Patents for B24B 49 - Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation (8,827) |
---|
12/17/1998 | DE19724030A1 Rotary and/or translatory machine tool, e.g. for grinding or planing of workpieces |
12/16/1998 | EP0884136A1 Polishing method and polishing apparatus using the same |
12/10/1998 | WO1998055264A1 Semiconductor wafer cmp process monitoring and endpoint |
12/09/1998 | EP0882550A2 Polisher with a vibration detection system |
12/08/1998 | US5846882 Endpoint detector for a chemical mechanical polishing system |
12/08/1998 | US5846121 Method for machining a workpiece by renewing a tool movable range |
12/02/1998 | EP0881484A2 Method and apparatus for in-situ monitoring of thickness during chemical-mechanical polishing |
12/02/1998 | EP0881040A2 Method and apparatus for in-situ monitoring of thickness using a multi-wavelength spectrometer during chemical-mechanical polishing |
12/02/1998 | EP0881039A2 Wafer polishing apparatus with retainer ring |
12/02/1998 | EP0881036A2 Lens shape measuring apparatus |
12/01/1998 | US5842909 System for real-time control of semiconductor wafer polishing including heater |
11/25/1998 | EP0880023A1 Method and device for the automatic detection of surface faults during the continuous mechanical removal of material from casted products |
11/24/1998 | US5841662 Method and apparatus for chucked work piece recognition |
11/17/1998 | US5836805 Method of forming planarized layers in an integrated circuit |
11/12/1998 | DE19719503A1 Semiconductor wafer chemical and mechanical polishing device |
11/10/1998 | US5834645 In a chemical mechanical planarization system |
11/10/1998 | US5834377 In situ method for CMP endpoint detection |
11/10/1998 | US5834375 Chemical-mechanical polishing planarization monitor |
11/10/1998 | US5833519 Method and apparatus for mechanical polishing |
11/05/1998 | DE19720623C1 Polishing device for semiconductor substrate |
11/03/1998 | US5830041 Method and apparatus for determining endpoint during a polishing process |
10/29/1998 | DE19717795A1 Method of trimming profiled grinding wheels with hard implement |
10/28/1998 | EP0873544A1 In situ technique for monitoring and controlling a process of chemical-mechanical-polishing via a radiative communication link |
10/27/1998 | US5827112 Method and apparatus for grinding wafers |
10/27/1998 | US5827111 Method and apparatus for grinding wafers |
10/27/1998 | US5826453 Burnishing method and apparatus for providing a layer of compressive residual stress in the surface of a workpiece |
10/22/1998 | DE19715606A1 Guide rail for tip-less or centreless grinding machine |
10/20/1998 | US5825180 Magnetic disk test apparatus having heads moveable along substantially parallel axes |
10/20/1998 | US5823853 Apparatus for the in-process detection of workpieces with a monochromatic light source |
10/14/1998 | EP0870576A2 Polishing Apparatus |
10/14/1998 | CN1195840A Manufacturing method for magnetic heads |
10/14/1998 | CN1195599A Automatic lapping method of thin film element and lapping apparatus using the same |
10/14/1998 | CN1195597A Automatic lapping method and lapping apparatus using the same |
10/13/1998 | US5820448 Carrier head with a layer of conformable material for a chemical mechanical polishing system |
10/07/1998 | EP0868975A1 Polishing apparatus |
10/07/1998 | EP0868968A2 Grinder and grinding method |
10/06/1998 | US5816896 Method and device for polishing gemstones |
10/06/1998 | US5816895 Surface grinding method and apparatus |
10/06/1998 | US5816892 Positioning control for combined milling machine and internally positioned grinding wheel |
10/06/1998 | US5816891 Performing chemical mechanical polishing of oxides and metals using sequential removal on multiple polish platens to increase equipment throughput |
10/06/1998 | US5816890 Electrical lap guide wiring configuration |
09/30/1998 | EP0867261A2 Spectacle lens production |
09/29/1998 | US5813900 Grinding machine for grinding cylindrical workpieces |
09/23/1998 | EP0865875A2 Precise polishing apparatus and method |
09/23/1998 | EP0865874A2 Polishing apparatus and method |
09/23/1998 | EP0865871A2 Spectacle lens production |
09/23/1998 | EP0865870A2 Method for sizing natural- or synthetic-stone elements, particularly ceramic tiles, and machine for carrying out the method |
09/23/1998 | EP0865342A1 Improvements in and relating to grinding machines |
09/15/1998 | USRE35898 Lens periphery processing apparatus, method for obtaining processing data, and lens periphery processing method |
09/15/1998 | US5807163 Method and apparatus for controlling the diameter and geometry of an orifice with an abrasive slurry |
09/08/1998 | US5803798 Dual column abrading machine |
09/01/1998 | US5801066 Method and apparatus for measuring a change in the thickness of polishing pads used in chemical-mechanical planarization of semiconductor wafers |
09/01/1998 | US5800248 Control of chemical-mechanical polishing rate across a substrate surface |
09/01/1998 | US5800247 Non-contact gaging apparatus and method |
08/26/1998 | EP0860237A2 Surface planarization apparatus and work measuring method |
08/26/1998 | EP0859689A1 Apparatus for checking the diameter of crankpins rotating with an orbital motion |
08/26/1998 | CN2288816Y Variable frequency controller for conveyer belt of electric abrasive finishing machine |
08/20/1998 | WO1998035782A1 Device and method for reproducible surface finishing of a test surface |
08/19/1998 | CN1190791A Method and apparatus for controlling flatness of polished semiconductor wafer |
08/18/1998 | US5796229 Method and apparatus for robotic force controlled material removal with programmable overload release function |
08/13/1998 | WO1998034760A1 Method and apparatus for cleaning workpiece surfaces and monitoring probes during workpiece processing |
08/12/1998 | EP0857538A1 Method for manufacturing rotary cutting tool and rotary cutting tool |
08/11/1998 | US5791969 System and method of automatically polishing semiconductor wafers |
08/05/1998 | EP0856379A1 Grinding belt assembly for machining a cylindrical bearing surface on a workpiece |
08/05/1998 | EP0713435B1 Environmental conditioning of workpieces |
08/04/1998 | US5789918 Temperature compensated differential transformer and a measuring device using the same |
08/04/1998 | US5788432 Method and apparatus for computing allowable spindle rotation speed |
08/04/1998 | US5787595 Method and apparatus for controlling flatness of polished semiconductor wafer |
07/23/1998 | DE19701754A1 Surface grinding method with rotary wheel |
07/22/1998 | EP0853527A1 Device for measuring or checking an orbitally mobile cylindrical part during machining thereof |
07/21/1998 | US5782678 Dual column abrading machine |
07/21/1998 | US5782675 Apparatus and method for refurbishing fixed-abrasive polishing pads used in chemical-mechanical planarization of semiconductor wafers |
07/21/1998 | US5782674 Sensors for internal grinding machines |
07/15/1998 | CN1187407A Polishing method of substrate and polishing device therefor |
07/14/1998 | US5779518 Superfinishing method and apparatus |
07/07/1998 | US5777739 Endpoint detector and method for measuring a change in wafer thickness in chemical-mechanical polishing of semiconductor wafers |
07/07/1998 | US5775980 Polishing method and polishing apparatus |
06/30/1998 | US5773731 Method and apparatus for detecting residual grinding amount |
06/30/1998 | US5771599 Method of and instrument for measuring roll diameter in roll grinder |
06/25/1998 | WO1998027252A1 Method for preparing a gemstone for polishing |
06/25/1998 | DE19650155C1 Fine finishing machine for workpieces |
06/24/1998 | EP0849041A2 Polishing method |
06/23/1998 | US5770522 Polishing block heater |
06/18/1998 | DE19755716A1 Device for determining the quantity of material removed e.g. from a semiconductor wafer |
06/17/1998 | EP0847835A1 Method and apparatus for polishing semiconductor substrates |
06/17/1998 | EP0782491B1 Grinding machine |
06/17/1998 | CN1185028A Method and device for polishing semiconductor wafers |
06/16/1998 | US5766057 Centerless grinding machine |
06/11/1998 | WO1998024590A1 Method and apparatus for centerless grinding |
06/09/1998 | US5762539 Apparatus for and method for polishing workpiece |
06/09/1998 | US5762537 System for real-time control of semiconductor wafer polishing including heater |
06/09/1998 | US5762536 Sensors for a linear polisher |
06/09/1998 | US5761821 Gauging the diameter of eccentric cylindrical workpiece parts |
06/09/1998 | US5761781 Method of manufacturing a piezoelectric ceramic resonator |
06/04/1998 | DE19648903A1 Diamond truing and dressing procedure using known diamond dresser |
06/03/1998 | EP0844920A1 Method and apparatus for shaping an orifice with an abrasive slurry |
06/02/1998 | US5759085 Process for avoiding overstressing a workpiece during grinding |
05/14/1998 | WO1998020487A1 Gimbal micropositioning device |
05/14/1998 | WO1998019828A1 Multi-point bending of bars during fabrication of magnetic recording heads |
05/13/1998 | EP0841123A1 A carrier head with a flexible membrane for a chemical mechanical polishing system |