Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
02/2015
02/12/2015US20150044830 Hard mask for source/drain epitaxy control
02/12/2015US20150044829 Methods of Fabricating Semiconductor Devices Having Punch-Through Stopping Regions
02/12/2015US20150044828 Recrystallization of source and drain blocks from above
02/12/2015US20150044827 Method of locally stressing a semiconductor layer
02/12/2015US20150044826 Method of introducing local stress in a semiconductor layer
02/12/2015US20150044825 Compound semiconductor device and method of manufacturing the same
02/12/2015US20150044824 Fan-Out WLP With Package
02/12/2015US20150044823 Microelectronic package with integrated bearing surfaces
02/12/2015US20150044822 Circuit module and method of producing circuit module
02/12/2015US20150044821 Method for fabricating multi-chip stack structure
02/12/2015US20150044820 Method of fabricating low cte interposer without tsv structure
02/12/2015US20150044819 Packaging Methods and Structures for Semiconductor Devices
02/12/2015US20150044817 Thin film transistor and method of forming the same
02/12/2015US20150044809 Method for depositing particles onto a substrate, including a step of structuring a particle film on a liquid conveyor
02/12/2015US20150044799 Optical device wafer processing method
02/12/2015US20150044794 Semiconductor light-emitting device and method for forming the same
02/12/2015US20150044789 Method of manufacturing element substrate
02/12/2015US20150044788 Test apparatus and test method
02/12/2015US20150044787 Semiconductor test and monitoring structure to detect boundaries of safe effective modulus
02/12/2015US20150044786 Alignment Systems and Wafer Bonding Systems and Methods
02/12/2015US20150044785 Substrate backside texturing
02/12/2015US20150044783 Methods of alleviating adverse stress effects on a wafer, and methods of forming a semiconductor device
02/12/2015US20150044619 Carrier for Ultra-Thin Substrates and Method of Use
02/12/2015US20150044426 Catalytic etch with magnetic direction control
02/12/2015US20150044422 Silicon wafer and method for manufacturing the same
02/12/2015US20150044367 Method for Forming Monolayer Graphene-Boron Nitride Heterostructures
02/12/2015US20150044008 Robot Blade Design
02/12/2015US20150044001 Reduced Footprint Substrate Transport Vacuum Platform
02/12/2015US20150043228 Semiconductor device, and method of manufacturing semiconductor device
02/12/2015US20150043190 Embedded packaging with preformed vias
02/12/2015US20150043123 Locally heated multi-zone substrate support
02/12/2015US20150043122 Electrostatic chuck, mount plate support, and manufacturing method of electrostatic chuck
02/12/2015US20150042400 Systems and methods for integrated voltage regulators
02/12/2015US20150042372 Addressable test circuit and test method for key parameters of transistors
02/12/2015US20150041995 Chip package and fabrication method thereof
02/12/2015US20150041993 Method for manufacturing a chip arrangement, and a chip arrangement
02/12/2015US20150041990 Wiring substrate and manufacturing method therefor
02/12/2015US20150041988 Ultra high performance interposer
02/12/2015US20150041987 3D Packages and Methods for Forming the Same
02/12/2015US20150041986 Manufacturing method of a semiconductor device and method for creating a layout thereof
02/12/2015US20150041985 Semiconductor Device and Method of Making Wafer Level Chip Scale Package
02/12/2015US20150041984 Electronic Component and Method
02/12/2015US20150041983 Semiconductor-device manufacturing method and semiconductor device
02/12/2015US20150041982 Stacked redistribution layers on die
02/12/2015US20150041981 Semiconductor interconnect structure having a graphene-based barrier metal layer
02/12/2015US20150041980 Semiconductor Package with Reduced Thickness
02/12/2015US20150041976 Semiconductor device sealed in a resin section and method for manufacturing the same
02/12/2015US20150041969 Semiconductor package and fabrication method thereof
02/12/2015US20150041966 Methods and Systems for Dopant Activation Using Microwave Radiation
02/12/2015US20150041965 Power Semiconductor Device and Method
02/12/2015US20150041962 Semiconductor Device with Cell Trench Structures and Contacts and Method of Manufacturing a Semiconductor Device
02/12/2015US20150041960 Semiconductor device and method for manufacturing the same
02/12/2015US20150041959 Hardmask composition for forming resist underlayer film, process for producing a semiconductor integrated circuit device, and semiconductor integrated circuit device
02/12/2015US20150041958 Integration of dense and variable pitch fin structures
02/12/2015US20150041950 Conductor with sub-lithographic self-aligned 3d confinement
02/12/2015US20150041949 Shallow Trench Isolation Area Having Buried Capacitor
02/12/2015US20150041948 Semiconductor device including sti structure and method for forming the same
02/12/2015US20150041947 Semiconductor device manufacturing method, semiconductor device, and display device
02/12/2015US20150041946 Edge Termination Structure with Trench Isolation Regions
02/12/2015US20150041926 Tungsten gates for non-planar transistors
02/12/2015US20150041925 P type mosfet and method for manufacturing the same
02/12/2015US20150041921 Increasing ion/ioff ratio in finfets and nano-wires
02/12/2015US20150041920 Electrostatic discharge protection device and manufacturing method thereof
02/12/2015US20150041918 Self-Aligned Dual-Metal Silicide and Germanide Formation
02/12/2015US20150041912 Gate Stacks Including TaXSiYO for MOSFETS
02/12/2015US20150041911 3d transistor channel mobility enhancement
02/12/2015US20150041910 Integrated circuits with a partially-depleted region formed over a bulk silicon substrate and methods for fabricating the same
02/12/2015US20150041909 Completing middle of line integration allowing for self-aligned contacts
02/12/2015US20150041908 METHOD OF MANUFACTURING A FinFET DEVICE USING A SACRIFICIAL EPITAXY REGION FOR IMPROVED FIN MERGE AND FinFET DEVICE FORMED BY SAME
02/12/2015US20150041906 Methods of forming stressed fin channel structures for finfet semiconductor devices
02/12/2015US20150041905 Methods of forming replacement gate structures for transistors and the resulting devices
02/12/2015US20150041903 Semiconductor device and method of manufacturing the same
02/12/2015US20150041894 Method of fabricating semiconductor device
02/12/2015US20150041892 Semiconductor device
02/12/2015US20150041879 Semiconductor structures and methods of fabrication of same
02/12/2015US20150041878 Method for forming a floating gate in a recess of a shallow trench isolation (sti) region
02/12/2015US20150041876 Nonvolatile semiconductor memory device and method for manufacturing same
02/12/2015US20150041867 Fin field effect transistor and method for forming the same
02/12/2015US20150041861 Iii-n device structures and methods
02/12/2015US20150041860 Semiconductor device and manufacturing method thereof
02/12/2015US20150041854 FinFET Low Resistivity Contact Formation Method
02/12/2015US20150041853 Bonded epitaxial oxide structures for compound semiconductor on silicon substrates
02/12/2015US20150041828 Semiconductor device, and method for manufacturing semiconductor device
02/12/2015US20150041824 Transistor with bonded gate dielectric
02/12/2015US20150041809 Voltage contrast inspection of deep trench isolation
02/12/2015US20150041803 Semiconductor Device and Method for Manufacturing Thereof
02/12/2015US20150041751 Customizable nonlinear electrical devices
02/12/2015US20150041731 Method For Preparing Scandium-Doped Hafnium Oxide Film
02/12/2015US20150041657 Multiple beam transmission interferometric testing methods for the development and evaluation of subwavelength sized features within semiconductor and anisotropic devices
02/12/2015US20150041453 Visual feedback for process control in rtp chambers
02/12/2015US20150041433 Process For Plasma Treatment Employing Ceramic-Filled Polymer Composite Parts
02/12/2015US20150041431 Methods of laser processing photoresist in a gaseous environment
02/12/2015US20150041430 Method for treating inner surface of chlorine trifluoride supply passage in apparatus using chlorine trifluoride
02/12/2015US20150041360 Wafer container with tubular environmental control components
02/12/2015US20150041359 Substrate container with fluid-sealing flow passageway
02/12/2015US20150041353 Wafer carrier
02/12/2015US20150041327 Apparatuses and methods for maintaining ph in nickel electroplating baths
02/12/2015US20150041316 Semiconductor micro-analysis chip and method of manufacturing the same
02/12/2015US20150041314 Annular member and film-forming device in which same is used
02/12/2015US20150041208 Micro mechanical anchor for 3d architecture
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