Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
04/2008
04/15/2008US7358139 Method of forming a field effect transistor including depositing and removing insulative material effective to expose transistor gate conductive material but not transistor gate semiconductor material
04/15/2008US7358138 Method of manufacturing flash memory device
04/15/2008US7358137 Memory devices including barrier layers and methods of manufacturing the same
04/15/2008US7358136 Method for manufacturing semiconductor device
04/15/2008US7358135 Method of forming resistor of flash memory device
04/15/2008US7358134 Split gate flash memory cell and manufacturing method thereof
04/15/2008US7358133 Semiconductor device and method for making the same
04/15/2008US7358132 Self-aligned bipolar semiconductor device and fabrication method thereof
04/15/2008US7358131 Methods of forming SRAM constructions
04/15/2008US7358130 Method for monitoring lateral encroachment of spacer process on a CD SEM
04/15/2008US7358129 Nonvolatile semiconductor memory device and a method of the same
04/15/2008US7358128 Method for manufacturing a transistor
04/15/2008US7358127 Power semiconductor rectifier having broad buffer structure and method of manufacturing thereof
04/15/2008US7358126 Dual damascene structure and methods of forming the same
04/15/2008US7358125 Method of forming thin film transistor substrate
04/15/2008US7358124 Thin film transistor array panel and manufacturing method thereof
04/15/2008US7358123 Thin film transistor array panel and manufacturing method thereof
04/15/2008US7358122 High performance FET devices and methods thereof
04/15/2008US7358121 Tri-gate devices and methods of fabrication
04/15/2008US7358120 Silicon-on-insulator (SOI) read only memory (ROM) array and method of making a SOI ROM
04/15/2008US7358119 Thin array plastic package without die attach pad and process for fabricating the same
04/15/2008US7358118 Mounting method of flexible printed circuit and manufacturing method of electric optical device
04/15/2008US7358117 Stacked die in die BGA package
04/15/2008US7358116 Substrate conductive post formation
04/15/2008US7358115 Method of fabricating a semiconductor assembly including chip scale package and second substrate with exposed substrate surfaces on upper and lower sides
04/15/2008US7358114 Semiconductor device substrate, semiconductor device, and manufacturing method thereof
04/15/2008US7358112 Method of growing a semiconductor layer
04/15/2008US7358111 Imageable bottom anti-reflective coating for high resolution lithography
04/15/2008US7358110 Image sensor having inner lens
04/15/2008US7358109 Surface emitting laser package having integrated optical element and alignment post
04/15/2008US7358108 CMOS image sensor and method for fabricating the same
04/15/2008US7358107 Method of fabricating a germanium photo detector on a high quality germanium epitaxial overgrowth layer
04/15/2008US7358106 Hermetic MEMS package and method of manufacture
04/15/2008US7358105 Solid-state imaging device, method for manufacturing the same and interline transfer CCD image sensor
04/15/2008US7358104 Contact portion of semiconductor device, and thin film transistor array panel for display device including the contact portion
04/15/2008US7358103 Method of fabricating an imaging device for collecting photons
04/15/2008US7358102 Method for fabricating microelectromechanical optical display devices
04/15/2008US7358101 Method for preparing an optical active layer with 1˜10 nm distributed silicon quantum dots
04/15/2008US7358100 Bottom conductor for integrated MRAM
04/15/2008US7358037 Binder diffusion transfer patterning of a thick film paste layer
04/15/2008US7358027 Copolymer for use in chemical amplification resists
04/15/2008US7357963 Apparatus and method of crystallizing amorphous silicon
04/15/2008US7357961 Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device
04/15/2008US7357879 Cupric chloride solution and triazole compound; capable of forming an etching-inhibiting coating; nonuniform irregularities formed on the side wall of the circuit pattern by the etching improves the adhesion between the circuit pattern and an insulating resin layer covering the circuit pattern
04/15/2008US7357877 Dispersion of nanowires of semiconductor material
04/15/2008US7357876 Eliminating printability of sub-resolution defects in imprint lithography
04/15/2008US7357846 Substrate processing apparatus and substrate processing method
04/15/2008US7357842 Cluster tool architecture for processing a substrate
04/15/2008US7357840 Solvent bath and drain
04/15/2008US7357839 SOI wafer and a method of producing the same
04/15/2008US7357838 Relaxed silicon germanium substrate with low defect density
04/15/2008US7357837 GaN single crystal substrate and method of making the same
04/15/2008US7357836 Crystalline membranes
04/15/2008US7357698 Polishing pad and chemical mechanical polishing apparatus using the same
04/15/2008US7357694 Jet singulation
04/15/2008US7357691 Method for depositing carbon nanotubes on a substrate of a field emission device using direct-contact transfer deposition
04/15/2008US7357258 Thin-plate supporting container
04/15/2008US7357257 Thin plate supporting container
04/15/2008US7357165 Method and apparatus for cutting protective tape
04/15/2008US7357144 Contamination control apparatus, management system and related methods
04/15/2008US7357138 Method for etching high dielectric constant materials and for cleaning deposition chambers for high dielectric constant materials
04/15/2008US7357115 Wafer clamping apparatus and method for operating the same
04/15/2008US7356922 Method of fabricating a rate gyroscope and accelerometer multisensor
04/15/2008US7356921 Method for forming a conductive layer pattern
04/10/2008WO2008043047A2 Apparatus and method for substrate clamping in a plasma chamber
04/10/2008WO2008043010A2 Gold-tin solder joints having reduced embrittlement
04/10/2008WO2008042932A2 Interdigitated leadfingers
04/10/2008WO2008042732A2 Recessed sti for wide transistors
04/10/2008WO2008042580A2 Offset correction techniques for positioning substrates
04/10/2008WO2008042566A2 Semiconductor device with circuits formed with essentially uniform pattern density
04/10/2008WO2008042528A2 Uv-assisted dielectric formation for devices with strained germanium-containing layers
04/10/2008WO2008042445A2 Systems and methods for production of semiconductor and photovoltaic grade silicon
04/10/2008WO2008042413A1 Apparatus and method forming a contact to silicide and a contact to a contact
04/10/2008WO2008042304A2 Interconnect structure using through wafer vias and method of fabrication
04/10/2008WO2008042295A1 Carrier for reducing entrance and/or exit marks left by a substrate-processing meniscus
04/10/2008WO2008042238A1 Reduction of entrance and exit marks left by a substrate-processing meniscus
04/10/2008WO2008042165A2 Transistor surround gate structure with partial silicon-on-insulator for memory cells, memory arrays, memory devices and systems and methods of forming same
04/10/2008WO2008042140A1 Stressed field effect transistor and methods for its fabrication
04/10/2008WO2008042091A1 High chamber temperature process and chamber design for photo-resist stripping and post-metal etch passivation
04/10/2008WO2008042032A1 Apparatus and method for delivering uniform fluid flow in a chemical deposition system
04/10/2008WO2008041778A1 Polishing apparatus, polishing method, and treating apparatus
04/10/2008WO2008041769A1 Liquid material vaporizer
04/10/2008WO2008041741A1 Substrate treating apparatus, substrate treating method, and rinsing method for drainage cup
04/10/2008WO2008041716A1 Semiconductor device and manufacturing method thereof
04/10/2008WO2008041702A1 Plasma doping method and apparatus
04/10/2008WO2008041670A1 Apparatus for manufacturing semiconductor, method for manufacturing semiconductor device, storage medium, and computer program
04/10/2008WO2008041646A1 Resin paste for die bonding, method for manufacturing semiconductor device, and semiconductor device
04/10/2008WO2008041625A1 Film coating apparatus
04/10/2008WO2008041613A1 Nonvolatile semiconductor storage device
04/10/2008WO2008041604A1 Laser processing method
04/10/2008WO2008041601A1 Plasma oxidizing method, plasma oxidizing apparatus, and storage medium
04/10/2008WO2008041600A1 Plasma oxidizing method, plasma processing apparatus, and storage medium
04/10/2008WO2008041599A1 Plasma oxidizing method, storage medium, and plasma processing apparatus
04/10/2008WO2008041581A1 Laser processing device
04/10/2008WO2008041579A1 Laser working method
04/10/2008WO2008041575A1 Stage device and exposure device
04/10/2008WO2008041539A1 Laser processing method
04/10/2008WO2008041536A1 Non-volatile semiconductor storage device and method for operating the same
04/10/2008WO2008041535A1 Cu-Mn ALLOY SPUTTERING TARGET AND SEMICONDUCTOR WIRING
04/10/2008WO2008041519A1 Nitride semiconductor manufacturing method