Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
09/2005
09/15/2005US20050204317 Integrated circuit design system, integrated circuit design program, and integrated circuit design method
09/15/2005US20050204314 Placement and routing method to reduce Joule heating
09/15/2005US20050204233 System-on-chip (SOC) having built-in-self-test circuits and a self-test method of the SOC
09/15/2005US20050204227 Semiconductor circuit apparatus and scan test method for semiconductor circuit
09/15/2005US20050204212 Data memory system
09/15/2005US20050204196 Substrate processing apparatus and substrate processing method
09/15/2005US20050203721 Ion implantation simulation apparatus, method, and program
09/15/2005US20050203719 Method for simulating reliability of semiconductor device
09/15/2005US20050203664 Method and apparatus for aligning a cassette
09/15/2005US20050203269 Novel dicarboxylic acids are described herein that are suitable for the preparation of high-temperature-stable polymers, which are particularly useful in forming suitable dielectrics in microelectronics.
09/15/2005US20050203262 Fluorinated polymers, photoresists and processes for microlithography
09/15/2005US20050203250 has excellent adhesive properties and proper adhesive force in regard to a surface of a semiconductor wafer, which can prevent contamination and breakage of a wafer surface due to penetration of grinding water
09/15/2005US20050202987 Stripping formulation for photoresists containing ammonium difluoride or ammonium fluoride, a sulfone or sulfoxide solvent and a basic amine
09/15/2005US20050202762 Dresser for polishing cloth and method for producing the same
09/15/2005US20050202758 Carrier for holding an object to be polished
09/15/2005US20050202757 Device for the simultaneous double-side grinding of a workpiece in wafer form
09/15/2005US20050202716 Insert and electronic component handling apparatus provided with the same
09/15/2005US20050202691 Connector
09/15/2005US20050202686 Method of manufacturing semiconductor device
09/15/2005US20050202685 Adhesion improvement for low k dielectrics
09/15/2005US20050202683 Method of depositing an amorphous carbon film for etch hardmask application
09/15/2005US20050202682 Nitride semiconductor growth method, nitride semiconductor substrate, and nitride semiconductor device
09/15/2005US20050202681 Method and/or system for forming a thin film
09/15/2005US20050202680 Method for shrinking a dimension of a gate
09/15/2005US20050202678 Semiconductor wafer front side protection
09/15/2005US20050202677 Method for dishing reduction and feature passivation in polishing processes
09/15/2005US20050202675 Calibration standard for critical dimension verification of sub-tenth micron integrated circuit technology
09/15/2005US20050202674 Microelectronic device fabricating method, integrated circuit, and intermediate construction
09/15/2005US20050202673 Silicide formed from ternary metal alloy films
09/15/2005US20050202672 Method for manufacturing tungsten/polysilicon word line structure in vertical dram and device manufactured thereby
09/15/2005US20050202671 Interconnect structure and method for fabricating the same
09/15/2005US20050202670 Polishing compound for insulating film for semiconductor integrated circuit and method for producing semiconductor integrated circuit
09/15/2005US20050202669 Method for structuring a semiconductor device
09/15/2005US20050202668 Methods of patterning a surface using single and multilayer molecular films
09/15/2005US20050202666 Method of fabricating semiconductor device
09/15/2005US20050202665 Method of fabricating n-type semiconductor diamond, and semiconductor diamond
09/15/2005US20050202664 Method of inhibiting metal silicide encroachment in a transistor
09/15/2005US20050202663 Method of manufacturing semiconductor device and semiconductor device
09/15/2005US20050202662 Method for fabricating oxide thin films
09/15/2005US20050202661 Non-activated guard ring for semiconductor devices
09/15/2005US20050202660 Electrochemical fabrication process including process monitoring, making corrective action decisions, and taking appropriate actions
09/15/2005US20050202659 Ion implantation of high-k materials in semiconductor devices
09/15/2005US20050202658 Method for limiting slip lines in a semiconductor substrate
09/15/2005US20050202657 Formation of ultra-shallow junctions by gas-cluster ion irradiation
09/15/2005US20050202656 Method of fabrication of semiconductor device
09/15/2005US20050202655 Method for manufacturing semiconductor device
09/15/2005US20050202654 Process and system for laser crystallization processing of film regions on a substrate to provide substantial uniformity, and a structure of such film regions
09/15/2005US20050202653 High density plasma process for silicon thin films
09/15/2005US20050202652 High-density plasma hydrogenation
09/15/2005US20050202651 Methods and apparatus relating to singulating semiconductor wafers and wafer scale assemblies
09/15/2005US20050202650 Method of dividing a wafer which has a low-k film formed on dicing lines
09/15/2005US20050202649 Optical interference reflective element and repairing and manufacturing methods thereof
09/15/2005US20050202648 Memory cells
09/15/2005US20050202647 Process for creating metal-insulator-metal devices
09/15/2005US20050202645 Method for forming capacitor of semiconductor device
09/15/2005US20050202644 Method for fabricating metal gate structures
09/15/2005US20050202643 Transistor and method for manufacturing the same
09/15/2005US20050202642 Method of forming polysilicon gate structures with specific edge profiles for optimization of LDD offset spacing
09/15/2005US20050202641 Radiation-hardened transistor fabricated by modified CMOS process
09/15/2005US20050202640 Gate technology for strained surface channel and strained buried channel MOSFET devices
09/15/2005US20050202639 Method of manufacturing memory device comprising gate having uniformly distributed silicon nano dots
09/15/2005US20050202638 Method of reducing step height
09/15/2005US20050202637 Recessed termination for trench schottky device without junction curvature
09/15/2005US20050202636 Single-pole component manufacturing
09/15/2005US20050202635 Method for fabricating vertical transistor
09/15/2005US20050202634 Method for forming a top oxide with nitride liner
09/15/2005US20050202633 Method of manufacturing nonvolatile memory cell
09/15/2005US20050202632 Fabrication of conductive lines interconnecting first conductive gates in nonvolatile memories having second conductive gates provided by conductive gate lines, wherein the adjacent conductive gate lines for the adjacent columns are spaced from each other, and non-volatile memory structures
09/15/2005US20050202631 Poly-etching method for split gate flash memory cell
09/15/2005US20050202630 Selective polysilicon stud growth
09/15/2005US20050202629 Method and structure for non-single-polycrystalline capacitor in an integrated circuit
09/15/2005US20050202628 Dynamic random access memory cell and method for fabricating the same
09/15/2005US20050202627 Method for forming a dielectric layer in a semiconductor device
09/15/2005US20050202626 Method for fabricating a semiconductor structure
09/15/2005US20050202625 Semiconductor device and manufacturing method thereof
09/15/2005US20050202624 Plasma ion implantation system
09/15/2005US20050202623 Semiconductor device and method of fabricating same
09/15/2005US20050202622 Interconnecting conductive layers of memory devices
09/15/2005US20050202621 Wire bond with multiple stitch bonds
09/15/2005US20050202620 Method to manufacture polymer memory with copper ion switching species
09/15/2005US20050202619 Thin film device supply body, method of fabricating thin film device, method of transfer, method of fabricating semiconductor device, and electronic equipment
09/15/2005US20050202618 Semiconductor device and manufacturing method of the same
09/15/2005US20050202617 Gate structure for a transistor and method for fabricating the gate structure
09/15/2005US20050202615 Nano-enabled memory devices and anisotropic charge carrying arrays
09/15/2005US20050202613 T-gate formation
09/15/2005US20050202612 Thin film transistor and method of manufacturing the same
09/15/2005US20050202611 Method of laser irradiation
09/15/2005US20050202610 Method for manufacturing ag-oxide-based electric contact material and product of the same
09/15/2005US20050202609 Integral-type liquid crystal panel with image sensor function
09/15/2005US20050202608 Locally thinned fins
09/15/2005US20050202607 Method of forming FinFET gates without long etches
09/15/2005US20050202606 Semiconductor device and method of forming the same
09/15/2005US20050202605 Method of manufacturing semiconductor device
09/15/2005US20050202604 Integrated semiconductor device and method to make same
09/15/2005US20050202603 Semiconductor device including gate electrode for applying tensile stress to silicon substrate, and method of manufacturing the same
09/15/2005US20050202602 Method of manufacturing a semiconductor device
09/15/2005US20050202601 Electro-optical device, method of manufacturing the same, and electronic apparatus
09/15/2005US20050202600 Silicon-on insulator (soi) substrate having dual surface crystallographic orientations and method of forming same
09/15/2005US20050202599 Method of forming metal pattern having low resistivity
09/15/2005US20050202598 Process for producing optical semiconductor device
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