Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
02/2010
02/09/2010US7659129 Fabricating method for quantum dot of active layer of LED by nano-lithography
02/09/2010US7659128 Method of processing silicon wafer and method of manufacturing liquid ejecting head
02/09/2010US7659127 Manufacturing device of semiconductor package and manufacturing method of semiconductor package
02/09/2010US7659126 Electrical test method and apparatus
02/09/2010US7659050 High resolution silicon-containing resist
02/09/2010US7659042 photomasks; photoresists; for hard-to-etch metal layers such as copper; integrated circuits; improved resolution
02/09/2010US7659041 Lithographic method of manufacturing a device
02/09/2010US7659040 Exposure mask and method of manufacturing the same, and semiconductor device manufacturing method
02/09/2010US7658973 Incorporating nitrogen into a dielectric film using a nitridation gas and a rapid thermal annealing process, wherein an ultra-low pressure of equal to or less than about 10 Torr is used for the rapid thermal annealing process
02/09/2010US7658970 Forming a cobalt layer on a tungsten barrier layer using a cyclical deposition process to sequentially expose the substrate to a precursor gas of cobalt having a cyclopentadienyl ligand and a silicon reducing gas; copper plating to fill high aspect ratio, nano-interconnect semiconductor features
02/09/2010US7658860 etching; surface treatment; water and oil repellent; ink jets
02/09/2010US7658822 SiOx:Si composite articles and methods of making same
02/09/2010US7658816 Focus ring and plasma processing apparatus
02/09/2010US7658801 Heat treatment apparatus
02/09/2010US7658800 Gas distribution assembly for use in a semiconductor work piece processing reactor
02/09/2010US7658799 Plasma film-forming apparatus and plasma film-forming method
02/09/2010US7658798 Method for fixing metal particles and method for manufacturing substrate containing metal particles, method for manufacturing substrate containing carbon nanotube, and method for manufacturing substrate containing semiconductor-crystalline rod, employing thereof
02/09/2010US7658773 Method for fabricating a solid electrolyte memory device and solid electrolyte memory device
02/09/2010US7658772 Creating network of channels on one surface of two substrates, coating substrates with one or more layers of materials, the coating extending over regions between channels and into channels, contacting surfaces and applying pressure causing surface features on one layer to match surface features in other
02/09/2010US7658601 Pattern forming apparatus
02/09/2010US7658586 Advanced low cost high throughput processing platform
02/09/2010US7658290 Substrate storage container
02/09/2010US7658289 Substrate storage container
02/09/2010US7658204 Semiconductor manufacturing apparatus enabling inspection of mass flow controller maintaining connection thereto
02/09/2010US7658163 Direct write# system
02/04/2010WO2010014974A2 Phase transition devices and smart capacitive devices
02/04/2010WO2010014657A2 Passivation of aluminum nitride substrates
02/04/2010WO2010014626A2 Novel silicon precursors to make ultra low-k films with high mechanical properties by plasma enhanced chemical vapor deposition
02/04/2010WO2010014553A2 Concrete vacuum chamber
02/04/2010WO2010014433A2 Field enhanced inductively coupled plasma (fe-icp) reactor
02/04/2010WO2010014399A2 Chamber plasma-cleaning process scheme
02/04/2010WO2010014380A2 Within-sequence metrology based process tuning for adaptive self-aligned double patterning
02/04/2010WO2010014287A1 Semiconductor devices with extended active regions
02/04/2010WO2010014283A1 Lateral devices containing permanent charge
02/04/2010WO2010014251A2 Transistor with embedded si/ge material having enhanced boron confinement
02/04/2010WO2010014246A1 Performance enhancement in pmos and nmos transistors on the basis of silicon/carbon material
02/04/2010WO2010014128A2 Normally-off semiconductor devices and methods of fabricating the same
02/04/2010WO2010014103A1 Semiconductor package with integrated interference shielding and method of manufacture therof
02/04/2010WO2010014094A1 Multi-gigabit analog to digital converter
02/04/2010WO2010014091A1 Wire feed system with moveable guide member for a wire bonding machine
02/04/2010WO2010014058A1 System and method for manufacturing thin film electrical devices
02/04/2010WO2010014041A1 Method and system for detecting micro-cracks in wafers
02/04/2010WO2010013831A1 A film depositing apparatus and method
02/04/2010WO2010013764A1 Chip mounting apparatus
02/04/2010WO2010013746A1 Deposition film forming apparatus and deposition film forming method
02/04/2010WO2010013732A1 Method of teaching conveying robot
02/04/2010WO2010013728A1 Semiconductor device and method for manufacturing same
02/04/2010WO2010013683A1 Semiconductor device and method for manufacturing semiconductor device
02/04/2010WO2010013671A1 Exposure method and system, and device manufacturing method
02/04/2010WO2010013665A1 Defect review device and method, and program
02/04/2010WO2010013661A1 Method and device for cleaning a substrate, and storage medium
02/04/2010WO2010013646A1 Method for manufacturing epitaxial wafer and wafer holder used in the method
02/04/2010WO2010013636A1 Wiring film, thin film transistor, target, wiring film formation method
02/04/2010WO2010013624A1 Current introducing terminal, plasma surface processing apparatus provided with the current introducing terminal, and plasma surface processing method
02/04/2010WO2010013612A1 Circuit pattern examining apparatus and circuit pattern examining method
02/04/2010WO2010013588A1 Metal nano-ink, process for producing the metal nano-ink, and die bonding method and die bonding apparatus using the metal nano-ink
02/04/2010WO2010013566A1 Magnetoresistive element, magnetic random access memory, and initialization method thereof
02/04/2010WO2010013564A1 Defect review device, defect review method, and defect review execution program
02/04/2010WO2010013562A1 Silicon etchant and etching method
02/04/2010WO2010013549A1 Apparatus and method for transferring board-like work
02/04/2010WO2010013497A1 Sputtering target for forming wiring film of flat panel display
02/04/2010WO2010013422A1 Transfer robot control method
02/04/2010WO2010013404A1 Semiconductor device and method for manufacturing the same
02/04/2010WO2010013390A1 Wafer polishing method and double side polishing apparatus
02/04/2010WO2010013349A1 Electron beam recorder, and apparatus and method for controlling the same
02/04/2010WO2010013348A1 Electron beam recorder, its controller, and control method
02/04/2010WO2010013331A1 Electron beam device
02/04/2010WO2010013286A1 Semiconductor device and manufacturing method
02/04/2010WO2010013194A2 Orientation of an electronic cmos structure with respect to a buried structure in the case of a bonded and thinned-back stack of semiconductor wafers
02/04/2010WO2010013008A1 Active matrix oled display and driver therefor
02/04/2010WO2010012863A1 Atomic layer deposition apparatus and loading methods
02/04/2010WO2010012860A1 A lithographic process using a nanowire mask, and nanoscale devices fabricated using the process
02/04/2010WO2010012739A1 Semiconductor-on-insulator substrate coated with intrinsic and doped diamond films
02/04/2010WO2010012331A1 Clean room-suitable linear guide
02/04/2010WO2010012159A1 A chemical-mechanical polishing liquid
02/04/2010WO2009152207A3 Zinc oxide alloys and devices including the same
02/04/2010WO2009137610A3 Method of forming an electronic device including removing a differential etch layer
02/04/2010WO2009137279A3 Dynamic alignment of wafers using compensation values obtained through a series of wafer movements
02/04/2010WO2009134916A3 Process for forming cobalt and cobalt silicide materials in tungsten contact applications
02/04/2010WO2009134678A3 Surface treatment to improved resistive-switching characteristics
02/04/2010WO2009099255A4 Chip supply pallet and chip supply apparatus
02/04/2010US20100031224 Pattern verification method, program thereof, and manufacturing method of semiconductor device
02/04/2010US20100030545 Pattern shape predicting method and pattern shape predicting apparatus
02/04/2010US20100030508 Pin electronics circuit, semiconductor device test equipment and system
02/04/2010US20100029841 Silicone-containing polymer and a heat-resistant resin composition comprising the silicon-containing polymer
02/04/2010US20100029185 Polishing pad and a method for manufacturing the same
02/04/2010US20100029182 Polishing pad
02/04/2010US20100029094 Method and Apparatus for Forming a High Quality Low Temperature Silicon Nitride Layer
02/04/2010US20100029093 Plasma oxidizing method, plasma processing apparatus, and storage medium
02/04/2010US20100029092 Semiconductor Device Producing Method, Substrate Producing Method and Substrate Processing Apparatus
02/04/2010US20100029091 Method of Forming Tunnel Insulation Layer in Flash Memory Device
02/04/2010US20100029090 Novel contact etch stop film
02/04/2010US20100029089 Method for manufacturing semiconductor device, and substrate processing apparatus
02/04/2010US20100029088 Modulated metal removal using localized wet etching
02/04/2010US20100029087 Apparatus and method for etching semiconductor wafer
02/04/2010US20100029086 Method for manufacturing semiconductor device and storage medium
02/04/2010US20100029085 Cleaning composition and process for producing semiconductor device
02/04/2010US20100029084 Pattern forming method and pattern forming device
02/04/2010US20100029083 Method for Forming Laterally Extending Dielectric Layer in a Trench-Gate FET
02/04/2010US20100029082 Method and apparatus for angular high density plasma chemical vapor deposition
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