Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
01/1992
01/29/1992EP0468874A2 Lamp annealing process for semiconductor wafer and apparatus for execution of such process
01/29/1992EP0468817A2 Infra-red scanning microscopy
01/29/1992EP0468759A1 Method for crystallising a non-single crystal semiconductor by heating
01/29/1992EP0468758A1 Method of forming insulating films, capacitances, and semiconductor devices
01/29/1992EP0468741A1 Position detecting method
01/29/1992EP0468711A2 Matrix-addressed type display device
01/29/1992EP0468630A2 Method of increasing the breakdown voltage of a MOS transistor without changing the fabrication process
01/29/1992EP0468491A2 Method for checking parts to be measured
01/29/1992EP0468463A2 Semiconductor memory device
01/29/1992EP0468422A2 Semiconductor memory
01/29/1992EP0468409A1 Interface apparatus for transporting substrates between substrate processing apparatus
01/29/1992EP0468275A2 Filmcarrier for tape automated bonding
01/29/1992EP0468274A2 Method of forming an electrode on a mask for manufacturing semiconductor devices, spinner for applying resist to a semiconductor-manufacturing mask, and mask-housing case
01/29/1992EP0468271A1 Bipolar transistor and method of manufacture
01/29/1992EP0468227A1 Positive photoresist composition
01/29/1992EP0468213A2 Semiconductor substrate, method of manufacturing semiconductor substrate and semiconductor device, and method of inspecting and evaluating semiconductor substrate
01/29/1992EP0468136A2 Contact structures for semiconductor devices and method for their manufacture
01/29/1992EP0468071A1 Method of producing micromechanical sensors for the AFM/STM/MFM profilometry and micromechanical AFM/STM/MFM sensor head
01/29/1992EP0468067A1 Yarn for use in setup
01/29/1992EP0468035A1 Diffuser features for spin-coated films
01/29/1992EP0177561B1 Chip selection in automatic assembly of integrated circuit
01/29/1992CN1058298A Silicon film capacitor pressure sensor and its making method
01/29/1992CN1058275A Trap charge relaxation spectra method and its measuring system
01/28/1992US5084842 Dynamic random access memory with enhanced sense-amplifier circuit
01/28/1992US5084825 Process control with guard band and fault limit
01/28/1992US5084808 Lighting optical system
01/28/1992US5084752 Semiconductor device having bonding pad comprising buffer layer
01/28/1992US5084751 Bipolar transistor
01/28/1992US5084746 Semiconductor memory device
01/28/1992US5084744 Field effect transistor with active layer apart from guard-ring
01/28/1992US5084633 Bidirectional current sensing for power MOSFETS
01/28/1992US5084624 Apparatus for making homogeneous the implantation of ions on the surface of planar samples
01/28/1992US5084483 Mixing resists with aolvents in tanks
01/28/1992US5084437 Technetium cuprate as a superconductor and buffer multilayer element
01/28/1992US5084421 Bonding a semiconductor with a paste of silver flake, glass frit, surfactant, thixotropic agent and solvent
01/28/1992US5084419 Method of manufacturing semiconductor device using chemical-mechanical polishing
01/28/1992US5084418 Method of making an array device with buried interconnects
01/28/1992US5084417 Method for selective deposition of refractory metals on silicon substrates and device formed thereby
01/28/1992US5084416 Burying a wiring layer film securely into a contact hole havin g high aspect ratio
01/28/1992US5084415 Adhesive layer on dielectric
01/28/1992US5084414 For VLSI circuits, three step additive process, selectively de positing a tungsten conductor
01/28/1992US5084413 Method for filling contact hole
01/28/1992US5084412 Method of manufacturing a semiconductor device with a copper wiring layer
01/28/1992US5084411 Reduced dislocation spacings
01/28/1992US5084410 Method of manufacturing semiconductor devices
01/28/1992US5084409 Both silicon and gallium arsenide, shadow masking layer is und ercut resulting in planar structure
01/28/1992US5084408 Eliminating unwanted crystal defects in corners of trenches
01/28/1992US5084407 Depositing a blanket layer of silicon over a patterned polysil icon layer and on exposed semiconductor wafer then polishing
01/28/1992US5084406 Method for forming low resistance DRAM digit-line
01/28/1992US5084405 Process to fabricate a double ring stacked cell structure
01/28/1992US5084404 Gate array structure and process to allow optioning at second metal mask only
01/28/1992US5084403 Contact hole
01/28/1992US5084402 Bipolar transistor
01/28/1992US5084401 Stroboscope
01/28/1992US5084400 Oxidizing metallic electrode
01/28/1992US5084323 Oxidation resistant barrier layer for refractory metal
01/28/1992US5084248 Apparatus for growing a compound semiconductor crystal
01/28/1992US5084130 Method for depositing material on depressions
01/28/1992US5084125 Continuous processing, cleaning, removing deposits
01/28/1992US5084071 Method of chemical-mechanical polishing an electronic component substrate and polishing slurry therefor
01/28/1992US5083896 Object handling device
01/28/1992US5083865 Particle monitor system and method
01/28/1992US5083757 Rotational flexure stage
01/28/1992US5083381 Method and apparatus for drying semiconductor materials
01/28/1992US5083364 System for manufacturing semiconductor substrates
01/28/1992CA1295055C Integrated thin-film diaphragm; backside etch
01/28/1992CA1295053C Bilateral switching device
01/28/1992CA1294813C Photoimaging processes and compositions
01/23/1992WO1992001314A1 N-type semiconducting diamond, and method of making the same
01/23/1992WO1992001310A1 Electronic device provided with metal fluoride film
01/23/1992WO1992001309A1 Process for the thin etching of substrates
01/23/1992WO1992001287A1 Device with self-amplifying dynamic mos transistor storage cells
01/23/1992WO1992001233A1 Method and apparatus for resistance measurements on a semiconductor element
01/23/1992WO1992001198A1 Liquid cooled cooling device
01/23/1992WO1992001089A1 Crystallisation process
01/23/1992DE4123158A1 Mfg. conductive layer array - etches masking layer to form number of etched masking layer sections at preset intermediate spacing
01/23/1992DE4122587A1 Semiconductor substrate surface cleaning - by plasma etching using fluorine-contg. gas, renewed etching using fluorine-contg. gas and UV-irradiation at reduced pressure
01/23/1992DE4113590A1 Microcomputer with programming unit - contains overwritable, non-volatile memory with gate and selection circuits facilitating program content definition
01/23/1992DE4022904A1 Verfahren zum anbringen einer die orientierung des kristallgitters einer kristallscheibe angebenden markierung A method for attaching a marker the orientation of the crystal lattice of a crystal disc indicating
01/23/1992DE4022664A1 Bonding tool for connecting electrical leads to contact surfaces - acts as electro-resistance welder and/or thermal bonding unit independently or simultaneously
01/23/1992DE4022545A1 Solder contact points prodn. on semiconductor contact layer - using structurised oxide film of e.g. silica or alumina as solder stop in simple, quick and economical technique
01/22/1992EP0467803A1 Pin-diode having a low initial overvoltage
01/22/1992EP0467799A1 Overvoltage protection device and monolithic manufacturing process thereof
01/22/1992EP0467636A1 Method of manufacturing field effect transistors
01/22/1992EP0467624A1 Apparatus for and method of backside protection during substrate processing
01/22/1992EP0467623A2 Apparatus for and method of protection during substrate processing
01/22/1992EP0467584A2 A method of monitoring product development
01/22/1992EP0467553A1 Integrated circuit device having signal wiring structure of ultrahigh-speed performance
01/22/1992EP0467445A1 Apparatus for projecting a mask pattern on a substrate
01/22/1992EP0467397A1 Apparatus for forming reduced pressure and for processing object
01/22/1992EP0467392A1 Chemical vapor depositions apparatus and method of manufacturing annealed films
01/22/1992EP0467391A2 Plasma apparatus, and method and system for extracting electrical signal of member to which high-frequency-wave is applied
01/22/1992EP0467390A1 Support table for plate-like body and processing apparatus using the table
01/22/1992EP0467361A1 BICMOS gate array device
01/22/1992EP0467356A2 Treatment system having gate device for decompression chamber
01/22/1992EP0467244A1 Semiconductor integrated circuit
01/22/1992EP0467190A2 Process for depositing highly doped polysilicon layer on stepped surface of semiconductor wafer resulting in enhanced step coverage
01/22/1992EP0467081A2 Method of manufacturing a bipolar transistor
01/22/1992EP0467046A2 Device for etching or crating
01/22/1992EP0466939A1 Ic testing device