Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
06/1990
06/05/1990US4931549 Process for aryl-quinone and aryl-naphthoquinone diazide sulfonic acids
06/05/1990US4931540 Polyimides or oligomers; molding materials, photoresists, adhesives; heat, oxygen resistant
06/05/1990US4931427 Thermally degrading a metal compound-polymer complex followed by oxidation
06/05/1990US4931405 Method for manufacturing a semiconductor device and suppressing the generation of bulk microdefects near the substrate surface layer
06/05/1990US4931381 Image reversal negative working O-quinone diazide and cross-linking compound containing photoresist process with thermal curing treatment
06/05/1990US4931380 Pre-exposure method for increased sensitivity in high contrast resist development of positive working diazo ketone photoresist
06/05/1990US4931379 High sensitivity resists having autodecomposition temperatures greater than about 160° C.
06/05/1990US4931351 Bilayer lithographic process
06/05/1990US4931103 Tricholine phosphate surface treating agent
06/05/1990US4931072 Method of breaking foam, and arrangement for the same
06/05/1990CA1270089A1 Photopolymerizable composition
06/05/1990CA1269876A1 Hologram recording medium
06/05/1990CA1269837A1 Needlecraft with metallic substrate
06/05/1990CA1269824A1 Device for aligning a photomask onto a printed wiring board
05/1990
05/30/1990EP0370834A2 Semiconductor device, and method of manufacture
05/30/1990EP0370693A2 Novel onium salts and the use thereof as photoinitiators
05/30/1990EP0370511A2 Method of fabricating a photoplate
05/30/1990EP0370486A2 Method for high temperature reaction process
05/30/1990EP0370355A1 Radiation-polymerisable mixture, and registration material prepared thereof
05/29/1990US4929537 Photoresist compositions based on hydroxystyrene copolymers
05/29/1990US4929536 Image reversal negative working O-napthoquinone diazide and cross-linking compound containing photoresist process with thermal curing
05/29/1990US4929534 Positive-working photosensitive mixture and photolithographic copying material produced therefrom with o-quinone dialide sulfonyl ester and azo coupler
05/29/1990US4929533 Process for producing presensitized diazo resin lithographic printing plate using 1-methoxy-2-propanol as coating solvent
05/29/1990US4929532 Multilayer laminate using polyvinyl acetate adhesive
05/29/1990US4929531 Single batch full color images
05/29/1990US4929402 Method for production of three-dimensional objects by stereolithography
05/29/1990US4929139 Passive electrostatic vacuum particle collector
05/29/1990US4929083 Focus and overlay characterization and optimization for photolithographic exposure
05/29/1990US4929054 Mounting for high resolution projection lenses
05/29/1990US4928936 Loading apparatus
05/29/1990US4928593 Tensioning roller, and device provided with such a tensioning roller
05/29/1990CA2003933A1 Method of making a pattern
05/29/1990CA1269791A1 Curable composition and the use thereof
05/29/1990CA1269765A2 Deep-uv lithography
05/29/1990CA1269748A1 Method of forming a variable width channel
05/29/1990CA1269719A1 Microwave apparatus for generating plasma afterglows for stripping semiconductor
05/29/1990CA1269561A1 Screen emulsions
05/23/1990EP0369941A2 Substituted alpha-pyrones and process for their preparation
05/23/1990EP0369645A1 Triazine photoinitiators in a ternary system for addition polymerization
05/23/1990EP0369444A2 Photosensitive resin composition and method of preparing volume type phase hologram member using same
05/23/1990EP0369398A2 Polyphosphazene derivatives containing carbonyl groups suitable for photoreticulation processes
05/23/1990EP0369379A2 Image forming method
05/23/1990EP0369224A2 Stripping composition and use thereof
05/23/1990EP0369219A1 Light-sensitive compounds, preparation of a light-sensitive mixture therewith and a recording material
05/23/1990EP0369194A2 Sulfonium salts and use and preparation thereof
05/23/1990EP0369081A1 Method of preparing volume type hologram film
05/23/1990EP0369053A1 Method of manufacturing masks with structures in the submicrometer region
05/23/1990EP0187870B1 Pattern formation
05/23/1990CN1042447A Pre-coating composition for luminescent screen of cathode ray tube
05/22/1990US4927956 Or 4-hydroxystyrene derivatives
05/22/1990US4927865 Anthraquinoylcarboxylic acid hydrazides, curable compositions and use thereof
05/22/1990US4927741 Processing of exposed lithographic printing plates by conducting second exposure under water
05/22/1990US4927739 Flexographic printing plate
05/22/1990US4927738 Paints, inks, adhesives, printing plates
05/22/1990US4927737 Radiation polymerizable composition and element containing a photopolymerizable acrylic monomer
05/22/1990US4927736 Hydroxy polyimides and high temperature positive photoresists therefrom
05/22/1990US4927733 Conformation of vacuum - laminated solder mask coated printed circuit boards by fluid pressurizing
05/22/1990US4927732 Positive-working photosensitive composition containing a dye and positive-working photosensitive recording material prepared therefrom
05/22/1990US4927731 Photothermogrphy; microcapsules; storage stability; image clarity
05/22/1990US4927730 Light-sensitive material containing silver halide, reducing agent and polymerizable compound
05/22/1990US4927723 Photocurable, front and back exposure
05/22/1990US4927703 Process for the anionic polymerization of acrylic monomers and optionally of vinyl comonomers
05/22/1990US4926567 Process and apparatus for drying coated web
05/22/1990CA1269342A1 Method of electroforming articles using a photomask mandrel
05/21/1990CA2002873A1 Onium salts and the use thereof as photoinitiators
05/17/1990WO1990005382A1 Positive working polyamic acid/imide photoresist compositions and their use as dielectrics
05/17/1990WO1990005325A1 Positive-working photoresists employing a selected mixture of ethyl lactate and ethyl 3-ethoxy propionate as casting solvent
05/17/1990WO1990005065A1 Device for cleaning photopolymer printing plates with solvents, drying said printing plates and recovering the solvents
05/17/1990CA2000855A1 Triazine photoinitiators in a ternary system for addition polymerization
05/16/1990EP0368800A2 Polyimide-type positive photoresists
05/16/1990EP0368629A2 Photoinitiators and photosensitive compositions containing such photoinitiators
05/16/1990EP0368482A1 Method of making a product with a feature having a multiplicity of fine lines
05/16/1990EP0368327A2 Light-sensitive composition
05/16/1990EP0368289A2 Process for drying coated web
05/16/1990EP0368261A2 Unit magnification optical system
05/16/1990EP0368085A1 Process for the preparation of substituted 1,2-naphthoquinone-(2)-diazide-4-sulfonate esters, and their use in a light-sensitive mixture
05/16/1990EP0367762A1 Arrangement for producing a structure by means of photolithography and manufacturing process thereof
05/16/1990EP0212439B1 Polymers and radiosensitive compositions containing them
05/16/1990CA2002906A1 Hardenable resin composition
05/15/1990US4926210 Image forming apparatus
05/15/1990US4926209 Image recording apparatus using planar illuminator as a light source
05/15/1990US4925915 Fluorine containing polyimides
05/15/1990US4925912 Auto-photocrosslinkable copolyimides and polyimide compositions
05/15/1990US4925775 Crosslinking, photopolymerization; tensile strength
05/15/1990US4925773 Solder resist ink composition
05/15/1990US4925771 Process of making photosensitive aqueous developable ceramic coating composition including freeze drying the ceramic solid particles
05/15/1990US4925770 Contrast-enhancing agent for photolithography
05/15/1990US4925769 Light-sensitive photopolymerizable laminate material
05/15/1990US4925768 Photopolymerizable composition containing a tetrapolymer binder
05/15/1990US4924800 Apparatus for applying photo-resist to substrate
05/15/1990US4924589 Method of making and testing an integrated circuit
05/15/1990CA2002950A1 Image forming method
05/15/1990CA2002727A1 Substituted–- pyrones and process for their preparation
05/15/1990CA1268985A1 Photosensitive elastomeric polymer composition for flexographic printing plate
05/14/1990EP0349632A4 Gap sensing/adjustment apparatus and method for a lithography machine.
05/10/1990DE3932451A1 Doppelkammelektrode fuer oberflaechenwellenvorrichtungen und herstellungsverfahren hierfuer Interdigital electrode for oberflaechenwellenvorrichtungen and manufacturing processes for here
05/10/1990DE3837875A1 Process for the production of grating structures having sections which are mutually offset by half a grating period
05/10/1990DE3837874A1 Process for the production of grating structures having sections which are mutually offset by half a grating period
05/09/1990EP0367568A1 Use of plasma in ashing processes
05/09/1990EP0367132A2 Light-sensitive composition
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