Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
04/2008
04/29/2008US7364798 Internal member for plasma-treating vessel and method of producing the same
04/29/2008US7364772 Manifold; chamber for receiving organic material, an aperture plate for heating the organic material, emitting vaporized organics; coating an organic layer on a substrate of an OLED device; electrical insulator for concentrating heat in the unsupported region of the aperture plate
04/29/2008US7364644 Silver selenide film stoichiometry and morphology control in sputter deposition
04/24/2008WO2008048710A2 Nanometer-scale sharpening of conductor tips
04/24/2008WO2008048339A1 Apparatus and method for nano plasma deposition
04/24/2008WO2008047900A1 Sputtering film-forming apparatus and backing plate for sputtering film-forming apparatus
04/24/2008WO2008047810A1 Antibacterial substratum and process for producing the same
04/24/2008WO2008047667A1 Multilayer film for wiring and wiring circuit
04/24/2008WO2008047564A1 Semiconductor device manufacturing method and semiconductor device
04/24/2008WO2008047549A1 Transparent conductive film substrate and method of forming titanium oxide based transparent conductive film for use therein
04/24/2008WO2008047511A1 Al-Ni-B ALLOY MATERIAL FOR REFLECTION FILM
04/24/2008WO2008047458A1 Wafer alignment apparatus using metal mask
04/24/2008WO2008047062A2 Friction piece in a lubricated medium, working at contact pressures higher than 200 mpa
04/24/2008WO2008047049A2 Titanium layer comprising inserted nitrogen atoms, and associated implantation method
04/24/2008WO2008046830A1 Low glare mirror plate and rear-view mirror with this type of mirror plate
04/24/2008WO2008046395A1 Method of working material by heavy ion bombardment and a subsequent etching process
04/24/2008WO2008000573A3 Wear-resistant coating and production method for the same
04/24/2008US20080095956 region-wise metallization on carrier substrate having soluble colored layer, hardener added to first layer, additive in second layer for inactivating hardener, removing inactivated materials via dissolving with water; vapor deposition, cathode sputtering
04/24/2008US20080095952 Apparatus and method for nano plasma deposition
04/24/2008US20080095939 plurality of layers applied layer by layer to the peripheral surface by applying, using PVD, metal adhesive layer based on Cr to peripheral surface without adding nitrogen to process gas; Nitrogen is added while increasing the partial pressure forming a CrN gradient layer on the adhesive layer
04/24/2008US20080093215 Batch-Type Remote Plasma Processing Apparatus
04/24/2008US20080093212 By-product collecting processes for cleaning processes
04/24/2008US20080093047 Casting molds coated for surface enhancement and methods of making
04/24/2008US20080092946 Semiconductor Grain Microstructures for Photovoltaic Cells
04/24/2008US20080092945 Semiconductor Grain and Oxide Layer for Photovoltaic Cells
04/24/2008DE102006049608A1 Device for adjusting a working point during reactive sputtering within a defined sputtering region comprises a measuring unit, an evaluating unit for calculating the intensity ratios and a control circuit for controlling reactive gas flow
04/24/2008DE102006048912A1 Verfahren zur Herstellung eines Wärmeschutzes A method for producing a thermal protection
04/24/2008DE10159907B4 Beschichtungsverfahren Coating process
04/24/2008CA2668288A1 Friction piece in a lubricated medium, working at contact pressures higher than 200 mpa
04/23/2008EP1914121A2 Method for manufacturing a heat insulation
04/23/2008EP1913624A1 Sputtering target with slow-sputter layer under target material
04/23/2008EP1913177A1 Porous metallized sheets coated with an inorganic layer having low emissivity and high moisture vapor permeability
04/23/2008EP1913170A2 Method for deposition of an anti-scratch coating
04/23/2008EP1595004A4 Method of depositing dlc on substrate
04/23/2008EP1210468B1 Method for cleaning a pvd or cvd reactor and waste-gas lines of the same
04/23/2008CN201050596Y Zirconium plating nitride piston ring
04/23/2008CN201049962Y Thin film deposition device
04/23/2008CN101165871A Substrate supporting member
04/23/2008CN101165617A Method of optimizing process recipe of substrate processing system
04/23/2008CN101165206A Substrate fixture and rotary disc for coating film and film coating machine
04/23/2008CN101165205A Method and device for coating anti reflection passive film on crystal silicon solar cell sheet
04/23/2008CN101164966A Oxide sintering body, its manufacturing method, transparent conductive film, and solar energy cell obtained by using the same
04/23/2008CN101164931A Die produced glass model core and producing method thereof
04/23/2008CN101164930A Die produced glass model core and producing method thereof
04/23/2008CN101164773A Coated cutting tool
04/23/2008CN101164772A Coated cutting tool
04/23/2008CN100383923C Producing method of silicon substrate nano-zinc oxide
04/23/2008CN100383922C Method and apparatus for forming bias sputtering film
04/23/2008CN100383918C Replacing method of valv device, processing system and sealing components
04/23/2008CN100383276C Cathode sputterion device with permanent magnet structure
04/23/2008CN100383275C Method for preparing optical thin film with gold silver nanometer particle and dispersal oxide
04/23/2008CN100383274C Method for raising property of lanthanum barium manganese oxide film by laser irradiation
04/23/2008CN100383073C Transparent titanium oxide-aluminum and/or aluminum oxide coating with rutile structure
04/22/2008US7361928 Doped aluminum oxide dielectrics
04/22/2008US7361412 Self-propagating formation reactions in nanostructured multilayer foils provide rapid bursts of heat at room temperature and therefore can act as local heat sources; rapid cooling results in a very fine microstructure
04/22/2008US7361302 Oxidation and fatigue resistant metallic coating
04/22/2008CA2427550C Oxidation and fatigue resistant metallic coating
04/17/2008WO2008044626A1 Sb-Te BASE ALLOY SINTER SPUTTERING TARGET
04/17/2008WO2008044602A1 Method for forming thin film and multilayer structure of thin film
04/17/2008WO2008044531A1 Process for producing vanadium dioxide thin film and product thereof
04/17/2008WO2008044489A1 Takeup type vacuum filming apparatus
04/17/2008WO2008044474A1 Method for forming transparent conductive film
04/17/2008WO2008043606A1 Layer system having at least one mixed crystal layer of a polyoxide
04/17/2008US20080090739 Masked Solid Porous Supports Allowing Fast And Easy Reagent Exchange To Accelerate Electrode-Based Microarrays
04/17/2008US20080090159 photomask blank comprising a multilayer film including at least four layers of different compositions, wherein the interface between the layers is moderately graded in composition; a phase shift mask blank comprising a phase shift film of at least two layers including a surface layer of a composition
04/17/2008US20080090100 Target for vaporizing under an electron beam, a method of fabricating it, a thermal barrier and a coating obtained from a target, and a mechanical part including such a coating
04/17/2008US20080090095 Base metal layer on one plane of an insulating film, a copper film layer on the base metal layer made of a chrome-molybdenum-nickel alloy
04/17/2008US20080090020 Method for fabricating metal-insulator-metal capacitor
04/17/2008US20080090001 Film forming method, film forming apparatus, pattern forming method, and manufacturing method of semiconductor apparatus
04/17/2008US20080088067 Target for vaporizing under an electron beam, a method of fabricating it, a thermal barrier and a coating obtained from a target, and a mechanical part including such a coating
04/17/2008US20080087629 Method for Manufacturing Semiconductor Device
04/17/2008US20080087359 Heat treatment; spray coating; vapor deposition; fusion
04/17/2008US20080087214 Load lock chamber with decoupled slit valve door seal compartment
04/17/2008US20080086948 Coating plant with a charging lock and device therefor
04/17/2008DE10360540B4 Reflektierende Schichtenfolge mit Barriereschichten sowie deren Verwendung Reflective layer sequence with barrier layers and their use
04/17/2008DE102007048758A1 Transport device for conveying elongate substrates through vacuum coating system, has retainer bar operatively connected to array of substrate holding inserts so that spacing between each insert and substrate can be changed
04/17/2008DE102006049432A1 Verfahren zur Herstellung von selbst aggregierenden Monolagen auf Festkörperoberflächen Process for the preparation of self-aggregating monolayers on solid surfaces
04/17/2008DE102006048409A1 Production of layers and/or crystals of group 3 metal nitrides using sublimation comprises producing the metal nitride from a source containing the metal nitride and depositing the metal nitride on a substrate and/or seed crystal
04/17/2008CA2665044A1 Layer system with at least one mixed crystal layer of a polyoxide
04/17/2008CA2634420A1 Method for fabricating nanostructures
04/16/2008EP1912483A1 Plasma generator and film forming method employing same
04/16/2008EP1912266A1 Method of forming phase change memory devices in a pulsed DC deposition chamber
04/16/2008EP1911538A1 Edge replacing cutting tip and method for producing the same
04/16/2008EP1910585A2 Powder-fiber adhesive
04/16/2008EP1910013A2 Radiation arrangement
04/16/2008EP1472386B1 Non-stoichiometric niox ceramic target
04/16/2008EP1161309A4 A method for a repetitive ion beam processing with a by carbon containing ion beam
04/16/2008CN101164177A Method and device for producing electronic components
04/16/2008CN101163815A Source, an arrangement for installing a source, and a method for installing and removing a source
04/16/2008CN101163814A Method of film formation, film formation apparatus, permanent magnet, and process for producing permanent magnet
04/16/2008CN101163813A Coating, substrate provided with a coating and method for the application of a corrosion-resistant coating
04/16/2008CN101162774A Surface film coating modify method for improving lithium ionic cell positive pole safety
04/16/2008CN101162772A Spume lithium cathode of lithium metal secondary batteries and method for producing the same
04/16/2008CN101161856A Optical coating film thickness monitoring automatic control system and monitoring method
04/16/2008CN101161855A Magnetron sputtering cathode target for ultrahigh vacuum system
04/16/2008CN101161854A Co-Fe-Zr based alloy sputtering target material and process for production thereof
04/16/2008CN100382332C Semiconductor device and method of manufacturing semiconductor device
04/16/2008CN100382239C Method for electrically discharging substrate, substrate processing apparatus and program
04/16/2008CN100382238C Opening/closing mechanism for vacuum processing apparatus, and vacuum processing apparatus
04/16/2008CN100382237C Vacuum treatment device