Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
11/2005
11/03/2005WO2005104637A1 Method and apparatus for accurately applying structures to a substrate
11/03/2005WO2005104317A1 Silicon rich nitride cmos-compatible light sources and si-based laser structures
11/03/2005WO2005104314A2 Method for production of electronic and optoelectronic circuits
11/03/2005WO2005104260A1 Element, thin film transistor and sensor using the same, and method for manufacture of element
11/03/2005WO2005104254A1 Etching of substrates of light emitting devices
11/03/2005WO2005104253A1 Laser patterning of light emitting devices and patterned light emitting devices
11/03/2005WO2005104251A1 N-type group i i i nitride semiconductor layered structure
11/03/2005WO2005104250A1 Production method of compound semiconductor light-emitting device wafer
11/03/2005WO2005104243A1 Non-volatile transistor memory array incorporating read-only elements with single mask set
11/03/2005WO2005104239A1 Thin-film transistor and production method therefor
11/03/2005WO2005104238A1 Fin field effect transistor arrangement and method for producing a fin field effect transistor arrangement
11/03/2005WO2005104235A1 Semiconductor device and method of manufacturing such a device
11/03/2005WO2005104230A1 Wiring board, semiconductor device and wiring board manufacturing method
11/03/2005WO2005104229A1 Power semiconductor arrangement
11/03/2005WO2005104226A2 Method for production of through-contacts in a plastic mass and semiconductor component with said through contacts
11/03/2005WO2005104225A2 Method for forming a semiconductor device having a notched control electrode and structure thereof
11/03/2005WO2005104224A1 Method for integrating sige npn and vertical pnp devices on a substrate and related structure
11/03/2005WO2005104223A1 Process for the singulation of integrated devices in thin semiconductor chips
11/03/2005WO2005104222A1 Process for forming a solder mask, apparatus thereof and process for forming electric-circuit patterned internal dielectric layer
11/03/2005WO2005104221A1 Apparatus and method for sticking sheet
11/03/2005WO2005104220A1 Clean tunnel in single wafer processing system
11/03/2005WO2005104219A1 Device and method for treating a substrate in the field of semiconductor technology, in addition to a system comprising a device for treating a substrate
11/03/2005WO2005104218A1 Method of controlling trimming of a gate elecrode structure
11/03/2005WO2005104217A2 System and method for etching a mask
11/03/2005WO2005104216A2 Processing system and method for treating a substrate
11/03/2005WO2005104215A2 Method and system for adjusting a chemical oxide removal process using partial pressure
11/03/2005WO2005104214A2 Composition useful for removal of bottom anti-reflection coatings from patterned ion-implanted photoresist wafers
11/03/2005WO2005104213A2 COSMETIC FORMULATIONS COMPRISING ZnO NANOPARTICLES
11/03/2005WO2005104212A2 Wiring structure for integrated circuit with reduced intralevel capacitance
11/03/2005WO2005104211A2 Land grid array packaged device and method of forming same
11/03/2005WO2005104210A2 Arrayed ultrasonic transducer
11/03/2005WO2005104209A1 Methods for forming super-steep diffusion region profiles in mos devices and resulting semiconductor topographies
11/03/2005WO2005104208A1 Silicon semiconductor substrate heat-treatment method and silicon semiconductor substrate treated by the method
11/03/2005WO2005104207A1 Method for extending time between chamber cleaning processes
11/03/2005WO2005104206A1 Method of controlling the uniformity of pecvd-deposited thin films
11/03/2005WO2005104205A1 Composition for chemo-mechanical polishing (cmp)
11/03/2005WO2005104204A1 Heat treating device
11/03/2005WO2005104203A1 Substrate processing system and process for fabricating semiconductor device
11/03/2005WO2005104202A1 Method of cleaning substrate
11/03/2005WO2005104201A1 Sucking apparatus
11/03/2005WO2005104200A1 Substrate cleaning method, substrate cleaning equipment, computer program and program recording medium
11/03/2005WO2005104199A1 Polishing pad for semiconductor wafer, polishing multilayered body for semiconductor wafer having same, and method for polishing semiconductor wafer
11/03/2005WO2005104198A1 Semiconductor substrate and process for fabricating the same
11/03/2005WO2005104197A1 A method of forming a tantalum-containing gate electrode structure
11/03/2005WO2005104196A1 Measuring method, measuring equipment, exposing method and exposing equipment
11/03/2005WO2005104195A1 Exposure apparatus and device producing method
11/03/2005WO2005104194A1 Substrate processing method and substrate processing apparatus
11/03/2005WO2005104193A1 Method for correcting electron beam exposure data
11/03/2005WO2005104192A2 A METHOD FOR THE FABRICATION OF GaAs/Si AND RELATED WAFER BONDED VIRTUAL SUBSTRATES
11/03/2005WO2005104191A1 Methods for producing ruthenium film and ruthenium oxide film
11/03/2005WO2005104190A2 Semiconductor processing methods for forming electrical contacts, and semiconductor structures
11/03/2005WO2005104188A2 Polymer dielectrics for memory element array interconnect
11/03/2005WO2005104187A1 In-situ surface treatment for memory cell formation
11/03/2005WO2005104164A2 Honeycomb optical window deposition shield and method for a plasma processing system
11/03/2005WO2005104147A2 Cmos-compatible light emitting aperiodic photonic structures
11/03/2005WO2005104140A1 Low dielectric constant porous films
11/03/2005WO2005103832A1 Resist pattern forming method and composite rinse agent
11/03/2005WO2005103831A1 Rinsing fluid for lithography
11/03/2005WO2005103830A1 Rinse solution for lithography
11/03/2005WO2005103825A2 Device for covering substrates in a rotating manner
11/03/2005WO2005103820A1 Levenson type phase shift mask and production method therefor
11/03/2005WO2005103818A2 Method for structuring at least one layer and electric component with structures from said layer
11/03/2005WO2005103735A1 Sheet-shaped probe, manufacturing method thereof and application thereof
11/03/2005WO2005103734A1 Sheet-like probe, method of producing the probe, and application of the probe
11/03/2005WO2005103733A1 Sheet-like probe, method of producing the probe, and application of the probe
11/03/2005WO2005103732A1 Sheet-shaped probe, manufacturing method thereof and application thereof
11/03/2005WO2005103731A1 Sheet-shaped probe, manufacturing method thereof and application thereof
11/03/2005WO2005103730A1 Sheet-like probe, method of producing the probe, and application of the probe
11/03/2005WO2005103658A1 Defect inspection device and substrate production system using the same
11/03/2005WO2005103333A2 Wafer heater assembly
11/03/2005WO2005103327A1 Method of improving the wafer to wafer uniformity and defectivity of a deposited dielectric film
11/03/2005WO2005103321A2 Ionized physical vapor deposition (ipvd) process
11/03/2005WO2005103320A1 Indium oxide/zinc oxide/magnesium oxide sputtering target and transparent conductive film
11/03/2005WO2005103180A1 Adhesive sheet, semiconductor device and process for producing semiconductor device
11/03/2005WO2005103167A1 Uv curable composition for forming dielectric coatings and related method
11/03/2005WO2005103098A1 Resist protecting film forming material for immersion exposure process and resist pattern forming method using the protecting film
11/03/2005WO2005102932A1 Composition for chemo-mechanical polishing (cmp)
11/03/2005WO2005102872A2 Substrate container with fluid-sealing flow passageway
11/03/2005WO2005102871A2 Wafer container with sealable door
11/03/2005WO2005102870A2 Wafer container door with particulate collecting structure
11/03/2005WO2005102706A1 Device with gates configured in loop structures
11/03/2005WO2005102638A1 Method for forming vertical crack on brittle board and vertical crack forming apparatus
11/03/2005WO2005102615A1 Drive controlling apparatus and method of electronic component holding means and program therefor
11/03/2005WO2005102601A1 Polisher
11/03/2005WO2005074013A3 Silicon carbide on diamond substrates and related devices and methods
11/03/2005WO2005069372A8 Carbon nanotube conductor for trench capacitors
11/03/2005WO2005065430A3 Electrochemical fabrication methods for producing multilayer structures including the use of diamond machining in the planarization of deposits of material
11/03/2005WO2005060006A3 Gate insulating film comprising silicon and oxygen
11/03/2005WO2005057615A3 Closed cell trench metal-oxide-semiconductor field effect transistor
11/03/2005WO2005055310A3 Process for packaging components, and packaged components
11/03/2005WO2005050701A8 Stressed semiconductor device structures having granular semiconductor material
11/03/2005WO2005045900A3 Method of fabricating a finfet
11/03/2005WO2005043614A3 METHOD FOR FABRICATING SiGe-ON-INSULATOR (SGOI) AND Ge-ON-INSULATOR (GOI) SUBSTRATES
11/03/2005WO2005043594A3 Method for forming photo-defined micro electrical contacts
11/03/2005WO2005043591A8 HIGH PERFORMANCE STRESS-ENHANCED MOSFETs USING Si:C AND SiGe EPITAXIAL SOURCE/DRAIN AND METHOD OF MANUFACTURE
11/03/2005WO2005038881A3 Short-channel transistors
11/03/2005WO2005036598A3 Method of making a vertical electronic device
11/03/2005WO2005034186A3 Method for forming a semiconductor device having isolation regions
11/03/2005WO2005029545A3 Self-aligned planar double-gate process by self-aligned oxidation
11/03/2005WO2005024906A3 Structure and method for metal replacement gate of high performance device
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