Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
12/2008
12/17/2008EP2002480A2 Strained silicon with elastic edge relaxation
12/17/2008EP2002478A1 Electrically enhanced wirebond package
12/17/2008EP2002475A1 Method for producing an integrated circuit
12/17/2008EP2002474A2 Method of detaching a thin film by melting precipitates
12/17/2008EP2002473A1 Hole inspection apparatus and hole inspection method using the same
12/17/2008EP2002471A1 Interconnection of electronic devices with raised leads
12/17/2008EP2002470A2 Grown nanofin transistors
12/17/2008EP2002469A1 Nanofin tunneling transistors
12/17/2008EP2002467A2 Organic barc etch process capable of use in the formation of low k dual damascene integrated circuits
12/17/2008EP2002466A2 Gaas integrated circuit device and method of attaching same
12/17/2008EP2002465A1 Trim process for critical dimension control for integrated circuits
12/17/2008EP2002464A2 Method for forming thin film photovoltaic interconnects using self aligned process
12/17/2008EP2002463A2 Method and structure for fabricating bonded substrate structures using thermal processing to remove oxygen species
12/17/2008EP2002307A1 Method for in-situ aberration measurement of optical imaging system in lithographic tools
12/17/2008EP2001988A2 Improved alkaline solutions for post cmp cleaning processes
12/17/2008EP2001968A2 Oxidation-stabilized cmp compositions and methods
12/17/2008EP2001814A2 Methods for etching a bottom anti-reflective coating layer in dual damascene application
12/17/2008EP1917340B1 Method for removing ionic contaminants from the surface of a workpiece
12/17/2008EP1794099A4 Method of forming an in-situ recessed structure
12/17/2008EP1756860A4 Method of semiconductor fabrication in corporating disposable spacer into elevated source/drain processing
12/17/2008EP1756327B1 Methods of making gold nitride
12/17/2008EP1676302B1 Notch-free etching of high aspect soi structures using a time division multiplex process and rf bias modulation
12/17/2008EP1495312A4 Sample surface inspection apparatus and method
12/17/2008EP1454360A4 Trench mosfet device with improved on-resistance
12/17/2008EP1332349A4 Automated processing system
12/17/2008EP1328965B1 Treatment device for wafers
12/17/2008EP1316995B1 Semiconductor device and method for manufacturing the same
12/17/2008EP1238406B1 Gas cluster ion beam smoother apparatus
12/17/2008EP1155442B1 Method for fabricating a multilayer structure with controlled internal stresses
12/17/2008EP1127375B1 Bumped contacts for metal-to-semiconductor connections, and methods for fabricating same
12/17/2008CN201167088Y Supports for filming silicon chip
12/17/2008CN201166564Y Non-contact test system for solar wafer
12/17/2008CN101326646A 单片集成的半导体材料和器件 Monolithically integrated semiconductor materials and devices
12/17/2008CN101326643A MOS transistor and a method of manufacturing an MOS transistor
12/17/2008CN101326642A Gallium nitride material transistors and methods for wideband applications
12/17/2008CN101326640A CMOS device with zero soft error rate
12/17/2008CN101326639A Resistance in an integrated circuit
12/17/2008CN101326635A Semiconductor device and manufacture method thereof
12/17/2008CN101326634A Reflective sensor
12/17/2008CN101326633A Semiconductor device and manufacture method thereof
12/17/2008CN101326632A Semiconductor device and manufacture method thereof
12/17/2008CN101326631A Complementary metal oxide semiconductor
12/17/2008CN101326630A A method of forming a layer over a surface of a first material embedded in a second material in a structure for a semiconductor device
12/17/2008CN101326629A Process chamber for dielectric gapfill
12/17/2008CN101326627A Electrode sheet for electrostatic chuck, and electrostatic chuck
12/17/2008CN101326626A Stage device
12/17/2008CN101326625A Stage unit
12/17/2008CN101326624A A sealed enclosure for transporting and storing semiconductor substrates
12/17/2008CN101326623A Case and method for accepting semiconductor chip
12/17/2008CN101326622A Surface roughness tester
12/17/2008CN101326621A Field effect transistor structure with an insulating layer at the junction
12/17/2008CN101326620A Method of substrate treatment, computer-readable recording medium, substrate treating apparatus and substrate treating system
12/17/2008CN101326619A Method for dry chemical treatment of substrates and use thereof
12/17/2008CN101326618A Double side grinding machine for semiconductor wafer, static pressure pad, and double side grinding method using such static pressure pad
12/17/2008CN101326617A Pattern formation method and pattern formation apparatus, exposure method and exposure apparatus, and device manufacturing method
12/17/2008CN101326457A Aligning apparatus, bonding apparatus and aligning method
12/17/2008CN101326436A Appearance inspecting device
12/17/2008CN101326384A Mass body for controlling vibration
12/17/2008CN101326257A Adjuvant for controlling polishing selectivity and chemical mechanical polishing slurry comprising the same
12/17/2008CN101326256A Adjuvant capable of controlling a polishing selectivity and chemical mechanical polishing slurry comprising the same
12/17/2008CN101325846A 多层配线基板及其制造方法 A multilayer wiring board and its manufacturing method
12/17/2008CN101325845A Multilayer printed circuit board and method of fabricating the same
12/17/2008CN101325837A Plasma processing apparatus and radio frequency matching network thereof
12/17/2008CN101325369A Booster circuit, semiconductor device, and display device
12/17/2008CN101325247A Buffer layers for organic electroluminescent devices and methods of manufacture and use
12/17/2008CN101325246A Method for manufacturing organic LED low temperature polysilicon and laser annealing crystallizing system
12/17/2008CN101325231A Method for manufacturing conductor frame of LED
12/17/2008CN101325230A Method for manufacturing photoelectricity semiconductor element of semiconductor containing P-type three-tribe nitrogen compound
12/17/2008CN101325228A LED structure and combination method thereof
12/17/2008CN101325223A Nanometer silicon variable capacitance diode and method of processing the same
12/17/2008CN101325221A Thin-film transistor substrate, electronic device and preparation method thereof
12/17/2008CN101325220A Thin film transistor, method of fabricating the thin film transistor, and display device including the thin film transistor
12/17/2008CN101325219A Thin-film transistor substrate and manufacturing method thereof
12/17/2008CN101325218A Field effect transistor, logic circuit including the same and methods of manufacturing the same
12/17/2008CN101325214A Grid and method for manufacturing grid material
12/17/2008CN101325213A Memory devices and methods of manufacturing the same as well as memory array and method of manufacturing the same
12/17/2008CN101325211A Magnetic sensor and manufacturing method therefor
12/17/2008CN101325210A Magnetic sensor and production method thereof
12/17/2008CN101325209A Semiconductor device and method for manufacturing the same
12/17/2008CN101325208A Solid-state image capturing device, manufacturing method for solid-state image capturing device, and electronic information device
12/17/2008CN101325206A Image sensor and method for manufacturing thereof
12/17/2008CN101325204A Sensing chip structure with overlapping pattern layer, sensing chip encapsulation and preparation method
12/17/2008CN101325203A Semiconductor structure and forming method thereof
12/17/2008CN101325202A Thin film transistor array panel and manufacturing method thereof
12/17/2008CN101325201A Array substrate structure of transparent film transistor and manufacturing method thereof
12/17/2008CN101325200A Memory unit and method for manufacturing the same
12/17/2008CN101325192A Substrate easy to measure temperature and manufacturing method thereof
12/17/2008CN101325191A Square flat non-pin encapsulation structure with pattern on chip
12/17/2008CN101325190A Square flat non-pin encapsulation structure with pattern on the conductor frame
12/17/2008CN101325189A 半导体器件 Semiconductor devices
12/17/2008CN101325188A Wafer level semiconductor package with dual side build-up layers and method thereof
12/17/2008CN101325187A Multi-layer substrate surface treating layer structure and manufacturing method thereof
12/17/2008CN101325186A Insulating sheet and method for producing it, and power module comprising the insulating sheet
12/17/2008CN101325185A Heat pipe radiator and method of processing the same
12/17/2008CN101325184A Semiconductor device and manufacturing method thereof
12/17/2008CN101325183A Ultra-thin cavity type power module and encapsulation method thereof
12/17/2008CN101325181A Thin-film transistor array substrate and preparation method thereof
12/17/2008CN101325180A Systems and methods for self convergence during erase of a non-volatile memory
12/17/2008CN101325179A Method of fabricating semiconductor memory device having self-aligned electrode
12/17/2008CN101325178A Cutting device