producing substrate
08/26/2010WO2010096533A1 Physical vapor deposition with impedance matching network
08/26/2010WO2010096340A1 Simplified powder feeding and vaporization apparatus
08/26/2010WO2010035128A4 Evaporator for organic materials and method for evaporating organic materials
08/26/2010US20100217373 Implantable graft and methods of making same
08/26/2010US20100215975 Hard coating film, method of formation thereof, and material coated with hard coating film
08/26/2010US20100215950 Glass or glass-ceramic substrate with scratch-resistant coating and method for the production thereof
08/26/2010US20100215932 Wide-angle highly reflective mirrors at 193nm
08/26/2010US20100215929 Organic light emitting diode display
08/26/2010US20100215915 Method for manufacture and coating of nanostructured components
08/26/2010US20100215892 Thin film for reflection film or for semi-transparent reflection film, sputtering target and optical recording medium
08/26/2010US20100215848 Vacuum treatment of strip-shaped substrates
08/26/2010US20100215788 Mold and method for producing the same
08/26/2010US20100215643 Anti-infective functionalized surfaces and methods of making same
08/26/2010US20100214369 Piezoelectric film, method for forming piezoelectric film, piezoelectric device and liquid discharge device
08/26/2010US20100214230 ITO layer manufacturing process & application structure
08/26/2010US20100213851 Plasma source
08/26/2010US20100213166 Process and Device for The Precision-Processing Of Substrates by Means of a Laser Coupled Into a Liquid Stream, And Use of Same
08/26/2010US20100213161 Capillary-Channel Probes For Liquid Pickup, Transportation And Dispense Using Stressy Metal
08/26/2010US20100213055 Vacuum arc vaporisation source and also a vacuum arc vaporisation chamber with a vacuum arc vaporisation source
08/26/2010US20100213054 Vacuum coating apparatus with mutiple anodes and film coating method using the same
08/26/2010US20100213053 Sputter-coating apparatus
08/26/2010US20100213048 Magnetron sputtering cathode, magnetron sputtering apparatus, and method of manufacturing magnetic device
08/26/2010US20100213047 High-frequency sputtering device
08/26/2010US20100212596 Weight plate of vacuum evaporation apparatus and vacuum evaporation apparatus using the same
08/26/2010DE112008002678T5 Schichtbildungsvorrichtung und Schichtbildungsverfahren Film forming apparatus and film forming method
08/26/2010DE102009009022A1 Verfahren und Vorrichtung zur Beschichtung von flachen Substraten mit Chalkogenen Method and apparatus for the coating of flat substrates with chalcogens
08/25/2010EP2221395A1 Film formation method, film formation device, piezoelectric film, piezoelectric device and liquid discharge device
08/25/2010EP2221394A1 Thin film mainly composed of titanium oxide, sintered sputtering target suitable for the production of thin film mainly composed of titanium oxide, and method for production of thin film mainly composed of titanium oxide
08/25/2010EP2220265A1 Pvd vacuum coating unit
08/25/2010EP2220264A1 Refractory metal-doped sputtering targets
08/25/2010EP2220263A1 Thin film coating system and method
08/25/2010EP2220007A1 Method of making coated article including ion beam treatment of metal oxide protective film
08/25/2010EP1989340B1 Target arrangement
08/25/2010EP1520290B1 Device for coating substrates by physical vapour deposition, using a hollow cathode discharge method
08/25/2010CN201562674U Device for growth of reflection reducing coating layer of mercury cadmium telluride part
08/25/2010CN201560233U Continuous winding plating device for solar energy selectivity absorption film
08/25/2010CN201560232U Electroplated product with color electroplating structure
08/25/2010CN201559335U Removable ultrathin transfer carrier metal foil
08/25/2010CN1922339B Vapor deposition source with minimized condensation effects
08/25/2010CN1900349B Vacuum device assembly for applying coating onto substrate
08/25/2010CN1766157B Apparatus for fabricating display device
08/25/2010CN101815806A Film forming apparatus and film forming method
08/25/2010CN101812670A Vacuum cavity isolating mechanism
08/25/2010CN101812669A Product positioning and sputtering jig
08/25/2010CN101812668A Method for quickly preparing corrosion-resisting ceramic coating on surface of SPCC cold rolled steel
08/25/2010CN101812667A Magnetron sputtering plating film cathode device
08/25/2010CN101812666A Preparation method of vanadium oxide thin film material for non-refrigerated infrared focal plane array
08/25/2010CN101812665A Method for preparing indium tin oxide (ITO) target material with single-phase structure and high density
08/25/2010CN101812664A Supporting mechanism and automatic elevating device having same
08/25/2010CN101812663A Separate type seal cavity
08/25/2010CN101812662A Mask adhesion unit and deposition apparatus using the same
08/25/2010CN101811660A Co-doped nanometer zinc oxide powder body and preparation method thereof
08/25/2010CN101626143B Epitaxial growth design and method for realizing high-efficiency 1.5mu m communication band laser structure by adopting cylindrical InGaSb quantum dots
08/25/2010CN101556986B Multi-state resistive switching material, thin film prepared therewith, multi-sate resistive switching memory element and application of memory element in memory device
08/25/2010CN101545545B Titanium-nitride cermet composite-material wear-resistant ball valve
08/25/2010CN101503792B Size controllable metal and alloy nanoparticle gas-phase synthesizing method and apparatus
08/25/2010CN101477858B High stability high precision high resistance metal film resistor and sputtering film coating process
08/25/2010CN101368263B Preparation method of silicon nitride/silicon oxide double-layer anti-reflection protective film
08/25/2010CN101361010B Absorption-type multilayer film ND filter and process for producing the same
08/25/2010CN101327710B Method for decorating surface of metal
08/25/2010CN101294283B Method for processing magnesium alloy surface
08/25/2010CN101287858B High-purity ru alloy target, process for producing the same and sputtered film
08/25/2010CN101240412B Design supporting method, system, and program of magnetron sputtering apparatus
08/24/2010US7781625 In presence of ionic liquids or solvent-free ; alkylation of cyclohexene ; isomerization; rearrangement
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