Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
03/2009
03/18/2009CN100470368C Lithographic projection apparatus with lollector including concave mirror and convex mirror
03/18/2009CN100470367C Lithographic apparatus and device manufacturing method
03/18/2009CN100470340C Film crystal tube printing manufacturing method
03/18/2009CN100470339C Thin film transistor array panel for liquid crystal display
03/18/2009CN100470298C Continuous direct-write optical lithography technology
03/18/2009CN100470251C TFT tester and test method
03/18/2009CN100469948C Method and associated apparatus for tilting a substrate upon entry for metal deposition
03/18/2009CN100469942C Electroplating solution containing organic acid complexing agent
03/18/2009CN100469550C Resin sealing method for electronic part and mold used for the method
03/18/2009CN100469531C Polishing method for zinc oxide single crystal substrate level substrate
03/18/2009CN100469528C Vacuum-assisted pad conditioning system and method utilizing an apertured conditioning disk
03/18/2009CA2639645A1 Method for bonding a wire conductor laid on a substrate
03/17/2009US7506301 Method for correcting a mask pattern, system for correcting a mask pattern, program, method for manufacturing a photomask and method for manufacturing a semiconductor device
03/17/2009US7506232 Decompressor/PRPG for applying pseudo-random and deterministic test patterns
03/17/2009US7506227 Integrated circuit with embedded identification code
03/17/2009US7505832 Method and apparatus for determining a substrate exchange position in a processing system
03/17/2009US7505661 Optical waveguide, package board having the same, and manufacturing method thereof
03/17/2009US7505335 Nonvolatile semiconductor memory device
03/17/2009US7505329 Data line disturbance free memory block divided flash memory and microcomputer having flash memory therein
03/17/2009US7505324 Semiconductor memory device with a stacked gate including a floating gate and a control gate
03/17/2009US7505321 Programmable memory array structure incorporating series-connected transistor strings and methods for fabrication and operation of same
03/17/2009US7505305 Thin film magnetic memory device having a highly integrated memory array
03/17/2009US7505299 Semiconductor memory device
03/17/2009US7505234 Magnetoresistance effect element, magnetic head, magnetic reproducing apparatus, and magnetic memory
03/17/2009US7505204 Crystallization apparatus, crystallization method, and phase shifter
03/17/2009US7505155 Apparatus and method for inspecting poly-silicon
03/17/2009US7505153 Model and parameter selection for optical metrology
03/17/2009US7505144 Copper CMP flatness monitor using grazing incidence interferometry
03/17/2009US7505118 Wafer carrier
03/17/2009US7505116 Lithographic apparatus and device manufacturing method
03/17/2009US7504842 Probe holder for testing of a test device
03/17/2009US7504757 Multi-finger z-actuator
03/17/2009US7504732 Three dimensional structure memory
03/17/2009US7504728 Integrated circuit having bond pad with improved thermal and mechanical properties
03/17/2009US7504727 Semiconductor interconnect structure utilizing a porous dielectric material as an etch stop layer between adjacent non-porous dielectric materials
03/17/2009US7504725 Semiconductor memory device having low-resistance tungsten line and method of manufacturing the semiconductor memory device
03/17/2009US7504722 Semiconductor device with slanting side surface for external connection
03/17/2009US7504719 Printed wiring board having a roughened surface formed on a metal layer, and method for producing the same
03/17/2009US7504717 Semiconductor device
03/17/2009US7504715 Packaging of a microchip device
03/17/2009US7504711 Semiconductor substrate with strip conductors formed of carbon nanotubes and production thereof
03/17/2009US7504704 Shallow trench isolation process
03/17/2009US7504700 Method of forming an ultra-thin [[HfSiO]] metal silicate film for high performance CMOS applications and semiconductor structure formed in said method
03/17/2009US7504699 Fabrication of a semiconductor device with air gaps for ultra-low capacitance interconnections
03/17/2009US7504693 Dislocation free stressed channels in bulk silicon and SOI CMOS devices by gate stress engineering
03/17/2009US7504687 Atomic layer deposition of metal oxide and/or low asymmetrical tunnel barrier interpoly insulators
03/17/2009US7504686 Self-aligned non-volatile memory cell
03/17/2009US7504678 Tri-gate devices and methods of fabrication
03/17/2009US7504677 Multi-gate enhancement mode RF switch and bias arrangement
03/17/2009US7504674 The H2 plasma treatment removes unwanted oxide from the surface region of the core conducting layer such that the interface between the core conducting layer and the capping adhesion/barrier is substantially free of oxides
03/17/2009US7504663 Semiconductor device with a floating gate electrode that includes a plurality of particles
03/17/2009US7504660 Semiconductor device, method of fabricating same, and, electrooptical device
03/17/2009US7504656 Organic light emitting display device and method of fabricating the same
03/17/2009US7504645 Method of forming pattern writing data by using charged particle beam
03/17/2009US7504627 Electron beam inspection apparatus
03/17/2009US7504460 and a cross-linking agent comprising at least one of 1,3-bis(3-aminophenoxy)benzene, 1,3-bis(4-aminophenoxy)benzene, or 1,4-bis(4-aminophenoxy)benzene; upon curing produce a three dimensional cross-linked matrix having a low coefficient of thermal expansion
03/17/2009US7504345 Method for eliminating defects from semiconductor materials
03/17/2009US7504344 Method of forming a carbon polymer film using plasma CVD
03/17/2009US7504343 Semiconductor device and method for manufacturing the same
03/17/2009US7504342 Photolithography method for fabricating thin film
03/17/2009US7504341 Method of manufacturing a semiconductor apparatus using a substrate processing agent
03/17/2009US7504340 System and method for providing contact etch selectivity using RIE lag dependence on contact aspect ratio
03/17/2009US7504339 Method to form shallow trench isolation with rounded upper corner for advanced semiconductor circuits
03/17/2009US7504338 Method of pattern etching a silicon-containing hard mask
03/17/2009US7504337 IC chip uniform delayering methods
03/17/2009US7504336 Methods for forming CMOS devices with intrinsically stressed metal silicide layers
03/17/2009US7504335 Grafted seed layer for electrochemical plating
03/17/2009US7504334 Semiconductor device and method for manufacturing same
03/17/2009US7504333 Method of forming bit line of semiconductor device
03/17/2009US7504332 Water-barrier performance of an encapsulating film
03/17/2009US7504331 Method of fabricating self-assembled electrical interconnections
03/17/2009US7504330 Method of forming an insulative film
03/17/2009US7504329 Method of forming a Yb-doped Ni full silicidation low work function gate electrode for n-MOSFET
03/17/2009US7504328 Schottky barrier source/drain n-mosfet using ytterbium silicide
03/17/2009US7504327 Method of manufacturing thin film semiconductor device
03/17/2009US7504326 Use of scanning theme implanters and annealers for selective implantation and annealing
03/17/2009US7504325 Laser doping processing method and method for manufacturing semiconductor device
03/17/2009US7504324 Semiconductor base and its manufacturing method, and semiconductor crystal manufacturing method
03/17/2009US7504323 GaN single crystal substrate and method of making the same
03/17/2009US7504322 Growth of a semiconductor layer structure
03/17/2009US7504321 MBE growth of an algan layer or AlGaN multilayer structure
03/17/2009US7504320 Method for manufacturing a tag integrated circuit flexible board
03/17/2009US7504319 Apparatus and method of wafer dicing
03/17/2009US7504318 Nanopowder coating for scribing and structures formed thereby
03/17/2009US7504317 Manufacturing method of semiconductor device
03/17/2009US7504316 Method and device for separating a reinforcing-plate fixed to a reinforced semiconductor wafer
03/17/2009US7504315 Method of transporting semiconductor device and method of manufacturing semiconductor device
03/17/2009US7504314 Method for fabricating oxygen-implanted silicon on insulation type semiconductor and semiconductor formed therefrom
03/17/2009US7504313 Method for forming plural kinds of wells on a single semiconductor substrate
03/17/2009US7504311 Structure and method of integrating compound and elemental semiconductors for high-performance CMOS
03/17/2009US7504310 Semiconductors bonded on glass substrates
03/17/2009US7504309 Pre-silicide spacer removal
03/17/2009US7504308 Method of dual bird's beak LOCOS isolation
03/17/2009US7504307 Semiconductor devices including voltage-sustaining space-charge zone and methods of manufacture thereof
03/17/2009US7504306 Method of forming trench gate field effect transistor with recessed mesas
03/17/2009US7504305 Technique for forming the deep doped regions in superjunction devices
03/17/2009US7504304 Non-volatile semiconductor memory device and process of manufacturing the same
03/17/2009US7504303 Trench-gate field effect transistors and methods of forming the same
03/17/2009US7504302 Process of forming a non-volatile memory cell including a capacitor structure
03/17/2009US7504301 Stressed field effect transistor and methods for its fabrication
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