Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
10/2010
10/12/2010US7811895 Method of manufacturing a semiconductor device having a stacked capacitor
10/12/2010US7811894 Bipolar junction transistor and manufacturing method thereof
10/12/2010US7811893 Shallow trench isolation stress adjuster for MOS transistor
10/12/2010US7811892 Multi-step annealing process
10/12/2010US7811891 Method to control the gate sidewall profile by graded material composition
10/12/2010US7811890 Vertical channel transistor structure and manufacturing method thereof
10/12/2010US7811889 FinFET memory cell having a floating gate and method therefor
10/12/2010US7811888 Method for fabricating semiconductor memory device
10/12/2010US7811887 Forming silicon trench isolation (STI) in semiconductor devices self-aligned to diffusion
10/12/2010US7811886 Split-gate thin film storage NVM cell with reduced load-up/trap-up effects
10/12/2010US7811885 Method for forming a phase change device
10/12/2010US7811884 Method for manufacturing semiconductor device
10/12/2010US7811883 Method of forming a nanowire based non-volatile floating-gate memory
10/12/2010US7811882 Hardmask manufacture in ferroelectric capacitors
10/12/2010US7811881 Methods for forming semiconductor structures with buried isolation collars and semiconductor structures formed by these methods
10/12/2010US7811880 Fabrication of recordable electrical memory
10/12/2010US7811879 Process for PCM integration with poly-emitter BJT as access device
10/12/2010US7811878 Method of manufacturing SOI substrate
10/12/2010US7811877 Method of controlling metal silicide formation
10/12/2010US7811876 Reduction of memory instability by local adaptation of re-crystallization conditions in a cache area of a semiconductor device
10/12/2010US7811875 Dual work-function single gate stack
10/12/2010US7811874 Method for manufacturing silicon carbide semiconductor device, and silicon carbide semiconductor device
10/12/2010US7811873 Method for fabricating MOS-FET
10/12/2010US7811872 Method for manufacturing a field effect transistor having a field plate
10/12/2010US7811871 Low-capacitance contact for long gate-length devices with small contacted pitch
10/12/2010US7811870 Array substrate for liquid crystal display device and fabrication method thereof
10/12/2010US7811869 Fabrication method of multi-domain vertical alignment pixel structure
10/12/2010US7811868 Method for manufacturing a signal line, thin film transistor panel, and method for manufacturing the thin film transistor panel
10/12/2010US7811867 Method for manufacturing pixel structure
10/12/2010US7811866 Single passivation layer scheme for forming a fuse
10/12/2010US7811865 Method of forming a packaged chip multiprocessor
10/12/2010US7811864 Method of fabricating semiconductor package
10/12/2010US7811863 Method of making a semiconductor chip assembly with metal pillar and encapsulant grinding and heat sink attachment
10/12/2010US7811862 Thermally enhanced electronic package
10/12/2010US7811861 Image sensing device and packaging method thereof
10/12/2010US7811860 Method for producing a device and device
10/12/2010US7811859 Method of reducing memory card edge roughness by edge coating
10/12/2010US7811858 Package and the method for making the same, and a stacked package
10/12/2010US7811857 Method of manufacturing semiconductor device
10/12/2010US7811856 Semiconductor device and method for manufacturing the same
10/12/2010US7811855 Method for producing a matrix for detecting electromagnetic radiation and method for replacing an elementary module of such a detection matrix
10/12/2010US7811854 Assembling stacked substrates that can form 3-D structures
10/12/2010US7811853 Method for avoiding die cracking
10/12/2010US7811851 Phase change memory structures
10/12/2010US7811850 Method of operating image sensor
10/12/2010US7811849 Placing a MEMS part on an application platform using a guide mask
10/12/2010US7811848 Method for forming buried cavities within a semiconductor body, and semiconductor body thus made
10/12/2010US7811847 Optical semiconductor device and method for manufacturing the same
10/12/2010US7811846 Semiconductor devices grown in spherical cavity arrays and its preparation method
10/12/2010US7811845 Method for manufacturing high efficiency light-emitting diodes
10/12/2010US7811844 Method for fabricating electronic and photonic devices on a semiconductor substrate
10/12/2010US7811843 Method of manufacturing light-emitting diode
10/12/2010US7811841 Semiconductor composite device, method for manufacturing the semiconductor composite device, LED head that employs the semiconductor composite device, and image forming apparatus that employs the LED head
10/12/2010US7811840 Diodes, and methods of forming diodes
10/12/2010US7811839 Semiconductor light emitting device and method for manufacturing the same
10/12/2010US7811836 Methods of manufacturing reference sample substrates for analyzing metal contamination levels
10/12/2010US7811835 Method for processing a base that includes connecting a first base to a second base with an insulating film
10/12/2010US7811834 Methods of forming a ferroelectric layer and methods of manufacturing a ferroelectric capacitor including the same
10/12/2010US7811833 Method of manufacturing a multi-purpose magnetic film structure
10/12/2010US7811748 preventing pattern falling by adjusting the contact angle on the resist pattern surface; rinsing with a solution of a water-soluble copolymer of vinyl pyrrolidone and vinyl imidazole, then contacting with a solution of a fluorine compound capable of forming a complex with the resin; semiconductors
10/12/2010US7811746 photolithography methods for exposing semiconductor substrates; enhancing lithographic printing image resolution, reducing mask error factor and line edge roughness
10/12/2010US7811745 using plurality of dummy line patterns, etching to form trenches located between adjacent ones of the predetermined mask portions through photolithographic method, and filling the trenches with a predetermined material; forming patterns exactly and effectively
10/12/2010US7811740 comprising acrylate resin having a monocyclic or polycyclic alicyclic hydrocarbon structure, and a surfactant containing a fluorine compound or fluorine containing polyethers; resist pattern with good sensitivity, resolution, adhesion, and little in development defects; for an immersion exposure
10/12/2010US7811720 Orthogonal corners produced in a semiconductor device pattern to include one edge defined by a first mask and an orthogonal edge defined by a second mask; alleviate proximity effects
10/12/2010US7811647 Heat-peelable pressure-sensitive adhesive sheet and method for processing adherend using the heat-peelable pressure-sensitive adhesive sheet
10/12/2010US7811637 Silicon-containing polymer, process for producing the same, heat-resistant resin composition, and heat-resistant film
10/12/2010US7811635 fabricating organic/inorganic composite nanostructures on a substrate by depositing a solution having a block copolymer and an inorganic precursor on the substrate using dip pen nanolithography
10/12/2010US7811464 Elicit, evaluate, and utilize crystal defects, especially BMDs (bulk micro defects) in an ultralow-resistance silicon single crystal substrate having an electrical resistivity less than 10 m Omega *cm which cannot be readily detected by conventional techniques; chromeless
10/12/2010US7811428 Method and apparatus for an improved optical window deposition shield in a plasma processing system
10/12/2010US7811412 Substrate processing apparatus and substrate processing method drying substrate
10/12/2010US7811411 Thermal management of inductively coupled plasma reactors
10/12/2010US7811409 Bare aluminum baffles for resist stripping chambers
10/12/2010US7811337 Ultracapacitor electrode with controlled sulfur content
10/12/2010US7810985 Multiple function night light
10/12/2010US7810703 Wire bonding method
10/12/2010US7810702 Solder standoffs for injection molding of solder
10/12/2010US7810645 Paddle for securely mounting a wafer cassette holder thereto
10/12/2010US7810449 Plasma processing system with locally-efficient inductive plasma coupling
10/12/2010US7810448 Apparatus and method for the treating of workpieces
10/12/2010CA2481260C Method and device for conditioning semiconductor wafers and/or hybrids
10/12/2010CA2372985C Integrated fixation systems
10/07/2010WO2010115171A2 Carbon nanotube contact structures for use with semiconductor dies and other electronic devices
10/07/2010WO2010115137A1 Lateral diode and method of manufacturing the same
10/07/2010WO2010115128A2 High pressure rf-dc sputtering and methods to improve film uniformity and step-coverage of this process
10/07/2010WO2010115114A2 Enhanced etch deposition profile control using plasma sheath engineering
10/07/2010WO2010115110A2 Plasma processing apparatus
10/07/2010WO2010114961A2 Plasma processing apparatus
10/07/2010WO2010114954A2 End terminations for electrodes used in ion implantation systems
10/07/2010WO2010114823A2 Sputtering target for pvd chamber
10/07/2010WO2010114787A1 Method and structure for threshold voltage control and drive current improvement for high-k metal gate transistors
10/07/2010WO2010114716A1 Using electric-field directed post-exposure bake for double patterning (d-p)
10/07/2010WO2010114713A1 Microbolometer pixel and fabrication method utilizing ion implantation
10/07/2010WO2010114600A1 All-electron battery having area-enhanced electrodes
10/07/2010WO2010114495A1 A thermode assembly
10/07/2010WO2010114232A2 Rocker door valve for semiconductor-manufacturing equipment
10/07/2010WO2010114216A1 Apparatus for peeling metal in a via hole penetrating through a semiconductor wafer, and peeling method using same
10/07/2010WO2010114159A1 Photoelectric conversion device and manufacturing method thereof, solar cell, and target
10/07/2010WO2010114158A1 Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same
10/07/2010WO2010114117A1 Method and device for creating composite image
10/07/2010WO2010114107A1 Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same
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