Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
05/2010
05/19/2010CN101709470A Preparation method of composite coating containing diffusion barrier generated in situ
05/19/2010CN101709456A Method for preparing polysilicon film on graphite substrate by magnetic control sputtering
05/19/2010CN101709455A Multifunctional magnetic control sputtering film plating device
05/19/2010CN101709454A Rotary sputtering target and method for manufacturing same
05/19/2010CN101709453A Method for preparing ZnO doped Al transparent conductive film at room temperature
05/19/2010CN101709452A Cleaning method for sputtering target material of aluminum or aluminum alloy
05/19/2010CN101709451A 氮化硅薄膜溅射源装置 Silicon nitride films sputter source device
05/19/2010CN101709450A Method for preparing zirconium-titanium-aluminum-nitrogen nitride gradient hard reaction film
05/19/2010CN101346795B Method and installation for the vacuum polishing of a metal strip by means of magnetron sputtering
05/19/2010CN101311300B Ultra high vacuum magnetron sputtering rectangular plane sputtering target
05/19/2010CN101265549B Foam iron-nickel composite metal material and preparation method thereof
05/19/2010CN101224496B Manufacture method of sputtering targets
05/19/2010CN101210312B Film preparation method for balancing film stress
05/19/2010CN101208453B Gallium oxide-zinc oxide sputtering target, method of forming transparent conductive film and transparent conductive film
05/19/2010CN101206935B Method of preparing electron type high-temperature superconductor lanthanum cerium cuprum oxygen film
05/19/2010CN101202198B New type non-filament florescent lamp working in brightness arc transition zone
05/19/2010CN101192666B Anode active material, method of preparing the same, and anode and lithium battery containing the anode active material
05/19/2010CN101189358B Sputtering target and process for producing the same
05/19/2010CN101180574B Front surface mirror
05/19/2010CN101093751B Method for preparing cathode foil with high specific volume
05/19/2010CN101090994B Mask holding mechanism and film forming apparatus
05/19/2010CN101080510B Magnet structure for magnetron sputtering and cathode electrode unit and magnetron sputtering equipment
05/19/2010CN101070592B Composite ion-injection surface modification method for copper and its alloy
05/19/2010CN101034741B Zirconium adulterated lithium manganate anode film material and its making method
05/18/2010US7718983 Sputtered contamination shielding for an ion source
05/18/2010US7718574 Biaxially-textured film deposition for superconductor coated tapes
05/18/2010US7718231 fabricating silicon-on-insulators (SOIs) structures with a very thin (less than 100 nm), but uniform buried oxide; processing time is reduced, yet the throughput is increased by reducing the oxygen implantation dose
05/18/2010US7718222 Apparatus and method for high rate uniform coating, including non-line of sight
05/18/2010US7718117 Tungsten sputtering target and method of manufacturing the target
05/18/2010US7718095 Sputtering target, thin film for optical information recording medium and process for producing the same
05/18/2010US7718045 Ground shield with reentrant feature
05/18/2010US7718044 Method for controlling shaft coating taper
05/18/2010US7718043 Multilayer hard coating for tools
05/18/2010US7718042 Method for manufacturing sputter-coated substrates, magnetron source and sputtering chamber with such source
05/18/2010US7717079 Engine
05/18/2010US7716806 Tantalum sputtering target and method for preparation thereof
05/14/2010WO2010053605A1 Segmented film deposition
05/14/2010WO2010053135A1 Al alloy film for display device, display device and sputtering target
05/14/2010WO2010053060A1 Semiconductor device
05/14/2010WO2010053048A1 Co-Fe ALLOY FOR SOFT MAGNETIC FILMS, SOFT MAGNETIC FILM, AND PERPENDICULAR MAGNETIC RECORDING MEDIUM
05/14/2010WO2010052842A1 Information recording medium and method for producing same, and sputtering target
05/14/2010WO2010052184A2 Wear protection layer and method for the manufacture thereof
05/14/2010WO2010052000A1 Test glass changing system
05/14/2010WO2010033469A3 Dielectric material treatment saystem and method of operating
05/13/2010US20100120238 Semiconductor manufacturing apparatus and method
05/13/2010US20100120191 increase durability by including a carbonate in organic compound layer contains a phenanthroline compound; emit light with high luminance and high efficiency
05/13/2010US20100120145 Three-dimensional biocompatible skeleton structure containing nanoparticles
05/13/2010US20100119913 Metal separator for fuel cell and manufacturing method thereof
05/13/2010US20100119874 Laminated high moment film for head applications
05/13/2010US20100119843 Plasma resistant coatings for plasma chamber components
05/13/2010US20100119819 Coating
05/13/2010US20100119773 Coated Cemented Carbide Cutting Tools and Method for Pre-Treating and Coating to Produce Cemented Carbide Cutting Tools
05/13/2010US20100119735 Methods for depositing ultra thin coatings exhibiting low haze and methods for the preparation of such coatings
05/13/2010US20100117227 Method of preparing detectors for oxide bonding to readout integrated chips
05/13/2010US20100116788 Substrate temperature control by using liquid controlled multizone substrate support
05/13/2010US20100116654 Film coating apparatus
05/13/2010US20100116646 A sensing electrode for ph measurement chiefly in bodily fluids
05/13/2010US20100116645 Surface processing method and manufacturing method of recording medium
05/13/2010US20100116644 Device for carrying out a plasma-assisted process
05/13/2010US20100116643 Device for generating cold plasma in a vacuum chamber and use of said device for thermo-chemical processing
05/13/2010US20100116341 Copper-gallium allay sputtering target, method for fabricating the same and related applications
05/13/2010US20100116331 Photovoltaic device and process for producing same
05/12/2010EP2184743A1 Conductor layer manufacturing method
05/12/2010EP2184378A1 Evaporation source, process for producing optical member, and optical member
05/12/2010EP2183449A1 Vehicle handle and process for its coating
05/12/2010EP2183404A1 Piston ring
05/12/2010EP1996743B1 Use of magnesium-copper compositions for the evaporation of magnesium
05/12/2010DE102009021056A1 Verfahren und Vorrichtung zum Aufbringen oder Einbetten von Partikeln auf oder in eine durch Plasmabeschichtung aufgebrachte Schicht Method and apparatus for applying or embedding of particles on or in a coating applied by plasma coating layer
05/12/2010DE102008056125A1 Testglaswechselsystem zur selektiven Beschichtung und optischen Messung von Schichteigenschaften in einer Vakuumbeschichtungsanlage Test lens changing system for selectively coating and optical measurement of coating properties in a vacuum coating system
05/12/2010DE102008043634A1 Evaporator for evaporating organic materials in vacuum for the production of large-scale coating during the production of organic light diodes or organic solar cells and/or electronics, comprises thin-walled metallic evaporating container
05/12/2010DE102008021912B4 Beschichtungsverfahren und Vorrichtung zum Beschichten Coating methods and apparatus for coating
05/12/2010CN201466051U Solar cell masking band
05/12/2010CN201466048U Pipelined CdTe film solar cell preparing device
05/12/2010CN201464665U Large size microprism type reflection material mould
05/12/2010CN201459236U Transposition mechanism for multiple comparison strips
05/12/2010CN201459235U Integrally detachable observation window and baffle plate mechanism
05/12/2010CN201459234U Viewing window mechanism
05/12/2010CN201459233U Sputtering target material cooling device
05/12/2010CN201459232U Film making device using scanning to conduct steam plating
05/12/2010CN201459231U Evaporation source movable multifunctional film coating device
05/12/2010CN201459230U Baking electrode
05/12/2010CN201459229U Compensation baffle mechanism
05/12/2010CN201459228U Device for cleaning and protecting silver-layer sputtering mask of compact disc
05/12/2010CN1986872B Machine for treating substrates and method
05/12/2010CN1984855B Method for manufacturing target material for sputtering target
05/12/2010CN1944687B Strong laser induced periodical micro nano method and its device for material surface
05/12/2010CN1936071B Substrate carrier
05/12/2010CN1932072B Coating machine and method for operating a coating machine
05/12/2010CN1904653B Reflector member manufacturing method and reflector member manufactured by the method
05/12/2010CN1904133B Sputtering device and sputtering method
05/12/2010CN1891861B Process kit design for reducing particle generation
05/12/2010CN1891852B Sputtering equipment
05/12/2010CN1891663B Indium oxide-tin oxide powder and sputtering target using the same and method for producing the indium oxide-tin oxide powder
05/12/2010CN1882711B High purity hafnium, target and thin film composed of said high purity hafnium, and method for producing high purity hafnium
05/12/2010CN1800434B Method of controlling effusion cell of deposition system
05/12/2010CN1795288B Sealing lock for an spray plating line in for flate product
05/12/2010CN1794376B Inductance framework having sputtering film electrode and its production method
05/12/2010CN1676662B Two dimensional magnetron scanning for planar sputtering
05/12/2010CN1476379B Transparent laminate having low emissivity
05/12/2010CN101705474A Preparation method of iron nitride film with strong Hall effect
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