| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 10/25/2006 | CN1851888A Round-grade packing integrated-circuit method |
| 10/25/2006 | CN1851887A Method for processing patch diode |
| 10/25/2006 | CN1851886A Method for making thin-film transistor |
| 10/25/2006 | CN1851885A Washing method after wet etching and method for forming thin-film transistor using same |
| 10/25/2006 | CN1851884A Method of manufacturing flash memory device |
| 10/25/2006 | CN1851883A Method for forming inclined conductive layer |
| 10/25/2006 | CN1851882A Grating etching technology avoiding micro-channel phenomenon |
| 10/25/2006 | CN1851881A Semiconductor etching apparatus |
| 10/25/2006 | CN1851880A Polysilicon etching technology capable of preventing device from plasma damage |
| 10/25/2006 | CN1851879A Packing device of inductive coupling plasma coil |
| 10/25/2006 | CN1851878A Etching technology for reducing plasma damage |
| 10/25/2006 | CN1851877A Plasma cleaning method for removing silicon chip surface particle after etching process |
| 10/25/2006 | CN1851876A Adsorption stripping process for removing exposed zone polymer |
| 10/25/2006 | CN1851875A Gate etching process |
| 10/25/2006 | CN1851874A Polycrystalline silicon gate grid etching process for reducing particle generation |
| 10/25/2006 | CN1851873A Silicon gate etching process capable of avoiding microtrench phenomenon |
| 10/25/2006 | CN1851872A Polycrystalline silicon pulse etching process for improving anisotropy |
| 10/25/2006 | CN1851871A Polycrystalline silicon etching process capable of removing residual gas |
| 10/25/2006 | CN1851870A Method for reducing etching uniformity influence by dry cleaning process |
| 10/25/2006 | CN1851869A Particle-removing process before semiconductor etching |
| 10/25/2006 | CN1851868A Method of manufacture semiconductor device |
| 10/25/2006 | CN1851867A Ion injection uniformity control system and control method |
| 10/25/2006 | CN1851866A Method for preparing room temperature ferromagnetic semiconductor Co dopped TiO2 film |
| 10/25/2006 | CN1851865A Bare crystal and its manufacturing method |
| 10/25/2006 | CN1851864A Silicon chip unloading process |
| 10/25/2006 | CN1851863A Pneumatic type platform cover-opening mechanism |
| 10/25/2006 | CN1851862A Platform cover-opening mechanism |
| 10/25/2006 | CN1851861A Vacuum chamber gas-filling system |
| 10/25/2006 | CN1851860A Bottom electrode assembly for semiconductor device |
| 10/25/2006 | CN1851859A Silicon chip process test method |
| 10/25/2006 | CN1851858A Gas injection and diffusion system |
| 10/25/2006 | CN1851857A Silicon-chip separating process |
| 10/25/2006 | CN1851856A Reaction chamber for semiconductor treatment |
| 10/25/2006 | CN1851855A Plasma etching device exhaustring |
| 10/25/2006 | CN1851854A Lower-extraction type etching device |
| 10/25/2006 | CN1851853A Device and method for reducing thin-film type capacitance vacuum gauge zero-point drift |
| 10/25/2006 | CN1851852A Plasma etching device |
| 10/25/2006 | CN1851851A Quartz cover positioning protection device |
| 10/25/2006 | CN1851850A Silicon chip unloading process |
| 10/25/2006 | CN1851849A Silicon chip unloading process for reducing plasma damage |
| 10/25/2006 | CN1851848A Plasma reaction chamber temperature control system on-line fault detecting device and method |
| 10/25/2006 | CN1851845A Plasma treating coil |
| 10/25/2006 | CN1851844A ICP coil capable of adjusting local coupling strength |
| 10/25/2006 | CN1851721A Reliability estimating method for gallium arsenide one-chip microwave integrated circuit |
| 10/25/2006 | CN1851596A Mass flow controller on-line correction method |
| 10/25/2006 | CN1851593A Equipment alarm and interlocking treatment method |
| 10/25/2006 | CN1851587A Semiconductor manufacture equipment control system and method |
| 10/25/2006 | CN1851586A Automatic treating device and method for semiconductor manufacture process event |
| 10/25/2006 | CN1851585A Method for treating semiconductor processing data |
| 10/25/2006 | CN1851580A Method for controlling molecular pump for semiconductor etching device |
| 10/25/2006 | CN1851558A Overload buffer protection device |
| 10/25/2006 | CN1851556A Adjusting method for long mask exposure focusing plane correction |
| 10/25/2006 | CN1851547A Transflective liquid crystal display and manufacturing method of the same |
| 10/25/2006 | CN1851476A Interface and semiconductor testing apparatus using same |
| 10/25/2006 | CN1851420A Method for measuring electronic-temperature in plasma |
| 10/25/2006 | CN1851249A Semiconductor device and temperature detection method using the same |
| 10/25/2006 | CN1851053A Shielding plate for enhancing flow field uniformity |
| 10/25/2006 | CN1851052A Control method for removing residual gas for etching process |
| 10/25/2006 | CN1851051A Method for controlling chip temperature in reaction chamber for semiconductor etching process |
| 10/25/2006 | CN1851050A Granule control method for polycrystalline silicon etching process |
| 10/25/2006 | CN1850477A Resin molding apparatus |
| 10/25/2006 | CN1850362A Washing method for washing polymer film adhered on illinium oxide part surface |
| 10/25/2006 | CN1850361A Washing method for removing polymer film adhered on quartz pant surface |
| 10/25/2006 | CN1850360A Washing method for removing polymer film adhered on surface of anode alumimium-oxide part |
| 10/25/2006 | CN1850350A Air-intaking device for increasing intake evenness |
| 10/25/2006 | CN1850349A Air-intake nozzle |
| 10/25/2006 | CN1850348A Gas nozzle with function of increasing air-flow distribution evenness |
| 10/25/2006 | CN1850347A Air-intaking nozzle with adjustable air-supplying evenness |
| 10/25/2006 | CN1850346A Double-zone nozzle |
| 10/25/2006 | CN1282396C Carbon electric wire heating body sealing heater and fluid heater using tue same heater |
| 10/25/2006 | CN1282257C Device with nitrides system heterogenous structure and its manufacturing method |
| 10/25/2006 | CN1282256C Semiconductor device |
| 10/25/2006 | CN1282255C Semiconductor device and its producing method |
| 10/25/2006 | CN1282254C MOSFET and its manufacture |
| 10/25/2006 | CN1282253C Semiconductor device with small bag and its mfg. |
| 10/25/2006 | CN1282252C 电子电路 Electronic circuit |
| 10/25/2006 | CN1282250C Semiconductor storage apparatus |
| 10/25/2006 | CN1282249C Fast storage unit, manufacturing method of fast storage unit and its operation method |
| 10/25/2006 | CN1282248C Improved memory unit contact part |
| 10/25/2006 | CN1282247C 半导体器件及其制造方法 Semiconductor device and manufacturing method thereof |
| 10/25/2006 | CN1282246C High-power RF integrated circuit capable of blocking parasitic loss current and its mfg. method |
| 10/25/2006 | CN1282245C Semiconductor chip with partial embedded decoupling capacitance |
| 10/25/2006 | CN1282243C Semiconductor device with copper wirings |
| 10/25/2006 | CN1282242C Chip ratio package and manufacturing method thereof |
| 10/25/2006 | CN1282241C 半导体装置 Semiconductor device |
| 10/25/2006 | CN1282239C High density reluctance random access memory unit and manufacture method thereof |
| 10/25/2006 | CN1282238C Semiconductor producing process |
| 10/25/2006 | CN1282237C Method for making double inserted open structure |
| 10/25/2006 | CN1282236C Test element for tunnelling oxidl layer of flash memory and method thereof |
| 10/25/2006 | CN1282235C Observer for semiconductor element |
| 10/25/2006 | CN1282234C Method for mfg. low-resistance transistor element |
| 10/25/2006 | CN1282233C Double-grid field effect transistor and manufacturing method thereof |
| 10/25/2006 | CN1282232C Laser irradiation apparatus and laser irradiation method |
| 10/25/2006 | CN1282231C Systemic impurity process for vertical pulling silicon sheet |
| 10/25/2006 | CN1282230C Method for mfg. semiconductor device, and semiconductor device |
| 10/25/2006 | CN1282229C Method for removing silicon nitride layer |
| 10/25/2006 | CN1282228C Method and device for cutting non-metal substrate |
| 10/25/2006 | CN1282227C Wafer dividing method using cleavage |
| 10/25/2006 | CN1282226C Cerium oxide abrasive and method of abrading substrates |
| 10/25/2006 | CN1282225C Method for increasing crystal circlr cleaning efficiercy and improving process qualification rate |