Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
04/2012
04/26/2012WO2012053432A1 Method for recovering cerium oxide polishing agent and recovered product containing cerium oxide polishing agent
04/26/2012WO2012053400A1 Production method for photoelectric conversion element
04/26/2012WO2012053396A1 Resist pattern formation method and radiation-sensitive resin composition
04/26/2012WO2012053374A1 Method for driving semiconductor device
04/26/2012WO2012053302A1 Composition for forming overlaying film for resist for euv lithography
04/26/2012WO2012053268A1 Sheet adhesion device and adhesion method
04/26/2012WO2012053254A1 Method for manufacturing composite substrate having silicon carbide substrate
04/26/2012WO2012053253A1 Composite substrate having single crystal silicon carbide substrate
04/26/2012WO2012053252A1 Composite substrate having silicon carbide substrate
04/26/2012WO2012053178A1 Semiconductor junction structure and method for manufacturing semiconductor junction structure
04/26/2012WO2012053161A1 Production method for thin film transistor substrate, and thin film transistor substrate produced thereby
04/26/2012WO2012053132A1 Semiconductor manufacturing device, method for manufacturing film, and method for manufacturing semiconductor device
04/26/2012WO2012053131A1 Semiconductor device, and manufacturing method for same
04/26/2012WO2012053130A1 Semiconductor device
04/26/2012WO2012053129A1 Semiconductor device, and manufacturing method for same
04/26/2012WO2012053125A1 Semiconductor device
04/26/2012WO2012053071A1 Semiconductor device and method for manufacturing same
04/26/2012WO2012052858A1 Etching of oxide materials
04/26/2012WO2012052657A2 Checking the stoichiometry of i-iii-vi layers for use in photovoltaics using improved electrolysis conditions
04/26/2012WO2012052334A1 Load lock chamber, substrate processing system and method for venting
04/26/2012WO2012052298A1 Vertical semiconductor memory device and manufacturing method thereof
04/26/2012WO2012052252A2 Starter material for a sintering compound and method for producing said sintering compound
04/26/2012WO2012052039A1 Apparatus for coating a wafer
04/26/2012WO2012051960A1 Fluxless reflow process based on indium bumps
04/26/2012WO2012051824A1 Flash memory and fabricating and operating method thereof
04/26/2012WO2012051820A1 Substrate structure, semiconductor device and manufacturing method thereof
04/26/2012WO2012030703A3 Apparatus and method for heat treating a glass substrate
04/26/2012WO2012024061A3 Extended life deposition ring
04/26/2012WO2012021318A3 A high-k dielectric material and methods of forming the high-k dielectric material
04/26/2012WO2012018557A3 Symmetric vhf plasma power coupler with active uniformity steering
04/26/2012WO2012015973A3 Dynamic care areas
04/26/2012WO2012015610A3 Oxide-rich liner layer for flowable cvd gapfill
04/26/2012WO2012012154A3 Method of fabricating isolated capacitors and structure thereof
04/26/2012WO2012010186A8 Handling device for handling a wafer
04/26/2012WO2012009639A3 Aqueous cleaner for the removal of post-etch residues
04/26/2012WO2012009183A3 Method for fast estimation of lithographic binding patterns in an integrated circuit layout
04/26/2012WO2012008989A3 Forming memory using high power impulse magnetron sputtering
04/26/2012WO2012008686A3 Printing plate and method of manufacturing the same
04/26/2012WO2012006249A3 Testing techniques for through-device vias
04/26/2012WO2012006201A3 Cross-point memory utilizing ru/si diode
04/26/2012WO2012006139A3 Drying method for surface structure body
04/26/2012WO2012006094A3 Thyristor random access memory device and method
04/26/2012WO2012003611A8 Semiconductor device and manufacturing method thereof
04/26/2012WO2011163329A3 Extending the lifetime of a deep uv laser in a wafer inspection tool
04/26/2012WO2011159725A3 Discrete polarization scatterometry
04/26/2012WO2011156787A3 Pillar structure for memory device and method
04/26/2012WO2011151430A3 Production device and method
04/26/2012WO2011139862A3 Hermetic wafer-to-wafer bonding with electrical interconnection
04/26/2012WO2011133349A3 Methods for etching silicon-based antireflective layers
04/26/2012WO2011096800A3 Semiconductor device with a variable integrated circuit chip bump pitch
04/26/2012US20120100788 Manufacturing method of carrier for double-side polishing apparatus, carrier for double-side polishing apparatus, and double-side polishing method of wafer
04/26/2012US20120100783 Polishing pad, manufacturing method thereof and polishing method
04/26/2012US20120100728 Systems and methods for forming a time-averaged line image
04/26/2012US20120100727 Method of manufacturing semiconductor device, apparatus for manufacturing same, and storage medium
04/26/2012US20120100726 Methods of Forming Silicon Oxides and Methods of Forming Interlevel Dielectrics
04/26/2012US20120100725 Adhesiveness of fluorocarbon (cfx) film by doping of amorphous carbon
04/26/2012US20120100724 Combinatorial plasma enhanced deposition techniques
04/26/2012US20120100723 Combinatorial plasma enhanced deposition techniques
04/26/2012US20120100722 Substrate processing apparatus and semiconductor device manufacturing method
04/26/2012US20120100721 Method for treating a semiconductor wafer
04/26/2012US20120100720 Silicon etch with passivation using plasma enhanced oxidation
04/26/2012US20120100719 Method for making a planar membrane
04/26/2012US20120100718 CMP Fluid and Method for Polishing Palladium
04/26/2012US20120100717 Trench lithography process
04/26/2012US20120100716 Method to improve reliability (EM and TDDB) with post silylation plasma treatment process for copper damascene structures
04/26/2012US20120100715 Method of manufacturing a semiconductor device including through electrode
04/26/2012US20120100714 Method of Fabricating a Landing Plug in a Semiconductor Device
04/26/2012US20120100713 Method for manufacturing semiconductor device
04/26/2012US20120100712 Structure of power grid for semiconductor devices and method of making the same
04/26/2012US20120100711 Single chip semiconductor coating structure and manufacturing method thereof
04/26/2012US20120100710 Method and apparatus for manufacturing semiconductor device
04/26/2012US20120100709 Plating apparatus and plating method
04/26/2012US20120100708 Methods of Forming Integrated Circuit Devices Having Anisotropically-Oxidized Nitride Layers
04/26/2012US20120100707 Method for fabricating non-volatile memory device with three-dimensional structure
04/26/2012US20120100706 Microelectronic Fabrication Methods Using Composite Layers for Double Patterning
04/26/2012US20120100705 Method for forming memory cell transistor
04/26/2012US20120100704 Semiconductor device with vertical transistor and method for fabricating the same
04/26/2012US20120100703 Ion implantation system and ion implantation method using the same
04/26/2012US20120100702 Method of forming a semiconductor device
04/26/2012US20120100701 Method for cleaning silicon wafer, and method for producing epitaxial wafer using the cleaning method
04/26/2012US20120100700 Method for fabricating non-volatile memory device
04/26/2012US20120100699 Methods of making quantum dot films
04/26/2012US20120100698 Method for forming an aluminum nitride thin film
04/26/2012US20120100697 Film for semiconductor and semiconductor device manufacturing method
04/26/2012US20120100696 Workpiece dividing method
04/26/2012US20120100695 Manufacturing method of semiconductor device
04/26/2012US20120100694 Dividing method for wafer having die bonding film attached to the back side thereof
04/26/2012US20120100693 Semiconductor device and manufacturing method thereof
04/26/2012US20120100692 Methods of fabricating semiconductor structures and devices with strained semiconductor material
04/26/2012US20120100691 Processes for fabricating heterostructures
04/26/2012US20120100690 Method for manufacturing a heterostructure aiming at reducing the tensile stress condition of the donor substrate
04/26/2012US20120100689 Mim capacitor and associated production method
04/26/2012US20120100688 Self-Aligned Electrode Phase Change Memory
04/26/2012US20120100687 Methods for fabricating capacitor and methods for fabricating semiconductor device including the capacitor
04/26/2012US20120100686 Method of forming ultra-shallow junctions in semiconductor devices
04/26/2012US20120100685 Localized implant into active region for enhanced stress
04/26/2012US20120100684 Method of fabricating semiconductor device
04/26/2012US20120100683 Trench-typed power mos transistor and method for making the same
04/26/2012US20120100682 Manufactruing method of semiconductor device having vertical type transistor
04/26/2012US20120100681 Method of manufacturing source/drain structures
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