Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
09/2010
09/08/2010CN101827646A Lock device and method for opening the lock device
09/08/2010CN101826475A Apparatus and mask of inspecting mask, and apparatus and method of generating virtual chart
09/08/2010CN101825511A Minitype capacitance type gas sensor and preparation method thereof
09/08/2010CN101824618A Superhard DLC (Diamond-like Carbon) base nano composite coating PCB (Printed Circuit Board) microdriller and manufacturing method thereof
09/08/2010CN101824605A Pretreatment process for processing titanium nitride film deposited on surface of numerical control punch die
09/08/2010CN101824604A Continuous film coating device and film coating process thereof for inner wall of outer glass tube of solar heat collecting tube
09/08/2010CN101824603A Method for manufacturing composite film gas sensor
09/08/2010CN101824602A Magnetron sputtering pulse power supply with high starting voltage
09/08/2010CN101824601A Method for preparing Cu2SixSn1-xS3 photovoltaic film
09/08/2010CN101824600A Magnetron sputtering cathode, magnetron sputtering apparatus, and method of manufacturing magnetic device
09/08/2010CN101824599A Method for preparing Cr target by adopting vacuum casting method
09/08/2010CN101824598A Sputtering apparatus, double rotary shutter unit, and sputtering method
09/08/2010CN101824597A Method for growing p-type ZnO crystal thin film by Li-F codoping
09/08/2010CN101824596A Automatic cooling type power supply device
09/08/2010CN101824595A Nano crystal Cr2N/amorphous WC superhard film with superlattice structure and preparation method thereof
09/08/2010CN101824594A Method for exposing grains on surface of grains-reinforcing aluminum-based composite material and post-treating method
09/08/2010CN101824593A Preparation method of corrosion resistant anti-static silicon film
09/08/2010CN101824592A Deposition method capable of enhancing preferred orientation growth of AlN film
09/08/2010CN101824591A Deposition mas
09/08/2010CN101823353A Metal-diamond-like carbon (Me-DLC) nano composite membrane and preparation method thereof
09/08/2010CN101823147A Method for producing aluminum-titanium alloy target by means of high-intensity current
09/08/2010CN101560641B Tool for realizing both revolution and autorotation and only autorotation on multi-arc ion plating equipment
09/08/2010CN101538700B Method and equipment for preparing II type quantum well with molecular beam epitaxial process
09/08/2010CN101509123B Method for producing small-sized tin indium oxide nano-wire material in low-temperature
09/08/2010CN101463464B Method and apparatus for incline growth of morphology controllable nano luminescent cylindrical film
09/08/2010CN101435067B Preparation of tellurium nano-wire array based on physical vapour deposition
09/08/2010CN101413103B Method for infiltration plating platinum film on zirconium surface
09/08/2010CN101328574B Preparation of high film substrate bond strength photocatalysis TiO2 film
09/08/2010CN101285170B Process for preparing wide-band and wave-absorbing magnetic multilayer membrane
09/08/2010CN101250339B Ultraviolet light curing vacuum coating foundation and finish
09/08/2010CN101217197B A preparation method of gradient anode of solid oxide fuel battery
09/08/2010CN101128911B System and process for high-density, low-energy plasma enhanced vapor phase epitaxy
09/08/2010CN101044283B Improved breathable low-emissivity metallized sheets
09/08/2010CN101035925B Method for deposition of coating on a razor blade edge and razor blade
09/07/2010US7791005 Coil constructions configured for utilization in physical vapor deposition chambers, and methods of forming coil constructions
09/07/2010US7790644 sputtering target doped with titanium and gallium; realizes formation of zinc oxide based transparent conductive film having excellent environmental durability for use such as in solar cells; replacement for expensive indium tin oxide (ITO)
09/07/2010US7790339 Photomask blank
09/07/2010US7790289 Evaporation material for the production of average refractive optical layers
09/07/2010US7790216 electrodeposition; heat treatment
09/07/2010US7790064 Polycrystalline aluminum thin film and optical recording medium
09/07/2010US7790060 conductive Si is applied and coated on SiO2 particles, and sintering in a non-oxidizing environment; silicon is used to render the composition electrically conductive; used as thin films for touch-screen applications, barrier thin films in LCD displays and optical thin films
09/07/2010US7790004 holder includes a reusable base formed, from a ferro-magnetic material, which is attracted to the magnetic latch, and a disposable cover formed from a relatively inexpensive, ferromagnetic, easily formable material, encourages adherence of coating material and has a low vapor pressure at coating temp.
09/07/2010US7790003 magnetron sputter depositing a nanostructured coating comprising Cr or a Cu-Cr mixture on a Cu alloy workpiece which is a hollowed structure such as a rocket or jet engine combustion chamber line; utilizing magnetron and an external sputter target material comprising Cr or Cu, Cr; plasma enhancement
09/02/2010WO2010099091A1 Sputtered piezoelectric material
09/02/2010WO2010099007A1 In situ plasma clean for removal of residue from pedestal surface without breaking vacuum
09/02/2010WO2010098891A2 Electrode compositions and processes
09/02/2010WO2010098308A1 Organic compound steam generator and apparatus for producing organic thin film
09/02/2010WO2010098290A1 Sputtering target material, method for manufacturing sputtering target material, and thin film manufactured using the material and the method
09/02/2010WO2010098200A1 Stack article
09/02/2010WO2010098121A1 Method for manufacturing dielectric body, method for manufacturing semiconductor device, program, and recording medium
09/02/2010WO2010097124A1 Coating system and coating method for producing a coating system
09/02/2010WO2010097040A1 Method for preparing cds film
09/02/2010WO2010080946A3 Non-stick articles
09/02/2010US20100221885 Method of manufacturing dielectric film
09/02/2010US20100221580 Granular Perpendicular Media Interlayer For A Storage Device
09/02/2010US20100221575 Coated glass surfaces and method for coating a glass substrate
09/02/2010US20100221489 Coating on a glass substrate and a coated glass product
09/02/2010US20100221481 Optical data storage media containing substantially inert low melting temperature data layer
09/02/2010US20100221170 Iron Silicide Powder and Method for Production Thereof
09/02/2010US20100220557 Bridge or bottom plate for a timepiece movement
09/02/2010US20100220371 Security Functional Thin Film and Security Product Containing the Functional Thin Film
09/02/2010US20100220305 Optical element and exposure apparatus
09/02/2010US20100219070 Copper Alloy Sputtering Target, Process for Producing the Same and Semiconductor Element Wiring
09/02/2010US20100219064 Film forming method
09/02/2010US20100218978 Method of making an electrical circuit
09/02/2010US20100218801 Graphene and Hexagonal Boron Nitride Planes and Associated Methods
09/02/2010US20100218785 In situ plasma clean for removal of residue from pedestal surface without breaking vacuum
09/02/2010DE112008003056T5 Chalcogenid-Film und Verfahren zu dessen Herstellung Chalcogenide film and process for its preparation
09/02/2010DE102009029902A1 Vacuum coating system for coating substrates in a continuous process, comprises vacuum chambers, which have a compartment system having two compartments arranged one behind other in a flow direction of the substrate and transport openings
09/02/2010DE102004021734B4 Verfahren und Vorrichtung zur kontinuierlichen Beschichtung flacher Substrate mit optisch aktiven Schichtsystemen Method and apparatus for continuous coating of flat substrates with optically active layer systems
09/01/2010EP2224472A1 Substrate and method for manufacturing the same
09/01/2010EP2224024A1 Highly pure lanthanum, sputtering target comprising highly pure lanthanum, and metal gate film mainly composed of highly pure lanthanum
09/01/2010EP2222888A1 Method and apparatus for deposition of diffusion thin film
09/01/2010EP2222887A1 Non-stoichiometric titanium nitride films
09/01/2010EP1915419B1 Glazing system for vehicle tops and windows
09/01/2010EP1797610B1 Gas diffusion electrodes, membrane-electrode assemblies and method for the production thereof
09/01/2010EP1597066B1 Heat treatable coated article with chromium nitride ir reflecting layer and method of making same
09/01/2010CN201567369U Baseplate carrier
09/01/2010CN201567368U Sensing device of vacuum sputtering equipment
09/01/2010CN201567367U Intake controller in TCO coating equipment
09/01/2010CN201567366U Laser coating device based on transparent material
09/01/2010CN201567365U Novel multipurpose film coating machine rotating frame
09/01/2010CN201565676U Novel spline broach
09/01/2010CN1998062B Methods for stable and repeatable plasma ion implantation
09/01/2010CN1946870B Neutralizer
09/01/2010CN1930318B Indium oxide/cerium oxide sputtering target, transparent conductive film and process for producing transparent conductive film
09/01/2010CN1890398B A layered structure
09/01/2010CN1800443B Holding tray for substrate, substrate emendation system using the same and method thereof
09/01/2010CN1800441B Precipitation method and device for plasma reinforced film
09/01/2010CN1714422B Method for the production of a substrate with a magnetron sputter coating and unit for the same
09/01/2010CN1531012B Plasma treating method and treater
09/01/2010CN101822122A Apparatus for irradiation unit
09/01/2010CN101821865A Semiconductor element and method for production of semiconductor element
09/01/2010CN101821860A Production system of thin film solar battery
09/01/2010CN101821819A Transparent conducive film and method for producing the same
09/01/2010CN101821425A Method for coating fuel system components
09/01/2010CN101821424A High-frequency sputtering device
09/01/2010CN101821423A Vacuum thin film forming apparatus
09/01/2010CN101821422A Film forming method and film forming apparatus
09/01/2010CN101820766A Process for limiting the growth of microorganisms