Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
10/2010
10/28/2010US20100270535 Electronic device including an electrically polled superlattice and related methods
10/28/2010US20100270530 Semiconductor nanowire sensor device and method for manufacturing the same
10/28/2010US20100270528 Resistive random access memory device and method of same
10/28/2010US20100270527 Phase-change memory device and method of manufacturing the phase-change memory device
10/28/2010US20100270458 Liquid electrical interconnect and devices using same
10/28/2010US20100270403 Recycling method and recycling apparatus of slurry for use in wafer polishing
10/28/2010US20100270264 Near field exposure mask, method of forming resist pattern using the mask, and method of producing device
10/28/2010US20100269980 Plasma processing apparatus
10/28/2010US20100269903 Process for producing polycrystalline silicon substrate and polycrystalline silicon substrate
10/28/2010US20100269899 Solar Cell
10/28/2010US20100269893 Metal pastes and use thereof in the production of positive electrodes on p-type silicon surfaces
10/28/2010US20100269887 Crystallographically textured metal substrate, crystallographically textured device, cell and photovoltaic module including such device and thin layer deposition method
10/28/2010DE19937912B4 Halbleiterbauelement umfassend ein Paar schwebender Gates, zugehöriges Halbleiterbauelement und elektrisch programmier- und löschbares Speicherbauelement A semiconductor device comprising a pair of floating gates associated semiconductor device and electrically erasable programmable memory device and
10/28/2010DE112008002551T5 Verfahren zur Abscheidung von ternären Oxid-Gatedielektrika und Strukturen, die dadurch gebildet werden A method of deposition of ternary oxide gate dielectrics and structures which are formed by
10/28/2010DE10307454B4 Verfahren zur optischen Inspektion eines Halbleitersubstrats A method for the optical inspection of a semiconductor substrate
10/28/2010DE102010016566A1 Halbleiterbaustein mit mehreren Chips und Substrat in einer Metallkappe A semiconductor device having a plurality of chip and substrate in a metal cap
10/28/2010DE102010010106A1 Vorrichtung zur Prüfung und Entfernung von Partikeln und Programm zur Prüfung und Entfernung von Partikeln Apparatus for testing and removal of particles and program for testing and removal of particles
10/28/2010DE102009044323A1 Structured material layer manufacturing method for thin layer rear side contacting solar cell, involves applying material layer on substrate surface, and mechanically removing sacrificial structure such that layer is structured on surface
10/28/2010DE102009019063A1 Component part i.e. sensor e.g. acceleration sensor, for use in motor vehicle, has housing made of plastic and provided for embedding capsulated electronic assembly part together with screen section of conductor grid
10/28/2010DE102009018773A1 Verfahren zum Herstellen eines Halbleiterbauelementes, insbesondere einer Solarzelle, auf Basis einer Halbleiterdünnschicht mit einem direkten Halbleiter oder mit Germanium A method of manufacturing a semiconductor device, in particular a solar cell, on the basis of a semiconductor thin film semiconductor with a direct or germanium
10/28/2010DE102009018541A1 Contacting unit for electronic component, is porous metallic layered structure, and contact surface of electronic component and layered structure geometrically fit to each other, where thickness of layer is ten micrometers
10/28/2010DE102009018434A1 Aufnahmeeinrichtung zur Aufnahme von Halbleitersubstraten Receiving means for receiving semiconductor substrates
10/28/2010DE102009002519A1 Gekapselte Schaltungsvorrichtung für Substrate mit Absorptionsschicht sowie Verfahren zu Herstellung derselben Encapsulated circuit device for substrates with absorption layer and process for producing the same
10/28/2010DE102008060862B4 Verfahren zur miniaturisierbaren Kontaktierung isolierter Drähte A method for contacting miniaturisable insulated wires
10/28/2010DE102008038170B4 Verfahren zum Fertigen einer rippenförmigen Halbleiterstruktur sowie zum Fertigen eines Halbleiterbauelements A method of manufacturing a fin-shaped semiconductor structure, as well as for fabricating a semiconductor device
10/28/2010DE102007052097B4 Verfahren zur Herstellung eines SOI-Bauelements mit einer Substratdiode A method for manufacturing an SOI device having a body diode
10/28/2010DE102007049923B4 Photomasken-Layoutmuster Photomask layout pattern
10/28/2010DE102007034801B4 BiMOS-Halbleiterbauelement mit Herstellverfahren mit Bipolarintegration ohne zusätzliche Maskenschritte BiMOS semiconductor device manufacturing method with Bipolarintegration with no additional mask steps
10/28/2010DE102006019921B4 Verfahren zur Herstellung des Transistors mit eingebetteter Schicht mit Zugverformung mit geringem Abstand zu der Gateelektrode Process for the preparation of the transistor with embedded layer with tensile strain at a small distance to the gate electrode
10/28/2010DE102005037986B4 Verfahren zur Herstellung eines nicht-flüchtigen Speicherbausteins A process for producing a non-volatile memory device
10/28/2010DE102004042156B4 Transistor mit asymmetrischem Source/Drain- und Halo- Implantationsgebiet und Verfahren zum Herstellen desselben Of the same transistor with an asymmetrical source / drain and halo implant region and process for producing
10/28/2010DE102004027152B4 Verfahren zum Herstellen einer Flüssigkristallanzeigevorrichtung, welche Dünnschichttransistoren mit polykristallinem Silizium aufweist A method of manufacturing a liquid crystal display device which has thin film transistors with polycrystalline silicon
10/28/2010DE10049831B4 Photoresist-Strippermittel und Verfahren zum Strippen von Photoresistaufträgen unter Verwendung des Mittels Photoresist stripper means and methods for stripping photoresist orders using the agent
10/27/2010EP2244384A2 PLD architecture for flexible placement of IP function blocks
10/27/2010EP2244306A1 A memory cell, an array, and a method for manufacturing a memory cell
10/27/2010EP2244305A1 Semiconductor device manufacturing method
10/27/2010EP2244304A1 Semiconductor device and fabrication method thereof
10/27/2010EP2244303A1 Semiconductor device and method for manufacturing the same
10/27/2010EP2244302A1 Method for forming film for organic semiconductor layer and method for manufacturing organic thin film transistor
10/27/2010EP2244300A2 Semiconductor device having a buried insulating layer and method of manufacturing the same
10/27/2010EP2244299A1 MOS transistor for power applications and corresponding integrated circuit and manufacturing method
10/27/2010EP2244298A2 Semiconductor device and manufacturing method thereof
10/27/2010EP2244288A1 Semiconductor element module and method for manufacturing the same
10/27/2010EP2244287A2 A pre-treatment method to increase copper island density and to improve adhesion for Cu on barrier layers
10/27/2010EP2244286A2 Method for producing semiconductor substrate
10/27/2010EP2244285A1 Method to form solder deposits on substrates
10/27/2010EP2244284A2 Schottky diode with improved high current behaviour and method for its production.
10/27/2010EP2244283A1 Cleaning composition and method for cleaning substrate for electronic device
10/27/2010EP2244282A1 Illumination optical system, exposure device, device manufacturing method, correction filter, and exposure optical system
10/27/2010EP2244281A1 Curable composition for nanoimprint and pattern-forming method
10/27/2010EP2244280A1 Method for treatment of surface of soi substrate
10/27/2010EP2244279A2 Multi-stage optical homogenization
10/27/2010EP2244127A1 Fine pattern mask, method for producing the same, and method for forming fine pattern using the mask
10/27/2010EP2243158A2 Isolated cmos and bipolar transistors, isolation structures therefor and methods of fabricating the same
10/27/2010EP2243156A2 Methods and apparatuses for large diameter wafer handling
10/27/2010EP2243155A1 Noble metal cap for interconnect structures
10/27/2010EP2243154A1 Devices including fin transistors robust to gate shorts and methods of making the same
10/27/2010EP2243153A2 Zone melt recrystallization for inorganic films
10/27/2010EP2243152A2 Hybrid silicon laser-quantum well intermixing wafer bonded integration platform for advanced photonic circuits with electroabsorption modulators
10/27/2010EP2242870A1 New metal precursors containing beta-diketiminato ligands
10/27/2010EP2158605B1 Method for producing a set of chips mechanically interconnected by means of a flexible connection
10/27/2010EP1602745B1 Hafnium alloy target and process for producing the same
10/27/2010EP1579499B1 Method of self-assembling electronic circuitry and circuits formed thereby
10/27/2010EP1356513B1 Molding of protective caps
10/27/2010EP1160860B1 Heat sink material and manufacturing method thereof
10/27/2010CN201616434U 一种有机发光器件的薄膜封装结构 An organic thin film light-emitting device package structure of
10/27/2010CN201616426U 一种探针台 One probe station
10/27/2010CN201616425U 用于成型部件嵌入式拼装的半导体封装模具 Molded parts for the embedded semiconductor packaging mold assembly
10/27/2010CN201616424U 高电压器件封装模具中转进板的平衡装置 High voltage devices transit into packaging mold plate balancing device
10/27/2010CN201614409U 腔门固定结构及具有该结构的密封腔体机构 Chamber door with a fixed structure and organization of the seal cavity structure
10/27/2010CN1971901B Semiconductor device and its production method
10/27/2010CN1957461B Semiconductor device and method of manufacturing such a device
10/27/2010CN1950542B Yield improvement in silicon-germanium epitaxial growth
10/27/2010CN1950473B Insulating film forming composition, preparing method thereof, silica dioxide insulating film and preparing method thereof
10/27/2010CN1933205B Semiconductor substrate growing method, nitride-based light emitting device and method of manufacturing the same
10/27/2010CN1905233B Thin film transistor substrate and method of making the same
10/27/2010CN1904016B Composition for removal of residue comprising cationic salts and methods using same
10/27/2010CN1901161B Method for fabricating a circuitry component by continuous electroplating and circuitry component structure
10/27/2010CN1878888B Controlled vapor deposition of multilayered coatings adhered by an oxide layer
10/27/2010CN1870316B Organic thin film transistor (OTFT), its method of fabrication, and flat panel display including OTFT
10/27/2010CN1842909B Semiconductor device with nanoclusters
10/27/2010CN1841677B Schottky diode and method of manufacture
10/27/2010CN1826206B Focusing an optical beam to two focuses
10/27/2010CN1815628B Method and circuit for configuring programmable device
10/27/2010CN1789110B Wafer bonding of micro-electro mechanical systems to active circuitry
10/27/2010CN1741712B Method of forming wiring pattern and method of forming gate electrode for TFT
10/27/2010CN1735794B Apparatus and process for measuring ultraviolet (UV) light intensities
10/27/2010CN1724626B Composition for removing photoresist and/or etching residue from a substrate and use thereof
10/27/2010CN1717965B Method for mounting electronic component
10/27/2010CN1717802B Semiconductor device having a bond pad and method for its fabrication
10/27/2010CN1716539B Doping device
10/27/2010CN1662852B Multi-tiered lithographic template
10/27/2010CN1655056B Optic mask and manufacturing method of thin film transistor array panel using the same
10/27/2010CN1612051B Lithographic apparatus and device manufacturing method
10/27/2010CN1606155B Pipe core with pillar structures and manufacturing method thereof
10/27/2010CN1581504B Cell structure for bipolar integrated circuits and method
10/27/2010CN1572911B Apparatus and method for plating a substrate
10/27/2010CN1551332B Programmable logic devices with silicon-germanium circuitry and associated methods
10/27/2010CN101874339A Slide stage, and slide stage movable in x- and y-directions
10/27/2010CN101874309A Nitride semiconductor optical device, epitaxial wafer for nitride semiconductor optical device, and method for manufacturing semiconductor light-emitting device
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