H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
10/2006
10/26/2006	US20060237768 Programmable array logic or memory with p-channel devices and asymmetrical tunnel barriers
10/26/2006	US20060237767 Semiconductor device with double barrier film
10/26/2006	US20060237764 LANTHANIDE DOPED TiOx DIELECTRIC FILMS
10/26/2006	US20060237763 Electronic systems
10/26/2006	US20060237762 Semiconductor device and method of manufacturing the semiconductor device
10/26/2006	US20060237760 Thin-film capacitative element and electronic circuit and electronic equipment including the same
10/26/2006	US20060237759 Semiconductor device manufacturing method and semiconductor device
10/26/2006	US20060237745 Super lattice modification of overlying transistor
10/26/2006	US20060237740 Mbe growth of an algan layer or algan multilayer structure
10/26/2006	US20060237728 Silicon carbide power devices with self-aligned source and well regions
10/26/2006	US20060237722 Solid state imaging device
10/26/2006	US20060237719 Electronic components
10/26/2006	US20060237718 Porous solid of copper, silicon wafers, or silicon dioxide coated with a barrier layer with a complex of a substituted diimine or diamine propyl group
10/26/2006	US20060237717 Organic polymers, electronic devices, and methods
10/26/2006	US20060237716 Material and cell structure for storage applications
10/26/2006	US20060237647 X-ray imaging device
10/26/2006	US20060237404 Laser annealer and laser thin-film forming apparatus
10/26/2006	US20060237397 Method for manufacturing semiconductor device and laser irradiation apparatus
10/26/2006	US20060237392 Polymer remover
10/26/2006	US20060237391 Vacuum processing apparatus and vacuum processing method of sample
10/26/2006	US20060237343 Wafer protective sheet
10/26/2006	US20060237338 Substrate containing case
10/26/2006	US20060237307 Electrochemical processing cell
10/26/2006	US20060237229 Method for forming pattern and a wired board
10/26/2006	US20060237181 Multi-channel temperature control system for semiconductor processing facilities
10/26/2006	US20060237139 Vacuum ultraviolt ray bonding apparatus
10/26/2006	US20060237138 Apparatuses and methods for supporting microelectronic devices during plasma-based fabrication processes
10/26/2006	US20060237137 Semiconductor apparatus capable of reducing outgassing pollution and method of achieving the same
10/26/2006	US20060237136 O-ringless tandem throttle valve for a plasma reactor chamber
10/26/2006	US20060237127 after exposing and developing substrate, supplying solvent gas of treatment film to dissolve surface, supplying solvent gas (vapor of acetone); surface treatment; photoresists; photolithography; semiconductors
10/26/2006	US20060237087 Method of forming leads of a packaged semiconductor device
10/26/2006	US20060237061 In-situ gas blending and dilution system for delivery of dilute gas at a predetermined concentration
10/26/2006	US20060237054 Apparatus and method for washing quartz parts, particularly for process equipment used in semiconductor industries
10/26/2006	US20060236941 Passive wafer support for particle free wafer acceleration
10/26/2006	US20060236940 System and method for depositing a material on a substrate
10/26/2006	US20060236939 System and method for depositing a material on a substrate
10/26/2006	US20060236938 System and method for depositing a material on a substrate
10/26/2006	US20060236937 System and method for depositing a material on a substrate
10/26/2006	US20060236934 Plasma uniformity control by gas diffuser hole design
10/26/2006	US20060236929 Substrate processing apparatus and substrate processing method
10/26/2006	US20060236928 Treating solution supply nozzle, a substrate treating apparatus having this nozzle, and a method of manufacturing a treating solution supply nozzle
10/26/2006	US20060236923 Epitaxial growth of group III nitrides on silicon substrates via a reflective lattice-matched zirconium diboride buffer layer
10/26/2006	US20060236922 Method of surface treatment of group III nitride crystal film, group III nitride crystal substrate, group III nitride crystal substrate with epitaxial layer, and semiconductor device
10/26/2006	US20060236793 Sensor device for non-intrusive diagnosis of a semiconductor processing system
10/26/2006	US20060236532 Conductive elements
10/26/2006	US20060236513 System and method for detecting flow in a mass flow controller
10/26/2006	DE202005020817U1 Kontaktiervorrichung Kontaktiervorrichung
10/26/2006	DE19749378B4 MOS-Transistor und Verfahren zu dessen Herstellung MOS transistor and method of producing the
10/26/2006	DE19746920B4 Halbleitervorrichtung mit einer InGaP-Kanalschicht und einer Pufferschicht, sowie Verfahren zum Herstellen derselben A semiconductor device having a channel layer and an InGaP buffer layer, as well as methods for manufacturing the same
10/26/2006	DE19681430B4 Verfahren zur Herstellung eines Halbleiterbauelements A process for producing a semiconductor device
10/26/2006	DE112004001425T5 Verfahren und Vorrichtung zum Ätzen von scheibenförmigen Teilen Method and apparatus for etching disk-shaped parts
10/26/2006	DE10256713B4 Verfahren zur Herstellung eines Speicherungsknotenpunktes eines gestapelten Kondensators A process for the preparation of a storage node of a stacked capacitor
10/26/2006	DE10220923B4 Verfahren zur Herstellung eines nicht-flüchtigen Flash-Halbleiterspeichers A process for producing a non-volatile flash semiconductor memory
10/26/2006	DE102006017056A1 Vorrichtung und Verfahren zum Reinigen eines Halbleiterwafers Device and method for cleaning a semiconductor wafer
10/26/2006	DE102005057172A1 Schneidmaschine Cutting machine
10/26/2006	DE102005046133A1 Herstellungsverfahren für einen RCAT-Transistor und entsprechender RCAT-Transistor Manufacturing method for a RCAT transistor and corresponding RCAT transistor
10/26/2006	DE102005030940A1 Verfahren zum Bilden eines Kontakts eines Halbleiterbauelements durch Verwendung eines Festphasenepitaxieprozesses A method of forming a contact of a semiconductor device by using a Festphasenepitaxieprozesses
10/26/2006	DE102005030065A1 Festphasenepitaxie verwendendes Halbleiterbauelement und Verfahren zur Herstellung desselben Solid phase epitaxy-use semiconductor device and method of manufacturing the same
10/26/2006	DE102005028643A1 Verfahren zur Bildung einer LP-CVD-Oxidschicht ohne Oxidieren einer darunter liegenden Metallschicht A method of forming a LP-CVD oxide layer without oxidizing a underlying metal layer
10/26/2006	DE102005022084B3 Photolithographic method for structuring of e.g. dynamic RAM memory cell, involves resulting in ion implantation for doping of two different areas of substrate under two different implantation angles with respect to surface of substrate
10/26/2006	DE102005022017B3 Semiconductor chip stack manufacturing method, involves holding stabilization layer at chemical mechanical polishing- or etched stop layer while thinning wafer of isolated semiconductor chips
10/26/2006	DE102005018743A1 Verfahren zum Erkennen einer Lackkante auf einem Wafer A method for recognizing a paint edge on a wafer
10/26/2006	DE102005018737A1 Photomask structure transferring method for use in semiconductor technology, involves applying photoresist layer on organic anti-reflection layer, and exposing, in section, photoresist layer by imaging device and photomask
10/26/2006	DE102005018533A1 Macromolecules separating method for manufacturing carbon nano tube field effect transistors, involves applying acoustic waves on solid surface to separate and align macro molecules in surface and determining reaction of waves on molecules
10/26/2006	DE102005018162A1 Semiconductor treatment device for chemical vapor deposition, comprises reactor chamber with circular holder for a circular disk-shaped substrate formed on substrate holding zone adjacent to ring opening
10/26/2006	DE102005018029A1 Verfahren zum Herstellen eines elektrischen Bauelements A method of manufacturing an electric part
10/26/2006	DE102005017642A1 Verfahren und Vorrichtung zur Inspektion eines Wafers Method and apparatus for inspecting a wafer
10/26/2006	DE102005008478B3 Verfahren zur Herstellung von sublithographischen Strukturen A process for producing sublithographic structures
10/26/2006	DE102005008191A1 Verfahren zur Bestellung von VDMOS-Transistorenx Procedure for the appointment of VDMOS Transistorenx
10/26/2006	DE102004058958B4 Halbleiter-Bauelement aus einem Material mit hoher Bandlücke und Dielektrizitätskonstante A semiconductor device of a material having high dielectric constant and bandgap
10/26/2006	DE10131709B4 Verfahren zur Herstellung einseitiger Buried-Straps Process for the production of single- buried Straps
10/26/2006	DE10023002B4 Satz von Läuferscheiben sowie dessen Verwendung Set of carriers and the use thereof
10/26/2006	DE10003065B4 Verfahren zum Herstellen einer lichtemittierenden Halbleitereinrichtung mit beim Ausbilden einer Stromdiffusionsschicht aktiv geänderter Wachstumsrate A method of manufacturing a light emitting semiconductor device having active in forming a current diffusion layer modified growth rate
10/26/2006	CA2604256A1 Device and method for application of an even thin fluid layer to substrates
10/26/2006	CA2529870A1 Light-emitting device, method for making the same, and nitride semiconductor substrate
10/25/2006	EP1715531A1 Thin film transistor (TFT) and flat panel display including the TFT
10/25/2006	EP1715517A1 Ion implantation of spin on glass materials
10/25/2006	EP1715516A1 Semiconductor wafer treatment
10/25/2006	EP1715515A1 Gripper for handling of thin disk shaped objects
10/25/2006	EP1715514A1 Non-contact carrier device
10/25/2006	EP1715513A1 Airtight container
10/25/2006	EP1715512A2 Semiconductor device and method of forming the same
10/25/2006	EP1715511A2 Process for cleaning a silicon substrate
10/25/2006	EP1715510A1 Substrate cleaning liquid for semiconductor device and cleaning method
10/25/2006	EP1715509A2 Method of forming silicon films
10/25/2006	EP1715508A2 Single thin plate storage container
10/25/2006	EP1715445A1 Electronic device
10/25/2006	EP1715362A1 Beam measuring equipment and beam measuring method using the same
10/25/2006	EP1715329A1 Particle inspection apparatus and method, exposure apparatus, and device manufacturing method
10/25/2006	EP1715086A1 Method for reducing defect concentrations in crystals
10/25/2006	EP1715079A1 Deposition of titanium nitride film
10/25/2006	EP1715004A1 Die attach adhesives with improved stress performance
10/25/2006	EP1714730A1 Laser processing protection sheet and production methodfor laser processed article
10/25/2006	EP1714330A1 Methods of fabricating vertical carbon nanotube field effect transistors for arrangement in arrays and field effect transistors and arrays formed thereby
10/25/2006	EP1714325A1 Nitride heterojunction transistors having charge-transfer induced energy barriers and methods of fabricating the same
10/25/2006	EP1714324A2 High k dielectric film
10/25/2006	EP1714323A1 Compound semiconductor device and method of producing the same
10/25/2006	EP1714320A2 Conductive material compositions, apparatus, systems, and methods
10/25/2006	EP1714319A2 Semiconductor chip package
10/25/2006	EP1714317A1 Ferroelectric thin films and devices comprising thin ferroelectric films

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