Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
08/2010
08/31/2010US7786743 Probe tile for probing semiconductor wafer
08/31/2010US7786665 Organic electroluminescent device having a diffraction grating for enhancing light extraction efficiency
08/31/2010US7786607 Overlay correction by reducing wafer slipping after alignment
08/31/2010US7786600 Circuit substrate having circuit wire formed of conductive polarization particles, method of manufacturing the circuit substrate and semiconductor package having the circuit wire
08/31/2010US7786598 Semiconductor chip and semiconductor device, and method for manufacturing semiconductor device
08/31/2010US7786587 Semiconductor device and method for manufacturing thereof
08/31/2010US7786586 Inductor of semiconductor device and method for manufacturing the same
08/31/2010US7786585 Semiconductor integrated circuit device
08/31/2010US7786584 Through substrate via semiconductor components
08/31/2010US7786582 System for providing a redistribution metal layer in an integrated circuit
08/31/2010US7786580 Semiconductor device and method for manufacturing the same
08/31/2010US7786572 System in package (SIP) structure
08/31/2010US7786567 Substrate for electrical device and methods for making the same
08/31/2010US7786562 Stackable semiconductor chip layer comprising prefabricated trench interconnect vias
08/31/2010US7786559 Bezel packaging of frit-sealed OLED devices
08/31/2010US7786556 Semiconductor device and lead frame used to manufacture semiconductor device
08/31/2010US7786553 Method of fabricating semiconductor device
08/31/2010US7786538 Semiconductor device having a nickel silicide layer on a single crystal silicon layer
08/31/2010US7786537 Semiconductor device and method for manufacturing same
08/31/2010US7786533 High-voltage vertical transistor with edge termination structure
08/31/2010US7786530 Vertical field-effect transistor
08/31/2010US7786524 Semiconductor device and method of manufacturing the same
08/31/2010US7786523 Capacitor of dynamic random access memory and method of manufacturing the capacitor
08/31/2010US7786521 Semiconductor device with dielectric structure and method for fabricating the same
08/31/2010US7786518 Growth of unfaceted SiGe in MOS transistor fabrication
08/31/2010US7786509 Field-effect transistor and method of making same
08/31/2010US7786508 High operating temperature split-off band infrared detectors
08/31/2010US7786502 Nitride semiconductor light-emitting device and method of manufacturing the same
08/31/2010US7786497 Pixel structure of LCD and fabrication method thereof
08/31/2010US7786493 Light emitting diode, method for manufacturing light emitting diode, integrated light emitting diode, method for manufacturing integrated light emitting diode, light emitting diode backlight, light emitting diode illumination device, light emitting diode display, electronic apparatus, electronic device, and method for manufacturing electronic device
08/31/2010US7786490 Multi-chip module single package structure for semiconductor
08/31/2010US7786488 Nitride semiconductor wafer and method of processing nitride semiconductor wafer
08/31/2010US7786487 Semiconductor device and manufacturing method thereof
08/31/2010US7786468 Layer transfer of low defect SiGe using an etch-back process
08/31/2010US7786460 Phase change memory device and manufacturing method
08/31/2010US7786437 Pattern inspection method and pattern inspection system
08/31/2010US7786429 Camera module with window mechanical attachment
08/31/2010US7786423 Image sensor and method for manufacturing the same
08/31/2010US7786403 Method for high-resolution processing of thin layers using electron beams
08/31/2010US7786376 High efficiency solar cells and manufacturing methods
08/31/2010US7786320 semiconductors; low dielectric thin films; chemical vapor deposition
08/31/2010US7786025 Activating dopants using multiple consecutive millisecond-range anneals
08/31/2010US7786024 Selective processing of semiconductor nanowires by polarized visible radiation
08/31/2010US7786023 Metal pad formation method and metal pad structure using the same
08/31/2010US7786022 Method for forming insulating film with low dielectric constant
08/31/2010US7786021 High-density plasma multilayer gate oxide
08/31/2010US7786020 Method for fabricating nonvolatile memory device
08/31/2010US7786019 Multi-step photomask etching with chlorine for uniformity control
08/31/2010US7786017 Utilizing inverse reactive ion etching lag in double patterning contact formation
08/31/2010US7786016 Methods of uniformly removing silicon oxide and a method of removing a sacrificial oxide
08/31/2010US7786015 Method for fabricating self-aligned complementary pillar structures and wiring
08/31/2010US7786014 Electronic device and method for making the same
08/31/2010US7786013 Method of fabricating semiconductor device
08/31/2010US7786012 Tapered edge exposure for removal of material from a semiconductor wafer
08/31/2010US7786011 Composition and methods for forming metal films on semiconductor substrates using supercritical solvents
08/31/2010US7786010 Method for forming a thin layer on semiconductor substrates
08/31/2010US7786008 Integrated circuit packaging system having through silicon vias with partial depth metal fill regions and method of manufacture thereof
08/31/2010US7786007 Method and apparatus of stress relief in semiconductor structures
08/31/2010US7786006 Interconnect structures with a metal nitride diffusion barrier containing ruthenium and method of forming
08/31/2010US7786005 Method for manufacturing semiconductor device to form a via hole
08/31/2010US7786004 Method of treating an exposed conductive film prior to forming a silicide
08/31/2010US7786003 Buried silicide local interconnect with sidewall spacers and method for making the same
08/31/2010US7786002 Method for producing a component comprising a conductor structure that is suitable for use at high frequencies
08/31/2010US7786001 Electrical interconnect structure and method
08/31/2010US7786000 Buried bit line anti-fuse one-time-programmable nonvolatile memory
08/31/2010US7785999 Formation of fully silicided metal gate using dual self-aligned silicide process
08/31/2010US7785998 Methods of forming dispersions of nanoparticles, and methods of forming flash memory cells
08/31/2010US7785997 Method for fabricating semiconductor device
08/31/2010US7785996 Nonvolatile memory device and method of manufacturing the same
08/31/2010US7785995 Semiconductor buffer structures
08/31/2010US7785994 Ion implantation method and semiconductor device manufacturing method
08/31/2010US7785993 Method of growing a strained layer
08/31/2010US7785992 Array substrate for flat display device and method for fabricating the same
08/31/2010US7785991 Process for integrating a III-N type component on a (001) nominal silicium substrate
08/31/2010US7785990 Semiconductor device and method of fabricating the same
08/31/2010US7785989 Growth substrates for inverted metamorphic multijunction solar cells
08/31/2010US7785988 Processes for forming backplanes for electro-optic displays
08/31/2010US7785987 Isolating chip-to-chip contact
08/31/2010US7785986 Method of manufacturing semiconductor device
08/31/2010US7785985 Methods of manufacturing semiconductor devices
08/31/2010US7785984 Manufacturing method for semiconductor device
08/31/2010US7785983 Semiconductor device having tiles for dual-trench integration and method therefor
08/31/2010US7785982 Structures containing electrodeposited germanium and methods for their fabrication
08/31/2010US7785981 Solid-state imaging device and method of manufacturing solid-state imaging device
08/31/2010US7785980 Method of manufacturing semiconductor device using alignment mark and mark hole
08/31/2010US7785979 Integrated circuits comprising resistors having different sheet resistances and methods of fabricating the same
08/31/2010US7785978 Method of forming memory cell using gas cluster ion beams
08/31/2010US7785977 Thin film capacitor and manufacturing method therefor
08/31/2010US7785975 SOI device with improved storage capacity and method for manufacturing the same
08/31/2010US7785974 Methods of employing a thin oxide mask for high dose implants
08/31/2010US7785973 Electronic device including a gate electrode having portions with different conductivity types and a process of forming the same
08/31/2010US7785972 Method for fabricating semiconductor MOS device
08/31/2010US7785971 Fabrication of complementary field-effect transistors with vertical body-material dopant profiles tailored to alleviate punchthrough and reduce current leakage
08/31/2010US7785970 Method of forming source and drain regions utilizing dual capping layers and split thermal processes
08/31/2010US7785969 Method for forming semiconductor device
08/31/2010US7785967 Method for manufacturing a semiconductor device
08/31/2010US7785966 Method for fabricating floating gates structures with reduced and more uniform forward tunneling voltages
08/31/2010US7785965 Dual storage node memory devices and methods for fabricating the same
08/31/2010US7785964 Non-volatile semiconductor memory device and method of manufacturing the same
08/31/2010US7785963 Method for fabricating inverted T-shaped floating gate memory
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