Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
12/2008
12/04/2008US20080296606 Electronic Module and Chip Card With Indicator Light
12/04/2008US20080296604 Light-emitting diode lead frame and manufacture method thereof
12/04/2008US20080296591 Conductor Structure, Pixel Structure, and Methods of Forming the Same
12/04/2008US20080296590 LED-Based Light Source Having Improved Thermal Dissipation
12/04/2008US20080296588 Semiconductor substrate with electromagnetic-wave-scribed nicks, semiconductor light-emitting device with such semiconductor substrate and manufacture thereof
12/04/2008US20080296585 GROWTH METHOD OF GaN CRYSTAL, AND GaN CRYSTAL SUBSTRATE
12/04/2008US20080296583 Display Device And Manufacturing Method of The Same
12/04/2008US20080296582 Tft-lcd array substrate
12/04/2008US20080296581 Pixel structure and method for forming the same
12/04/2008US20080296579 Nanosilicon semiconductor substrate manufacturing method and semiconductor circuit device using nanosilicon semiconductor substrate manufactured by the method
12/04/2008US20080296578 Wiring Material and a Semiconductor Device Having a Wiring Using the Material, and the Manufacturing Method Thereof
12/04/2008US20080296577 Camera module package
12/04/2008US20080296575 Thin film transistor, array substrate and method for manufacturing the same
12/04/2008US20080296574 Pixel Structure of LCD and Fabrication Method Thereof
12/04/2008US20080296571 Multi-project wafer and method of making same
12/04/2008US20080296569 Compound semiconductor material and method for forming an active layer of a thin film transistor device
12/04/2008US20080296568 Thin film transistors and methods of manufacturing the same
12/04/2008US20080296567 Method of making thin film transistors comprising zinc-oxide-based semiconductor materials
12/04/2008US20080296566 Making organic thin film transistor substrates for display devices
12/04/2008US20080296565 Method of fabricating polycrystalline silicon layer, tft fabricated using the same, method of fabricating tft, and organic light emitting diode display device having the same
12/04/2008US20080296561 Memory Device and Semiconductor Device
12/04/2008US20080296559 Method for Fabricating a Nanoelement Field Effect Transistor with Surrounded Gate Structure
12/04/2008US20080296557 Semiconductor Power Switch and Method for Producing a Semiconductor Power Switch
12/04/2008US20080296556 Method For Dopant Calibration of Delta Doped Multilayered Structure
12/04/2008US20080296555 Lamp with controllable spectrum
12/04/2008US20080296552 Phase change memory cell structures and methods for manufacturing the same
12/04/2008US20080296437 Method and Device to Generate a Transverse Casimir Force for Propulsion, Guidance and Maneuvering of a Space Vehicle
12/04/2008US20080296262 Process and Device for Cleaning and Etching a Substrate Wi
12/04/2008US20080296259 Apparatus and method for treating substrate using plasma
12/04/2008US20080296255 Magnetic Porous Particles and Method of Making
12/04/2008US20080296165 Plating apparatus
12/04/2008US20080295966 Electrode Assembly For The Removal Of Surface Oxides By Electron Attachment
12/04/2008US20080295965 Plasma processing apparatus
12/04/2008US20080295962 Method and system for mask handling in high productivity chamber
12/04/2008US20080295882 Photovoltaic device and method of manufacturing photovoltaic devices
12/04/2008US20080295871 Chemical Supply System
12/04/2008US20080295770 Liquid substance supply device for vaporizing system, vaporizer, vaporization performance appraisal method
12/04/2008US20080295421 System and method for installing a semiconductor manufacturing apparatus
12/04/2008US20080295412 Apparatus for storing substrates
12/04/2008US20080295326 Manufacture of a Layer Including a Component
12/04/2008DE19964494B4 Verfahren zur Herstellung ferroelektrischer Speichereinrichtungen Process for the preparation of ferroelectric memory devices
12/04/2008DE19857852B4 Halbleitervorrichtung und Verfahren zu deren Herstellung Semiconductor device and process for their preparation
12/04/2008DE19845790B4 Verfahren zur naßchemischen Abdünnung von Si-Schichten im aktiven Emittergebiet eines Bipolartransistors A method for wet chemical thinning of Si layers in the active emitter region of a bipolar transistor
12/04/2008DE19533754B4 Isolierschicht-Vorrichtung (IG-Vorrichtung) mit einem Aufbau mit einer Source mit engem Bandabstand, und Verfahren zu deren Herstellung Insulating means (IG) device having a structure having a source with a narrow band gap, and processes for their preparation
12/04/2008DE10357783B4 Nitrid-Lichtemissionsbauteil Nitride light emitting component
12/04/2008DE10353139B4 Stapelbares modulares Gehäusesystem und ein Verfahren zu dessen Herstellung A stackable modular housing system and a method for its preparation
12/04/2008DE10330490B4 Integrierte MIM-Kondensatorstruktur Integrated MIM capacitor structure
12/04/2008DE102008026294A1 Loading and unloading unit for plate support, has lifting device movable through receiving opening of plate support, plate transport device arranged on head of lifting device, which is provided for positioning plate
12/04/2008DE102008025381A1 Laserstrahlbearbeitungseinrichtung Laser beam machining device
12/04/2008DE102008025319A1 Panel level package (PLP) structure for complementary metal oxide semiconductor (CMOS) image sensor, has transparent cover e.g. glass cover that is adhered on die and dielectric layer to create gap in the transparent cover
12/04/2008DE102008024188A1 Lateraler Bipolartransistor und Herstellungsverfahren A lateral bipolar transistor and manufacturing method
12/04/2008DE102008003656A1 Herstellungsverfahren einer selbstjustierenden Fin-Feldeffekttransistor-(FinFET-) Vorrichtung Production process of a self-adjusting fin field effect transistor (FinFET) device
12/04/2008DE102008001535A1 Bipolartransistor und Verfahren zur Herstellung desselben Bipolar transistor and method of manufacturing the same
12/04/2008DE102007046429A1 Device for simultaneous supporting electronic elements, particularly for simultaneous support of semiconductor chip from wafer arrangement, has multiple element-support modules for support of electronic element in each case
12/04/2008DE102007032269A1 Verbindungsstruktur und integrierte Schaltung Connection structure and integrated circuit
12/04/2008DE102007025528A1 Measuring device i.e. temperature measuring device, for process automation technology, has sensor unit for producing measured parameter, and contact unit connected with sensor unit at contact region, which is formed as recess of sensor unit
12/04/2008DE102007025342A1 Höheres Transistorleistungsvermögen von N-Kanaltransistoren durch Verwenden einer zusätzlichen Schicht über einer Doppelverspannungsschicht in einem Halbleiterbauelement Higher transistor performance of N-channel transistors by using an additional layer over a double strain layer in a semiconductor device
12/04/2008DE102007025341A1 Mehrschrittabscheidesteuerung Mehrschrittabscheidesteuerung
12/04/2008DE102007025339A1 Verfahren und System zum Entfernen leerer Trägerbehälter von Prozessanlagen durch Steuern einer Zuordnung zwischen Steuerungsaufgaben und Trägerbehälter Method and system for removing empty container carrier of process plants by controlling a mapping between control tasks and support vessel
12/04/2008DE102007025336A1 Technik für die Verformungserzeugung in siliziumbasierten Transistoren durch Anwendung von Implantationstechniken zur Herstellung einer verformungsinduzierenden Schicht unter dem Kanalgebiet Technique for generating the deformation in silicon-based transistors by using implantation techniques for the production of a strain-inducing layer below the channel region
12/04/2008DE102007025326A1 Verfahren zum Ausbilden einer Halbleiterstruktur, das eine Implantation von Ionen in eine zu ätzende Materialschicht umfasst A method of forming a semiconductor structure that comprises implantation of ions into a material to be etched layer
12/04/2008DE102007024986A1 Temperaturstabile TCO-Schicht, Verfahren zur Herstellung und Anwendung Stable temperature TCO layer, methods for making and using
12/04/2008DE102007024954A1 Method for polishing semiconductor wafer, involves conditioning of porous polishing clothes, which is made of definite material and have definite porosity and pore distribution, by conditioner
12/04/2008DE102004047749B4 Halbleiterbauteil Diode und IGBT sowie dafür geeignetes Herstellungsverfahren Diode and IGBT semiconductor device and manufacturing method suitable therefor
12/04/2008DE102004011850B4 Schleuderbeschichtungsvorrichtung und -verfahren Spin coating apparatus and method
12/04/2008CA2688226A1 Gripper, in particular a bernoulli gripper
12/03/2008EP1998375A2 Semiconductor device having oxide semiconductor layer and manufacturing method
12/03/2008EP1998374A2 Semiconductor device having oxide semiconductor layer and manufacturing method thereof
12/03/2008EP1998373A2 Semiconductor device having oxide semiconductor layer and manufacturing method thereof
12/03/2008EP1998369A2 Semiconductor substrate and manufacturing method of semiconductor device
12/03/2008EP1998368A2 Method for manufacturing soi wafer
12/03/2008EP1998367A2 Method for manufacturing soi wafer
12/03/2008EP1998366A1 Substrate support, substrate processing device and method of placing a substrate
12/03/2008EP1998365A1 Electrostatic attraction apparatus for glass substrate and method for attracting and releasing such glass substrate
12/03/2008EP1998364A2 Semiconductor thin film forming system
12/03/2008EP1998363A2 Frequency Doubling Using Spacer Mask
12/03/2008EP1998362A2 Frequency Tripling Using Spacer Mask Having Interposed Regions
12/03/2008EP1998361A1 Adjusting method, substrate treating method, substrate treating device, exposure device, inspection device, measurement inspection system, treating device, computer system, program, and information recording medium
12/03/2008EP1998360A1 Lid unit for thin plate supporting container
12/03/2008EP1998359A2 Slit valve
12/03/2008EP1998358A2 Filament lamp and light-irradiation-type heat treatment device
12/03/2008EP1998220A1 Active matrix substrate, display device and television receiver
12/03/2008EP1997941A1 PROCESS FOR PRODUCING ZnO SINGLE CRYSTAL ACCORDING TO METHOD OF LIQUID PHASE GROWTH
12/03/2008EP1997587A2 Method of polishing compound semiconductor substrate, compound semiconductor substrate, method of manufacturing compound semiconductor epitaxial substrate, and compound semiconductor epitaxial substrate
12/03/2008EP1997156A1 Method for fabricating a semiconductor component with a specifically doped surface region using out-diffusion, and corresponding semiconductor component
12/03/2008EP1997148A1 Semiconductor field-effect transistor, memory cell and memory device
12/03/2008EP1997143A2 Electronic device and a process for forming the electronic device
12/03/2008EP1997138A2 Methods and materials useful for chip stacking, chip and wafer bonding
12/03/2008EP1997137A1 Method for producing an integrated circuit
12/03/2008EP1997136A2 Apparatus and method for carrying substrates
12/03/2008EP1997135A1 Method and device for electrostatically fixing substrates having a conductive layer
12/03/2008EP1997134A1 Apparatus and method for detecting defects in wafer using line sensor camera
12/03/2008EP1997133A1 Method for producing an active or passive electronic component, and electronic component
12/03/2008EP1997132A2 Method of forming a semiconductor device and structure thereof
12/03/2008EP1997131A2 Methods of performance improvement of hvmos devices
12/03/2008EP1997129A2 Low ph post-cmp residue removal composition and method of use
12/03/2008EP1997128A2 Packaging of mems devices
12/03/2008EP1997127A2 Plasma dielectric etch process including in-situ backside polymer removal for low-dielectric constant material
12/03/2008EP1997126A2 Thin silicon or germanium sheets and photovoltaics formed from thin sheets
12/03/2008EP1997125A2 Growth method using nanostructure compliant layers and hvpe for producing high quality compound semiconductor materials
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