Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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01/23/1996 | US5486427 Patterned array of uniform metal microbeads |
01/23/1996 | US5486424 Silylated photoresist layer and planarizing method |
01/23/1996 | US5486282 Electroetching process for seed layer removal in electrochemical fabrication of wafers |
01/23/1996 | US5486267 Method for applying photoresist |
01/23/1996 | US5486266 Integrated circuits |
01/23/1996 | US5486265 Chemical-mechanical polishing of thin materials using a pulse polishing technique |
01/23/1996 | US5486264 Laser etching of semiconductors |
01/23/1996 | US5486263 Etching a diamond body with a molten or partially molten metal |
01/23/1996 | US5486237 Polysilicon thin film and method of preparing polysilicon thin film and photovoltaic element containing same |
01/23/1996 | US5486235 Plasma dry cleaning of semiconductor processing chambers |
01/23/1996 | US5486234 Removal of field and embedded metal by spin spray etching |
01/23/1996 | US5486132 For mounting to a tool |
01/23/1996 | US5486080 High speed movement of workpieces in vacuum processing |
01/23/1996 | US5485949 Capillary for a wire bonding apparatus and a method for forming an electric connection bump using the capillary |
01/23/1996 | US5485910 Conveyor |
01/23/1996 | US5485861 Cleaning tank |
01/23/1996 | US5485759 Boat test apparatus |
01/23/1996 | US5485644 Substrate treating apparatus |
01/23/1996 | CA2031459C Surface structure of ceramics substrate and method of manufacturing the same |
01/19/1996 | CA2151850A1 Hot-clock adiabatic gate using multiple clock signals with different phases |
01/18/1996 | WO1996001549A1 Ternary compound film and manufacturing method therefor |
01/18/1996 | WO1996001501A1 Lateral semiconductor structure designed to produce a temperature-compensated voltage limitation |
01/18/1996 | WO1996001500A1 SiC FIELD-EFFECT TRANSISTORS AND METHOD OF MANUFACTURING THEM |
01/18/1996 | WO1996001496A1 Method of manufacturing a semiconductor device with a moisture impermeable barrier layer |
01/18/1996 | WO1996001495A1 Method, carrier and mould parts for encapsulating a chip |
01/18/1996 | WO1996001494A1 Method of forming an ohmic contact to a iii-v semiconductor material |
01/18/1996 | WO1996001493A1 Thin film of abo3 with excess a-site and b-site modifiers and method of fabricating integrated circuits with same |
01/18/1996 | WO1996001483A1 Micromechanical component and process for producing the same |
01/18/1996 | DE4432806C1 Device for holding quartz-glass hollow cylinders in optical fibre mfr. |
01/18/1996 | DE4425258A1 Electrical module terminal bending method for e.g. diode SMD package |
01/18/1996 | DE4424929A1 Holder used in deposition appts. for semiconductor material |
01/18/1996 | DE2858815C2 Substrate surface prodn. for isoplanar semiconductor device |
01/18/1996 | DE19525745A1 Verfahren zur Bildung eines Abdeckungsmusters A method for forming a resist pattern |
01/18/1996 | DE19525576A1 Dünnfilmtransistor und Verfahren zu dessen Herstellung A thin film transistor and method of producing the |
01/18/1996 | DE19525536A1 Integrated circuit fault analysis testing method |
01/18/1996 | DE19523536A1 CMOS FET and complementary bipolar transistor mfr. |
01/18/1996 | DE19517975A1 Polysilizium-Feldringstruktur für Leistungs-IC's Polysilicon field ring structure for power ICs |
01/18/1996 | DE19509198A1 Semiconductor device for dynamic random access memory |
01/17/1996 | EP0692826A2 Method to suppress subthreshold leakage due to sharp isolation corners in submicron FET structures |
01/17/1996 | EP0692825A2 Analogue MISFET with threshold voltage adjuster |
01/17/1996 | EP0692824A2 Improvements in and relating to semiconductor devices |
01/17/1996 | EP0692821A2 Method of manufacturing semiconductor layer |
01/17/1996 | EP0692820A1 Manufacturing one sided resin sealed semiconductor devices and a carrier used for it |
01/17/1996 | EP0692819A2 Method of manufacturing a semiconductor device including pre-oxidation process |
01/17/1996 | EP0692818A2 Oxygen removing method and contaminant removing method usable in semiconductor device fabricating process, and compound semiconductor device fabricating method and apparatus based on both methods |
01/17/1996 | EP0692817A1 Wafer carrier |
01/17/1996 | EP0692816A2 Wafer shipper and package |
01/17/1996 | EP0692815A2 Method and apparatus for etching film layers on large substrates |
01/17/1996 | EP0692814A1 Multi-electrode electrostatic chuck |
01/17/1996 | EP0692799A2 Trimmable capacitor |
01/17/1996 | EP0692556A1 K cell type vapor source and shutter |
01/17/1996 | EP0692553A1 Vaporization sequence for multiple liquid precursors |
01/17/1996 | EP0692551A1 Sputtering apparatus and methods |
01/17/1996 | EP0692318A1 Method of and apparatus for cleaning workpiece |
01/17/1996 | EP0692156A1 Electrostatic chuck with conformal insulator film |
01/17/1996 | EP0692146A1 Charge-coupled device array for spectroscopic detection |
01/17/1996 | EP0692141A1 Stripping, passivation and corrosion inhibition of semiconductor substrates |
01/17/1996 | EP0692140A1 Stripping, passivation and corrosion inhibition of semiconductor substrates |
01/17/1996 | EP0692138A1 Reactive dc sputtering system |
01/17/1996 | EP0692137A1 Compositions and methods for providing anisotropic conductive pathways and bonds between two sets of conductors |
01/17/1996 | EP0683709A4 Apparatus and method for polishing. |
01/17/1996 | EP0666972A4 Gas heater for processing gases. |
01/17/1996 | EP0619918A4 Microwave energized deposition process using a pressure lower than the minimum point pressure of the paschen curve. |
01/17/1996 | EP0585343A4 Primary flow cvd apparatus and method |
01/17/1996 | EP0584143B1 Process and device for manufacturing plastic mouldings having wall regions of reduced thickness |
01/17/1996 | EP0542746B1 Elimination of etch stop undercut |
01/17/1996 | CN1115121A Internal-connection amorphous silicon solar cell and manufacture method |
01/17/1996 | CN1115119A Semiconductor unit and manufacture of same |
01/17/1996 | CN1115118A Method of manufacturing semiconductor devices with semiconductor elements formed in a layer of semiconductor material provided on a support slice |
01/17/1996 | CN1115117A Method for forming metal interconnection of semiconductor device |
01/17/1996 | CN1115116A Method for forming a metallic barrier layer in semiconductor device |
01/17/1996 | CN1115115A A method for making a fine annular charge storage electrode in a semiconductor device using a phase shift mask |
01/17/1996 | CN1115098A Flash memory cells, metthod for fabricating the same and method for arraying the same |
01/17/1996 | CN1115067A Microminiature, monolithic, variable electrical device and apparatus including same |
01/17/1996 | CN1115044A Phase shift mask and method for fabricating the same |
01/17/1996 | CN1030742C Two square memory cells having highly conductive word lines |
01/17/1996 | CN1030722C Process for continuously forming large area functional deposited film by microwave PCVD method and apparatus suitable for practicing same |
01/16/1996 | US5485495 X-ray mask, and exposure apparatus and device production using the mask |
01/16/1996 | US5485429 Semiconductor memory device with refresh timer circuit |
01/16/1996 | US5485420 Static-random-access memory cell and an integrated circuit having a static-random-access memory cell |
01/16/1996 | US5485398 Method and apparatus for inspecting bent portions in wire loops |
01/16/1996 | US5485138 Thin film resistor and method for manufacturing the same |
01/16/1996 | US5485114 Semiconductor integrated circuit with internal compensation for changes in time delay |
01/16/1996 | US5485103 Programmable logic array with local and global conductors |
01/16/1996 | US5485102 Programmable logic devices with spare circuits for replacement of defects |
01/16/1996 | US5485097 Method of electrically measuring a thin oxide thickness by tunnel voltage |
01/16/1996 | US5485091 On a semiconductor substrate |
01/16/1996 | US5485080 Non-contact measurement of linewidths of conductors in semiconductor device structures |
01/16/1996 | US5485063 Motor control circuit for a wire bonding apparatus |
01/16/1996 | US5485039 Semiconductor substrate having wiring conductors at a first main surface electrically connected to plural pins at a second main surface |
01/16/1996 | US5485038 Microelectronic circuit substrate structure including photoimageable epoxy dielectric layers |
01/16/1996 | US5485037 Integrated circuit package |
01/16/1996 | US5485035 Method for planarization of an integrated circuit |
01/16/1996 | US5485034 Semiconductor device including bipolar transistor having shallowed base |
01/16/1996 | US5485032 Antifuse element with electrical or optical programming |
01/16/1996 | US5485030 Dielectric element isolated semiconductor device and a method of manufacturing the same |
01/16/1996 | US5485029 On-chip ground plane for semiconductor devices to reduce parasitic signal propagation |
01/16/1996 | US5485028 Semiconductor device having a single crystal semiconductor layer formed on an insulating film |
01/16/1996 | US5485027 Isolated DMOS IC technology |
01/16/1996 | US5485026 Semiconductor integrated circuit device having improved integration and design flexibility |