Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
12/2008
12/23/2008US7468325 Method of cleaning silicon nitride layer
12/23/2008US7468324 Microelectromechanical devices and their fabrication
12/23/2008US7468323 Method of forming high aspect ratio structures
12/23/2008US7468322 Methods of multi-step electrochemical mechanical planarization of Cu
12/23/2008US7468321 Application of impressed-current cathodic protection to prevent metal corrosion and oxidation
12/23/2008US7468320 Reduced electromigration and stressed induced migration of copper wires by surface coating
12/23/2008US7468319 Method for preventing a metal corrosion in a semiconductor device
12/23/2008US7468318 Method for manufacturing mold type semiconductor device
12/23/2008US7468317 Method of forming metal line of semiconductor device
12/23/2008US7468316 Low fabrication cost, fine pitch and high reliability solder bump
12/23/2008US7468315 System and process for producing nanowire composites and electronic substrates therefrom
12/23/2008US7468314 Schottky diode structure to reduce capacitance and switching losses and method of making same
12/23/2008US7468313 Engineering strain in thick strained-SOI substrates
12/23/2008US7468312 Laser irradiation apparatus, laser irradiation method, and method of manufacturing a semiconductor device
12/23/2008US7468311 Deposition of silicon-containing films from hexachlorodisilane
12/23/2008US7468310 Method of machining substrate and method of manufacturing element
12/23/2008US7468309 Semiconductor wafer treatment method
12/23/2008US7468308 Exfoliating method, transferring method of thin film device, and thin film device, thin film integrated circuit device, and liquid crystal display device produced by the same
12/23/2008US7468307 Semiconductor structure and method
12/23/2008US7468306 Method of manufacturing a semiconductor device
12/23/2008US7468305 Forming pocket and LDD regions using separate masks
12/23/2008US7468304 Method of fabricating oxide semiconductor device
12/23/2008US7468303 Semiconductor device and manufacturing method thereof
12/23/2008US7468302 Method of forming trench type isolation film of semiconductor device
12/23/2008US7468301 PMOS transistor with increased effective channel length in the peripheral region and a multi-height substrate
12/23/2008US7468300 Semiconductor device having high voltage MOS transistor and fabrication method thereof
12/23/2008US7468299 Non-volatile memory cells and methods of manufacturing the same
12/23/2008US7468298 Method of manufacturing flash memory device
12/23/2008US7468297 Method of manufacturing semiconductor device
12/23/2008US7468296 Thin film germanium diode with low reverse breakdown
12/23/2008US7468295 Method of fabricating T-gate
12/23/2008US7468294 Semiconductor device and a method of manufacturing the same
12/23/2008US7468293 Method for the production of window elements which can be soldered into a housing in a hermetically tight manner and of a window element sealing a housing
12/23/2008US7468292 Method of making wafer level package structure by grinding the backside thereof and then forming metal layer on the ground side
12/23/2008US7468291 Method and apparatus for locating and/or forming bumps
12/23/2008US7468290 Depositing the organosilicate film onto substrate via chemical vapor deposition of chemical reagent comprising a structure-former precursor to provide the organosilicate film having a first material hardness and a first elastic modulus; exposing the organosilicate film to an ultraviolet radiation source
12/23/2008US7468289 Solid-state imaging device and method for manufacturing the same
12/23/2008US7468288 Die-level opto-electronic device and method of making same
12/23/2008US7468287 Method of fabricating a heterojunction of organic semiconducting polymers
12/23/2008US7468286 System and method for securing optoelectronic packages for mounting components at a mounting angle
12/23/2008US7468285 Method of manufacturing a light emitting device
12/23/2008US7468284 Method of bonding substrates
12/23/2008US7468283 Method and resulting structure for fabricating test key structures in DRAM structures
12/23/2008US7468239 Photomask for semi-transmission film is formed in one step process; large-scale
12/23/2008US7468108 Chemisorbing layer of metal precursor at least one monolayer thick on substrate, treating chemisorbed layer at a temperature of 100-190 degrees C. with an oxidant effective to remove the non-metal components to form a treated layer consisting essentially of metal; ozone used as oxidant
12/23/2008US7468105 CMP cleaning composition with microbial inhibitor
12/23/2008US7468104 Chemical vapor deposition apparatus and deposition method
12/23/2008US7468103 Method of manufacturing gallium nitride-based single crystal substrate
12/23/2008US7467919 Automatic door opener
12/23/2008US7467635 Apparatus and method for substrate processing
12/23/2008US7467598 System for, and method of, etching a surface on a wafer
12/18/2008WO2008154582A2 Semiconductor die coating and interconnection fixture and method
12/18/2008WO2008154526A2 Method to make low resistance contact
12/18/2008WO2008154471A2 Stable gold bump solder connections
12/18/2008WO2008154371A2 Two-sided substrate lead connection for minimizing kerf width on a semiconductor substrate panel
12/18/2008WO2008154359A1 Electrically alterable non- volatile memory array with embedded logic, and method for arranging
12/18/2008WO2008154320A1 Tri-layer resist damascene via and trench patterning in integrated circuits
12/18/2008WO2008154186A1 Enhanced sensitivity non-contact electrical monitoring of copper contamination on silicon surface
12/18/2008WO2008154159A1 Intertwined finger capacitors
12/18/2008WO2008153770A2 Inspection system using back side illuminated linear sensor
12/18/2008WO2008153682A1 Substrate gripper with integrated electrical contacts
12/18/2008WO2008153674A1 Method and apparatus for anisotropic etching
12/18/2008WO2008153672A1 Mechanically flexible and durable substrates and method of making
12/18/2008WO2008153593A1 Nanomaterial-based gas sensors
12/18/2008WO2008153362A2 Wire saw device and its machining method using thereof
12/18/2008WO2008153342A2 Probe substrate assembly
12/18/2008WO2008153268A1 Semiconductor package inspection system and inspection method using semiconductor package inspection system
12/18/2008WO2008153267A1 Regenerating process and regenerating system to regenerate waste slurry from semiconductor wafer manufacturing process
12/18/2008WO2008153245A2 Semiconductor package module using anodized oxide layer and manufacturing method thereof
12/18/2008WO2008153195A1 Power semiconductor device, power semiconductor device manufacturing method, and motor drive device
12/18/2008WO2008153155A1 Surface treatment agent for forming pattern and pattern forming method using the treatment agent
12/18/2008WO2008153154A1 Cyclic compound, photoresist base material and photoresist composition
12/18/2008WO2008153128A1 Semiconductor device
12/18/2008WO2008153121A1 Zno-based thin film and zno-based semiconductor element
12/18/2008WO2008153110A1 Resist composition for negative working-type development, and method for pattern formation using the resist composition
12/18/2008WO2008153109A1 Resist composition for negative development and method of forming pattern therewith
12/18/2008WO2008153107A1 Method of cleaning object and object cleaning system
12/18/2008WO2008153086A1 Substrate detecting apparatus, substrate aligning apparatus, substrate bonding apparatus having substrate detecting apparatus and substrate aligning apparatus, wafer outer shape detecting apparatus, wafer aligning apparatus, and wafer bonding apparatus having wafer outer shape detecting apparatus and wafer outer shape detec
12/18/2008WO2008153082A1 Resin composition, embedding material, insulating layer, and semiconductor device
12/18/2008WO2008153066A1 Polymer compound, positive resist composition, and method for forming resist pattern
12/18/2008WO2008153064A1 Plasma processing apparatus and plasma processing method
12/18/2008WO2008153054A1 Plasma processing apparatus and method for using plasma processing apparatus
12/18/2008WO2008153053A1 Plasma processing apparatus, power supply apparatus and method for using plasma processing apparatus
12/18/2008WO2008153052A1 Plasma processing apparatus and method for using plasma processing apparatus
12/18/2008WO2008153026A1 Metallized substrate and process for producing the same
12/18/2008WO2008153023A1 Measuring member, sensor, measuring method, exposure apparatus, exposure method, and device producing method
12/18/2008WO2008153013A1 Micro wave plasma processing device, micro wave plasma processing method, and micro wave transmitting plate
12/18/2008WO2008153005A1 Information recording/reproducing device
12/18/2008WO2008152998A1 Adhesive composition
12/18/2008WO2008152981A1 Process management system
12/18/2008WO2008152944A1 Method for producing group iii nitride semiconductor, method for manufacturing group iii nitride semiconductor light-emitting device, group iii nitride semiconductor light-emitting device, and lamp
12/18/2008WO2008152940A1 Substrate supporting mechanism
12/18/2008WO2008152926A1 Euv light source, euv exposure apparatus and semiconductor device manufacturing method
12/18/2008WO2008152915A1 Process for producing magnetic device, apparatus for producing magnetic device, and magnetic device
12/18/2008WO2008152908A1 Resistive element, neuron element, and neural network information processing apparatus
12/18/2008WO2008152907A1 Agent for stripping resist film on electroconductive polymer, method for stripping resist film, and substrate with patterned electroconductive polymer
12/18/2008WO2008152895A1 Positional shift detecting apparatus and processing system using the same
12/18/2008WO2008152873A1 Laser processing device
12/18/2008WO2008152843A1 Epoxy resin composition
12/18/2008WO2008152801A1 Inspection device, inspection method, and program