| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 07/14/2005 | US20050150867 Solvent-soluble compound having an unsaturated bond-containing chain which can undergo hydrogen addition in an electrolyte solution; low temperature stability, as represented by the impedance ratio at a low temperature and an ordinary temperature, and a satisfactory usable life |
| 07/14/2005 | US20050150866 Productivity enhancing thermal sprayed yttria-containing coating for plasma reactor |
| 07/14/2005 | US20050150863 Etching method and etching apparatus |
| 07/14/2005 | US20050150862 Workpiece alignment assembly |
| 07/14/2005 | US20050150861 Etching apparatus and etching method |
| 07/14/2005 | US20050150860 Etching apparatus |
| 07/14/2005 | US20050150777 Method and system for material removal and planarization |
| 07/14/2005 | US20050150776 Electrolytic etching method and apparatus |
| 07/14/2005 | US20050150773 Method for forming deposition film and method for producing photovoltaic device |
| 07/14/2005 | US20050150770 Apparatus and method for electrolytically depositing copper on a semiconductor workpiece |
| 07/14/2005 | US20050150757 Controlling temperature of liner; minimization of stress |
| 07/14/2005 | US20050150691 High temperature environment tool system and method |
| 07/14/2005 | US20050150686 Organic dielectric electronic interconnect structures and method for making |
| 07/14/2005 | US20050150685 Configuration having an electronic device electrically connected to a printed circuit board |
| 07/14/2005 | US20050150684 Electronic device and method for producing the same |
| 07/14/2005 | US20050150683 Methods of fabricating substrates and substrate precursor structures resulting therefrom |
| 07/14/2005 | US20050150633 Heat sink and method for manufacturing the same |
| 07/14/2005 | US20050150601 Gas distribution plate assembly for plasma reactors |
| 07/14/2005 | US20050150600 Method of reducing surface contamination in semiconductor wet-processing vessels |
| 07/14/2005 | US20050150597 Apparatus and method for controlled cleaving |
| 07/14/2005 | US20050150559 Apparatus and method for controlling exhaust pressure in semiconductor manufacturing |
| 07/14/2005 | US20050150530 Substrate cleaning apparatus |
| 07/14/2005 | US20050150518 Apparatuses and methods for cleaning test probes |
| 07/14/2005 | US20050150516 Semiconductor manufacturing method and apparatus |
| 07/14/2005 | US20050150515 polishing apparatus for semiconductor wafers; solution gas dissolved in the gas dissolved water can be controlled to a prescribed level of concentration; high throughput, large number of wafers |
| 07/14/2005 | US20050150462 Lift pin for used in semiconductor manufacturing facilities and method of manufacturing the same |
| 07/14/2005 | US20050150461 Apparatus of depositing thin film with high uniformity |
| 07/14/2005 | US20050150460 Insitu post atomic layer deposition destruction of active species |
| 07/14/2005 | US20050150458 Reduced volume reactor |
| 07/14/2005 | US20050150457 Plasma-Assisted Sputter Deposition System |
| 07/14/2005 | US20050150455 Processing apparatus and processing method |
| 07/14/2005 | US20050150454 Deposition chamber and method for depositing low dielectric constant films |
| 07/14/2005 | US20050150451 Position adjusting method and substrate processing system |
| 07/14/2005 | US20050150450 Thin film forming apparatus, film supplier, film cassette, transport mechanism and transport method |
| 07/14/2005 | US20050150447 Recycling by mechanical means of a wafer comprising a multilayer structure after taking-off a thin layer thereof |
| 07/14/2005 | US20050150404 Hardened nano-imprinting stamp |
| 07/14/2005 | US20050150402 Printing device, production unit, and production method of electronic parts |
| 07/14/2005 | US20050150297 High-resolution in-plane tuning fork gyroscope and methods of fabrication |
| 07/14/2005 | US20050150173 Methanol-silica interaction adds colloidal stability to the chemical mechanical polishing (CMP) formulation; acidic pH |
| 07/14/2005 | US20050150172 Resin structure and abrasive grains, wherein a critical surface tension of the resin is within a specified range; for chemical mechanical polishing; polishing efficiency, quality without any slurry |
| 07/14/2005 | DE4232817B4 Halbleiter-Speicherzelle und Verfahren zu deren Herstellung A semiconductor memory cell and process for their preparation |
| 07/14/2005 | DE19748274B4 Verfahren zur Herstellung eines Kondensators A method for manufacturing a capacitor |
| 07/14/2005 | DE19549750B4 Elektronikbauteil mit anodisch gebontetem Leiterrahmen Electronic component having an anodically gebontetem lead frame |
| 07/14/2005 | DE19522942B4 Mehr-Substrat-Beschickungsstation für Halbleitervorrichtungsherstellungssystem More substrate loading station for semiconductor device manufacturing system |
| 07/14/2005 | DE10392854T5 System und Verfahren zum Kalibrieren von Temperaturmeßvorrichtungen in Wärmebehandlungskammern System and method for calibrating temperature measuring devices in the heat treatment chambers |
| 07/14/2005 | DE10361419A1 Layer structure for a memory component comprises a functional layer containing a lithographically fixed material for fixing the functional layer on the layer lying below it |
| 07/14/2005 | DE10359889A1 Bridge field effect transistor memory cell has charge storage layer designed for selective charge carrier introduction or removal by application of given electrical potential |
| 07/14/2005 | DE10359732A1 Substratträger zur Aufnahme und Lagerfixierung eines flächigen Körpers Substrate carrier for receiving and bearing fixing a flat body |
| 07/14/2005 | DE10358299A1 Capacitor component for integrated circuits has trench in a substrate containing alternating conductive and dielectric layers |
| 07/14/2005 | DE10358099A1 Electrochemical etching process for a semiconductor probe preferably gallium nitride measures surface current at electrolyte contact and applies jet of fresh electrolyte |
| 07/14/2005 | DE10357756A1 Production of metal oxynitride layers, used as a dielectric in an electronic component of a semiconductor device, comprises depositing a metal compound on a substrate and reacting with nitrogen oxide and/or dinitrogen monoxide |
| 07/14/2005 | DE10357698A1 Träger für zu behandelnde Gegenstände sowie Verfahren zur Herstellung eines solchen A support for objects to be treated as well as methods for producing such |
| 07/14/2005 | DE10357044A1 Verfahren zur Dotierung von organischen Halbleitern mit Chinondiiminderivaten Method for doping of organic semiconductors with Chinondiiminderivaten |
| 07/14/2005 | DE10351201B3 Neuro-sensor and process to manufacture a semiconductor neuro-sensor on a transistorized foundation structure |
| 07/14/2005 | DE10344814B3 Speichervorrichtung zur Speicherung elektrischer Ladung und Verfahren zu deren Herstellung Storage means for storing electric charge and process for their preparation |
| 07/14/2005 | DE10327126B4 Verfahren zur Herstellung von Chipmodulen Process for the preparation of chip modules |
| 07/14/2005 | DE10324491B4 Herstellungsverfahren für Dual-Workfunction-Logikbauelemente in vertikalen DRAM-Prozessen Manufacturing method for dual workfunction logic components in vertical DRAM processes |
| 07/14/2005 | DE10255652B4 Schleifkissen, Vorrichtung zum chemisch-mechanischen Polieren und Verfahren zum nasschemischen Schleifen einer Substratoberfläche Abrasive pad, apparatus for chemical mechanical polishing, and wet chemical method of grinding a substrate surface |
| 07/14/2005 | DE102004059664A1 Semiconductor wafer measurement point focusing method for semiconductor manufacturing process, involves regulating lens current value to perform focusing while widening focus depth, if evaluation value is less than preset level |
| 07/14/2005 | DE102004059636A1 MOS transistor drain/source path manufacturing method for use in nitride ROM, involves etching spacer made of tetra ethyl ortho silicate to create spacing between gate contact and source region and between contact and drain region |
| 07/14/2005 | DE102004059629A1 Halbleitervorrichtung vom Typ mit dielektrischer Isolierung und Verfahren zu deren Herstellung A semiconductor device of the type with dielectric isolation, and methods for their preparation |
| 07/14/2005 | DE102004059616A1 Fabrication of semiconductor devices by removing by-product from surface of semiconductor device fabrication apparatus, without opening processing chamber, after each time that conductive layer has been formed on metal oxide layer |
| 07/14/2005 | DE102004059167A1 Filmchip und einen solchen verwendendes LCD Film chip and such-use LCD |
| 07/14/2005 | DE102004058702A1 Verfahren für die Kalibration der Greifachse des Bondkopfs eines Automaten für die Montage von Halbleiterchips auf einem Substrat A method for the calibration of the gripping axis of the bonding head of an automatic machine for the mounting of semiconductor chips on a substrate |
| 07/14/2005 | DE102004052559A1 Einrichtung für die Montage von Halbleiterchips Means for the mounting of semiconductor chips |
| 07/14/2005 | DE102004026010A1 In-plane switching LCD formation method for video unit, involves defining different sized liquid crystal cell areas on bare glass, so that longer sides of one cell area runs in direction different to that of longer sides of other cell area |
| 07/14/2005 | DE102004007697B3 Etching a sacrificial layer comprises preparing system and carrier wafers, arranging the carrier wafer on the system wafer, filling hollow sections, etching and separating chips |
| 07/14/2005 | DE10164192B4 Vorrichtung und Verfahren zur Bearbeitung von Substraten Apparatus and method for processing substrates |
| 07/13/2005 | EP1553815A2 Apparatus and method for mounting component |
| 07/13/2005 | EP1553700A2 Surface acoustic wave device |
| 07/13/2005 | EP1553667A2 Optical element, and its manufacturing method |
| 07/13/2005 | EP1553643A2 Laser irradiation method and method for manufacturing crystalline semiconductor film |
| 07/13/2005 | EP1553638A1 Light receiving or light emitting device and its production method |
| 07/13/2005 | EP1553637A2 Photovoltaic device |
| 07/13/2005 | EP1553634A1 Heterojunction bipolar transistor |
| 07/13/2005 | EP1553633A2 Infrared sensor device and manufacturing method thereof |
| 07/13/2005 | EP1553632A2 Method for producing solid-state imaging device |
| 07/13/2005 | EP1553631A2 Nitrided STI liner oxide for reduced corner device impact on vertical device performance |
| 07/13/2005 | EP1553630A1 Modular board device and high frequency module and method for producing them |
| 07/13/2005 | EP1553627A1 Material for a heat dissipation substrate for mounting a semiconductor and a ceramic package using the same |
| 07/13/2005 | EP1553625A1 Method for fabrication of a contact structure |
| 07/13/2005 | EP1553624A1 Silicon-Germanium SOI structure and method for production thereof |
| 07/13/2005 | EP1553623A1 Anisotropic conductivity connector, probe member, wafer inspecting device, and wafer inspecting method |
| 07/13/2005 | EP1553622A1 Anisotropic conductivity connector, conductive paste composition, probe member, wafer inspecting device, and wafer inspecting method |
| 07/13/2005 | EP1553621A1 Anisotropic conductivity connector, conductive paste composition, probe member, wafer inspecting device, and wafer inspecting method |
| 07/13/2005 | EP1553620A1 Semiconductor device producing method |
| 07/13/2005 | EP1553619A1 Non-volatile SONOS semiconductor memory device and method of manufacturing the same |
| 07/13/2005 | EP1553618A1 Production method for thin-film crystal wafer, semiconductor device using it and production method therefor |
| 07/13/2005 | EP1553617A1 Method for forming pattern and method for manufacturing semiconductor device |
| 07/13/2005 | EP1553601A2 Method and apparatus for a high density magnetic random access memory (MRAM) with stackable architecture |
| 07/13/2005 | EP1553578A1 Method for delivery of substrate to film forming device for disk-like substrate, substrate delivery mechanism and substrate holder used for the method, and method of manufacturing disk-like recording medium using the method |
| 07/13/2005 | EP1553453A2 Water-soluble material, chemically amplified resist and pattern formation method using the same |
| 07/13/2005 | EP1553452A2 Photoresist compositions comprising polymers |
| 07/13/2005 | EP1553451A1 Photoresist base material, method for purification thereof, and photoresist compositions |
| 07/13/2005 | EP1553446A1 Pattern size correcting device and pattern size correcting method |
| 07/13/2005 | EP1553419A1 Probe Card |
| 07/13/2005 | EP1553406A1 Method for double sided optical inspection of thin film disks or wafers |
| 07/13/2005 | EP1553303A2 Apparatus for evacuating a plurality of vacuum chambers |
| 07/13/2005 | EP1553216A2 Method of manufacturing group-III nitride crystal |
| 07/13/2005 | EP1553208A2 Substrate processing apparatus and cleaning method therefor |