Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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08/17/2011 | CN102157448A Method of forming a semiconductor die |
08/17/2011 | CN102157447A Method for dicing a semiconductor wafer, a chip diced from a semiconductor wafer, and an array of chips diced from a semiconductor wafer |
08/17/2011 | CN102157446A Method for processing wafer |
08/17/2011 | CN102157445A Method for increasing connection strength of integrated circuit package |
08/17/2011 | CN102157444A Manufacturing method of organic electroluminescence element and image display system |
08/17/2011 | CN102157443A Manufacturing method of protection circuit for array unit of image sensor |
08/17/2011 | CN102157442A Method for forming interconnection among microelectronic chips |
08/17/2011 | CN102157441A Method for manufacturing composite covering layer |
08/17/2011 | CN102157440A Method for producing a multifunctional dielectric layer on a substrate |
08/17/2011 | CN102157439A Ultra-low dielectric constant material film and preparation method thereof |
08/17/2011 | CN102157438A Method for manufacturing wafer-level patch panel |
08/17/2011 | CN102157437A Method for forming semiconductor structure |
08/17/2011 | CN102157436A Copper electroplating method capable of reducing metal damage |
08/17/2011 | CN102157435A Contact hole forming method |
08/17/2011 | CN102157434A Method for manufacturing SOI (silicon on insulator) LIGBT (lateral insulated gate bipolar transistor) device unit with p buried layer and longitudinal channel |
08/17/2011 | CN102157433A Manufacturing method of VC SOI nLDMOS (Vertical Channel Silicon-on-insulator n Lateral Double-diffused Metal Oxide Semiconductor) device unit with p-type buried layer |
08/17/2011 | CN102157432A GeOI structure and formation method thereof |
08/17/2011 | CN102157431A Semiconductor device and manufacturing method thereof |
08/17/2011 | CN102157430A Method of forming shallow trench isolation structure |
08/17/2011 | CN102157429A Manufacturing method of shallow trench isolation structure |
08/17/2011 | CN102157428A Method for forming shallow trench isolation (STI) structure |
08/17/2011 | CN102157427A Table structure, and processing apparatus |
08/17/2011 | CN102157426A Wafer support device and wafer processing process |
08/17/2011 | CN102157425A Ring assembly for substrate processing chamber |
08/17/2011 | CN102157424A Substrate conveying apparatus and substrate conveying method |
08/17/2011 | CN102157423A Substrate mounting table and method for manufacturing the same, and substrate processing apparatus |
08/17/2011 | CN102157422A Winding core and wafer-processing belt wound on same |
08/17/2011 | CN102157421A Silicon wafer prealignment device and prealignment method |
08/17/2011 | CN102157420A Vacuum treating apparatus, method of operating the same and recording medium |
08/17/2011 | CN102157419A Push rod device for discharging of chip loader |
08/17/2011 | CN102157418A Automation for high throughput semiconductor batch-wafer processing equipment |
08/17/2011 | CN102157417A Silicon slice transmission robot |
08/17/2011 | CN102157416A Automatic detection method of dry etching silicon slice |
08/17/2011 | CN102157415A Method for testing wafer parameters of bare chips |
08/17/2011 | CN102157414A Process monitoring method and device for channel MOS devices |
08/17/2011 | CN102157413A On-line measuring device for frictional force generated during polishing of small-sized wafer |
08/17/2011 | CN102157412A Optical emission spectrum signal-based method for detecting fault of plasma etching process |
08/17/2011 | CN102157411A Structure and method for measuring electric property change of MOSFET (metal-oxide-semiconductor field effect transistor) device |
08/17/2011 | CN102157410A Device and method for substrate analysis |
08/17/2011 | CN102157409A Bonder |
08/17/2011 | CN102157408A Through hole-interconnected wafer level MOSFET packaging structure and realization method |
08/17/2011 | CN102157407A Use method of adhesive for circuit member connection |
08/17/2011 | CN102157406A Method for bonding chip with resin substrate through ultrasonic vibration |
08/17/2011 | CN102157405A Melting sealing cap-sealing process-based chip vacuum eutectic welding method |
08/17/2011 | CN102157404A Method for manufacturing semiconductor device |
08/17/2011 | CN102157403A Multiple chip ball mounting device and method |
08/17/2011 | CN102157402A System-in-package method |
08/17/2011 | CN102157401A High-density SIP (system in package) method of chip |
08/17/2011 | CN102157400A Method for encapsulating high-integration wafer fan-out |
08/17/2011 | CN102157399A Automatic charging system of semiconductor packaging equipment |
08/17/2011 | CN102157398A Resin seal device for metal die |
08/17/2011 | CN102157397A Method of forming an em protected semiconductor die |
08/17/2011 | CN102157396A Apparatus and method for embedding components in small-form-factor, system-on-packages |
08/17/2011 | CN102157395A Electronic tag volume winding process and device thereof |
08/17/2011 | CN102157394A High-density system-in-a-package method |
08/17/2011 | CN102157393A Fan-out high-density packaging method |
08/17/2011 | CN102157392A Method for encapsulating low-cost chip fan-out structures |
08/17/2011 | CN102157391A Semiconductor device and method of forming thin profile wlcsp with vertical interconnect over package footprint |
08/17/2011 | CN102157390A Machine station and method for automatically removing defective semiconductor packaged products |
08/17/2011 | CN102157389A Method for assembling radio-frequency power field effect transistor |
08/17/2011 | CN102157388A Apparatus and method for manufacturing substrate |
08/17/2011 | CN102157387A Thin film transistor and manufacture method thereof |
08/17/2011 | CN102157386A Manufacturing method of TFT (Thin Film Transistor) |
08/17/2011 | CN102157385A LDMOS (Lateral Double-diffused Metal Oxide Semiconductor) device and manufacturing method thereof |
08/17/2011 | CN102157384A Method for manufacturing transistor |
08/17/2011 | CN102157383A Manufacturing method of SOI (Silicon On Insulator) nLDMOS (n Laterally Diffused Metal Oxide Semiconductor) device unit with P buried layer |
08/17/2011 | CN102157382A Hyperconjugation forming method |
08/17/2011 | CN102157381A Method of manufacturing semiconductor device |
08/17/2011 | CN102157380A Methods of manufacturing semiconductor devices |
08/17/2011 | CN102157379A High-performance semiconductor device and manufacturing method thereof |
08/17/2011 | CN102157378A Semiconductor device manufacturing method |
08/17/2011 | CN102157377A Super-junction VDMOS (Vertical Double-diffused Metal Oxide Semiconductor) device and manufacturing method thereof |
08/17/2011 | CN102157376A Glass passivation process for diode |
08/17/2011 | CN102157375A Dual wavelength thermal flux laser anneal |
08/17/2011 | CN102157374A Method for manufacturing trapezoid field oxide layer |
08/17/2011 | CN102157373A Method for planing semiconductor structure |
08/17/2011 | CN102157372A Plasma processing apparatus and method |
08/17/2011 | CN102157371A Method for producing monocrystalline silicon nanometer structure |
08/17/2011 | CN102157370A Cleaning method and method for manufacturing electronic device |
08/17/2011 | CN102157369A Reduced twisting in ultra-high aspect ratio dielectric etch |
08/17/2011 | CN102157368A Method for removing residues after chemical mechanical polishing |
08/17/2011 | CN102157367A Optical device wafer processing method |
08/17/2011 | CN102157366A Method for reducing warping degree of thinned wafer |
08/17/2011 | CN102157365A Method for thinning a wafer |
08/17/2011 | CN102157364A Scribe-line draining during wet-bench etch and clean processes |
08/17/2011 | CN102157363A Ion implantation method of substrate back of power device |
08/17/2011 | CN102157362A Metal gate electrode using silicidation and method of formation thereof |
08/17/2011 | CN102157361A Method for preparing semiconductor T-shaped gate electrode by utilizing photon beam super-diffraction technology |
08/17/2011 | CN102157360A Method for manufacturing gate |
08/17/2011 | CN102157359A Method for manufacturing 6-inch POWERMOS transistor epitaxial layer |
08/17/2011 | CN102157358A Method for synthesizing carbon nano tube and zinc oxide heterostructure by hydrothermal method |
08/17/2011 | CN102157357A Method for cleaning semiconductor silicon wafer |
08/17/2011 | CN102157356A Method for preparing lower electrode of metal-insulator-metal semiconductor device |
08/17/2011 | CN102157355A Method of cleaning and micro-etching semiconductor wafers |
08/17/2011 | CN102157354A Method for preparing polymer-sylvine composite material with high dielectric constant |
08/17/2011 | CN102157353A Method for preparing diamond substrate for high-heat-conductivity integrated circuit |
08/17/2011 | CN102157352A Wet etching method and device for micro-nano structure |
08/17/2011 | CN102157351A Chip pickup and placement control method |
08/17/2011 | CN102157350A Manufacturing method for semiconductor device |
08/17/2011 | CN102157349A Method of manufacyuring semiconductor device |