Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
03/2013
03/27/2013CN102077318B Method and apparatus for laser annealing
03/27/2013CN102074576B Normally off gallium nitride field effect transistors (fet)
03/27/2013CN102074544B Through-silicon via structure and a process for forming the same
03/27/2013CN102067350B Functionalized molecular element, manufacturing method thereof, and functionalized molecular device
03/27/2013CN102067348B Nitride semiconductor element and method for production thereof
03/27/2013CN102067279B Method and system for supplying a cleaning gas into a process chamber
03/27/2013CN102064133B Method for making semiconductor device
03/27/2013CN102064105B Substrate processing method
03/27/2013CN102057476B 快速衬底支撑件温度控制 Quick substrate support temperature control
03/27/2013CN102057469B 清洁装置 Cleaning device
03/27/2013CN102057464B Spin processing apparatus and spin processing method
03/27/2013CN102054771B Method for manufacturing complementary metal-oxide semiconductor (CMOS) image sensor
03/27/2013CN102054769B Forming method of complementary metal oxide semiconductor (CMOS) structure
03/27/2013CN102054716B Method and structure for molding leadframe strip
03/27/2013CN102054658B Heating fixture of packaging lineup process and method thereof
03/27/2013CN102053106B Defect detection method
03/27/2013CN102044545B Flash memory of discrete gate and manufacturing method thereof
03/27/2013CN102044466B Electrostatic chuck and method for eliminating residual electric charges of electrostatic chuck
03/27/2013CN102034860B Group III nitride semiconductor device, production method therefor, power converter
03/27/2013CN102034822B Terrace metal-oxide-semiconductor field effect transistor (MOSFET) with step-like terrace gate and improved source body contact performance and manufacturing method thereof
03/27/2013CN102034754B Method for fabricating an integrated circuit device and photoresist stripping composition
03/27/2013CN102031557B Epitaxial wafer and production method thereof
03/27/2013CN102027584B Semiconductor component fabrication method and semiconductor component
03/27/2013CN102024757B 像素结构及其制造方法 Pixel structure and manufacturing method
03/27/2013CN102024741B Method for forming shallow trench isolation structure
03/27/2013CN102017216B Device having hole injection/transport layer, method for manufacturing the same, and ink for forming hole injection/transport layer
03/27/2013CN102016722B Robot for in-vacuum use
03/27/2013CN102013386B Heating tool in semiconductor encapsulating and routing process and method thereof
03/27/2013CN102004220B Method and system for testing chips
03/27/2013CN101999161B Apparatus including heating source reflective filter for pyrometry
03/27/2013CN101996940B Semiconductor device and method of manufacturing the same
03/27/2013CN101996918B Method for aligning substrate
03/27/2013CN101996917B Method of aligning substrate
03/27/2013CN101996908B Method for detecting wafer
03/27/2013CN101996892B System level photoelectric structure and manufacturing method thereof
03/27/2013CN101993032B Method for manufacturing microstructural film pattern and TFT-LCD array substrate
03/27/2013CN101989617B Fin structure for a semiconductor transistor and its manufacture method
03/27/2013CN101978794B Power combiner and microwave introduction mechanism
03/27/2013CN101978477B Method for film formation, apparatus for film formation, and computer-readable recording medium
03/27/2013CN101971349B Method for producing thin film transistor and thin film transistor
03/27/2013CN101970338B Microfluidic device and method of operation
03/27/2013CN101969024B Method for double pattern density
03/27/2013CN101965542B Photosensitive polyorganosiloxane composition
03/27/2013CN101964381B P-n transparent homojunction diode and preparation method thereof
03/27/2013CN101939838B Multiple memory cells and method
03/27/2013CN101939829B Method of producing thin film transistor and thin film transistor
03/27/2013CN101933402B Multiple phase RF power for electrode of plasma chamber
03/27/2013CN101933170B Method for the production of a semiconductor structure
03/27/2013CN101930973B Electrostatic discharge structures and methods of manufacture
03/27/2013CN101925991B Bonding apparatus, and method for adjusting height of bonding stage on bonding apparatus
03/27/2013CN101922034B Apparatus and method for plating a substrate
03/27/2013CN101919041B Substrate holder, substrate supporting apparatus, substrate processing apparatus, and substrate processing method using the same
03/27/2013CN101911247B Semiconductor device and method for manufacturing the same
03/27/2013CN101896998B Semiconductor substrate, method for producing semiconductor substrate, and electronic device
03/27/2013CN101890548B Solder printing type die bonding method
03/27/2013CN101887857B Manufacturing method of semiconductor device
03/27/2013CN101879700B Chemical mechanical polishing device, polishing method and system for wafer
03/27/2013CN101877317B Non-planar transistors and methods of fabrication thereof
03/27/2013CN101859694B Film forming apparatus and film forming method
03/27/2013CN101859693B Substrate processing apparatus, and substrate processing method
03/27/2013CN101855334B High negative zeta potential polyhedral silsesquioxane composition and method for damage free semiconductor wet clean
03/27/2013CN101840885B Method of manufacturing electronic device and display
03/27/2013CN101840884B Substrate etching method and system
03/27/2013CN101840843B Method of manufacturing integrated circuits and apparatus for making laser marks on a wafer making laser marks on a wafer
03/27/2013CN101828149B Displacement device with precision measurement
03/27/2013CN101826519B LED integrated light source board, special mould and manufacture method
03/27/2013CN101821835B Polishing composition
03/27/2013CN101820135B Semiconductor laser and method of manufacturing semiconductor laser
03/27/2013CN101819926B Method and system for controlling an implantation process
03/27/2013CN101816059B Method for curing a dielectric film
03/27/2013CN101814422B Apparatus and method for treating substrate
03/27/2013CN101807590B Multispectral photosensitive component
03/27/2013CN101800245B Structure and method for forming inter-poly dielectric in a shielded gate field effect transistor
03/27/2013CN101796627B Process for obtaining a hybrid substrate comprising at least one layer of a nitrided material
03/27/2013CN101796620B Semiconductor device and method for manufacturing the same
03/27/2013CN101790784B Stage apparatus assembling method
03/27/2013CN101784958B Photosensitive composition, cured film formed therefrom, and device having cured film
03/27/2013CN101779136B Apparatus and method for sensing battery cell voltage using isolation capacitor
03/27/2013CN101745865B Substrate polishing apparatus and method of polishing substrate using the same
03/27/2013CN101743627B Methods of forming improved epi fill on narrow isolation bounded source/drain regions and structures formed thereby
03/27/2013CN101743615B Apparatus and method for wet treatment of disc-like articles
03/27/2013CN101740478B Dual mosaic method
03/27/2013CN101740336B Cavity window and plasma process cavity
03/27/2013CN101730461B Aligning method used for welding BGA chip
03/27/2013CN101687980B Heat curable resin compositon
03/27/2013CN101685824B Gallium nitride-based epitaxial wafer and method of fabricating epitaxial wafer
03/27/2013CN101681844B Method of depositing materials on a non-planar surface
03/27/2013CN101663766B Iii-nitride light emitting devices grown on tempaltes to reduce strain
03/27/2013CN101656211B Method for manufacturing high-frequency high-voltage diode by using gas phase doping area fused silicon chip
03/27/2013CN101650527B Gray tone mask blank, gray tone mask and forming method of product machining identification or product information identification
03/27/2013CN101630629B Cmp by controlling polish temperature
03/27/2013CN101626001B Semiconductor device and method of manufacturing the same
03/27/2013CN101596508B Normal pressure aerosol spray apparatus and method of forming a film using the same
03/27/2013CN101595565B Method of producing precision vertical and horizontal layers in a vertical semiconductor structure
03/27/2013CN101585019B Semiconductor processing device and nozzle structure used in same
03/27/2013CN101567382B Gate structure and method for forming same
03/27/2013CN101552292B Semiconductor device and method of manufacturing the same
03/27/2013CN101542686B Vacuum processing apparatus and film forming method using vacuum processing apparatus
03/27/2013CN101533229B Reticle for projection exposure apparatus and exposure method using the same
03/27/2013CN101533216B Manufacturing method of a semiconductor device