H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
08/2011
08/17/2011	CN102157348A Flattening mechanism of wafer film laminator
08/17/2011	CN102157347A High-yield laser heat treatment device and method
08/17/2011	CN102157346A Method for demoulding chip
08/17/2011	CN102157345A Plasma reactor and etching method using the same
08/17/2011	CN102157344A Heating-stage scanner for deep ultraviolet laser annealing
08/17/2011	CN102157343A Laser annealing device and method using trapezoidal beam spot for scanning
08/17/2011	CN102157342A Device and method for rotating chip
08/17/2011	CN102157325A Plasma processing apparatus and plasma processing method
08/17/2011	CN102156900A Wireless communication device for remote authenticity verification of semiconductor chips, multi-chip modules and derivative products
08/17/2011	CN102156388A Object with an improved suitability for a plasma cleaning treatment
08/17/2011	CN102156372A Electrophoretic display device and method for fabricating the same
08/17/2011	CN102156369A Thin film transistor liquid crystal display (TFT-LCD) array substrate and manufacturing method thereof
08/17/2011	CN102156368A Thin film transistor liquid crystal display (TFT-LCD) array substrate and manufacturing method thereof
08/17/2011	CN102156365A Liquid crystal display device and method for manufacturing the same and method for repairing the same
08/17/2011	CN102156360A Flexible display device and manufacturing method thereof
08/17/2011	CN102154704A Nitride semiconductor crystal, manufacturing method of the nitride semiconductor freestanding substrate and nitride semiconductor device
08/17/2011	CN102154650A Thick aluminum etching method during producing bipolar integrated circuit
08/17/2011	CN102154648A Etching method
08/17/2011	CN102154631A Gas gate for isolating regions of differing gaseous pressure
08/17/2011	CN102154626A Surface treatment method for measuring diffusion length of silicon wafer
08/17/2011	CN102154624A Reactor, chemical vapor deposition reactor and metal organic chemical vapor deposition reactor
08/17/2011	CN102154623A An active viewport detection assembly for substrate detection in a vapor deposition system
08/17/2011	CN102153990A Polishing liquid composition
08/17/2011	CN102153964A Adhesive composition, circuit connecting material and connecting structure of circuit member
08/17/2011	CN102153961A Film for flip chip type semiconductor back surface
08/17/2011	CN102153960A Film for flip chip type semiconductor back surface
08/17/2011	CN102153951A Coating composition containing polysilazane
08/17/2011	CN102153695A Photosensitive compositions
08/17/2011	CN102153367A Carbon nano tube dispersion liquid, manufacturing method of thin layer and display panel of the same
08/17/2011	CN102152966A Substrate-levitating device
08/17/2011	CN102152414A Substrate separation device
08/17/2011	CN102152413A Wafer processing method
08/17/2011	CN102152297A Series type R-shaft expanding mechanical arm
08/17/2011	CN102152233A Polishing pad
08/17/2011	CN102152232A Polishing pad and method for producing the same
08/17/2011	CN102152227A Auxiliary plate for grinding pad and regeneration method for grinding pad employing same
08/17/2011	CN102152206A Polishing apparatus, polishing method and pressing member for pressing a polishing tool
08/17/2011	CN102151986A Laser processing device
08/17/2011	CN102151985A Laser processing method
08/17/2011	CN102151927A Welding method for welding columns of encapsulated integrated circuit (IC)
08/17/2011	CN101853852B Groove MOS (Metal Oxide Semiconductor) device integrating Schottky diodes in unit cell and manufacture method
08/17/2011	CN101814434B Method for manufacturing nitrogen face polar AlN/AlInN composite back barrier gallium nitride field effect transistor
08/17/2011	CN101789414B Ultrathin semiconductor chip packaging structure and manufacturing process thereof
08/17/2011	CN101777542B Chip packaging structure and packaging method
08/17/2011	CN101772842B Semiconductor device, method for manufacturing the same and image display
08/17/2011	CN101770968B Inflation valve and chip box configured with same
08/17/2011	CN101770933B Plasma process equipment and gas distribution device thereof
08/17/2011	CN101764053B Photoetching method
08/17/2011	CN101752290B Method for making shallow groove insolation structure
08/17/2011	CN101752277B System-in-a-package method and structure thereof
08/17/2011	CN101752228B Photolithography
08/17/2011	CN101740574B Read only memory and manufacturing method thereof
08/17/2011	CN101740449B Vortex flow silicon slice holder
08/17/2011	CN101740421B Wafer and manufacturing method, system-level package structure and package method thereof
08/17/2011	CN101740391B Fabricating method of NMOS (N-channel Metal Oxide Semiconductor)
08/17/2011	CN101730931B Edge ring arrangements for substrate processing
08/17/2011	CN101728331B Method for preventing punch through voltage between bit lines from decreasing and semiconductor memory
08/17/2011	CN101728226B Segregation apparatus and segregation method
08/17/2011	CN101714532B Package and fabricating method thereof
08/17/2011	CN101697350B Multi-point silicon transistor with double ultra sallow isolation structures
08/17/2011	CN101689514B Method for packaging semiconductor
08/17/2011	CN101689508B Method for forming a dual metal gate structure
08/17/2011	CN101681870B Dynamic temperature backside gas control for improved within-substrate processing uniformity
08/17/2011	CN101675501B Method of fabricating a transistor with semiconductor gate combined locally with a metal
08/17/2011	CN101673789B Light emitting diode package substrate structure, manufacturing method thereof and packaging structure thereof
08/17/2011	CN101673740B Semiconductor device and manufacturing method thereof
08/17/2011	CN101673663B Device for cleaning wafer
08/17/2011	CN101667624B Field-effect transistor
08/17/2011	CN101665918B Film forming method and film forming apparatus
08/17/2011	CN101660143B Flat heater and plasma processing equipment
08/17/2011	CN101652850B Tool for transferring semiconductor device
08/17/2011	CN101651084B Electrostatic chuck supply current sampling device, method and plasma device
08/17/2011	CN101645393B Substrate processing apparatus, heating device, and semiconductor device manufacturing method
08/17/2011	CN101641773B Adhesive film for semiconductor and semiconductor device made with the same
08/17/2011	CN101625990B Method for removing microgrooves in etching clearance wall
08/17/2011	CN101621036B Semiconductor device with amorphous silicon MAS memory cell structure and method for manufacturing same
08/17/2011	CN101621035B Amorphous silicon MONOS or MAS memory cell structure with OTP function
08/17/2011	CN101620991B Growth of atomic layer deposition epitaxial silicon of TFT flash memory cell
08/17/2011	CN101620347B Silicon-based liquid crystal device and manufacturing method thereof
08/17/2011	CN101617395B Thermosetting die bonding film
08/17/2011	CN101593677B Method for etching an object to be processed
08/17/2011	CN101587825B Plasma processing apparatus and plasma processing method
08/17/2011	CN101573782B Semiconductor layer manufacturing method, semiconductor layer manufacturing apparatus and semiconductor device manufactured by using such method and apparatus
08/17/2011	CN101572236B Semiconductor device and method for forming same
08/17/2011	CN101572223B Substrate proximity processing structures and methods for using and making the same
08/17/2011	CN101567334B Method to fabricate an ESD resistant tunneling magnetoresistive read transducer
08/17/2011	CN101553909B Sealing material and mounting method using the sealing material
08/17/2011	CN101553905B Semiconductor fabrication process including silicide stringer removal processing
08/17/2011	CN101553900B Plasma confinement rings including RF absorbing material for reducing polymer deposition
08/17/2011	CN101542690B Aqueous dispersion for chemical mechanical polishing and method of chemical mechanical polishing of semiconductor device
08/17/2011	CN101517716B Method for forming silicon oxide film, plasma processing apparatus
08/17/2011	CN101515542B Plasma etching carbonaceous layers with sulfur-based etchants
08/17/2011	CN101501139B Silicone resin and silicone composition
08/17/2011	CN101498042B Preparation of resistance variable oxide material Co3O4 thin film
08/17/2011	CN101496158B Load lock chamber with decoupled slit valve door seal compartment
08/17/2011	CN101494182B Inspection method
08/17/2011	CN101486279B Laser marker
08/17/2011	CN101479850B Bit-erasing architecture for seek-scan probe (ssp) memory storage
08/17/2011	CN101470309B Reflection and transmission type LCD and its fabrication method
08/17/2011	CN101459175B Semiconductor device and method of fabricating the same

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