Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
12/2008
12/10/2008CN101320203A Mold
12/10/2008CN101320181A Display device and method of manufacturing the same
12/10/2008CN101320167A Liquid crystal display device and liquid crystal display panel
12/10/2008CN101320160A Panel carrier
12/10/2008CN101320158A Transmission module
12/10/2008CN101320148A Display substrate, method of manufacturing the same and display device having the display substrate
12/10/2008CN101320147A Display substrate and method for manufacturing the same, display apparatus
12/10/2008CN101320103A Production method of image sensor microlens structure
12/10/2008CN101319400A Method for Fe doped growing GaFeN dilution magnetic semiconductor and uses thereof
12/10/2008CN101319311A Method and apparatus for silicon oxide deposition on large area substrates
12/10/2008CN101319301A Optical thin-film-forming methods and apparatus, and optical elements formed using same
12/10/2008CN101319172A Alkaline aqueous solution composition used for washing or etching substrates
12/10/2008CN101318359A 切削装置 Cutting device
12/10/2008CN101318309A CMP systems and methods utilizing amine-contained polymer
12/10/2008CN101318308A Chemical mechanical grinding apparatus
12/10/2008CN101318264A Design method for ultraviolet laser machining apparatus for cutting wafer
12/10/2008CN101318186A Refurbishment of a coated chamber component
12/10/2008CN100442954C Thin film pattern forming method, device and method of manufacture, electrooptical device
12/10/2008CN100442550C Semiconductor light-emitting element and method for manufacturing same, integrated semiconductor light-emitting device and method for manufacturing same, image display and method for manufacturing sam
12/10/2008CN100442549C Gan-based III - V group compound semiconductor light emitting device and method of fabricating the same
12/10/2008CN100442548C Low resistance electrode and compound semiconductor light emitting device including the same
12/10/2008CN100442542C Method of manufacturing variable capacitance diode and variable capacitance diode
12/10/2008CN100442539C A method of forming a metal pattern and a method of fabricating tft array panel by using the same
12/10/2008CN100442537C Termination structures for semiconductor devices and the manufacture thereof
12/10/2008CN100442535C Semiconductor device and method of manufacturing such a device
12/10/2008CN100442532C Semiconductor device and method for forming the same
12/10/2008CN100442531C CMOSImage sensor and manufacturing method therefor
12/10/2008CN100442529C Imager with tuned color filter
12/10/2008CN100442526C Light-receiving device, method for manufacturing the same, and optoelectronic integrated circuit comprising the same
12/10/2008CN100442525C Cell, standard cell, standard cell library, a placement method using standard cell, and a semiconductor integrated circuit
12/10/2008CN100442524C Structure and method for disposable programmable memory for built-in EEPROM
12/10/2008CN100442523C Non-volatile semiconductor memory
12/10/2008CN100442522C Integrated semiconductor circuit comprising a transistor and a strip conductor
12/10/2008CN100442520C Semiconductor device and manufacturing method of the same
12/10/2008CN100442519C Structure and manufacturing method of semiconductor memory device
12/10/2008CN100442517C Semiconductor devices having different gate dielectrics and methods for manufacturing the same
12/10/2008CN100442515C Electronic device
12/10/2008CN100442511C Semiconductor device and method of manufacturing the same
12/10/2008CN100442509C Thin film transistor array panel
12/10/2008CN100442506C Semiconductor integrated circuit device, signal processing device and FM multi-data processing apparatus
12/10/2008CN100442505C Semiconductor device with capacitor and fuse and its manufacture method
12/10/2008CN100442503C Semiconductor integrated circuit device
12/10/2008CN100442502C Semiconductor, electronic device and their producing method and electronic instrument
12/10/2008CN100442500C Fin-type antifuse
12/10/2008CN100442499C Semiconductor device
12/10/2008CN100442498C Deep via seed repair using electroless plating chemistry
12/10/2008CN100442490C Bipolar and CMOS integration with reduced contact height
12/10/2008CN100442489C Semiconductor device and mfg. method thereof
12/10/2008CN100442486C Microelectronic assembly having thermoelectric elements to cool a die and a method of making the same
12/10/2008CN100442484C Method and apparatus for forming a flip chip semiconductor package and method for producing a substrate for the flip chip semiconductor package
12/10/2008CN100442483C Optical semiconductor device, method for fabricating the same, lead frame and electronic equipment
12/10/2008CN100442481C Semiconductor device and its mfg. method
12/10/2008CN100442479C Method for repairing thin-film transistor array substrate and thin film removing method
12/10/2008CN100442478C Method for manufacturing a semiconductor device having polysilicon plugs
12/10/2008CN100442477C Vertical gate cmos with lithography-independent gate length
12/10/2008CN100442476C Nano-device with enhanced strain inductive transferring rate for CMOS technology and its process
12/10/2008CN100442475C Method and structure for manufacturing halftone mask for semiconductor wafer
12/10/2008CN100442474C Method of manufacturing semiconductor device
12/10/2008CN100442473C Method for manufacturing semiconductor device
12/10/2008CN100442472C Method of manufacturing semiconductor device
12/10/2008CN100442471C Semiconductor device and method for fabricating the same
12/10/2008CN100442470C Inline connection setting method and device and substrate processing devices and substrate processing system
12/10/2008CN100442469C Method to detect photoresist residue on a semiconductor device
12/10/2008CN100442468C Flip chip mounting method and flip chip mounting element
12/10/2008CN100442467C A processing technique for moisture-proof insulation of preamplifier
12/10/2008CN100442466C Manufacturing method of assembling structure of photoelectric semiconductor wafer
12/10/2008CN100442465C Producing process for chip packaging body without kernel dielectric layer
12/10/2008CN100442464C Semiconductor device fabrication method
12/10/2008CN100442463C Method for improving voltage distribution of component threshold value
12/10/2008CN100442462C CMOS integration for multi-thickness silicide devices
12/10/2008CN100442461C Manufacture of a trench-gate semiconductor device
12/10/2008CN100442460C Method for forming nickel silicide by plasma annealing
12/10/2008CN100442459C Manufacturing process of self-aligned silicide barrier layer
12/10/2008CN100442458C Production of triple high K grid medium materials
12/10/2008CN100442457C Flank wall making method
12/10/2008CN100442456C Plasma processing apparatus
12/10/2008CN100442455C Precursor composition, method for manufacturing precursor composition, method for manufacturing strong electrolyte membrane and its uses
12/10/2008CN100442454C Method for forming dielectric film
12/10/2008CN100442453C Method for the elimination of the effects of defects on wafers
12/10/2008CN100442452C Plasma etching method
12/10/2008CN100442451C Plasma processing system
12/10/2008CN100442450C Method for washing back etching in integrated circuit production
12/10/2008CN100442449C Removal of post-etch residues in semiconductor processing
12/10/2008CN100442448C Substrate processing apparatus, substrate processing method, and substrate holding apparatus
12/10/2008CN100442447C Method for forming aluminum-mirror layer by back-etching and chemical mechanical grinding
12/10/2008CN100442446C Semiconductor device
12/10/2008CN100442445C Method for producing grid and etching conductive layer
12/10/2008CN100442444C Method for providing a semiconductor substrate with a layer structure of activated dopants
12/10/2008CN100442443C Method for preparing high electron mobility hydrogenated nano-crystalline silicon thin films using crystal lattice strain
12/10/2008CN100442442C Process for producing silicon epitaxial wafer
12/10/2008CN100442441C Method and apparatus for forming epitaxial layers
12/10/2008CN100442440C Forming method for semiconductor thin film and forming device for semiconductor thin film
12/10/2008CN100442439C Method for making substrate in partucular for optics, electronic or optoelectronics and resulting substrate
12/10/2008CN100442438C Manufacturing method of amorphous carbon-film semiconductor
12/10/2008CN100442437C Substrate processing methodq
12/10/2008CN100442436C Method for forming pattern and method for manufacturing semiconductor device
12/10/2008CN100442435C Electron beam writing equipment and electron beam writing method
12/10/2008CN100442434C Semiconductor memory having segmented row repair
12/10/2008CN100442430C Plasma processor with electrode simultaneously responsive to plural frequencies
12/10/2008CN100442429C Multi-part electrode for a semiconductor processing plasma reactor and method of replacing a portion of a mutli-part electrode