Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
02/2008
02/14/2008US20080038929 Method of dry etching oxide semiconductor film
02/14/2008US20080038928 Electron beam etching device and method
02/14/2008US20080038927 Method for multi-layer resist plasma etch
02/14/2008US20080038926 Method of treating a mask layer prior to performing an etching process
02/14/2008US20080038925 Methods and apparatus for igniting a low pressure plasma
02/14/2008US20080038924 Highly-selective metal etchants
02/14/2008US20080038923 Device and methodology for reducing effective dielectric constant in semiconductor devices
02/14/2008US20080038922 Etch-stop layer and method of use
02/14/2008US20080038921 Method of Manufacturing Semiconductor Device
02/14/2008US20080038920 System and method of selectively depositing ruthenium films by digital chemical vapor deposition
02/14/2008US20080038919 Plasma sputtering film deposition method and equipment
02/14/2008US20080038918 Semiconductor device and method for manufacturing the same
02/14/2008US20080038917 MULTILAYER HARDMASK SCHEME FOR DAMAGE-FREE DUAL DAMASCENE PROCESSING OF SiCOH DIELECTRICS
02/14/2008US20080038916 Method for the production of planar structures
02/14/2008US20080038915 Device and methodology for reducing effective dielectric constant in semiconductor devices
02/14/2008US20080038914 Semiconductor element and manufacturing method thereof
02/14/2008US20080038913 Methods of forming aluminum-free wire bond pad and pad so formed
02/14/2008US20080038912 Interconnect for improved die to substrate electrical coupling
02/14/2008US20080038911 Method for manufacturing semiconductor device
02/14/2008US20080038910 Multiple lithography for reduced negative feature corner rounding
02/14/2008US20080038909 Method of Fabricating Lateral Double Diffused Metal Oxide Semiconductor Field Effect Transistor
02/14/2008US20080038908 Method and system for continuous large-area scanning implantation process
02/14/2008US20080038907 Method for Fabricating Non-Volatile Memory Device
02/14/2008US20080038906 Method for Producing P-Type Ga2o3 Film and Method for Producing Pn Junction-Type Ga2o3 Film
02/14/2008US20080038905 METHOD OF FORMING HfSiN METAL FOR n-FET APPLICATIONS
02/14/2008US20080038904 Method and Device for Handling an Article in the Course of Semiconductor Fabrication
02/14/2008US20080038903 Semiconductor wafer holding method, semiconductor wafer holding apparatus and semiconductor wafer holding structure
02/14/2008US20080038902 Semiconductor bonding and layer transfer method
02/14/2008US20080038901 Controlled Process and Resulting Device
02/14/2008US20080038900 Methods for surface activation by plasma immersion ion implantation process utilized in silicon-on-insulator structure
02/14/2008US20080038899 Method Of Manufacturing A Flash Memory Device
02/14/2008US20080038898 Structure and method for mixed-substrate simox technology
02/14/2008US20080038897 Method of manufacturing a semiconductor device
02/14/2008US20080038896 Methods for etching doped oxides in the manufacture of microfeature devices
02/14/2008US20080038895 Capacitor of semiconductor device and method of manufacturing the same
02/14/2008US20080038894 Electronic beam processing device and method using carbon nanotube emitter
02/14/2008US20080038893 Reverse metal process for creating a metal silicide transistor gate structure
02/14/2008US20080038892 Semiconductor device having an under stepped gate for preventing gate failure and method of manufacturing the same
02/14/2008US20080038891 HIGH VOLTAGE MOSFET HAVING Si/SiGe HETEROJUNCTION STRUCTURE AND METHOD OF MANUFACTURING THE SAME
02/14/2008US20080038890 Method for improved trench protection in vertical umosfet devices
02/14/2008US20080038889 Fin structure and method of manufacturing fin transistor adopting the fin structure
02/14/2008US20080038888 Integrated circuit arrangement with capacitor and fabrication method
02/14/2008US20080038887 Method for fabricating semiconductor mos device
02/14/2008US20080038886 Stress enhanced mos circuits and methods for their fabrication
02/14/2008US20080038884 Method of fabricating thin film transistor array substrate
02/14/2008US20080038883 Method for manufacturing semiconductor device utilizing recrystallized semiconductor film formed on an insulating film
02/14/2008US20080038882 Thin-film device and method of fabricating the same
02/14/2008US20080038881 Thin Film Transistor Array Panel and Manufacturing Method Thereof
02/14/2008US20080038880 Method of manufacturing a semiconductor device
02/14/2008US20080038879 Split-channel antifuse array architecture
02/14/2008US20080038878 Encapsulation circuitry on a substrate
02/14/2008US20080038877 Light-Weight Flash Hard Drive With Plastic Frame
02/14/2008US20080038876 Method and system for sealing a substrate
02/14/2008US20080038875 Physical quantity sensor, lead frame, and manufacturing method therefor
02/14/2008US20080038874 Chip package and method for fabricating the same
02/14/2008US20080038873 Apparatus and method for manufacturing semiconductor device
02/14/2008US20080038872 Method of manufacturing semiconductor device
02/14/2008US20080038871 Multipath soldered thermal interface between a chip and its heat sink
02/14/2008US20080038870 Thermal method to control underfill flow in semiconductor devices
02/14/2008US20080038869 High performance system-on-chip using post passivation process
02/14/2008US20080038868 Process for Packaging Components, and Packaged Components
02/14/2008US20080038866 Method for fabricating active matrix organic electro-luminescence display panel
02/14/2008US20080038865 Method of manufacturing image sensor
02/14/2008US20080038863 Profiling solid state samples
02/14/2008US20080038862 Microlens, an image sensor including a microlens, method of forming a microlens and method for manufacturing an image sensor
02/14/2008US20080038861 Support with integrated deposit of gas absorbing material for manufacturing microelectronic microoptoelectronic or micromechanical devices
02/14/2008US20080038860 Dielectric actuator or sensor structure and method of making it
02/14/2008US20080038859 Method for forming micromachined structure
02/14/2008US20080038857 Method of manufacturing nitride-based semiconductor light-emitting device
02/14/2008US20080038856 Semiconductor device and method of fabricating the same
02/14/2008US20080038855 Light-emitting device, light-emitting apparatus, image display apparatus, method of manufacturing light-emitting device, and method of manufacturing image display apparatus
02/14/2008US20080038854 Light emitting diode package and fabrication method thereof
02/14/2008US20080038853 LED of side view type and the method for manufacturing the same
02/14/2008US20080038852 Method for manufacturing layered periodic structures
02/14/2008US20080038851 Pattern for evaluating electric characteristics, method for evaluating electric characteristics, method for manufacturing semiconductor device and method for providing reliability assurance
02/14/2008US20080038850 Method for manufacturing semiconductor device
02/14/2008US20080038849 Evaluation method of fine pattern, manufacturing method of device having the fine pattern
02/14/2008US20080038848 Apparatus and method for fabricating semiconductor packages
02/14/2008US20080038847 Method of forming dummy pattern
02/14/2008US20080038846 Method of fabricating a capacitor of a memory device
02/14/2008US20080038678 ArF excimer laser beam (193 nm); lithography; photoresist; organic copolymer of pyrimidinetrione, imidazolidinedione, imidazolidinetrione or triazinetrione units and a diepoxide, and also a diacid to form a copolyester; solvent
02/14/2008US20080038675 Exposure Method, Exposure Apparatus, Exposure System and Device Manufacturing Method
02/14/2008US20080038580 Group III-V Crystal
02/14/2008US20080038578 Atomic layer deposition for turbine components
02/14/2008US20080038564 Method of Producing a Plate-Shaped Structure, in Particular, From Silicon, Use of Said Method and Plate-Shaped Structure Thus Produced, in Particular From Silicon
02/14/2008US20080038542 Method for high resolution patterning using soft X-ray, process for preparing nano device using the method
02/14/2008US20080038535 Composite material, having high thermal conductivity and low thermal expansion coefficient, and heat-dissipating substrate, and their production methods
02/14/2008US20080038532 Method of forming nanoparticle array using capillarity and nanoparticle array prepared thereby
02/14/2008US20080038527 Method for Forming Organic Silica Film, Organic Silica Film, Wiring Structure, Semiconductor Device, and Composition for Film Formation
02/14/2008US20080038518 Air gap formation
02/14/2008US20080038484 Coatings, and Methods and Devices for the Manufacture Thereof
02/14/2008US20080038481 Fabricating and cleaning chamber components having textured surfaces
02/14/2008US20080038463 Atomic layer deposition process
02/14/2008US20080038456 Method of covering clear aperture of optic during deposition of glue protection layer
02/14/2008US20080038400 Sealing apparatus for semiconductor wafer, mold of sealing apparatus, and semiconductor wafer
02/14/2008US20080038154 Method, Apparatus and Kit for Breath Diagnosis
02/14/2008US20080038098 Electronic Device Test Apparatus
02/14/2008US20080038097 Apparatus for clamping a stack of trays
02/14/2008US20080038095 Apparatus for vacuum treating two dimensionally extended substrates and method for manufacturing such substrates
02/14/2008US20080037860 Pattern inspection apparatus, image alignment method, displacement amount estimation method, and computer-readable recording medium with program recorded thereon
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