Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
01/1996
01/27/1996CA2152969A1 Method for vacuum plasma protective treatment of metal substrates
01/25/1996DE4426200A1 Cathode sputtering appts.
01/25/1996DE4425626A1 Method and appts. for plasma coating components with metal and polymer layers
01/25/1996DE4422697C1 Vapour coating device for prodn. of thin filmed solar cells
01/24/1996EP0693626A1 Vacuum chamber for ultra high vacuum processing at high temperatures
01/24/1996EP0693580A1 Oxide thin film having quartz crystal structure and process for producing the same
01/24/1996EP0693572A2 Glass cutting wheel
01/24/1996EP0693463A1 Adhering a metal coating to a glass substrate
01/24/1996EP0693137A1 Hollow containers with inert or impermeable inner surface through plasma-assisted deposition of a primarily inorganic substance
01/24/1996CN2218186Y Elastic clamp for vacuum film plating on heat collecting tube
01/24/1996CN1115459A Protective film material and magnetic head comprising a protective film made of the material
01/24/1996CN1030784C Metal fibre products, its production method and double roller processor
01/24/1996CN1030777C Metal plasma source ion injection process and apparatus
01/23/1996US5486702 Scan technique to reduce transient wafer temperatures during ion implantation
01/23/1996US5486277 High performance capacitors using nano-structure multilayer materials fabrication
01/23/1996US5486276 Method for manufacturing small magnetic disks from a large disk
01/23/1996US5486235 Plasma dry cleaning of semiconductor processing chambers
01/18/1996WO1996001549A1 Ternary compound film and manufacturing method therefor
01/18/1996WO1996001502A1 Epitaxial thallium high temperature superconducting films formed via a nucleation layer
01/18/1996DE4424929A1 Holder used in deposition appts. for semiconductor material
01/18/1996CA2194400A1 Epitaxial thallium high temperature superconducting films formed via a nucleation layer
01/17/1996EP0692556A1 K cell type vapor source and shutter
01/17/1996EP0692552A1 Ion beam assisted method of producing a diamondlike carbon coating
01/17/1996EP0692551A1 Sputtering apparatus and methods
01/17/1996EP0692550A1 Preferential sputtering of insulators from conductive targets
01/17/1996EP0692138A1 Reactive dc sputtering system
01/17/1996EP0491811B1 Deposition heaters
01/17/1996CN1114984A Common-sputtering solid lubricating film
01/16/1996US5484663 Article having a coating simulating brass
01/16/1996US5484011 Method of transferring heat to or from a wafer
01/16/1996US5483920 Method of forming cubic boron nitride films
01/13/1996CA2153754A1 K cell type vapor source having an improved shutter
01/12/1996CA2143275A1 Ion beam assisted method of producing a diamond like carbon coating
01/11/1996DE4425874A1 Substrate carrier
01/11/1996DE4422472A1 Appts. for high-rate gas flow sputtering
01/11/1996DE4212053C1 Metal surgical instrument for HF or laser surgery
01/11/1996DE19524359A1 Verfahren zur Herstellung von Dünnschicht-Elektrolumineszenz-Elementen A process for the manufacture of thin film electroluminescent elements
01/10/1996EP0691419A1 A process and apparatus for forming multi-layer optical films
01/10/1996EP0691418A1 Process for preparing high crystallinity oxide thin film
01/10/1996CN1114784A Collimator and manufacturing method therefor
01/09/1996US5483077 System and method for magnetic scanning, accelerating, and implanting of an ion beam
01/09/1996US5483037 Multiple target laser ablation system
01/09/1996US5482892 Method of producing white phosphorus for molecular beam epitaxy
01/09/1996US5482788 Article having a protective coating simulating brass
01/09/1996US5482785 Magnetic recording medium having an intermediate layer comprising uniform size globules of Ag Sn peritectic alloy
01/09/1996US5482743 Vapor deposition of alumina on substrate by oxidation, coating and agglomeration
01/09/1996US5482612 Methods and systems for shielding in sputtering chambers
01/09/1996US5482611 Physical vapor deposition employing ion extraction from a plasma
01/09/1996US5482610 Sputtering, housing
01/09/1996US5482607 Film forming apparatus
01/09/1996US5482604 Off-axis radio frequency diode apparatus for sputter deposition of RLG mirrors
01/09/1996US5482603 Method of producing electroluminescence emitting film
01/09/1996US5482602 Broad-beam ion deposition coating methods for depositing diamond-like-carbon coatings on dynamic surfaces
01/05/1996CA2152718A1 Process for preparing high crystallinity oxide thin film
01/04/1996WO1996000441A1 Optical information carrier
01/04/1996DE4446414A1 Sputtering appts.
01/04/1996DE4422688A1 Appts. for processing runny granular materials in vacuum
01/04/1996DE19523753A1 Magnetic recording medium used in hard disk mechanism
01/04/1996DE19522331A1 Sputter coating workpiece with metal oxide
01/04/1996DE19521724A1 Glowing cathode prodn. for use in electron tubes
01/03/1996EP0690494A2 Connection and build-up-process for multi-chip-modules
01/03/1996EP0690475A1 Structure for alignment of an ion source aperture with a predetermined ion beam path
01/03/1996EP0690473A2 Ion beam electron neutralizer
01/03/1996EP0632846B1 Arrangement for vacuum coating bulk goods
01/03/1996EP0612277A4 Methods for alloy migration sintering.
01/03/1996CN1114424A Surfacial reflection reducing coating series of lithium triborate and preparing process
01/02/1996US5480730 Laminate of metal, metal oxide and second metal
01/02/1996US5480684 Method of reducing carbon incorporation into films produced by chemical vapor deposition involving organometallic precursor compounds
01/02/1996US5480532 Indium tin oxide matrix with indium and tin metals formed by annealing
01/02/1996US5480531 Partially reduced indium tin oxide target; hot pressing
01/02/1996US5480530 Sputter coating compact disks
01/02/1996US5480529 Apparatus for depositing low stress films
01/02/1996US5480527 Ionized vapors, uniform coating or doping
01/02/1996CA1337856C Process for manufacturing a metallized polyolefin film and resulting film
12/1995
12/28/1995WO1995035553A1 Surface component with a spatial, locally coated micro-structure and its use
12/27/1995EP0689227A2 Microwave plasma processing method
12/27/1995EP0688887A1 Wafer processing reactor
12/27/1995EP0527133B1 Plasma reaction chamber having conductive diamond-coated surfaces
12/27/1995CN2216067Y Controlled electric arc target
12/26/1995US5478800 Process for preparing a superconducting thin film
12/26/1995US5478657 Titanium discs useful for magnetic discs
12/26/1995US5478650 Nanophase diamond films
12/26/1995US5478634 Ultra-thin film laminate
12/26/1995US5478609 Substrate heating mechanism
12/26/1995US5478459 Plasma sputtering installation with microwave enhancement
12/26/1995US5478456 Containing yttria and amorphous carbon; pyrolysis
12/26/1995US5478455 Method for controlling a collimated sputtering source
12/26/1995US5478400 Apparatus for fabricating semiconductor devices
12/26/1995US5478398 Device for forming a compound oxide superconductor thin film
12/26/1995US5478195 Process and apparatus for transferring an object and for processing semiconductor wafers
12/26/1995CA1337809C Sputtering target for producing electroconductive transparent films and process for manufacture thereof
12/21/1995WO1995034918A1 ELECTROCHEMICAL HYDROGEN STORAGE ALLOYS AND BATTERIES FABRICATED FROM Mg CONTAINING BASE ALLOYS
12/21/1995DE4421045A1 Plasma-assisted coating appts.
12/21/1995DE4420951A1 Appts. for detecting micro-arcs in sputtering units
12/20/1995EP0688046A2 A method of manufacturing ferroelectric bismuth layered oxides
12/20/1995EP0688043A1 Wafer processing apparatus
12/20/1995EP0688042A1 Wafer processing apparatus
12/20/1995EP0688016A2 Method for manufacturing magnetic recording medium and apparatus therefor
12/20/1995EP0687748A1 Boron nitride films and process of making same
12/20/1995EP0687190A1 A spatially distributed sma actuator film