Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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03/03/1992 | US5093224 Electron-induced polymerization |
03/03/1992 | US5093152 Process for protecting an optical substrate by plasma deposition |
03/03/1992 | US5092978 Apparatus for fabricating piezoelectric films |
03/03/1992 | US5092957 Carrier-lifetime-controlled selective etching process for semiconductors using photochemical etching |
03/03/1992 | US5092937 Noncontamination by cleaning, rinsing and drying in inert gas of high purity |
03/03/1992 | US5092729 Apparatus for transporting a wafer and a carrier used for the same |
03/03/1992 | US5092557 Apparatus for holding and positioning a substrate cassette |
03/03/1992 | US5092080 Apparatus for opening and closing core tube |
03/03/1992 | US5092036 Filling metal tubes, then etching tubes away |
03/03/1992 | US5092033 Method for packaging semiconductor device |
03/03/1992 | US5092032 Manufacturing method for a multilayer printed circuit board |
03/03/1992 | US5092031 Method and apparatus for bonding external leads |
03/03/1992 | CA1296816C Process for producing a semiconductor article |
03/03/1992 | CA1296814C Single wafer moated signal processor |
03/03/1992 | CA1296802C Semiconductor device for charge-coupled device |
03/03/1992 | CA1296560C Non-precipitating photoresist composition |
03/01/1992 | WO1992003590A1 Method and apparatus for reducing wafer contamination |
03/01/1992 | CA2194855A1 Process gas distribution system and method |
03/01/1992 | CA2089646A1 Method and apparatus for reducing wafer contamination |
02/28/1992 | CA2049595A1 Borate coinitiators for photopolymerizable compositions |
02/27/1992 | DE4026822A1 Surface mountable device carrier prodn. for reliability - esp. for mfg. tape-automated-bonding, by forming bond and contact elements on insulating polyimide film and resistance electroplating |
02/27/1992 | DE4026797A1 Forming recombination centres in semiconductor component - irradiating semiconductor by ions of preset energy and diffusing recombination atoms |
02/27/1992 | DE4026710A1 Thickening gold layer - on titanium-tungsten bond layer of ceramic circuit, by electroplating, with reduced blister formation |
02/27/1992 | DE4026666A1 Mfg. monolithic semiconductor chip on substrate wafer - applying beam leads from contact windows to chip edge via insulating layer |
02/26/1992 | EP0472465A2 Method of depositing insulating layer on underlaying layer using plasma-assisted CVD process using pulse-modulated plasma |
02/26/1992 | EP0472452A1 Power transistor and its manufacturing process |
02/26/1992 | EP0472451A1 Hybrid integrated circuit interconnection structure and method of fabrication |
02/26/1992 | EP0472441A1 Two-step cleaning method for semiconductor devices |
02/26/1992 | EP0472435A1 Carrier for film carrier type semiconductor device |
02/26/1992 | EP0472357A2 A semiconductor integrated circuit |
02/26/1992 | EP0472347A2 Method of making a contact on a group III-V compound semiconductor device |
02/26/1992 | EP0472331A2 Integrated circuit resistor fabrication using focused ion beam |
02/26/1992 | EP0472328A2 Method of making a polysilicon emitter bipolar transistor |
02/26/1992 | EP0472316A2 Multichannel plate assembly for gas source molecular beam epitaxy |
02/26/1992 | EP0472290A1 Resist materials |
02/26/1992 | EP0472277A1 Method for laser scribing substrates |
02/26/1992 | EP0472262A1 Heterojunction bipolar transistor |
02/26/1992 | EP0472241A2 Electrically programmable and erasable semiconductor memory and its operation method |
02/26/1992 | EP0472240A2 Electrically programmable and erasable semiconductor memory and its method of operation |
02/26/1992 | EP0472217A1 Method of manufacturing semiconductor devices |
02/26/1992 | EP0472199A1 Method of manufacturing plastic molded semiconductor device and apparatus for manufacturing the same |
02/26/1992 | EP0472165A1 Low dielectric inorganic composition for multilayer ceramic package |
02/26/1992 | EP0472135A1 Integrated circuit chip formed with a capacitor having a low voltage coefficient, and method of making such capacitor |
02/26/1992 | EP0472112A2 Method and apparatus for covering an inner region of a vacuum chamber |
02/26/1992 | EP0472065A1 User-proof post-assembly offset voltage trim |
02/26/1992 | EP0472055A1 Misfet |
02/26/1992 | EP0472045A1 Method and apparatus for controlling plasma processing |
02/26/1992 | EP0472041A2 Method and apparatus for detecting deformations of leads of semiconductor device |
02/26/1992 | EP0472029A1 Light-sensitive composition and process for the formation of relief pattern |
02/26/1992 | EP0472012A2 Method of boron diffusion into semiconductor wafers |
02/26/1992 | EP0471845A1 Method of forming silicon oxide film |
02/26/1992 | EP0471844A1 Silicon oxide film and semiconductor device having the same |
02/26/1992 | EP0471819A1 Apparatus for ion implantation |
02/26/1992 | EP0471737A1 Semiconductor device. |
02/26/1992 | EP0471664A1 Electrochemical planarization |
02/26/1992 | EP0460106A4 Novel glass deposition viscoelastic flow process |
02/26/1992 | EP0144444B1 Method of manufacturing semiconductor device |
02/26/1992 | CN1059066A Stripping method for removing resist from printed circuit board |
02/26/1992 | CN1059050A 高度集成的半导体存储器件及其制造方法 Highly integrated semiconductor memory device and manufacturing method thereof |
02/25/1992 | WO1992003902A1 Method and device for hermetic encapsulation of electronic components |
02/25/1992 | US5091979 Sub-micron imaging |
02/25/1992 | US5091922 Charge transfer device type solid state image sensor having constant saturation level |
02/25/1992 | US5091882 Nonvolatile semiconductor memory device and method of operating the same |
02/25/1992 | US5091825 Orthogonal bonding method and equipment |
02/25/1992 | US5091772 Semiconductor device and package |
02/25/1992 | US5091770 Semiconductor device having a ceramic package |
02/25/1992 | US5091768 Semiconductor device having a funnel shaped inter-level connection |
02/25/1992 | US5091767 Article comprising a lattice-mismatched semiconductor heterostructure |
02/25/1992 | US5091766 Thyristor with first and second independent control electrodes |
02/25/1992 | US5091763 Self-aligned overlap MOSFET and method of fabrication |
02/25/1992 | US5091762 Semiconductor memory device with a 3-dimensional structure |
02/25/1992 | US5091760 Semiconductor device |
02/25/1992 | US5091744 Illumination optical system |
02/25/1992 | US5091692 Probing test device |
02/25/1992 | US5091689 Constant current circuit and integrated circuit having said circuit |
02/25/1992 | US5091660 Semiconductor logic circuit |
02/25/1992 | US5091657 High speed multiplex switch circuit and method |
02/25/1992 | US5091655 Reduced path ion beam implanter |
02/25/1992 | US5091342 Multilevel resist plated transfer layer process for fine line lithography |
02/25/1992 | US5091341 Method of sealing semiconductor device with resin by pressing a lead frame to a heat sink using an upper mold pressure member |
02/25/1992 | US5091340 Flatness, accuracy |
02/25/1992 | US5091339 Etching, patterning |
02/25/1992 | US5091338 Process for forming heat resistant ohmic electrode |
02/25/1992 | US5091337 Method of manufacturing amorphous-silicon thin-film transistors |
02/25/1992 | US5091335 MBE growth technology for high quality strained III-V layers |
02/25/1992 | US5091334 Semiconductor device |
02/25/1992 | US5091333 Multilayer; interrupting growth temperature control |
02/25/1992 | US5091332 Concurrent forming channel stops and dielectrics |
02/25/1992 | US5091331 Ultra-thin circuit fabrication by controlled wafer debonding |
02/25/1992 | US5091330 Bonding wafer containing grooves |
02/25/1992 | US5091329 Gate oxidation, partial shielding of substrate, doping |
02/25/1992 | US5091328 Method of late programming MOS devices |
02/25/1992 | US5091327 Fabrication of a high density stacked gate eprom split cell with bit line reach-through and interruption immunity |
02/25/1992 | US5091326 EPROM element employing self-aligning process |
02/25/1992 | US5091324 Boron doping to adjust threshold voltage |
02/25/1992 | US5091323 Forming patterned oxidation resistant film, then silicon oxide, removal oxidation resistant film, forming emitters |
02/25/1992 | US5091322 Semiconductor device and method of manufacturing the same |
02/25/1992 | US5091321 Second doping step through emitter contact hole |
02/25/1992 | US5091320 Optical method for controlling thickness of semiconductor |
02/25/1992 | US5091289 Process for forming multi-level coplanar conductor/insulator films employing photosensitive polyimide polymer compositions |