Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
07/2005
07/21/2005US20050158913 Solid state imaging apparatus and its manufacturing method
07/21/2005US20050158911 Process for producing circuit board having built-in electronic part
07/21/2005US20050158910 Protective layer for use in packaging a semiconductor die and method for forming same
07/21/2005US20050158909 Solution deposition of chalcogenide films containing transition metals
07/21/2005US20050158907 Image sensor device and method of fabricating the same
07/21/2005US20050158906 Radiation detector
07/21/2005US20050158904 Device transferring method
07/21/2005US20050158903 Display device and method of manufacturing the same
07/21/2005US20050158901 Semiconductor device and method for forming the same
07/21/2005US20050158900 Fabrication method for liquid crystal display
07/21/2005US20050158898 Methods of forming nanocavity laser structures
07/21/2005US20050158897 Image sensor device and method of fabricating the same
07/21/2005US20050158896 Device transferring method
07/21/2005US20050158895 Device transferring method
07/21/2005US20050158893 Using protective cups to fabricate light emitting semiconductor packages
07/21/2005US20050158892 Methods of treating a silicon carbide substrate for improved epitaxial deposition and resulting structures and devices
07/21/2005US20050158891 Apparatus and processes for the mass production of photovoltaic modules
07/21/2005US20050158889 Wafer thickness control during backside grind
07/21/2005US20050158888 System and method for product yield prediction
07/21/2005US20050158887 Yield based, in-line defect sampling method
07/21/2005US20050158886 Method for processing semiconductor
07/21/2005US20050158885 Wet bench wafer floating detection system
07/21/2005US20050158884 Method Of In-Situ Treatment of Low-K Films With a Silylating Agent After Exposure to Oxidizing Environments".
07/21/2005US20050158883 Multilayered structure film and method of making the same
07/21/2005US20050158882 Method of forming nano-sized MTJ cell without contact hole
07/21/2005US20050158881 Method of making toroidal mram cells
07/21/2005US20050158849 Process of fabricating polymer sustained microelectrodes
07/21/2005US20050158819 Preparing wafer substrate with immobilized probes, separating into individual chips, mating chips to package associated with reaction chamber; high throughput assay
07/21/2005US20050158673 Liquid-filled balloons for immersion lithography
07/21/2005US20050158671 forming resist patterns on films provided for the semiconductor substrates, forming pattern of conductive films, etching using the resist pattern as a mask, stripping using liquids and rinsing the substrate to remove particles or metal impurities
07/21/2005US20050158670 Apparatus for processing substrate and method of processing the same
07/21/2005US20050158667 Solvent free photoresist strip and residue removal processing for post etching of low-k films
07/21/2005US20050158666 forming dielectric multilayers over substrates, then forming a photoresist masking layer, etching pattern into and through the dielectric layers, adding gases and stripping the photoresists by ashing in oxygen and wet chemical solvents, to form semiconductors; microelectronics
07/21/2005US20050158665 substrates having film patterns including dielectric, semiconductor, electroconductive and protective films, having low wettability; displays; electronics
07/21/2005US20050158664 Method of integrating post-etching cleaning process with deposition for semiconductor device
07/21/2005US20050158659 Photosensitive resin composition for black matrix
07/21/2005US20050158657 Radiation-sensitive resin composition
07/21/2005US20050158656 Chemical amplification type positive resist composition
07/21/2005US20050158653 spin coating thin films having electrical resistance on semiconductor wafer, photomask and optical masks, then evaluating using radiation beams
07/21/2005US20050158639 Method for producing liquid crystal display apparatus
07/21/2005US20050158638 transferring apperture patterns onto photoresist films, using projectors and phase shifting masks having radiation transparent films and light shields, to manufacture a dynamic random access memory
07/21/2005US20050158637 comprising radiation transparent plates through which light passes, having blocking patterns for selectively blocking the light, and concave and convex portions for imprinting pateerns on photoresist films; lithography
07/21/2005US20050158636 Photomask and method of controlling transmittance and phase of light using the photomask
07/21/2005US20050158634 Photolithography mask comprising absorber/phase-shifter elements
07/21/2005US20050158557 Resin composition for encapsulating semiconductor
07/21/2005US20050158538 an aromatic silane derivative as primer layer, first protective layer is acrylonitrile-styrene copolymer; a second protective layer is a highly chlorinated polymer;
07/21/2005US20050158527 Epoxy resins containing fine metal particle selected from platinum (Pt), palladium (Pd), copper (Cu), gold (Au), nickel (Ni), and silver (Ag).; rate of moisture absorption from 500 to 14500 ppm; electrostatic latent image is formed, by electrostatically attaching metal-containing resin particles
07/21/2005US20050158479 Volatile copper(II) complexes and reducing agents for deposition of copper films by atomic layer deposition
07/21/2005US20050158478 Substrate processing apparatus and substrate processing method
07/21/2005US20050158477 Deposition apparatus and a deposition method using medium in a supercritical state
07/21/2005US20050158473 Proximity substrate preparation sequence, and method, apparatus, and system for implementing the same
07/21/2005US20050158469 Atomic layer deposition exhibiting narrow design rule; high quality, reliability; step coverage on a wafer using a plurality of reactant gases
07/21/2005US20050158466 Mixture containing nonionic surfactant and stabilizer compound, such as triglyme, dipivaloylmethane, pinacol, pivalic acid or hexyleneglycol; for overcoating substrate with bismuth ferrite; heat treatment; suitable for application to non-volatile ferroelectric memories; low decomposition temperature
07/21/2005US20050158454 Method and system for forming an organic light-emitting device display having a plurality of passive polymer layers
07/21/2005US20050158164 Semiconductor manufacturing system and wafer holder for semiconductor manufacturing system
07/21/2005US20050158153 Substrate edge grip apparatus
07/21/2005US20050158152 Container conveying system
07/21/2005US20050158009 Structure and method for temporarily holding integrated circuit chips in accurate alignment
07/21/2005US20050157770 Integrated photonic devices
07/21/2005US20050157765 Low temperature grown layers with migration enhanced epitaxy adjacent to an InGaAsN(Sb) based active region
07/21/2005US20050157583 Method for the production of a memory cell, memory cell and memory cell arrangement
07/21/2005US20050157578 Semiconductor memory device
07/21/2005US20050157573 Method of forming non-volatile resistance variable devices
07/21/2005US20050157570 Semiconductor device
07/21/2005US20050157566 Semiconductor device with circuit for detecting abnormal waveform of signal and preventing the signal from being transmitted
07/21/2005US20050157564 Non-volatile semiconductor memory device and electric device with the same
07/21/2005US20050157558 Data writing method for semiconductor memory device and semiconductor memory device
07/21/2005US20050157555 Nonvolatile semiconductor memory device
07/21/2005US20050157551 Multi-state non-volatile integrated circuit memory systems that employ dielectric storage elements
07/21/2005US20050157549 Non-volatile memory cell using high-k material and inter-gate programming
07/21/2005US20050157547 Thin film transistor memory device
07/21/2005US20050157545 Magnetoresistive element and magnetic memory unit
07/21/2005US20050157544 Magnetic tunneling junction film structure with process determined in-plane magnetic anisotropy
07/21/2005US20050157542 Magnetoresistive element and magnetic memory unit
07/21/2005US20050157540 Soft-reference four conductor magnetic memory storage device
07/21/2005US20050157538 Magnetic storage device using ferromagnetic tunnel function element
07/21/2005US20050157536 Semiconductor device including nonvolatile memory and method of fabricating the same
07/21/2005US20050157530 Ferroelectric memory
07/21/2005US20050157529 Ic card
07/21/2005US20050157527 Semiconductor memory device
07/21/2005US20050157478 Printed circuit board and method for manufacturing printed circuit board
07/21/2005US20050157477 Electronic device and production method thereof
07/21/2005US20050157448 Polarizing property electrode for electrical double layer capacitor and manufacturing method of polarizing property electrode for electrical double layer capacitor, and manufacturing method of electrode sheet for electrical double layer capacitor
07/21/2005US20050157400 Projection objective having adjacently mounted aspheric lens surfaces
07/21/2005US20050157391 Diffractive optical element
07/21/2005US20050157297 Periodic patterns and technique to control misalignment between two layers
07/21/2005US20050157296 Method and apparatus for measuring optical overlay deviation
07/21/2005US20050157286 Method and system for detecting sensitivity of photosensitive materials and exposure correcting method
07/21/2005US20050157285 Lithographic apparatus
07/21/2005US20050157284 Lithographic apparatus, device manufacturing method, and device manufactured thereby
07/21/2005US20050157283 Optical element with a self-assembled monolayer, lithographic projection apparatus including such an optical element, and device manufacturing method
07/21/2005US20050157282 Optical element, lithographic apparatus comprising such optical element and device manufacturing method
07/21/2005US20050157281 Off-axis levelling in lithographic projection apparatus
07/21/2005US20050157279 Light source unit, exposure apparatus, and device manufacturing method
07/21/2005US20050157244 Driver chip and display apparatus including the same
07/21/2005US20050157236 Liquid crystal display device and manufacturing method therefor
07/21/2005US20050157222 Method of manufacturing semiconductor device
07/21/2005US20050157161 Multibeam exposure device
07/21/2005US20050156924 Voltage booster circuit, power supply circuit, and liquid crystal driver
07/21/2005US20050156923 Voltage booster circuit, power supply circuit, and liquid crystal driver
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