Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
03/2012
03/14/2012CN102376586A Manufacturing method for compound ball for electronic device
03/14/2012CN102376585A Manufacturing method of circuit board
03/14/2012CN102376584A Semiconductor device and method for manufacturing the same
03/14/2012CN102376583A Manufacturing method of semiconductor device
03/14/2012CN102376582A Semiconductor device structure and method for producing same
03/14/2012CN102376581A MOS (Metal-Oxide-Semiconductor) transistor and manufacturing method thereof
03/14/2012CN102376580A Method for manufacturing super junction semiconductor device
03/14/2012CN102376579A Manufacturing method of NMOS (N-channel Metal Oxide Semiconductor) transistor
03/14/2012CN102376578A Method for implementing dual stress strain technology
03/14/2012CN102376577A Method for eliminating damage to etching barrier layer and method for implementing stress memory technology
03/14/2012CN102376576A Methods for manufacturing grid groove and semiconductor device
03/14/2012CN102376575A Forming method of metal-oxide semiconductor (MOS) transistor source drain stress area and manufacturing method of MOS transistor
03/14/2012CN102376574A Semiconductor device and manufacturing method thereof
03/14/2012CN102376573A NMOS transistor and formation method thereof
03/14/2012CN102376572A Method for producing semiconductor device
03/14/2012CN102376571A Method for manufacturing semiconductor device
03/14/2012CN102376570A Manufacturing method of N-type radio frequency lateral double-diffused metal-oxide semiconductor (LDMOS)
03/14/2012CN102376569A Manufacturing method of micrometering structure for position measurement in laser processing
03/14/2012CN102376568A Method for depositing polysilicon in deep trench of deep-trench Schottky diode wafer
03/14/2012CN102376567A Method for etching metal
03/14/2012CN102376566A Method of forming a pattern structure for a semiconductor device
03/14/2012CN102376565A Semiconductor device manufacturing method
03/14/2012CN102376564A A-si seasoning effect to improve sin run-to-run uniformity
03/14/2012CN102376563A Method of flattening a recess and fabricating a semiconductor structure
03/14/2012CN102376562A Ashing treatment method for semiconductor process
03/14/2012CN102376561A Etching method
03/14/2012CN102376560A Manufacturing method of semi-conductor device
03/14/2012CN102376559A Plasma processing method and plasma processing apparatus
03/14/2012CN102376558A Method of supplying etching gas and etching apparatus
03/14/2012CN102376557A Production method of doped polysilicon grid, MOS (Metal Oxide Semiconductor) transistor and production method thereof
03/14/2012CN102376556A Method for producing insulation layer between two electrodes
03/14/2012CN102376555A Method for improving reliability of SONOS (Silicon Oxide Nitride Oxide Semiconductor) by oxidizing ON film as tunneling dielectric medium
03/14/2012CN102376554A Manufacturing method for trench-type power semiconductor
03/14/2012CN102376553A Grid etching method
03/14/2012CN102376552A Method for preventing grid electrode from damage in ion implantation process
03/14/2012CN102376551A Manufacturing method for structure of semiconductor device and structure of semiconductor device
03/14/2012CN102376550A Multilayer film formation method and film deposition apparatus used with the method
03/14/2012CN102376549A Film forming apparatus and film forming method
03/14/2012CN102376548A Method for reducing auto-doping and external diffusion in epitaxial process
03/14/2012CN102376547A Coating device and nozzle maintenance method
03/14/2012CN102376546A Vaporizing apparatus, substrate processing apparatus, coating and developing apparatus, and substrate processing method
03/14/2012CN102376545A Method of forming fine patterns
03/14/2012CN102376544A Nondestructive surface flattening method during semiconductor integrated circuit manufacturing
03/14/2012CN102376543A Development method in semiconductor component manufacture process
03/14/2012CN102376542A Production method of fine pattern of semiconductor
03/14/2012CN102376541A Method for adjusting uniformity of critical dimensions in integrated circuit manufacture
03/14/2012CN102376540A Substrate processing method and substrate processing apparatus
03/14/2012CN102376539A Method for producing an electrical circuit and electrical circuit
03/14/2012CN102376538A Method of forming a poly silicon resistor device and semiconductor device
03/14/2012CN102376537A Method of manufacturing semiconductor devices
03/14/2012CN102376536A Method Of Manufacturing Fine Patterns
03/14/2012CN102376535A Semiconductor device and fabricating method thereof
03/14/2012CN102376534A Manufacturing method of standard sheet for silicon epitaxial film thickness test
03/14/2012CN102376533A Method and device for manufacturing alternately arranged P-type and N-type semiconductor thin layer structure
03/14/2012CN102376532A Wafer cleaning device
03/14/2012CN102376531A Method for improving photoetching marking signal after epitaxial filling and CMP (corrugated metal pipe) grinding
03/14/2012CN102376530A Substrate processing apparatus and temperature adjustment method
03/14/2012CN102376529A Container storage facility
03/14/2012CN102376528A Dictionary Mark Optimization Guide Device And Method
03/14/2012CN102376527A Semiconductor Wafer Cooling Device
03/14/2012CN102376526A Substrate cleaning/drying apparatus and substrate processing apparatus comprising the same, and substrate cleaning/drying method and method for manufacturing display panel
03/14/2012CN102376525A Exhaust system for semiconductor processing and method for cleaning exhaust system
03/14/2012CN102376524A Two-stage sealing adhesive removing method for semiconductor element and laser grooving processing device
03/14/2012CN102376520A Ion implantation dose detection control apparatus of plasma immersion ion implanter
03/14/2012CN102376405A Via-less thin film resistor with a dielectric cap
03/14/2012CN102375600A Touch substrate and method of manufacturing the same
03/14/2012CN102375413A Advanced process control system and method utilizing virtual metrology with reliance index and computer program product thereof
03/14/2012CN102375350A Detection layout and detection method of development technology
03/14/2012CN102375342A Coating method of photoresist
03/14/2012CN102375336A Manufacturing Method Of Photosensitive Resin Composition And Solidified Embossing Pattern, And Semiconductor Device
03/14/2012CN102375328A Testing photo mask template and application thereof
03/14/2012CN102375277A Liquid crystal display device and method of manufacturing the same
03/14/2012CN102375175A Light uniform scattering plate and substrate processing device using same
03/14/2012CN102374315A One-way control valve, vacuum device for chip manufacture procedure and gas recoil preventing method
03/14/2012CN102373509A Silicon wafer and method for producing it
03/14/2012CN102373445A Method for monitoring leakage rate in chemical vapor deposition reaction cavity
03/14/2012CN102373022A Thermally releasable sheet-integrated film for semiconductor back surface, method of collecting semiconductor element, and method of producing semiconductor device
03/14/2012CN102373020A Dicing tape-integrated film for semiconductor back surface and method for producing the film, and method for producing semiconductor device
03/14/2012CN102373019A Dicing tape-integrated film for semiconductor back surface, and process for producing semiconductor device
03/14/2012CN102373017A Wafer processing adhesive tape
03/14/2012CN102373016A Wafer processing adhesive tape
03/14/2012CN102371534A Chemical mechanical polishing method for surface of wafer
03/14/2012CN102371532A Reworking method for chemical mechanical lapping process
03/14/2012CN102371254A 清洗系统及方法 Cleaning system and method
03/14/2012CN102044408B Method for dynamically adjusting chemically mechanical polishing (CMP) rate
03/14/2012CN102024783B Semiconductor element for use in interconnection process and manufacturing method thereof
03/14/2012CN102024705B Semiconductor and method for producing same
03/14/2012CN102019578B Method for removing wafer from grinding head of chemical mechanical polishing equipment
03/14/2012CN101930912B Process of realizing p plus and n plus diffusion on both sides of silicon chip by utilizing mask
03/14/2012CN101925987B Method for forming strained channel PMOS devices and integrated circuits therefrom
03/14/2012CN101916784B SOI (Silicon on Insulator) variable buried oxide layer thickness device and preparation method thereof
03/14/2012CN101887908B Active drive organic electroluminescent device and preparation method thereof
03/14/2012CN101887863B Manufacture method of silicon perforation
03/14/2012CN101882576B Method for improving efficiency of erasing floating gate
03/14/2012CN101859794B Display and method of manufacturing the same
03/14/2012CN101859719B Particle detection method and device thereof
03/14/2012CN101859698B Groove etching and polycrystalline silicon injection process
03/14/2012CN101853855B Manufacturing method of silicon wafer with perforating holes
03/14/2012CN101834204B Semiconductor device and manufacturing method thereof
03/14/2012CN101800223B Method and apparatus to suppress fringing field interference of charge trapping nand memory
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