Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
03/2009
03/12/2009WO2009031462A1 Method for processing substrate, program, computer storage medium, and substrate processing system
03/12/2009WO2009031450A1 Substrate heat-treating apparatus, and substrate heat-treating method
03/12/2009WO2009031434A1 Single crystal thin film of organic semiconductor compound and method for producing the same
03/12/2009WO2009031432A1 Dicing device and dicing method
03/12/2009WO2009031423A1 Method for producing metal oxide semiconductor thin film and thin film transistor using the same
03/12/2009WO2009031419A1 Vacuum processing system
03/12/2009WO2009031416A1 Clean conveyance system
03/12/2009WO2009031413A1 Top panel and plasma processing apparatus using the same
03/12/2009WO2009031405A1 Power source stabilizing circuit, electronic device, and testing device
03/12/2009WO2009031392A1 Bonding wafer manufacturing method
03/12/2009WO2009031389A1 Aqueous dispersion for chemical mechanical polishing and method for preparing the same, kit for preparing aqueous dispersion for chemical mechanical polishing, and chemical mechanical polishing method for semiconductor device
03/12/2009WO2009031387A1 FERROMAGNETIC TUNNEL JUNCTION ELEMENT HAVING (Fe, Co, Ni)SiB FREE LAYER
03/12/2009WO2009031381A1 Metal oxide semiconductor manufacturing method and thin film transistor obtained by the method
03/12/2009WO2009031377A1 Multiple-channel self-alignment transistor fabricated by double self-alignment process and its manufacturing method
03/12/2009WO2009031349A1 Semiconductor device using carbon nanotube film and process for producing the semiconductor device
03/12/2009WO2009031342A1 Active matrix substrate, display device and method for manufacturing active matrix substrate
03/12/2009WO2009031336A1 Semiconductor element
03/12/2009WO2009031276A1 Iii nitride structure and method for manufacturing iii nitride semiconductor fine columnar crystal
03/12/2009WO2009031270A1 Wafer reclamation method and wafer reclamation apparatus
03/12/2009WO2009031259A1 Method for producing thin film transistor substrate, production program and recording medium with the program recorded thereon
03/12/2009WO2009031232A1 Sputtering method and system
03/12/2009WO2009031085A1 A transistor and a method of manufacturing the same
03/12/2009WO2009030662A2 Process for obtaining a hybrid substrate comprising at least one layer of a nitrided material
03/12/2009WO2009030562A1 Method for the production and contacting of electronic components by means of a substrate plate, particularly a dcb ceramic substrate plate
03/12/2009WO2009030494A2 Mounting device for disk-shaped substrates such as solar wafers
03/12/2009WO2009030284A1 Positioning device to position one or more electronic circuit boards, in particular for photovoltaic cells, in a metal-deposition unit
03/12/2009WO2009030230A1 A method of determining an electrical property of a test sample
03/12/2009WO2009030165A1 Ldmos and semiconductor device integrated with ldmos and cmos
03/12/2009WO2009018395A3 Self-aligned t-gate carbon nanotube field effect transistor devices and method for forming the same
03/12/2009WO2009018203A3 Integrated circuit formation using different angled implants
03/12/2009WO2009013425A3 Substrate for the epitaxial growth of gallium nitride
03/12/2009WO2009012295A3 Fin-type field effect transistor structure with merged source/drain silicide and method of forming the structure
03/12/2009WO2009012053A3 Isolated tri-gate transistor fabricated on bulk substrate
03/12/2009WO2009011532A3 Apparatus, method for depositing thin film on wafer and method for gap-filling trench using the same
03/12/2009WO2009009639A3 Electronic assemblies without solder and methods for their manufacture
03/12/2009WO2009009526A3 A processing system platen having a variable thermal conductivity profile
03/12/2009WO2009008659A3 Plasma etching apparatus and method of etching wafer
03/12/2009WO2009006445A3 Systems and methods for electronic detection with nanofets
03/12/2009WO2009006263A3 Forming complimentary metal features using conformal insulator layer
03/12/2009WO2009006175A3 Test structure, test structure formation and mask reuse in semiconductor processing
03/12/2009WO2008154371A3 Two-sided substrate lead connection for minimizing kerf width on a semiconductor substrate panel
03/12/2009WO2008148377A3 Method for the selective thermal treatment of the surface of a planar substrate
03/12/2009WO2008140180A3 In-line virtual-masking method for maskless lithography
03/12/2009WO2008114167A3 Extended drain transistor with resecced gate and method of producing the same
03/12/2009US20090068935 Polishing apparatus
03/12/2009US20090068915 Highly efficient organic light-emmitting device using substrate or electrode having nanosized half-spherical convex and method for preparing the same
03/12/2009US20090068854 Silicon nitride gap-filling layer and method of fabricating the same
03/12/2009US20090068853 Impurity control in hdp-cvd dep/etch/dep processes
03/12/2009US20090068852 Method of forming a carbon polymer film using plasma cvd
03/12/2009US20090068851 Susceptor, manufacturing apparatus for semiconductor device and manufacturing method for semiconductor device
03/12/2009US20090068850 Method of Fabricating Flash Memory Device
03/12/2009US20090068849 Multi-region processing system and heads
03/12/2009US20090068848 Systems and methods for manipulating liquid films on semiconductor substrates
03/12/2009US20090068847 Methods for removing contaminants from aluminum-comprising bond pads and integrated circuits therefrom
03/12/2009US20090068846 Compositions and method for treating a copper surface
03/12/2009US20090068845 Low contamination components for semiconductor processing apparatus and methods for making components
03/12/2009US20090068844 Etching Process
03/12/2009US20090068843 Method of forming mark in ic-fabricating process
03/12/2009US20090068842 Method for forming micropatterns in semiconductor device
03/12/2009US20090068841 Chemical mechanical polishing method of organic film and method of manufacturing semiconductor device
03/12/2009US20090068840 Polishing liquid and method for manufacturing semiconductor device
03/12/2009US20090068839 Slurry, chemical mechanical polishing method using the slurry, and method of forming metal wiring using the slurry
03/12/2009US20090068838 Method for forming micropatterns in semiconductor device
03/12/2009US20090068837 Line ends forming
03/12/2009US20090068836 Method of forming contact plug of semiconductor device
03/12/2009US20090068835 Method of fabricating ultra-deep vias and three-dimensional integrated circuits using ultra-deep vias
03/12/2009US20090068834 Method of forming a contact plug of a semiconductor device
03/12/2009US20090068833 Method of forming contact hole of semiconductor device
03/12/2009US20090068832 Thin films
03/12/2009US20090068831 3d ic method and device
03/12/2009US20090068830 Microelectronic package interconnect and method of fabrication thereof
03/12/2009US20090068829 Method of manufacturing semiconductor device
03/12/2009US20090068828 Dual work function cmos devices utilizing carbide based electrodes
03/12/2009US20090068827 Method for fabricating semiconductor device
03/12/2009US20090068826 Method of fabricating semiconductor device
03/12/2009US20090068825 Implementation of temperature-dependent phase switch layer for improved temperature uniformity during annealing
03/12/2009US20090068824 Fabricating method of semiconductor device
03/12/2009US20090068823 Plasma Ion Doping Method and Apparatus
03/12/2009US20090068822 Method for preparing substrate for growing gallium nitride and method for preparing gallium nitride substrate
03/12/2009US20090068821 Charge-free low-temperature method of forming thin film-based nanoscale materials and structures on a substrate
03/12/2009US20090068820 Microspheres including nanoparticles
03/12/2009US20090068819 Tape structures, and methods and apparatuses for separating a wafer using the same
03/12/2009US20090068818 Method of forming an isolation layer of a semiconductor device
03/12/2009US20090068817 Method for forming isolation layer in semiconductor device
03/12/2009US20090068816 Method for forming isolation layer in semiconductor device
03/12/2009US20090068815 Semiconductor device and manufacturing method thereof
03/12/2009US20090068814 Semiconductor Devices Including Capacitor Support Pads and Related Methods
03/12/2009US20090068813 Method for fabricating a semiconductor device
03/12/2009US20090068812 Method of Forming Memory Devices by Performing Halogen Ion Implantation and Diffusion Processes
03/12/2009US20090068811 Semiconductor device and method of manufacturing the same
03/12/2009US20090068810 Method of fabrication of metal oxide semiconductor field effect transistor
03/12/2009US20090068809 Semiconductor memory device having local etch stopper and method of manufacturing the same
03/12/2009US20090068808 Method of manufacturing a nonvolatile semiconductor memory device having a gate stack
03/12/2009US20090068807 Dual gate oxide device integration
03/12/2009US20090068806 Field effect transistor
03/12/2009US20090068805 Method of forming metal-oxide-semiconductor transistors
03/12/2009US20090068804 Drain extended pmos transistors and methods for making the same
03/12/2009US20090068803 Method for making an integrated circuit including vertical junction field effect transistors
03/12/2009US20090068802 Beam homogenizer and laser irradiation apparatus
03/12/2009US20090068801 Method of manufacturing array substrate of liquid crystal display device
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