| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 04/22/2008 | US7361609 Mask patterns for semiconductor device fabrication and related methods |
| 04/22/2008 | US7361608 Method and system for forming a feature in a high-k layer |
| 04/22/2008 | US7361607 Method for multi-layer resist plasma etch |
| 04/22/2008 | US7361606 Method of forming a metal line and method of manufacturing display substrate having the same |
| 04/22/2008 | US7361605 System and method for removal of photoresist and residues following contact etch with a stop layer present |
| 04/22/2008 | US7361604 Method for reducing dimensions between patterns on a hardmask |
| 04/22/2008 | US7361603 Passivative chemical mechanical polishing composition for copper film planarization |
| 04/22/2008 | US7361602 CMP process |
| 04/22/2008 | US7361601 Chemical mechanical polish process and method for improving accuracy of determining polish endpoint thereof |
| 04/22/2008 | US7361600 Semiconductor manufacturing apparatus having a built-in inspection apparatus and a device manufacturing method using said manufacturing apparatus |
| 04/22/2008 | US7361599 Integrated circuit and method |
| 04/22/2008 | US7361598 Method for fabricating semiconductor device capable of preventing scratch |
| 04/22/2008 | US7361597 Semiconductor device and method of fabricating the same |
| 04/22/2008 | US7361596 Semiconductor processing methods |
| 04/22/2008 | US7361595 Transition metal thin film forming method |
| 04/22/2008 | US7361594 Method of manufacturing a thin film transistor, thin film transistor, thin film transistor circuit, electronic device, and electronic apparatus |
| 04/22/2008 | US7361593 Methods of forming vias in multilayer substrates |
| 04/22/2008 | US7361592 Method for producing a component comprising at least one germanium-based element and component obtained by such a method |
| 04/22/2008 | US7361590 Semiconductor device and manufacturing method thereof |
| 04/22/2008 | US7361589 Copper interconnect systems which use conductive, metal-based cap layers |
| 04/22/2008 | US7361588 Etch process for CD reduction of arc material |
| 04/22/2008 | US7361587 Semiconductor contact and nitride spacer formation system and method |
| 04/22/2008 | US7361586 Preamorphization to minimize void formation |
| 04/22/2008 | US7361585 System for and method of planarizing the contact region of a via by use of a continuous inline vacuum deposition |
| 04/22/2008 | US7361584 Detection of residual liner materials after polishing in damascene process |
| 04/22/2008 | US7361583 RF semiconductor devices and methods for fabricating the same |
| 04/22/2008 | US7361582 Method of forming a damascene structure with integrated planar dielectric layers |
| 04/22/2008 | US7361581 High surface area aluminum bond pad for through-wafer connections to an electronic package |
| 04/22/2008 | US7361580 Semiconductor device and manufacturing method thereof |
| 04/22/2008 | US7361579 Method for selective chemical vapor deposition of nanotubes |
| 04/22/2008 | US7361578 Method to form large grain size polysilicon films by nuclei-induced solid phase crystallization |
| 04/22/2008 | US7361577 Method of manufacturing semiconductor device |
| 04/22/2008 | US7361576 Defect reduction of non-polar and semi-polar III-Nitrides with sidewall lateral epitaxial overgrowth (SLEO) |
| 04/22/2008 | US7361575 Semiconductor device and method for manufacturing the same |
| 04/22/2008 | US7361574 Single-crystal silicon-on-glass from film transfer |
| 04/22/2008 | US7361573 Method of peeling off and method of manufacturing semiconductor device |
| 04/22/2008 | US7361572 STI liner modification method |
| 04/22/2008 | US7361571 Method for fabricating a trench isolation with spacers |
| 04/22/2008 | US7361569 Methods for increasing photo-alignment margins |
| 04/22/2008 | US7361568 Embedded capacitors and methods for their fabrication and connection |
| 04/22/2008 | US7361567 Non-volatile nanocrystal memory and method therefor |
| 04/22/2008 | US7361566 Method of forming poly-silicon thin film transistors |
| 04/22/2008 | US7361565 Method of forming a metal gate in a semiconductor device |
| 04/22/2008 | US7361564 Method of manufacturing high-voltage device |
| 04/22/2008 | US7361563 Methods of fabricating a semiconductor device using a selective epitaxial growth technique |
| 04/22/2008 | US7361562 Method of manufacturing semiconductor device |
| 04/22/2008 | US7361561 Method of making a metal gate semiconductor device |
| 04/22/2008 | US7361560 Method of manufacturing a dielectric layer in a memory device that includes nitriding step |
| 04/22/2008 | US7361559 Manufacturing method for a MOS transistor comprising layered relaxed and strained SiGe layers as a channel region |
| 04/22/2008 | US7361558 Method of manufacturing a closed cell trench MOSFET |
| 04/22/2008 | US7361557 Insulated gate type semiconductor device and method for fabricating the same |
| 04/22/2008 | US7361556 Method of fabricating semiconductor side wall fin |
| 04/22/2008 | US7361555 Trench-gate transistors and their manufacture |
| 04/22/2008 | US7361554 Multi-bit non-volatile memory device, method of operating the same, and method of manufacturing the multi-bit non-volatile memory device |
| 04/22/2008 | US7361553 Semiconductor device manufacturing method |
| 04/22/2008 | US7361552 Semiconductor integrated circuit including a DRAM and an analog circuit |
| 04/22/2008 | US7361551 Method for making an integrated circuit having an embedded non-volatile memory |
| 04/22/2008 | US7361550 Methods of fabricating semiconductor memory devices including electrode contact structures having reduced contact resistance |
| 04/22/2008 | US7361549 Method for fabricating memory cells for a memory device |
| 04/22/2008 | US7361548 Methods of forming a capacitor using an atomic layer deposition process |
| 04/22/2008 | US7361547 Method for forming a capacitor for use in a semiconductor device |
| 04/22/2008 | US7361546 Method of forming conductive stud on vertical memory device |
| 04/22/2008 | US7361545 Field effect transistor with buried gate pattern |
| 04/22/2008 | US7361544 Method for fabricating capacitor in semiconductor device |
| 04/22/2008 | US7361543 Method of forming a nanocluster charge storage device |
| 04/22/2008 | US7361542 Method of fabricating CMOS image sensor |
| 04/22/2008 | US7361541 Programming optical device |
| 04/22/2008 | US7361540 Method of reducing noise disturbing a signal in an electronic device |
| 04/22/2008 | US7361539 Dual stress liner |
| 04/22/2008 | US7361538 Transistors and methods of manufacture thereof |
| 04/22/2008 | US7361537 Method of fabricating recess channel array transistor |
| 04/22/2008 | US7361536 Method of fabrication of a field effect transistor with materialistically different two etch stop layers in an enhanced mode transistor and an depletion mode transistor |
| 04/22/2008 | US7361535 Liquid crystal display device having polycrystalline TFT and fabricating method thereof |
| 04/22/2008 | US7361534 Method for fabricating SOI device |
| 04/22/2008 | US7361533 Stacked embedded leadframe |
| 04/22/2008 | US7361532 Method of manufacturing semiconductor device |
| 04/22/2008 | US7361531 Methods and apparatus for Flip-Chip-On-Lead semiconductor package |
| 04/22/2008 | US7361530 Method of fabricating a semiconductor integrated circuit that includes patterning a semiconductor substrate with a first photomask that uses metal for blocking light and patterning the same substrate with a second photomask that uses organic resin for blocking light |
| 04/22/2008 | US7361529 Transistor production using semiconductor printing fluid |
| 04/22/2008 | US7361528 Germanium infrared sensor for CMOS imagers |
| 04/22/2008 | US7361527 Image sensor with improved charge transfer efficiency and method for fabricating the same |
| 04/22/2008 | US7361526 Germanium photo detector having planar surface through germanium epitaxial overgrowth |
| 04/22/2008 | US7361525 Semiconductor integrated device having solid-state image sensor packaged within and production method for same |
| 04/22/2008 | US7361524 Method of manufacturing floating structure |
| 04/22/2008 | US7361523 Three-axis accelerometer |
| 04/22/2008 | US7361522 Growing lower defect semiconductor crystals on highly lattice-mismatched substrates |
| 04/22/2008 | US7361521 Method of manufacturing vertical GaN-based light emitting diode |
| 04/22/2008 | US7361520 Optical waveguide device and manufacturing method thereof |
| 04/22/2008 | US7361519 Method of manufacturing a semiconductor device |
| 04/22/2008 | US7361518 Semiconductor element, semiconductor device, and method for fabrication thereof |
| 04/22/2008 | US7361454 Exposing a resist film formed on semiconductor substrate to a light using photomask in which patterns are arranged two-dimensionally at a predetermined altitude; development; reducing an opening size; setting a reflow start temperature, heating; coating with water soluble resin; crosslinking; etching |
| 04/22/2008 | US7361453 using a first and a second pattern, the patterns being identical but displaced over a distance with respect to each other; second pattern is created on the upper mask layer or on the lower mask layer at locations where the upper mask layer has been removed |
| 04/22/2008 | US7361452 Methods for forming a metal line in a semiconductor manufacturing process |
| 04/22/2008 | US7361448 resist pattern thickening material contains a resin and a polyhydric alcohol; water-soluble or alkali-soluble; using the thickened resist pattern as a mask, a high-quality, high-performance semiconductor device having an extremely fine pattern can be produced |
| 04/22/2008 | US7361447 Photoresist polymer and photoresist composition containing the same |
| 04/22/2008 | US7361446 Positive resist composition |
| 04/22/2008 | US7361436 Light shield zones; chromium film and phase shifting mask on radiation transparent substrate; design masking pattern |
| 04/22/2008 | US7361435 Alternating phase shifting masking; generating destructive interference |
| 04/22/2008 | US7361433 Photomask for forming photoresist patterns repeating in two dimensions and method of fabricating the same |
| 04/22/2008 | US7361387 thin film deposition on semiconductors |