| Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378) |
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| 04/03/2008 | DE19730993B4 Vakuumbeschichtungsvorrichtung zum allseitigen Beschichten von Substraten durch Rotation der Substrate im Partikelstrom Vacuum coater for coating substrates on all sides by rotating the substrates in the particle flow |
| 04/03/2008 | DE102007046380A1 Schneidwerkzeug Cutting tool |
| 04/03/2008 | DE102007029314A1 Cap for displays or control switches comprises cover which fits over light source or switch and is designed so that illuminated symbol is displayed on its upper surface, underside of cover carrying translucent metal layer, applied by PVD |
| 04/03/2008 | DE102006047010A1 Method for inserting and removing substrates from a vacuum coating installation comprises replacing already coated substrates with substrates to be coated while maintaining the process vacuum and further processing |
| 04/03/2008 | DE102006046312A1 Method for depositing a transparent conducting oxide layer on a solar cell having an absorber layer comprises using pulsed magnetron sputtering |
| 04/03/2008 | DE102006046150A1 Method for coating the components of a gas turbine comprises coating the components with a layer made from a material which is similar to the material of the component using a plasma-aided physical vapor deposition process |
| 04/03/2008 | DE102006045369A1 Production of hollow moldings with thin film on inner surface comprises injection molding pair of half-shells and vapor coating in mold, by covering with vaporization chamber containing target electrode, substrate electrode and vacuum line |
| 04/03/2008 | DE102006044933A1 Production of hollow moldings with thin film on inner surface comprises molding pair of half-shells using sliding mold, moving sliding mold with half-shells in molds, and coating inner surface of one using vaporization system on fixed mold |
| 04/03/2008 | CA2662537A1 Workpiece with hard coating |
| 04/02/2008 | EP1906466A1 Piezoelectric film, process of manufacturing the same and piezoelectric element |
| 04/02/2008 | EP1906433A1 Plasma discharge film-forming apparatus and method |
| 04/02/2008 | EP1905867A1 Process for forming a film, piezoelectric film, and piezoelectric device |
| 04/02/2008 | EP1905866A1 Process for forming a film, piezoelectric film, piezoelectric device, and liquid discharge apparatus |
| 04/02/2008 | EP1905865A1 Sputtering apparatus and method for manufacturing transparent conducting film |
| 04/02/2008 | EP1905864A1 In Sm OXIDE SPUTTERING TARGET |
| 04/02/2008 | EP1905863A2 Slide member |
| 04/02/2008 | EP1904901A1 Reinforced micromechanical part |
| 04/02/2008 | EP1540030A4 Non-planar sputter targets having crystallographic orientations promoting uniform deposition |
| 04/02/2008 | EP1444378A4 Textured-metastable aluminum alloy sputter targets |
| 04/02/2008 | EP1444376A4 High-purity aluminum sputter targets |
| 04/02/2008 | EP1392881B1 Single source sputtering of thioaluminate phosphor films |
| 04/02/2008 | EP1333935A4 Coating formation by reactive deposition |
| 04/02/2008 | EP1105245B1 Method of bonding of dissimilar metals |
| 04/02/2008 | EP0897022B1 Sputtering target |
| 04/02/2008 | CN101155945A Components comprising metallic material, physical vapor deposition targets, thin films, and methods of forming metallic components |
| 04/02/2008 | CN101155944A Apparatus for film formation and method for film formation |
| 04/02/2008 | CN101155650A Sputtering target and method of fabrication |
| 04/02/2008 | CN101153822A Infrared window and its production method and its application in infrared imaging detection of electrical equipment |
| 04/02/2008 | CN101153383A Control method for ionic beam electric charge |
| 04/02/2008 | CN101153382A Control method for ionic beam electric charge |
| 04/02/2008 | CN101153381A Method for implementing cobalt doping in zinc oxide nano pole |
| 04/02/2008 | CN101153380A Vacuum production method for SiOx coating on organic precoating metal sheet |
| 04/02/2008 | CN101153379A Method for producing transparent Mgo film and obtained product |
| 04/02/2008 | CN101152780A Hard-material-coated member excellent in durability |
| 04/02/2008 | CN101152779A Metalliferous carbon coating composition similar with diamond |
| 04/02/2008 | CN101152778A Variable emissivity heat-controlled coating and plating method thereof |
| 04/02/2008 | CN101152777A Method for improving variable emissivity heat-controlled coating capability |
| 04/02/2008 | CN101152751A Forming method and apparatus for hollow molding product with film on internal surface |
| 04/02/2008 | CN101152750A Forming method and apparatus for hollow molding product with film on internal surface |
| 04/02/2008 | CN100379057C Separate type mask device for manufacturing OLED display |
| 04/02/2008 | CN100379052C Electroluminescent display device, manufacturing method and electronic instrument thereof |
| 04/02/2008 | CN100378923C Magnetron plasma processing apparatus |
| 04/02/2008 | CN100378920C Ion mixing device and porous electrode for ion mixing device |
| 04/02/2008 | CN100378915C Method for measuring parallel beam injection angle |
| 04/02/2008 | CN100378900C Consecutive deposition system |
| 04/02/2008 | CN100378469C Antireflection film and antireflection layer-affixed plastic substrate |
| 04/02/2008 | CN100378352C Metal-to-metal spherical bearing |
| 04/02/2008 | CN100378245C Sputtering apparatus |
| 04/02/2008 | CN100378239C Cemented carbide tool and method of making the same |
| 04/01/2008 | US7352048 Integration of barrier layer and seed layer |
| 04/01/2008 | US7351482 Ceramic compositions for thermal barrier coatings stabilized in the cubic crystalline phase |
| 04/01/2008 | US7351293 Method and device for rotating a wafer |
| 04/01/2008 | US7351292 Assembly for processing substrates |
| 04/01/2008 | CA2284363C Thermal barrier coating systems and materials |
| 03/27/2008 | WO2008036187A2 Method of making first surface mirror with oxide graded reflecting layer structure |
| 03/27/2008 | WO2008035818A1 Method and apparatus for producing small structures |
| 03/27/2008 | WO2008035617A1 Ag ALLOY THIN FILM, AND Ag ALLOY SPUTTERING TARGET FOR FORMATION OF THE Ag ALLOY THIN FILM |
| 03/27/2008 | WO2008035587A1 Vacuum processing system |
| 03/27/2008 | WO2008035508A1 Component for processing apparatus, processing apparatus, method for manufacturing component for processing apparatus, and method for manufacturing processing apparatus |
| 03/27/2008 | WO2008034756A1 Green compact consisting of a polymer ceramic material and method for sealing openings in components |
| 03/27/2008 | WO2008034611A1 Cap for a display or control element, comprising a light-permeable metal coating, and method for the production thereof |
| 03/27/2008 | WO2008034610A1 Display and/or control element in a motor vehicle |
| 03/27/2008 | WO2008034419A1 Method for producing a coated product, product and tool for carrying out the method |
| 03/27/2008 | WO2006132916A8 Large area elastomer bonded sputtering target and method for manufacturing |
| 03/27/2008 | US20080076683 Comprising a hard carbon coating layer with good abrasion resistance and low friction properties even under an unlubricated condition |
| 03/27/2008 | US20080076269 Process for Forming Thin Film and System for Forming Thin Film |
| 03/27/2008 | US20080075998 Physical vapor deposition; improved ion permeability; electroltyic fuel cells; oxygen pump cells |
| 03/27/2008 | US20080075889 three-dimensional structure does not have close packing structure; connecting first end of connectors to specific crystal faces of the first crystalline particles and simultaneously connecting second ends of connector to surfaces of second particles; decahedral titanium oxide; silane couplers |
| 03/27/2008 | US20080075880 higher throughput and is conducive to sequential ion implantation processing; pre-amorphization implantation process or a strain altering implantation |
| 03/27/2008 | US20080075879 metal substrate, metal bonding layer, ceramics thermal barrier; columnar structure of stabilized zirconia, or ZrO2-HfO2 solid solution; simultaneously melting two ZrO2 deposition and Lanthanum oxide deposition materials by electron beam physical vapor deposition; low thermal conductivity; durability |
| 03/27/2008 | US20080075877 thermal spraying metal hydroxide, carbonate, or nitrate particles and a noble metal, nobel metal hydroxide, carbonate, or nitrate on one side; on other side a physical vapor deposition process of ruthenium, rhodium, palladium, silver, iridium, platinum and/or gold; microchannel catalytic heat exchanger; |
| 03/27/2008 | US20080075855 Carbiding, nitriding or metallization; vapor deposition of carbides, carbonitrides, nitrides or metal silicon nitrides or carbides from organometallic compounds in presence of adhesion promoter; forming copper film |
| 03/27/2008 | US20080075834 provides methods and apparatus for controlling ion dosage in real time during plasma processes. In one embodiment, ion dosages may be controlled using in-situ measurement of the plasma from a mass distribution sensor combined with in-situ measurement from an RF probe. |
| 03/27/2008 | US20080073766 System for manufacturing microelectronic, microoptoelectronic or micromechanical devices |
| 03/27/2008 | US20080073411 Sputtering target and method for preparation thereof |
| 03/27/2008 | US20080073203 Method of making first surface mirror with oxide graded reflecting layer structure |
| 03/27/2008 | DE102007038171A1 Production of a bipolar plate for collecting electrodes and distributing between fuel cells comprises creating an electrically conducting fuel cell component and applying a graphite-containing/conducting carbon layer on one side |
| 03/27/2008 | DE102006043394A1 Device for the rapid and automatic vacuum coating of workpieces comprises a processing chamber with a wall region arranged parallel to the axis of a holding device and formed as a closure |
| 03/27/2008 | DE102006043303A1 Sliding layer manufactured by magnetron-sputtering procedure, useful for tribological system from piston and cylinder in combustion engine, comprises metal carbide particles deposited in a matrix from amorphous hydrogenous hard carbon |
| 03/27/2008 | DE102006043294A1 Repair method for a gas turbine component comprises preparing the component with a site which is smaller than specified, measuring the site, filling the site with a material, measuring the filled site and removing excess material |
| 03/27/2008 | DE10024827B4 Elektrodenanordnung und ihre Verwendung Electrode assembly and their use |
| 03/26/2008 | EP1903123A2 Mounting plate with a cooled backing plate set on top |
| 03/26/2008 | EP1903122A1 Sputtering target for the formation of phase-change films and process for the production of the target |
| 03/26/2008 | EP1902153A1 Chalcogenide pvd targets with a composition adjusted by solid phase bond of particles with congruently melting compound |
| 03/26/2008 | EP1902152A1 Apparatus and method for coating a substrate |
| 03/26/2008 | EP1902151A2 Water-soluble polymeric substrate having metallic nanoparticle coating |
| 03/26/2008 | EP1595003A4 Apparatus and methods for ionized deposition of a film or thin layer |
| 03/26/2008 | EP1275135B1 Apparatus for thermally processing wafers |
| 03/26/2008 | CN201040767Y Vacuum vertical film plating machine workpiece rotating frame |
| 03/26/2008 | CN101151701A A method for operating a pulsed arc evaporation source and a vacuum processing equipment with the pulsed arc evaporation source |
| 03/26/2008 | CN101151557A High reflection mirror and process for producing the same |
| 03/26/2008 | CN101151398A Deep-pot-shaped copper sputtering target and process for producing the same |
| 03/26/2008 | CN101151397A Multi-layered hard material coating for tools |
| 03/26/2008 | CN101151115A Replacement cutter tip and method of manufacturing the same |
| 03/26/2008 | CN101150197A Fuel cell membrane electrode assemblies with improved power outputs and poison resistance |
| 03/26/2008 | CN101150115A Conductive resistance blocking layer material for copper interconnection and making method |
| 03/26/2008 | CN101148821A Chemical fiber plus material normal pressure plasma treatment method |
| 03/26/2008 | CN101148761A Fe/MoS2 nano multilayer film and preparation method thereof |
| 03/26/2008 | CN101148754A Method for increasing permalloy thin film magnetic resistance change rate |
| 03/26/2008 | CN101148753A Yttrium-iron garnet thin film material and preparation method thereof |