Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
02/2012
02/28/2012US8125756 Electrostatic holding apparatus, vacuum environmental apparatus using it and joining apparatus
02/28/2012US8125261 Multi-power source semiconductor device
02/28/2012US8125247 Complementary spin transistor logic circuit
02/28/2012US8125091 Wire bonding over active circuits
02/28/2012US8125085 Semiconductor device having wiring with oxide layer of impurity from the wiring
02/28/2012US8125082 Reduction of silicide formation temperature on SiGe containing substrates
02/28/2012US8125079 Molded semiconductor device, apparatus for producing the same, and method for manufacturing the same
02/28/2012US8125065 Elimination of RDL using tape base flip chip on flex for die stacking
02/28/2012US8125054 Semiconductor device having enhanced scribe and method for fabrication
02/28/2012US8125051 Device layout for gate last process
02/28/2012US8125046 Micro-electromechanical system devices
02/28/2012US8125044 Semiconductor structure having a unidirectional and a bidirectional device and method of manufacture
02/28/2012US8125039 One-time programmable, non-volatile field effect devices and methods of making same
02/28/2012US8125038 Nanolaminates of hafnium oxide and zirconium oxide
02/28/2012US8125036 Integrated circuit having an edge passivation and oxidation resistant layer and method
02/28/2012US8125033 Polycrystalline silicon layer, flat panel display using the same, and method of fabricating the same
02/28/2012US8125032 Modified hybrid orientation technology
02/28/2012US8125026 Gate of trench type MOSFET device and method for forming the gate
02/28/2012US8125022 Semiconductor device and method of manufacturing the same
02/28/2012US8125017 Semiconductor integrated circuit device with reduced leakage current
02/28/2012US8125016 Semiconductor device and its manufacturing method
02/28/2012US8125012 Non-volatile memory device with a silicon nitride charge holding film having an excess of silicon
02/28/2012US8125003 High-performance one-transistor memory cell
02/28/2012US8124994 Electrical current distribution in light emitting devices
02/28/2012US8124980 Display device
02/28/2012US8124973 Electronic appliance including transistor having LDD region
02/28/2012US8124970 Phase change memory device having buried conduction lines directly underneath phase change memory cells and fabrication method thereof
02/28/2012US8124963 Thin film transistor, method of fabricating the thin film transistor, organic light emitting diode display device, method of fabricating the organic light emitting diode display device, and donor substrate for laser induced thermal imaging
02/28/2012US8124961 Single electron transistor
02/28/2012US8124958 Method of fabricating semiconductor devices on a group IV substrate with controlled interface properties and diffusion tails
02/28/2012US8124916 Thermal processing of silicon wafers
02/28/2012US8124545 Methods of etching oxide, reducing roughness, and forming capacitor constructions
02/28/2012US8124544 Method for manufacturing semiconductor device
02/28/2012US8124543 Method for manufacturing semiconductor laser diode
02/28/2012US8124542 Method of fabricating semiconductor device
02/28/2012US8124541 Etchant gas and a method for removing material from a late transition metal structure
02/28/2012US8124540 Hardmask trim method
02/28/2012US8124539 Plasma processing apparatus, focus ring, and susceptor
02/28/2012US8124538 Selective etch of high-k dielectric material
02/28/2012US8124537 Method for etching integrated circuit structure
02/28/2012US8124536 Manufacturing method of capacitor electrode, manufacturing system of capacitor electrode, and storage medium
02/28/2012US8124535 Method of fabricating solar cell
02/28/2012US8124534 Multiple exposure and single etch integration method
02/28/2012US8124533 Method of manufacturing power semiconductor device
02/28/2012US8124532 Semiconductor device comprising a copper alloy as a barrier layer in a copper metallization layer
02/28/2012US8124531 Depositing tungsten into high aspect ratio features
02/28/2012US8124530 Method of preventing generation of arc during rapid annealing by joule heating
02/28/2012US8124529 Semiconductor device fabricated using a metal microstructure control process
02/28/2012US8124528 Method for forming a ruthenium film
02/28/2012US8124527 CMP process flow for MEMS
02/28/2012US8124526 Methods of forming a thin ferroelectric layer and methods of manufacturing a semiconductor device including the same
02/28/2012US8124525 Method of forming self-aligned local interconnect and structure formed thereby
02/28/2012US8124524 Methods of forming metal interconnection structures
02/28/2012US8124523 Fabrication method of a semiconductor device and a semiconductor device
02/28/2012US8124522 Reducing UV and dielectric diffusion barrier interaction through the modulation of optical properties
02/28/2012US8124521 Electrical through contact
02/28/2012US8124520 Integrated circuit mount system with solder mask pad
02/28/2012US8124519 Apparatus and method for bonding silicon wafer to conductive substrate
02/28/2012US8124518 Semiconductor heterostructure nanowire devices
02/28/2012US8124517 Method of forming an interconnect joint
02/28/2012US8124516 Trilayer resist organic layer etch
02/28/2012US8124515 Gate etch optimization through silicon dopant profile change
02/28/2012US8124514 Nonvolatile semiconductor storage device and method for manufacturing same
02/28/2012US8124512 Methods of forming integrated circuit devices having different gate electrode cross sections
02/28/2012US8124511 Method of manufacturing a semiconductor device having reduced N/P or P/N junction crystal disorder
02/28/2012US8124510 Method of manufacturing a silicon carbide semiconductor device
02/28/2012US8124509 Method of forming porous diamond films for semiconductor applications
02/28/2012US8124508 Method for low temperature ion implantation
02/28/2012US8124507 Semiconductor device and method for fabricating the same
02/28/2012US8124506 USJ techniques with helium-treated substrates
02/28/2012US8124505 Two stage plasma etching method for enhancement mode GaN HFET
02/28/2012US8124504 Method for growth of GaN single crystal, method for preparation of GaN substrate, process for producing GaN-based element, and GaN-based element
02/28/2012US8124503 Carbon nanotube diameter selection by pretreatment of metal catalysts on surfaces
02/28/2012US8124502 Semiconductor device manufacturing method, semiconductor device and semiconductor device manufacturing installation
02/28/2012US8124501 Method of producing semiconductor wafer
02/28/2012US8124500 Laser processing method
02/28/2012US8124499 Method and structure for thick layer transfer using a linear accelerator
02/28/2012US8124498 Method of manufacturing group III nitride semiconductor layer bonded substrate
02/28/2012US8124497 Method of manufacturing nitride semiconductor device
02/28/2012US8124495 Semiconductor device having enhanced photo sensitivity and method for manufacture thereof
02/28/2012US8124494 Method for reshaping silicon surfaces with shallow trench isolation
02/28/2012US8124493 Method of manufacturing a semiconductor device having an electrode exposed through a hole
02/28/2012US8124492 Semiconductor device manufacturing method
02/28/2012US8124491 Container capacitor structure and method of formation thereof
02/28/2012US8124490 Semiconductor device and method of forming passive devices
02/28/2012US8124489 Monolithic microwave integrated circuit device and method of forming the same
02/28/2012US8124488 Method of fabricating memory
02/28/2012US8124487 Method for enhancing tensile stress and source/drain activation using Si:C
02/28/2012US8124486 Method to enhance channel stress in CMOS processes
02/28/2012US8124485 Molecular spacer layer for semiconductor oxide surface and high-K dielectric stack
02/28/2012US8124484 Forming a MOS memory device having a dielectric film laminate as a charge accumulation region
02/28/2012US8124483 Semiconductor devices and methods of manufacture thereof
02/28/2012US8124482 MOS transistor with gate trench adjacent to drain extension field insulation
02/28/2012US8124481 Semiconductor device for reducing interference between adjoining gates and method for manufacturing the same
02/28/2012US8124480 Methods of fabricating silicon carbide devices incorporating multiple floating guard ring edge terminations
02/28/2012US8124479 Diffusing impurity ions into pillars to form vertical transistors
02/28/2012US8124477 Non-volatile semiconductor memory device and method for manufacturing the same
02/28/2012US8124476 Semiconductor device and method of manufacturing the same
02/28/2012US8124475 Integrated circuit arrangement with capacitor and fabrication method
02/28/2012US8124474 Method for producing electrode for electric double layer capacitor