Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
11/2010
11/04/2010US20100276709 Method for manufacturing compound semiconductor substrate, compound semiconductor substrate and light emitting device
11/04/2010US20100276706 Method for the Production of a Plurality of Optoelectronic Components, and Optoelectronic Component
11/04/2010US20100276701 Low thermal resistance and robust chip-scale-package (csp), structure and method
11/04/2010US20100276698 Gate electrodes for millimeter-wave operation and methods of fabrication
11/04/2010US20100276697 Semiconductor device
11/04/2010US20100276695 Display device and manufacturing method thereof
11/04/2010US20100276691 Method for fabricating flexible semiconductor device and layered film used therefore
11/04/2010US20100276690 Silicon Wafer Having Testing Pad(s) and Method for Testing The Same
11/04/2010US20100276688 Oxide semiconductor field effect transistor and method for manufacturing the same
11/04/2010US20100276686 Thin film transistor substrate and method of fabricating the same
11/04/2010US20100276684 Rectifier and Process for Producing the Rectifier
11/04/2010US20100276669 Electric nanodevice and method of manufacturing same
11/04/2010US20100276667 Nonvolatile memory electronic device including nanowire channel and nanoparticle-floating gate nodes and a method for fabricating the same
11/04/2010US20100276666 Controlled quantum dot growth
11/04/2010US20100276665 Production of semiconductor devices
11/04/2010US20100276664 Thin-walled structures
11/04/2010US20100276662 Junctionless metal-oxide-semiconductor transistor
11/04/2010US20100276657 Multilayer structure comprising a phase change material layer and method of producing the same
11/04/2010US20100276656 Devices Comprising Carbon Nanotubes, And Methods Of Forming Devices Comprising Carbon Nanotubes
11/04/2010US20100276590 Microengineered Vacuum Interface for an Ionization System
11/04/2010US20100276394 MICROFEATURE WORKPIECE PROCESSING SYSTEM FOR, e.g., SEMICONDUCTOR WAFER ANALYSIS
11/04/2010US20100276393 Plasma processing apparatus and method
11/04/2010US20100276392 Cmp system utilizing halogen adduct
11/04/2010US20100276003 Layered film and manufacturing method thereof, photoelectric conversion device and manufacturing method thereof, and solar cell apparatus
11/04/2010US20100275997 Conductive compositions and processes for use in the manufacture of semiconductor devices: mg-containing additive
11/04/2010US20100275995 Bifacial solar cells with back surface reflector
11/04/2010US20100275990 Photoelectric conversion device and manufacturing method thereof
11/04/2010US20100275989 Semiconductor device and manufacturing method thereof
11/04/2010US20100275969 Assembly techniques for solar cell arrays and solar cells formed therefrom
11/04/2010US20100275965 Solar cell and method of manufacturing the same
11/04/2010US20100275846 Plasma processing method, plasma processing apparatus, and computer recording medium
11/04/2010DE19680529B4 Verfahren zur Herstellung von Hochdruck-Silicium-oxynitrid (Oxynitrid)-Gate-Dielektrika für Metalloxid Halbleiter (MOS)-Vorrichtungen mit polykristallinen P+-Silicium (Polysilicium)-Gate-Elektroden A process for producing high-pressure silicon oxynitride (oxynitride) gate dielectrics for metal oxide semiconductor (MOS) devices with P + polycrystalline-silicon (polysilicon) gate electrode
11/04/2010DE112009000159T5 Hochreines Hochtemperaturventil High purity high temperature valve
11/04/2010DE112008003510T5 Im Mikro- und/oder Nanobereich liegende Neuromorphe integrierte Hybridschaltung In the micro- and / or nano-scale lying Neuromorphic hybrid integrated circuit
11/04/2010DE112008002790T5 Drahtsägevorrichtung A wire saw
11/04/2010DE112008002677T5 FET hoher Dichte mit integriertem Schottky FET high-density integrated Schottky
11/04/2010DE112008002628T5 Polierzusammensetzung Polishing composition
11/04/2010DE112008002423T5 Ladungsausgleich in der Aktivfläche und Kantenabschlussfläche eines MOSFETs Charge balance in the active area and edge termination area of ​​a MOSFET
11/04/2010DE102010018423A1 Verfahren zum chemisch-mechanischen Polieren eines Substrats A method for chemical mechanical polishing of a substrate
11/04/2010DE102009056310A1 Verfahren zur Herstellung einer Siliciumcarbid-Halbleitervorrichtung und Siliciumcarbid-Halbleitervorrichtung A process for producing a silicon carbide semiconductor device and the silicon carbide semiconductor device
11/04/2010DE102009018977A1 Vorrichtung zur Ausrichtung und Vorfixierung eines Wafers Apparatus for alignment and prefixing a wafer
11/04/2010DE102009018971A1 Konstruktion einer Schottkydiode mit verbessertem Hochstromverhalten und Verfahren zu deren Herstellung Construction of a Schottky diode with improved high-current behavior and process for their preparation
11/04/2010DE102009000883B4 Substrat zur Aufnahme mindestens eines Bauelements und Verfahren zur Herstellung eines Substrats Substrate for receiving at least one device and process for the preparation of a substrate
11/04/2010DE102008048651B4 Verfahren zur Herstellung eines Halbleiterbauelements mit zwei Kondensatoren A process for producing a semiconductor device with two capacitors
11/04/2010DE102007055017B4 Verfahren zum Verbinden zweier Fügeflächen und Bauteil mit zwei verbundenen Fügeflächen A method for joining two joining surfaces and components associated with two joining surfaces
11/04/2010DE102005048380B4 Vorrichtung zum Belichten eines Substrats, Photomaske und modifiziertes Beleuchtungssystem der Vorrichtung und Verfahren zum Bilden eines Musters an einem Substrat unter Verwendung der Vorrichtung An apparatus for exposing a substrate, photomask and modified illumination system of the apparatus and method for forming a pattern on a substrate using the apparatus
11/04/2010CA2751823A1 Lateral junction field-effect transistor
11/04/2010CA2750215A1 Threshold voltage adjustment through gate dielectric stack modification
11/03/2010WO2010026910A1 Sheet peeling apparatus and sheet peeling method
11/03/2010EP2246918A1 Laser Irradiation Apparatus and Method of Manufacturing Display Device Using the Same
11/03/2010EP2246910A1 Semiconductor substrate, semiconductor element, light emitting element and electronic element
11/03/2010EP2246895A1 Semiconductor device, and method for manufacturing the same
11/03/2010EP2246894A1 Amorphous oxide and thin film transistor
11/03/2010EP2246893A2 Semiconductor device including a MOS transistor and a production method therefor
11/03/2010EP2246892A2 Method of manufacturing quantum dots in a semiconductor device
11/03/2010EP2246883A1 Semiconductor storage device, semiconductor device having memory mounted therein, and methods for fabricating the devices
11/03/2010EP2246882A1 Method for transferring a layer from a donor substrate onto a handle substrate
11/03/2010EP2246881A2 Joining structure and a substrate-joining method using the same
11/03/2010EP2246880A1 Semiconductor device fabrication method
11/03/2010EP2246879A1 Method for manufacturing flexible semiconductor device and multilayer film used therein
11/03/2010EP2246878A1 Method for preparing soi substrate having backside sandblasted
11/03/2010EP2246877A1 Method for machining nitride semiconductor wafer, nitride semiconductor wafer, process for producing nitride semiconductor device, and nitride semiconductor device
11/03/2010EP2246876A1 Water-repellant composition for substrate to be exposed, method of forming resist pattern, electronic device produced by the formation method, method of imparting water repellency to substrate to be exposed, water-repellant set for substrate to be exposed, and method of imparting water repellency with the same to substrate to be exposed
11/03/2010EP2246875A1 Vacuum processing device, method for maintaining vacuum processing device and vacuum processing factory
11/03/2010EP2246738A1 Photomask and photomask/pellicle assembly
11/03/2010EP2246737A1 Photomask blank and photomask
11/03/2010EP2246708A1 Method for producing a defect map of individual components, in particular semiconductor components, on a carrier, in particular a semiconductor wafer
11/03/2010EP2246400A1 Circuit connecting material
11/03/2010EP2246384A1 Solution for formation of organic thin film, and method for production thereof
11/03/2010EP2246371A1 Curable resin composition for nanoimprint
11/03/2010EP2246177A1 Roller type nano-imprint device, mold roll for the roller type nano-imprint device, fixed roll for the roller type nano-imprint device, and nano-imprint sheet manufacturing method
11/03/2010EP2245912A2 Multiple phase rf power for electrode of plasma chamber
11/03/2010EP2245669A2 Solution-processed high mobility inorganic thin-film transistors
11/03/2010EP2245661A1 Multiple memory cells and method
11/03/2010EP2245659A1 Memory device with local data lines and method of making and operating the same
11/03/2010EP2245658A1 Systems and devices including fin transistors and methods of using, making, and operating the same
11/03/2010EP2245657A2 Optoelectronic semiconductor body and method for producing an optoelectronic semiconductor body
11/03/2010EP2245656A1 Automatic handling buffer for bare stocker
11/03/2010EP2245655A1 Method for patterned etching of selected material
11/03/2010EP2245512A2 On-track process for patterning hardmask by multiple dark field exposures
11/03/2010EP2245510A1 Optical component for euvl and smoothing method thereof
11/03/2010EP2245473A2 Measuring method and device for characterizing a semiconductor component
11/03/2010EP2244987A1 Single-sided high throughput wet etching and wet processing apparatus and method
11/03/2010EP2233978A8 Composition for formation of anti-reflective film, and pattern formation method using the composition
11/03/2010EP1946355B1 Integrated circuit devices with trenches having different depths
11/03/2010EP1825509B1 Method for fabricating dual stressed SOI substrates
11/03/2010EP1741130B1 Device and method for treating a substrate in the field of semiconductor technology, in addition to a system comprising a device for treating a substrate
11/03/2010EP1733424B1 A semiconductor apparatus
11/03/2010EP1614151B1 Method for forming an antireflective layer
11/03/2010EP1552529B1 Method and apparatus for erasing flash memory
11/03/2010EP1399269B1 Waveform generator for microdeposition control system
11/03/2010EP1399267B1 Microdeposition apparatus
11/03/2010EP1371092B2 Method for structuring a flat substrate consisting of a glass-type material
11/03/2010EP1365288B1 Pattern forming method using a photo mask
11/03/2010EP1354019B1 Azeotrope-like composition of 1,2-dichloro-3,3,3-trifluoropropene and hydrogen fluoride
11/03/2010EP1303883B1 Semiconductor arrangement with buried island and contact regions
11/03/2010EP1223613B1 Electrode structure for semiconductor device, manufacturing method and apparatus for the same
11/03/2010EP1114355B1 Method and apparatus for developing photoresist patterns
11/03/2010EP0985007B2 Oxygen-containing phosphor powders, methods for making phosphor powders and devices incorporating same
11/03/2010CN201623016U Clamp and sample box with the same
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