| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 07/28/2005 | US20050161158 Exhaust conditioning system for semiconductor reactor |
| 07/28/2005 | US20050161157 Substrate treating apparatus and method |
| 07/28/2005 | US20050161077 Apparatus for manufacturing photovoltaic elements |
| 07/28/2005 | US20050161060 Including a proton donor (e.g., a hydrogen plasma step) to react with the porogen, then reacting with a fluorine donor, the plasma enhanced chemical vapor deposition (PECVD) chamber is more effectively cleaned following a porous interlayer dielectric (ILD) deposition |
| 07/28/2005 | US20050160992 Substrate gripping apparatus |
| 07/28/2005 | US20050160991 Barrel type susceptor |
| 07/28/2005 | US20050160990 Apparatus for electroless deposition of metals onto semiconductor substrates |
| 07/28/2005 | US20050160989 Workpiece holder for semiconductor manufacturing apparatus |
| 07/28/2005 | US20050160988 Semiconductor-producing apparatus |
| 07/28/2005 | US20050160986 Electron cyclotron resonance equipment with variable flare angle of horn antenna |
| 07/28/2005 | US20050160983 ALD apparatus and method |
| 07/28/2005 | US20050160982 Plasma enhanced semicondutor deposition apparatus |
| 07/28/2005 | US20050160981 Systems and methods for forming zirconium and/or hafnium-containing layers |
| 07/28/2005 | US20050160977 Method and apparatus for fluid processing a workpiece |
| 07/28/2005 | US20050160974 Microelectronic fabrication system components and method for processing a wafer using such components |
| 07/28/2005 | US20050160972 Method and resulting structure for manufacturing semiconductor substrates |
| 07/28/2005 | US20050160971 Method for manufacturing silicon epitaxial wafer |
| 07/28/2005 | US20050160967 Process for preparing single crystal silicon having improved gate oxide integrity |
| 07/28/2005 | US20050160827 Pressure sensors having transducers positioned to provide for low drift |
| 07/28/2005 | US20050160826 Pressure sensors having stable gauge transducers |
| 07/28/2005 | US20050160825 Pressure sensors having neutral plane positioned transducers |
| 07/28/2005 | US20050160824 Pressure sensors having spacer mounted transducers |
| 07/28/2005 | US20050160823 Implantable pressure sensors |
| 07/28/2005 | US20050160705 Station for controlling and purging a mini-environment |
| 07/28/2005 | US20050160619 Low-pressure dryer and low-pressure drying method |
| 07/28/2005 | US20050160592 Mounting system for high-mass heatsinks |
| 07/28/2005 | US20050160591 Method for dissociating metals from metal compounds |
| 07/28/2005 | US20050160585 Magnetoresistive memory device and method for fabricating the same |
| 07/28/2005 | US20050160575 Integration of high performance copper inductors with bond pads |
| 07/28/2005 | US20050160552 Cleaning apparatus |
| 07/28/2005 | DE4311388B4 Schichtsystem mit elektrisch aktivierbarer Schicht Layer system with electrically activatable layer |
| 07/28/2005 | DE4207264B4 Negativ arbeitendes strahlungsempfindliches Gemisch und damit hergestelltes Aufzeichnungsmaterial Negative-working radiation-sensitive mixture and thus produced recording material |
| 07/28/2005 | DE4133183B4 Gehäusekonstruktion für Chip-TAB-Bauelemente, Verwendung derselben und Verfahren zu deren Montage A case assembly for TAB-chip devices, use thereof and process for their mounting |
| 07/28/2005 | DE19726307B4 Verfahren zur Glättung der Isolierschicht eines Halbleiterbauelementes A process for the smoothing of the insulating layer of a semiconductor device |
| 07/28/2005 | DE10393440T5 Verfahren zum Behandeln von Halbleitermaterial A process for treating semiconductor material |
| 07/28/2005 | DE10392703T5 Metalloxidpulver für Hochpräzisionspolieren und ein Verfahren zur Herstellung desselben Metal oxide powders for high-precision polishing, and a method of manufacturing the same |
| 07/28/2005 | DE10361908A1 Pulse electric current generating apparatus used in microchip manufacture, has capacitor bank comprised of two capacitors, for producing high voltage for discharge |
| 07/28/2005 | DE10361659A1 Process for preparation of an epitaxial structural element based on a first group III/V compound semiconductor material system (SMS) with a first group V element on a substrate or buffer layer useful in semiconductor technology |
| 07/28/2005 | DE10361522A1 Optisches System Optical system |
| 07/28/2005 | DE10361135A1 Production process for a trench transistor uses high energy implant to form a drain drift region into which the base of the trench extends |
| 07/28/2005 | DE10361134A1 Process for producing deep p regions in silicon irradiates n substrate with high energy particles such that it is converted into a p region of required depth after a given time and temperature |
| 07/28/2005 | DE10361075A1 Verfahren und Vorichtung zur Trocknung von Schaltungssubstraten A method and Vorichtung for drying circuit substrates |
| 07/28/2005 | DE10360933A1 Verfahren zum Herstellen einer Kapazität in einer Schicht aus Low-k-Material A method of manufacturing a capacitance in a layer of low-k material |
| 07/28/2005 | DE10360708A1 Halbleitermodul mit einem Halbleiterstapel und Verfahren zur Herstellung desselben The same semiconductor module with a semiconductor stack and processes for preparing |
| 07/28/2005 | DE10359576A1 Verfahren zur Herstellung einer optischen Einheit A process for producing an optical unit |
| 07/28/2005 | DE10359248A1 Thin-film transistor for active matrix-type organic light emitting device, has gate electrode having larger superimposition area with source electrode than drain electrode |
| 07/28/2005 | DE10357673A1 Montage- und Klebeschicht für Halbleiterbauelement Assembly and an adhesive layer for semiconductor device |
| 07/28/2005 | DE10332294B4 Optiksensor nebst Verfahren zu seiner Herstellung sowie Erfassungseinrichtung Optic sensor together with methods for its preparation and detection device |
| 07/28/2005 | DE102004063455A1 Fotomaske Photomask |
| 07/28/2005 | DE102004062928A1 Interconnection structure fabrication method for semiconductor device, involves etching portion of etch stop layer and sacrificial insulating layer such that thickness ratio of layers is set to specific value |
| 07/28/2005 | DE102004062862A1 Transistor, such as metal oxide semiconductor transistor, comprises inversion epitaxial layer, trench, reverse spacers, gate electrode, spacers, pocket-well regions, lightly doped drain regions, source and drain regions, and silicide layer |
| 07/28/2005 | DE102004062861A1 Verfahren zur Herstellung einer nichtflüchtigen Speichervorrichtung A method of manufacturing a nonvolatile memory device |
| 07/28/2005 | DE102004062228A1 Wafer exposing method for use during semiconductor device fabrication, involves transferring image onto shot areas by irradiating projection light, and scanning die area of wafer by irradiating scanning light |
| 07/28/2005 | DE102004060378A1 Halbleitervorrichtung Semiconductor device |
| 07/28/2005 | DE102004060170A1 Halbleitervorrichtung und Verfahren zu ihrer Herstellung Semiconductor device and process for their preparation |
| 07/28/2005 | DE102004059971A1 Lasermaske und Kristallisationsverfahren unter Verwendung derselber sowie Display und Verfahren zu dessen Herstellung Laser mask and crystallization method using DERS Elber and display and process for its preparation |
| 07/28/2005 | DE102004058042A1 Material zur Bildung von Filmen auf Basis von Siliziumdioxid Material for the formation of films based on silicon dioxide |
| 07/28/2005 | DE102004058021A1 Halbleitervorrichtung und Verfahren zu deren Herstellung Semiconductor device and process for their preparation |
| 07/28/2005 | DE102004057180A1 Photomask for patterning integrated circuit device, has substrate including array of shadowing units via which patterning radiation is passed, where transmittance of radiation is greater than approximately twenty percentage |
| 07/28/2005 | DE102004055908A1 Semiconductor device such as an Insulating Gate Bipolar Transistor has pair of heat dissipating plates and heat dissipating block placed close to the device |
| 07/28/2005 | DE102004053387A1 Verbesserte LED-Array-Implementierung Improved LED array implementation |
| 07/28/2005 | DE102004052952A1 Ausrichtungsverfahren zur Herstellung eines integrierten Ultraschalltransducerfeldes Alignment method for manufacturing an integrated Ultraschalltransducerfeldes |
| 07/28/2005 | DE102004051839A1 Fabrication of thin film transistor array substrate for making liquid crystal display devices, by forming conductive pattern group having gate electrode and gate line, using etch resist and soft mold, and forming gate insulating film |
| 07/28/2005 | DE102004041641A1 Stabilisierte Cyclosiloxane zur Verwendung als Vorläufer für Dünnfilme mit niedriger dielektrischer Konstante Stabilized cyclosiloxanes for use as precursors for thin films with low dielectric constant |
| 07/28/2005 | DE102004040526A1 Magnetspeicherspeicherungsvorrichtung Magnetic memory storage device |
| 07/28/2005 | DE102004037009A1 Verfahren zum Herstellen einer Flüssigkristalldisplay-Vorrichtung A method of manufacturing a liquid crystal display device |
| 07/28/2005 | DE102004034357A1 Prüfkarten Trägerelement Test cards support element |
| 07/28/2005 | DE102004017313A1 Semiconductor component with surface mounted external contacts has chip with surface function blocks and short electrical contact rails between blocks and contact surfaces |
| 07/28/2005 | DE102004001107A1 Strukturierung auf Oberflächen mittels Folie Structuring of surfaces by film |
| 07/28/2005 | DE10123514B4 Halbleiter-Speicherbaustein Semiconductor memory device |
| 07/28/2005 | DE10065664B4 Integrierte Halbleiterspeicheranordnung Integrated semiconductor memory arrangement |
| 07/28/2005 | DE10044199B9 Ablenkanordnung und Projektionssystem für geladene Teilchen Deflection device and projection system for charged particles |
| 07/28/2005 | DE10043586B4 DRAM-Zellen mit tief eingegrabenen Kondensatoren und darüber liegenden, vertikalen Transistoren und ein Herstellungsverfahren dafür DRAM cells with deeply buried capacitors and overlying vertical transistors and a manufacturing method thereof |
| 07/28/2005 | CA2552704A1 Co-doping for fermi level control in semi-insulating group iii nitrides |
| 07/27/2005 | EP1557901A1 Microwave transmission line |
| 07/27/2005 | EP1557890A1 White-light LED and method for regulating the generated light color of the white-light LED |
| 07/27/2005 | EP1557889A1 Zn SEMICONDUCTOR LIGHT-EMITTING DEVICE AND METHOD FOR MANUFACTURING SAME |
| 07/27/2005 | EP1557888A1 Semiconductor device and process for fabricating the same |
| 07/27/2005 | EP1557884A2 Examination apparatus for biological sample and chemical sample |
| 07/27/2005 | EP1557883A1 Soi wafer and method for manufacturing soi wafer |
| 07/27/2005 | EP1557882A2 Alignment method, method for manufacturing a semiconductor device, substrate for a semiconductor device, electronic equipment |
| 07/27/2005 | EP1557880A1 Resin composition for encapsulating semiconductor |
| 07/27/2005 | EP1557879A2 Method of forming connection hole |
| 07/27/2005 | EP1557878A2 Station for control and purge of a mini-environment |
| 07/27/2005 | EP1557877A1 Probe device that controls temperature of object to be inspected and probe inspection method |
| 07/27/2005 | EP1557875A1 Process for forming tapered trenches in a dielectric material |
| 07/27/2005 | EP1557874A2 Method for etching high aspect ratio features in III-V based compounds for optoelectronic devices |
| 07/27/2005 | EP1557873A1 Heat treating system and heat treating method |
| 07/27/2005 | EP1557872A1 Plasma chemical vapor deposition method and plasma chemical vapor deposition device |
| 07/27/2005 | EP1557871A1 Thin film forming apparatus and thin film forming method and thin film forming system |
| 07/27/2005 | EP1557870A2 Group III nitride crystal substrate, method of its manufacture, and group-III nitride semiconductor device |
| 07/27/2005 | EP1557869A1 Exposure transfer mask and exposure transfer mask pattern exchange method |
| 07/27/2005 | EP1557868A1 Light irradiation heat treatment method and light irradiation heat treatment apparatus |
| 07/27/2005 | EP1557723A2 Alignment stage apparatus |
| 07/27/2005 | EP1557722A1 Optical element, lithographic apparatus comprising such optical element and device manufacturing method |
| 07/27/2005 | EP1557721A2 Immersion lithography fluids |
| 07/27/2005 | EP1557682A1 Test mode activation by phase comparison |
| 07/27/2005 | EP1557487A2 Method of manufacturing GaN crystal substrate |
| 07/27/2005 | EP1557481A2 Ferroelectric film, ferroelectric memory, and piezoelectric element |
| 07/27/2005 | EP1557224A1 Ultrasonic washing equipment and ultrasonic washing method |