H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
10/2006
10/31/2006	US7129114 Methods relating to singulating semiconductor wafers and wafer scale assemblies
10/31/2006	US7129113 Method of making a three-dimensional stacked semiconductor package with a metal pillar in an encapsulant aperture
10/31/2006	US7129112 Manufacturing method for semiconductor device, semiconductor device, and electronic apparatus
10/31/2006	US7129111 Method for forming bump protective collars on a bumped wafer
10/31/2006	US7129110 Semiconductor device and method for manufacturing the same
10/31/2006	US7129109 Method for structuring an oxide layer applied to a substrate material
10/31/2006	US7129107 Process for producing a semiconductor light-emitting device
10/31/2006	US7129106 Thin film transistor substrate of a horizontal electric field type and method of darkening defective pixel in the same
10/31/2006	US7129105 Method for manufacturing thin film transistor array panel for display device
10/31/2006	US7129104 Wavelength-insensitive radiation coupling for multi-quantum well sensor based on intersubband absorption
10/31/2006	US7129103 Semiconductor light emitting element and method of making the same
10/31/2006	US7129102 Light-emitting device, method of manufacturing a light-emitting device, and electronic equipment
10/31/2006	US7129101 Failure analysis vehicle for yield enhancement with self test at speed burnin capability for reliability testing
10/31/2006	US7129100 In-wafer testing of integrated optical components in photonic integrated circuits (PICs)
10/31/2006	US7129099 Method for manufacturing semiconductor device
10/31/2006	US7129098 Reduced power magnetoresistive random access memory elements
10/31/2006	US7129097 Integrated circuit chip utilizing oriented carbon nanotube conductive layers
10/31/2006	US7129058 Method of production of a nanoparticle of a compound semiconductor in a cavity of protein
10/31/2006	US7129029 For selectively removing photoresist residues from a microstructure
10/31/2006	US7129026 Lithographic process for multi-etching steps by using single reticle
10/31/2006	US7129025 Fabrication method of a three-dimensional microstructure
10/31/2006	US7129020 Liquid coating composition for forming a top antireflective film and photoresist laminate using the same, as well as method for forming photoresist pattern
10/31/2006	US7129017 Chemically amplified resist composition and method for forming patterned film using same
10/31/2006	US7129010 Substrates for in particular microlithography
10/31/2006	US7128976 Composition for film formation, method of film formation, and silica-based film
10/31/2006	US7128975 Allows fine textures to be formed uniformly, thereby effectively reducing reflectance in the solar cell; high conversion efficiency solar cells
10/31/2006	US7128974 Thick single crystal diamond layer method for making it and gemstones produced from the layer
10/31/2006	US7128946 Engraving pattern ; forming dielectric films
10/31/2006	US7128882 Decomposing perfluorcompounds contained in a gas and sucking a discharged gas containing acid gases resulting from the decomposition of the perfluorocompounds by a jet stream of an injected gas, thereby ejecting the sucked gas
10/31/2006	US7128852 Producing large quantities of a high quality, dense aerosol for spray pyrolysis operations; multi-phase particles for use in manufacturing electrically-conductive metallic films for electronic products
10/31/2006	US7128846 Process for producing group III nitride compound semiconductor
10/31/2006	US7128844 Metal/ceramic circuit board and method for producing same
10/31/2006	US7128843 Process for fabricating monolithic membrane substrate structures with well-controlled air gaps
10/31/2006	US7128825 Method and composition for polishing a substrate
10/31/2006	US7128823 Anolyte for copper plating
10/31/2006	US7128821 Immersing the wafer in an electropolishing electrolyte solution and removing defects and particles from the wafer by rotational friction between the wafer and the electrolyte solution in combination with electrolysis
10/31/2006	US7128806 Mask etch processing apparatus
10/31/2006	US7128805 Multiple elliptical ball plasma apparatus
10/31/2006	US7128804 Corrosion resistant component of semiconductor processing equipment and method of manufacture thereof
10/31/2006	US7128803 Integration of sensor based metrology into semiconductor processing tools
10/31/2006	US7128788 Manufacturing apparatus for buried insulating layer-type semiconductor silicon carbide substrate
10/31/2006	US7128787 Atomic layer deposition method
10/31/2006	US7128786 Process for depositing III-V semiconductor layers on a non-III-V substrate
10/31/2006	US7128785 Method for depositing especially crystalline layers from the gas phase onto especially crystalline substrates
10/31/2006	US7128783 Thin-film crystal-structure-processed mechanical devices, and methods and systems for making
10/31/2006	US7128587 Probe card covering system and method
10/31/2006	US7128570 Method and apparatus for purging seals in a thermal reactor
10/31/2006	US7128516 Workpiece transport apparatus
10/31/2006	US7128481 Substrate processing apparatus for inspecting processing history data
10/31/2006	US7128305 Unitary slot valve actuator with dual valves
10/31/2006	US7128279 Method and apparatus for fluid delivery to a backside of a substrate
10/31/2006	US7127901 Helium management control system
10/31/2006	US7127831 Methods and systems for processing a substrate using a dynamic liquid meniscus
10/31/2006	US7127828 Lockdown rotor for a processing machine
10/31/2006	US7127810 Method of manufacturing electronic device including aligning first substrate, second substrate and mask, and transferring object from first substrate to second substrate, including irradiating object on first substrate with light through mask
10/31/2006	US7127809 Method of forming one or more base structures on an LTCC cofired module
10/31/2006	US7127807 Process of manufacturing multilayer modules
10/31/2006	US7127805 Electronic device carrier and manufacturing tape
10/31/2006	US7127794 Auto-boating process
10/31/2006	CA2187354C Semiconductor devices and methods
10/26/2006	WO2006113932A2 Chip-scale package
10/26/2006	WO2006113754A2 Underfill dispense at substrate aperture
10/26/2006	WO2006113609A2 Maskless multiple sheet polysilicon resistor
10/26/2006	WO2006113443A2 Etching technique for the fabrication of thin (ai, in, ga)n layers
10/26/2006	WO2006113442A2 Wafer separation technique for the fabrication of free-standing (al, in, ga)n wafers
10/26/2006	WO2006113354A2 Dense nanostructured oxides with fine crystals prepared by field activation sintering
10/26/2006	WO2006113222A2 Removal of high-dose ion-implanted photoresist using self-assembled monolayers in solvent systems
10/26/2006	WO2006113186A2 Interconnect structure and method of fabrication of same
10/26/2006	WO2006113158A2 Mim capacitor and method of fabricating same
10/26/2006	WO2006113100A1 Dual wavelength thermal flux laser anneal
10/26/2006	WO2006112995A2 Glass-based semiconductor on insulator structures and methods of making same
10/26/2006	WO2006112964A2 Method of forming trench isolation in a semiconductor device
10/26/2006	WO2006112948A1 Method of forming a semiconductor device having a high-k dielectric
10/26/2006	WO2006112947A1 Method of forming a substrateless semiconductor package
10/26/2006	WO2006112815A2 Nanocontact printing
10/26/2006	WO2006112651A1 Semiconductor package pickup apparatus
10/26/2006	WO2006112647A1 Method of preparing metal oxide suspension
10/26/2006	WO2006112576A1 Method for manufacturing passive device and semiconductor package using thin metal piece
10/26/2006	WO2006112532A1 Substrate processing apparatus
10/26/2006	WO2006112531A1 Device for and method of polishing peripheral edge of semiconductor wafer
10/26/2006	WO2006112530A1 Substrate processing apparatus
10/26/2006	WO2006112524A1 Manufacturing method for semiconductor chips
10/26/2006	WO2006112519A1 Polishing composition
10/26/2006	WO2006112484A1 Convey error measuring method, calibration method, plotting method, exposure plotting method, plotting device, and exposure plotting device
10/26/2006	WO2006112458A1 Method of producing electronic apparatus
10/26/2006	WO2006112436A1 Exposure device, exposure method, and device manufacturing method
10/26/2006	WO2006112424A1 Manufacturing method for semiconductor chips
10/26/2006	WO2006112423A1 Manufacturing method for semiconductor chips, and semiconductor chip
10/26/2006	WO2006112393A1 Semiconductor device and semiconductor device manufacturing method
10/26/2006	WO2006112392A1 Shower plate and method for manufacturing the same
10/26/2006	WO2006112388A1 Semiconductor device manufacturing method, semiconductor device, plasma nitriding treatment method, control program and computer storage medium
10/26/2006	WO2006112384A1 Protruding electrode for connecting electronic component, electronic component mounted body using such electrode and methods for manufacturing such electrode and electronic component mounted body
10/26/2006	WO2006112383A1 Electronic circuit device and method for manufacturing same
10/26/2006	WO2006112377A1 Polishing slurry and polishing material using same
10/26/2006	WO2006112250A1 Induction heating element made of glassy carbon, heating device and heater
10/26/2006	WO2006112230A1 Composition for forming silica coat
10/26/2006	WO2006112217A1 Packaging system
10/26/2006	WO2006112202A1 Semiconductor device and process for producing the same
10/26/2006	WO2006112167A1 METHOD FOR MANUFACTURING p TYPE NITRIDE SEMICONDUCTOR AND SEMICONDUCTOR DEVICE MANUFACTURED BY SUCH METHOD
10/26/2006	WO2006112151A1 Drive method for driving element having capacity impedance, drive device, and imaging device

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