Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
05/2006
05/11/2006US20060097347 Novel slurry for chemical mechanical polishing of metals
05/11/2006US20060097341 Forming phase change memory cell with microtrenches
05/11/2006US20060097338 Temperature-compensated resistor and fabrication method therefor
05/11/2006US20060097335 Electronic package for image sensor, and the packaging method thereof
05/11/2006US20060097332 Semiconductor device, carrier, card reader, methods of initializing and checking authenticity
05/11/2006US20060097327 Low resistance semiconductor process and structures
05/11/2006US20060097318 Transistor with silicon and carbon layer in the channel region
05/11/2006US20060097311 Semiconductor memory device
05/11/2006US20060097310 Non-volatile memory devices including divided charge storage structures and methods of fabricating the same
05/11/2006US20060097309 Non-volatile semiconductor memory device having memory cell array suitable for high density and high integration
05/11/2006US20060097308 Multi-bit non-volatile memory device, method of operating the same, and method of manufacturing the multi-bit non-volatile memory device
05/11/2006US20060097307 Nonvolatile semiconductor memory and manufacturing method for the same
05/11/2006US20060097306 Multi bits flash memory device and method of operating the same
05/11/2006US20060097305 Capacitor with zirconium oxide and method for fabricating the same
05/11/2006US20060097304 Semiconductor memory devices including a vertical channel transistor and methods of manufacturing the same
05/11/2006US20060097303 Semiconductor device and its manufacturing method
05/11/2006US20060097294 Semiconductor device and method for fabricating the same
05/11/2006US20060097290 Semiconductor structure for imaging detectors
05/11/2006US20060097288 Cross-point nonvolatile memory devices using binary metal oxide layer as data storage material layer and methods of fabricating the same
05/11/2006US20060097287 Semiconductor device and manufacturing method thereof
05/11/2006US20060097285 Microcomputer chip with function capable of supporting emulation
05/11/2006US20060097284 Integrated circuit die with logically equivalent bonding pads
05/11/2006US20060097281 Strained semiconductor by wafer bonding with misorientation
05/11/2006US20060097266 Large-diameter sic wafer and manufacturing method thereof
05/11/2006US20060097265 Thin film transistor array panel and method for manufacturing the same
05/11/2006US20060097262 Thin film transistor array panel
05/11/2006US20060097260 Array substrates for use in liquid crystal displays and fabrication methods thereof
05/11/2006US20060097258 Semiconductor device and manufacturing method thereof
05/11/2006US20060097256 Electro-optical device and electronic device
05/11/2006US20060097252 Interconnect including a pliable surface and use thereof
05/11/2006US20060097220 Etching solution and method for removing low-k dielectric layer
05/11/2006US20060097219 High selectivity slurry compositions for chemical mechanical polishing
05/11/2006US20060097202 Collector having unused region for illumination systems using a wavelength <193 nm
05/11/2006US20060097200 Electron beam apparatus and a device manufacturing method by using said electron beam apparatus
05/11/2006US20060097194 Ion beam processing method
05/11/2006US20060097193 Ion implantation device and a method of semiconductor manufacturing by the implantation of boron hydride cluster ions
05/11/2006US20060097158 Scanning electron microscope
05/11/2006US20060096866 Insulator electrode devices
05/11/2006US20060096709 LCD bonding machine and method for fabricating LCD by using the same
05/11/2006US20060096707 Processing materials inside an atmospheric-pressure radiofrequency nonthermal plasma discharge
05/11/2006US20060096706 Dry etching apparatus and a method of manufacturing a semiconductor device
05/11/2006US20060096705 Removal of sacrificial materials in MEMS fabrications
05/11/2006US20060096704 Dry etching apparatus
05/11/2006US20060096702 Apparatus for monitoring and controlling force applied on workpiece surface during electrochemical mechanical processing
05/11/2006US20060096701 Apparatus for manufacturing an electronic device, method of manufacturing an electronic device, and program for manufacturing an electronic device
05/11/2006US20060096677 Temperature measurement and heat-treating methods
05/11/2006US20060096613 Semiconductor wafer washing system and method of supplying chemicals to the washing tanks of the system
05/11/2006US20060096533 Fluid control device
05/11/2006US20060096532 Thin film forming apparatus
05/11/2006US20060096525 Solid hollow fiber cooling crystallization systems and methods
05/11/2006US20060096524 Crystal growth method for nitride semiconductor and formation method for semiconductor device
05/11/2006US20060096521 Method for reducing defect concentration in crystals
05/11/2006US20060096395 High precision gas bearing split-axis stage for transport and constraint of large flat flexible media during processing
05/11/2006US20060096085 Methods for designing and tuning one or more packaged integrated circuits
05/11/2006US20060096049 Wafer cleaning brush
05/11/2006DE69926126T2 Verfahren zur ruhestrombestimmung A method for closed-circuit specifications
05/11/2006DE4446992B4 Vorrichtung zum Abscheiden von Schichten auf Substraten An apparatus for depositing layers on substrates
05/11/2006DE19957303B4 MOS-Transistor und Verfahren zu dessen Herstellung MOS transistor and method of producing the
05/11/2006DE19854187B4 Elementisolationsstruktur für Halbleitervorrichtung und deren Verfahren Element isolation structure for the semiconductor device and the method
05/11/2006DE19820816B4 Bondpadstruktur und entsprechendes Herstellungsverfahren Bondpadstruktur and manufacturing method thereof
05/11/2006DE19540900B4 Verfahren zum Herstellen einer Reaktionskammer durch Verbinden von Körpern aus Siliciumcarbid oder Graphit A method of preparing a reaction chamber by connecting bodies made of silicon carbide or graphite
05/11/2006DE112004001190T5 Laserpulsselektion mittels kontrollierter AOM-Belastung Laser pulse by means of controlled selection AOM-load
05/11/2006DE112004001049T5 Nichtflüchtige Speichervorrichtung A non-volatile memory device
05/11/2006DE112004000665T5 Prozess zur Herstellung eines Ferrokondensators Process for producing a ferro-capacitor
05/11/2006DE10313521B4 Vorrichtung und Verfahren zum Entfernen des Spritzgrats an Gehäuseseiten von in einem Leadframe angeordneten Bauelementen Apparatus and method for removing the Spritzgrats to housing sides of which is arranged in a lead frame components
05/11/2006DE10255884B4 Düsenanordnung Nozzle assembly
05/11/2006DE10229231B9 Verfahren zum Herstellen eines Strahlung emittierenden und/oder empfangenden Halbleiterchips mit einer Strahlungsein- und/oder -auskoppel-Mikrostruktur A method of manufacturing a radiation-emitting and / or receiving semiconductor chip having a radiation entrance and / or microstructure -auskoppel
05/11/2006DE10219771B4 Vorrichtung zum automatischen Reinigen von in Maschinenkassetten aufgenommenen Vakuumhaltern oder -pipetten Apparatus for automatically cleaning machines accommodated in cassettes vacuum chucks or -pipettes
05/11/2006DE10200678B4 Verfahren zum Bearbeiten eines Substrats zum Ausbilden einer Struktur A method for processing a substrate for forming a structure
05/11/2006DE102005052731A1 Siliziumkarbidhalbleitervorrichtung und Verfahren zur Herstellung derselben Silicon carbide semiconductor device and method of manufacturing the same
05/11/2006DE102005052719A1 Photon-verbesserte UV-Behandlung dielektrischer Schichten Photon improved UV treatment of dielectric layers
05/11/2006DE102005052514A1 Drucktuch für eine Druckwalze sowie Druckvorrichtung unter Verwendung eines solchen Drucktuchs Printing blanket for a printing roller and printing apparatus using such a printing blanket
05/11/2006DE102005052509A1 Druckplatte und Verfahren zum Herstellen derselben Printing plate and method for manufacturing the same
05/11/2006DE102005049247A1 High frequency switching transistor has doped barrier region on a substrate containing source and drain regions with channel and gate electrode and insulating interlayer
05/11/2006DE102005042521A1 Verfahren und Vorrichtung für eine sich verdrehende Halterungssonde zum sondieren von Testzugriffspunktstrukturen Method and apparatus for a-twist mount probe to probe test access point structures
05/11/2006DE102005030576A1 Verfahren und Vorrichtung zum Zerteilen eines Substrats unter Verwendung eines Femtosekundenlasers Method and apparatus for dividing a substrate using a femtosecond laser
05/11/2006DE102005025452A1 Halbleitervorrichtung mit einer Durchgangselektrode und Verfahren zu ihrer Herstellung A semiconductor device having a through electrode and process for their preparation
05/11/2006DE102005007599B3 Field stop zone producing method for e.g. bipolar transistor, involves subjecting semiconductor body to rapid thermal annealing process in nitrating atmosphere, before irradiation process of body
05/11/2006DE102004057536B3 Method for fabricating through-holes with different sizes e.g. for integrated circuit, requires use of auxiliary layer for generating different structural sizes
05/11/2006DE102004055181B3 Verfahren und Anordnung zur elektrischen Messung der Dicke von Halbleiterschichten Method and apparatus for electrical measurement of the thickness of semiconductor layers
05/11/2006DE102004054285A1 Production of structures in a semiconductor substrate used in the production of highly integrated semiconductor components comprises preparing a layer structure with the substrate, applying an inert stop layer and further processing
05/11/2006DE102004053906A1 Adaptervorrichtung für eine Substrat-Arbeitsstation The adapter device for a substrate workstation
05/11/2006DE102004053760A1 Halbleitereinrichtung und Verfahren für deren Herstellung Semiconductor device and methods for their preparation
05/11/2006DE102004053394A1 Halbleiteranordnung und Verfahren zur Herstellung einer Halbleiteranordnung A semiconductor device and method of manufacturing a semiconductor device
05/11/2006DE102004053393A1 Verfahren zur Herstellung eines Halbleitergegenstandes und Halbleitergegenstand A process for producing a semiconductor article and semiconductor article
05/11/2006DE102004053338A1 Reduction of oxide layer on a semiconductor surface by heat treatment in a chamber in a temperature-time process to a temperature of 900-1050degreesC useful in semiconductor technology, comprises treatment with CO2-containing process gas
05/11/2006DE102004052921A1 Verfahren zur Herstellung von Halbleiterbauelementen mit externen Kontaktierungen A process for producing semiconductor devices with external contacts
05/11/2006DE102004052580A1 System und Verfahren zum Zuführen von Vorstufengasen zu einer Implantationsanlage System and method for supplying precursor gases into a implanter
05/11/2006DE102004052578A1 Technik zum Erzeugen einer unterschiedlichen mechanischen Verformung in unterschiedlichen Kanalgebieten durch Bilden eines Ätzstoppschichtstapels mit unterschiedlich modifizierter innerer Spannung Technique for generating a different mechanical deformation in different channel regions by forming a Ätzstoppschichtstapels with differently modified internal stress
05/11/2006DE102004046257B3 Process to form interlocking assembly profile in multilayered semiconductor component
05/11/2006DE102004040671B4 Method for breaking-up thin, plate-shaped substrate or wafer along scribed line so placing wafer etc. on two-part support
05/11/2006DE102004029519A9 Verfahren zum Herstellen einer Schicht-Anordnung A method for producing a layer arrangement
05/11/2006DE102004026145A1 Halbleiterstruktur mit einem spannungsempfindlichen Element und Verfahren zum Messen einer elastischen Spannung in einer Halbleiterstruktur Semiconductor structure having a voltage sensitive element and method for measuring an elastic stress in a semiconductor structure
05/11/2006DE102004014984B4 Verfahren zur Bestimmung des substitutionellen Kohlenstoffgehalts in poly- oder monokristallinem Silicium Method for determining the substitutional carbon content in poly or mono-crystalline silicon
05/11/2006DE102004009174B4 Method for implanting semiconductor wafer used in production of integrated circuit involves applying amorphous layer on substrate, applying antireflection layer and resist layer, structuring resist layer and implanting ions
05/11/2006DE102004001411B4 Verfahren und Vorrichtung zum Bestimmen von Defekten in einer regelmäßigen Struktur Method and apparatus for detecting defects in a regular structure
05/11/2006DE10157538B4 Feldeffekttransistor sowie Verfahren zu seiner Herstellung Field effect transistor, and methods for its preparation
05/11/2006DE10136534B4 Wafer-Schneidemaschine Wafer cutting machine
05/11/2006DE10104274B4 Kontaktstruktur für ein Halbleiterbauteil mit MOS-Gatesteuerung sowie Verfahren zu seiner Herstellung Contact structure for a semiconductor device with MOS gate control as well as method for its preparation
05/11/2006DE10034855B4 System zum Test von schnellen integrierten Digitalschaltungen und BOST-Halbleiterschaltungsbaustein als Testschaltkreis A system for fast test of integrated digital circuits and BOST semiconductor circuit block as the test circuit