Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
07/2010
07/21/2010CN201530854U Magnetron sputtering chamber capable of automatically reducing temperature
07/21/2010CN1710144B Hard coating and its production method
07/21/2010CN101785126A deposition of piezoelectric aln for baw resonators
07/21/2010CN101785094A Substrate processing apparatus
07/21/2010CN101785088A Plasma processing method and plasma processing apparatus
07/21/2010CN101785071A Conductor layer manufacturing method
07/21/2010CN101784915A Optical article coated with an antireflection coating comprising a sublayer partially formed under ion assistance and manufacturing process
07/21/2010CN101784694A Sputtering method
07/21/2010CN101784693A Sputtering method and sputtering apparatus
07/21/2010CN101784692A Process for manufacturing multi-layered thin film by dry vacuum vapor deposition
07/21/2010CN101782663A Optical article and method for producing the same
07/21/2010CN101781860A Color-changeable fabric as well as preparation and application
07/21/2010CN101781807A Production method of tin-plated filigree
07/21/2010CN101781765A Antibacterial alloy coating component
07/21/2010CN101781754A Modularization solar selective coat continuous coating device
07/21/2010CN101781753A Technological method for preparing Cr-doped beta-FeSi2 films
07/21/2010CN101781752A Evaporation electrode
07/21/2010CN101781751A Manufacture method of non-conducting metal film used for surface of plastic product
07/21/2010CN101781750A Method for nonconductive metallization of plastic surface and plastic piece manufactured thereby
07/21/2010CN101781749A Preparation method of Cu doped p type ZnO thin film
07/21/2010CN101781748A Method for preparing amorphous carbon composite coating on surface of hard alloy material and high-speed steel material
07/21/2010CN101780727A White film and preparation method thereof
07/21/2010CN101319307B Method of manufacturing tin indium oxide target material
07/21/2010CN101298656B Preparation of high-hardness diamond-like multi-layer film
07/21/2010CN101232755B Evaporating device, evaporating method, display device and method of manufacturing display device, organic electroluminescent element, and display device
07/21/2010CN101146926B Droplet removing device and method in plasma generator
07/21/2010CN101008077B Method for precipitating large area amorphous, nanocrystalline alloy layer using single cathode plasma
07/20/2010US7760432 Photochromic resistant materials for optical devices in plasma environments
07/20/2010US7759657 vaporizing and ionizing polyhedral borane cluster molecules to form plasma, extracting through aperture to form ion beam, mass analyzing via magnet, transporting drift of ion beam and/or optionally applying additional acceleration or deceleration potentials to set final energy, implanting
07/20/2010US7758974 chromium silicon carbonitrides inorganic coatings on slides; lubricity and wear resistance of metal sliding members in devices using water as working fluid
07/20/2010US7758942 Ag base alloy thin film and sputtering target for forming Ag base alloy thin film
07/20/2010US7758914 Repairing the chromium/aluminum (C1A) protective coating on a worn zone of a turboprop blade by removing the coating and painting the exposed superalloy substrate with a paint containing a platinoid metal and chromium; vapor aluminizing the prelayer; cost efficiency; fuel efficiency; aircraft
07/20/2010US7758776 Rapid manufacturing of carbon nanotube composite structures
07/20/2010US7758699 Apparatus for and method of continuous HTS tape buffer layer deposition using large scale ion beam assisted deposition
07/20/2010CA2426814C Vacuum metalization process for chroming substrates
07/15/2010WO2010081064A1 Process for preparing znal target
07/15/2010WO2010080946A2 Non-stick articles
07/15/2010WO2010080268A1 Linear deposition source
07/15/2010WO2010080109A1 Vacuum deposition sources having heated effusion orifices
07/15/2010WO2010079754A1 Method for manufacturing electrochemical element electrode, electrochemical element electrode, and electrochemical element
07/15/2010WO2010079092A1 Device for projecting an image on a surface and device for moving said image
07/15/2010WO2010078914A1 Method and device for coating functional surfaces
07/15/2010WO2010078860A1 Vacuum coating system and method for operating a vacuum coating system
07/15/2010WO2010078754A1 Continuous film vacuum deposition method and apparatus
07/15/2010WO2010046636A3 Vacuum processing apparatus
07/15/2010US20100178493 Formation of Thin Uniform Coatings on Blade Edges Using Isostatic Press
07/15/2010US20100178447 Information recording medium, method for producing the same, and sputtering target
07/15/2010US20100176465 Method of epitaxially growing piezoresistors
07/15/2010US20100176002 Method of forming a colorful coating on a transparent plastic article
07/15/2010US20100175990 Dummy substrate, and start method of, retention/modification method of deposition condition, and stop method of deposition apparatus using same
07/15/2010US20100175989 Deposition apparatus, deposition system and deposition method
07/15/2010US20100175988 Apparatus and method for making sputtered films with reduced stress asymmetry
07/15/2010DE102009004502A1 Evaporating an evaporation material in the form of organic material, comprises heating the evaporation material in a process chamber of an evaporating device, evaporating over an evaporating surface and then depositing on a substrate
07/15/2010DE102009004188A1 Medizinisches Implantat und Verfahren zur Herstellung eines solchen Implantats Medical implant and process for producing such an implant
07/15/2010DE102009004158A1 Verfahren und Vorrichtung zur Funktionsflächenbeschichtung Method and apparatus for functional surface coating
07/15/2010DE102008042237B4 Metallische Beschichtung Metallic coating
07/14/2010EP2206800A1 Slide member
07/14/2010EP2205773A2 Method and apparatus for thermally converting metallic precursor layers into semiconducting layers, and also solar module
07/14/2010EP2205772A2 Method and arrangement for providing chalcogens
07/14/2010EP2205347A1 Lock device and method for opening the lock device
07/14/2010EP1654395B1 Target/backing plate constructions, and methods of forming them
07/14/2010CN201525883U Continuous film coating production apparatus for intermediate temperature full-glass vacuum solar heat collecting pipe
07/14/2010CN201525882U Conveyer of a carrying tool
07/14/2010CN201525881U Novel workpiece rotating structure of film plating machine
07/14/2010CN201525880U Electron gun emitter
07/14/2010CN201525879U Large-diameter crucible rotating device
07/14/2010CN201525878U Articulated correcting board mechanism
07/14/2010CN101778963A System and process for the continous vacuum coating of a material in web form
07/14/2010CN101778962A Method for thin film formation
07/14/2010CN101778961A Sputtering apparatus and thin film formation method
07/14/2010CN101777590A Heterogenous junction film material with white light photovoltaic effect and preparation method thereof
07/14/2010CN101777469A Method for preparing surface conduction electron emission film in W-Si-N nanometer diphase structure
07/14/2010CN101776338A Solar high-temperature and heat-absorbing CrFeON film and preparation process thereof
07/14/2010CN101775589A Preparation method of surface conduction electron-emitter film with Nb-Si-N nanometer bi-phase structure
07/14/2010CN101775588A Rectangular target with high target utilization ratio
07/14/2010CN101775587A Micro-drill for copper alloy processing and preparation method thereof
07/14/2010CN101775586A Preparation method of electrochemical oriented growth of polyporous Al2O3 film on non-aluminum base
07/14/2010CN101775585A Preparation method of high hardness zirconium nitride hard coat
07/14/2010CN101775584A Preparation method of c-axis inclined AlN thin film with homogeneous buffer layer
07/14/2010CN101775583A Method for manufacturing copper target components
07/14/2010CN101775582A Method for controlling film thickness of attenuator
07/14/2010CN101775581A Hot processing chamber
07/14/2010CN101775580A Preparation method of microwave plasma of aluminium nitride film
07/14/2010CN101775579A Preparation method of microwave plasma of titanium dioxide film
07/14/2010CN101775578A ZnAl target preparation method and prepared ZnAl target
07/14/2010CN101775577A Method for preparing surface conduction electron emitting film in Zr-Si-N nano double-phase structure
07/14/2010CN101775576A ZnO-based powder-metal composite sputtering target material and preparation method thereof
07/14/2010CN101775573A Surface hardening treatment technology for oil distribution cover of plunger pump
07/14/2010CN101775354A Microbe inoculator with boron nitride film coating and preparation method thereof
07/14/2010CN101773686A Shape memory alloy simulated nanometer film coating biological and medicinal implant material
07/14/2010CN101445911B Method for preparing monodispersed Cu nanoparticle template by using secondary evaporation method
07/14/2010CN101001973B Barrier film for flexible copper substrate and sputtering target for forming barrier film
07/13/2010US7754274 Forming a film which adjusts a shape of the substrate above at least one of the front side and the back side of the substrate; anddrilling through-holes in the substrate
07/13/2010US7754137 by melting piezoelectric material comprising lead zirconium titanate, polyvinylidene fluoride, and barium titanate with laser beam or spin coating
07/13/2010US7754110 Indium-oxide-based transparent conductive film and method for producing the film
07/13/2010US7754106 Flash evaporating release material in vacuum chamber, forming very thin film by cryocondensation, electron beam depositing metal oxide, crushing and heat or solvent removing release layer; for conductive inks and coatings
07/13/2010US7754056 Biosensor containing ruthenium, measurement using the same and application thereof
07/13/2010US7754043 Method for applying an optical coating to a surface of an article
07/13/2010US7754016 Multiple axis tumbler coating apparatus
07/13/2010US7754015 Vacuum vapor-deposition apparatus and method of producing vapor-deposited film