Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
04/2008
04/08/2008US7354168 Facet mirror having a number of mirror facets
04/08/2008US7353979 Method of fabricating substrate placing stage
04/08/2008US7353596 Component mounting method
04/08/2008US7353560 Proximity brush unit apparatus and method
04/08/2008CA2433565C Semiconductor device and fabrication method therof
04/05/2008CA2604754A1 Silver-containing nanoparticles with replacement stabilizer
04/03/2008WO2008039940A1 Methods and arrangement for creating recipes using best-known methods
04/03/2008WO2008039916A1 Organometallic precursor compounds
04/03/2008WO2008039845A2 Fluorine plasma treatment of high-k gate stack for defect passivation
04/03/2008WO2008039809A1 Dynamic component-tracking system and methods therefor
04/03/2008WO2008039717A2 Semiconductor dies and methods and apparatus to mold lock a semiconductor die
04/03/2008WO2008039687A2 Method for manufacturing a gate sidewall spacer using an energy beam treatment
04/03/2008WO2008039652A1 Non-doping implantation process utlizing a plasma ion implantation system
04/03/2008WO2008039606A1 Integrated substrate processing in a vacuum processing tool
04/03/2008WO2008039593A1 Method for integrated substrate processing in copper metallization
04/03/2008WO2008039496A2 Growth and applications of ultralong carbon nanotubes
04/03/2008WO2008039495A1 Tri-gate field-effect transistors formed by aspect ratio trapping
04/03/2008WO2008039459A1 Power mosfet with recessed field plate
04/03/2008WO2008039372A2 Assembling and applying nano-electro-mechanical systems
04/03/2008WO2008039340A1 Symmetric bipolar junction transistor design for deep sub-micron fabrication processes
04/03/2008WO2008039280A2 Real time process monitoring and control for semicontor layers
04/03/2008WO2008038970A1 Quantum dots having composition gradient shell structure and manufacturing method thereof
04/03/2008WO2008038947A1 Method for forming a fine pattern using isotropic etching
04/03/2008WO2008038940A1 Gate valve
04/03/2008WO2008038901A1 Plasma generator
04/03/2008WO2008038856A1 Method and apparatus for fabrication of thin film superconductor by spray pyrolysis chemical vapor deposition method
04/03/2008WO2008038823A1 Substrate treatment method and substrate treatment apparatus
04/03/2008WO2008038788A1 Method for forming silicon oxide film, plasma processing apparatus and storage medium
04/03/2008WO2008038787A1 Method for forming silicon oxide film, plasma processing apparatus and storage medium
04/03/2008WO2008038786A1 Silicon wafer heat treatment method
04/03/2008WO2008038752A1 Mobile unit system, pattern forming device, exposing device, exposing method, and device manufacturing method
04/03/2008WO2008038751A1 Line width measuring method, image forming status detecting method, adjusting method, exposure method and device manufacturing method
04/03/2008WO2008038602A1 Method of forming pattern
04/03/2008WO2008038590A1 Superstratum film forming composition and method of forming photoresist pattern
04/03/2008WO2008038588A1 Method for manufacturing organic material apparatus
04/03/2008WO2008038583A1 Cmp conditioner and process for producing the same
04/03/2008WO2008038565A1 Anisotropic conductive adhesive composition, anisotropic conductive film, circuit member connecting structure and method for manufacturing coated particles
04/03/2008WO2008038557A1 Adhesive sheet sticking device and sticking method
04/03/2008WO2008038553A1 Solar cell module
04/03/2008WO2008038550A1 Radiation-sensitive composition, method of forming silica-based coating film, silica-based coating film, apparatus and member having silica-based coating film and photosensitizing agent for insulating film
04/03/2008WO2008038546A1 Semiconductor inspecting apparatus and semiconductor integrated circuit
04/03/2008WO2008038544A1 Method for resist lower layer film formation, composition for resist lower layer film for use in the method, and method for pattern formation
04/03/2008WO2008038535A1 Silver particle composite powder and process for production thereof
04/03/2008WO2008038526A1 Method of forming pattern, and material for coating film formation
04/03/2008WO2008038482A1 Production method and production equipment of printed wiring board
04/03/2008WO2008038477A1 Planar heater and semiconductor heat treatment apparatus provided with the heater
04/03/2008WO2008038468A1 Electrical connecting device
04/03/2008WO2008038460A1 Photosensitive resin composition
04/03/2008WO2008038448A1 Negative-type resist composition for electron beam, and method for formation of resist pattern
04/03/2008WO2008038391A1 Semiconductor integrated apparatus and method for leveling power consumption of semiconductor integrated apparatus
04/03/2008WO2008038345A1 Method for manufacturing semiconductor device
04/03/2008WO2008038343A1 Semiconductor device having capacitor and its manufacturing method
04/03/2008WO2008038249A2 Process for preparing a semiconductor structure for mounting and mounted optoelectronic semiconductor structure
04/03/2008WO2008038237A2 Silicide formation on a wafer
04/03/2008WO2008038236A2 A multi-transistor based non-volatile memory cell with dual threshold voltage
04/03/2008WO2008038183A1 Flip-chip interconnection through chip vias
04/03/2008WO2008037953A1 Substrate holding apparatus
04/03/2008WO2008037791A1 Holding and turning device for touch-sensitive flat objects
04/03/2008WO2008037634A1 Design rules for on-chip inductors
04/03/2008WO2008037506A1 Uses of self-organized needle-type nanostructures
04/03/2008WO2008037131A1 Dual stage positioning and switching system
04/03/2008WO2008037065A1 Method and apparatus of forming domain inversion structures in a nonlinear ferroelectric substrate
04/03/2008WO2008021746A3 Methods for surface activation by plasma immersion ion implantation process utilized in silicon-on-insulator structure
04/03/2008WO2008021444A3 Semiconductor color image sensor
04/03/2008WO2008019329A3 Improved radiation immunity of integrated circuits using backside die contact and electrically conductive layers
04/03/2008WO2008015658A3 Method and apparatus for determining measurement values
04/03/2008WO2008013959A3 Methods and devices for forming nanostructure monolayers and devices including such monolayers
04/03/2008WO2008010959A9 Beam ablation lithography
04/03/2008WO2008009262A3 Module having a flat structure, and equipment method
04/03/2008WO2008005378A8 Gate dielectric materials for group iii-v enhancement mode transistors
04/03/2008WO2007145679A3 Planarization of gan by photoresist technique using an inductively coupled plasma
04/03/2008WO2007133604B1 Method for forming a semiconductor on insulator structure
04/03/2008WO2007130490A3 Plasma reactor with a dynamically adjustable plasma source power applicator
04/03/2008WO2007117519A3 Method for determining deformation parameters for a patterned device in a lithography system
04/03/2008WO2007112396A3 Semiconductor devices and electrical parts manufacturing using metal coated wires
04/03/2008WO2007106189A3 Method and system to position carbon nanotubes using ac dielectrophoresis
04/03/2008WO2007084782A8 Method for improved growth of semipolar (al,in,ga,b)n
04/03/2008WO2007076254A3 Piezoelectric and semiconducting coupled nanogenerators
04/03/2008WO2007056443A3 Reduced capacity carrier, transport, load port, buffer system
04/03/2008WO2006114753A3 Method of fabricating a bipolar transistor
04/03/2008US20080082954 Method and apparatus for designing fine pattern
04/03/2008US20080082953 Mask for forming fine pattern and method of forming the same
04/03/2008US20080081541 Rough polishing method of semiconductor wafer and polishing apparatus of semiconductor wafer
04/03/2008US20080081540 Substrate processing apparatus and substrate processing method
04/03/2008US20080081487 Method for fabricating semiconductor element
04/03/2008US20080081486 Field effect transistor having a stressed dielectric layer based on an enhanced device topography
04/03/2008US20080081485 Post-ion implant cleaning on silicon on insulator substrate preparation
04/03/2008US20080081484 Method for fabricating recess pattern in semiconductor device
04/03/2008US20080081483 Pulsed plasma etching method and apparatus
04/03/2008US20080081482 Selective-redeposition structures for calibrating a plasma process
04/03/2008US20080081481 Method for reducing resist poisoning during patterning of stressed nitrogen-containing layers in a semiconductor device
04/03/2008US20080081480 Method for reducing resist poisoning during patterning of silicon nitride layers in a semiconductor device
04/03/2008US20080081479 Method for fabricating fine pattern in semiconductor device
04/03/2008US20080081478 Method for planarization of wafer and method for formation of isolation structure in top metal layer
04/03/2008US20080081477 Method for forming a semiconductor device having a cylindrical hole in a dielectric film
04/03/2008US20080081476 Methods of Forming Integrated Circuit Devices Having Tensile and Compressive Stress Layers Therein and Devices Formed Thereby
04/03/2008US20080081475 Method for forming pattern in semiconductor device
04/03/2008US20080081474 Integration of a variable thickness copper seed layer in copper metallization
04/03/2008US20080081473 Method for integrated substrate processing in copper metallization
04/03/2008US20080081472 Manufacturing method of semiconductor device